The invention discloses a laser direct writing micro-nano structure system based on single-wavelength double beams. The system comprises a pulse laser device 1, a first high-speed optical switch 2, afirst 4f lens group 3, a first spatial filtering small hole 4, a polarization beam splitter 5, a continuous laser device 6, a second high-speed optical switch 7, a second 4f lens group 8, a second spatial filtering small hole 9, a spiral phase plate 10, a quarter-wave slide 11, a first reflector 12, a first semi-reflective semi-transparent mirror 13, an objective lens 14 and a to-be-photoetched sample 15. The system is advantaged in that two beams of laser with the same wavelength are selected as an excitation light source and a suppression light source respectively, high transient light intensity of the exciting light is utilized to ensure that nonlinear absorption of the material is used for initiating photopolymerization reaction, micro-nano structure processing is realized, the phase modulation technology is combined to adjust an inhibiting light focus into a hollow shape, so polymerization reaction is further localized in the central area of the exciting light, and a purpose of compressing the polymerization size is achieved.