Z-scan optical nonlinear measuring device and method

A technology of optical nonlinearity and measurement device, which is applied in the field of nonlinear optics and can solve problems such as optical nonlinearity measurement of semi-transparent or opaque samples, and non-negligible sample reflected light information, etc.

Active Publication Date: 2013-02-20
NANJING INST OF ADVANCED LASER TECH
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Problems solved by technology

[0004] However, the existing Z-scan method is not suitable for the optical nonlinear measurement of translucent or opaque samples, especially for semiconductor thin films with strong linear absorption, the spatial distribution of reflected light on the surface will change due

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  • Z-scan optical nonlinear measuring device and method
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  • Z-scan optical nonlinear measuring device and method

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Embodiment Construction

[0054] The present invention will be further described below in conjunction with embodiment and accompanying drawing, but should not limit protection scope of the present invention with this:

[0055] Please see first figure 1 , figure 1 It is an optical path structure diagram of a Z-scan optical nonlinear measuring device and a measuring method of the present invention. As can be seen from the figure, the Z-scan optical nonlinear measurement device of the present invention includes an output wavelength of λ 1 The first laser and wavelength λ 2 The second laser, light source parameter adjustment part, optical isolation part, polarization state adjustment part, reflection measurement and transmission measurement, etc. Distributed along the main optical axis formed by the main optical path of the first laser 2 output laser light (from left to right): the first filter aperture 3, the λ / 2 wave plate 4, the first beam splitter 5, the working wavelength lambda 1 Optical isolato...

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Abstract

The invention relates to a Z-scan optical nonlinear measuring device and method. The device and the method can be used for measuring the wavelengths of two lasers, wherein light sources can be continuous light or pulsed light, the pulse width and the repetition frequency are adjustable, and the incident laser power is continuously adjustable from 0 to 100%. According to the device, an optical isolator can be used for effectively eliminating the influence of surface reflection of an optical element and a to-be-measured sample to a laser so as to ensure that a measuring result is accurate and reliable; a lambda/4 wave plate is rotated to measure nonlinear optical parameters of the sample under the action of lasers in linear polarization, circular polarization and elliptical polarization states; light paths are adjusted to change the relative intensity of the two beams of light so as to implement two-tone time-resolved nonlinear absorption and refraction measurement; and the polarization states of pump light and probe light can be adjusted to measure the time response characteristics of the sample under the action of the lasers in the different polarization states. The device and the method can be used for measuring data of transmission openings, transmission closed holes and reflection openings simultaneously, thus being suitable for measurement of transparent samples and semitransparent samples.

Description

technical field [0001] The invention relates to nonlinear optics, in particular to a Z-scan optical nonlinear measurement device and method for measuring the nonlinear absorption coefficient and nonlinear refractive index of transparent samples and translucent samples. Background technique [0002] The third-order optical nonlinearity of the material makes the refractive index and absorption coefficient proportional to the light intensity. Using this nonlinear effect, real-time dynamic all-optical switches, optical transistors, optical limiters and optical bistable devices can be prepared and applied to optical Super resolution. Using the nonlinear effect of materials, the measurement of nonlinear optical parameters is very critical. Traditional methods for measuring optical nonlinearity include nonlinear interference, degenerate four-wave mixing, near-degenerate three-wave mixing, ellipsometry and beam distortion measurement. The first four methods have high measurement s...

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Application Information

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IPC IPC(8): G01N21/17G01N21/41
Inventor 蔡晓林魏劲松
Owner NANJING INST OF ADVANCED LASER TECH
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