The present invention discloses a magnetron
sputtering coated glass and its preparation process, relating to the technical field of low-
emissivity glass. The magnetron
sputtering coated glass includes a glass substrate, and the following film
layers are sequentially stacked on the upper surface of the glass substrate from bottom to top: a first film layer of
silicon nitride layer, a second film layer of
titanium oxide layer, a third film layer of aluminum
zinc oxide layer, a fourth film layer of metallic silver layer, a fifth film layer of metallic
titanium layer, a sixth film layer of
titanium oxide layer, a seventh film layer of aluminum
zinc oxide layer, an eighth film layer of metallic silver layer, a ninth film layer of metallic titanium layer, a tenth film layer of
titanium oxide layer, an eleventh film layer of aluminum
zinc oxide layer, a twelfth film layer of metallic silver layer, a thirteenth film layer of metallic titanium layer, a fourteenth film layer of
titanium oxide layer, a fifteenth film layer of zinc oxide
silicon layer, and a sixteenth film layer of
silicon nitride. By using magnetron
sputtering deposition to set multiple
dielectric films, interface films and
metal films on the surface of the
glass matrix, the present invention forms a low-
emissivity film
system, realizing the transmission of visible light and the reflection of
infrared light by the coated glass.