The application belongs to the technical field of
semiconductor photocatalyst preparation, and particularly relates to application of a
polymer microsphere with optical
whispering gallery mode
resonance characteristics in preparation of a photocatalyst, wherein the
polymer microsphere with optical
whispering gallery mode
resonance characteristics is used as a carrier for the first time, and
semiconductor nanoparticles are loaded on the surface of the
polymer microsphere for preparation of the photocatalyst; the optical
whispering gallery mode
resonance characteristics of the surface of the polymer microsphere are used to confine photons in the polymer microsphere for a long time through continuous
total internal reflection, to enhance the interaction between light and the
semiconductor nanoparticles in a full spectrum, and to form an evanescent field on the surface of the polymer microsphere, so that the
semiconductor nanoparticles are loaded on the surface of the polymer microsphere, the enhanced
light field can be fully utilized, the purpose of enhancing the photocatalytic effect of the
semiconductor nanoparticles is achieved, the photocatalytic
system is compatible with different semiconductor catalytic systems, has high universality, and provides a new idea for improving the light capture efficiency of the photocatalytic
system.