3results about How to "Short wavelength" patented technology

The invention discloses a near-infrared light mediated heterogeneous composite photocatalyst as well as a preparation method and application thereof, the heterogeneous composite photocatalyst is an up-conversion luminescent material loaded semiconductor material, and can realize up-conversion luminescent catalysis under the irradiation of 980nm near-infrared light; the up-conversion luminescent material is rare earth ion doped fluoride nanoparticles, fluoride is one or two of yttrium fluoride and sodium yttrium tetrafluoride, the doped rare earth ions comprise rare earth luminescent center ions and light absorption ions, the luminescent center ions comprise one of Er < 3 + >, Tm < 3 + >, Tb < 3 + > and Pr < 3 + >, and the light absorption ions comprise Yb < 3 + >; the semiconductor material is of a heterojunction structure which is tightly formed by Co3O4 quantum dots and g-C3N4 nanosheets. The up-conversion nanoparticles are synthesized by adopting a simple hydrothermal method and are loaded on the g-CN nanosheets modified by the CoO quantum dots, and the obtained composite material can effectively convert near-infrared light into visible green light, so that generation of photocatalytic reaction species is increased, and the up-conversion nanoparticles are recycled and reused for multiple times without inactivation.

This invention discloses a method for enhancing and controlling the radiation of an LPP-EUV light source based on dual-pulse spatiotemporal co-constraint, belonging to the field of semiconductor manufacturing technology. This invention obtains a spatiotemporal reference by real-time monitoring of a liquid metal droplet, uses a pre-pulse laser to induce target material deformation into a fogged target cloud, and combines high-speed imaging and a hydrodynamic model to predict the time and coordinates of the target cloud's energy absorption peak. It dynamically adjusts the delay time and optical axis direction of the main pulse laser to achieve dual-pulse spatiotemporal co-constraint, and constructs a closed-loop control system through a recursive least squares algorithm with a dynamic forgetting factor. This invention effectively improves the extreme ultraviolet light conversion efficiency, controls the power fluctuation of the light source within ±0.5%, and extends the maintenance cycle of optical components by 2 times. It can be widely applied to next-generation high-power extreme ultraviolet lithography light source systems, meeting the application requirements of semiconductor miniaturization processes.

This invention relates to the field of metal environment imaging, and more particularly to an environmental imaging method and apparatus based on millimeter-wave radar. The method includes the following steps: transmitting multi-frequency signals to the metal environment to be detected using a millimeter-wave radar array, and extracting multipath signal sequences; performing interferometric phase analysis based on the multipath signal sequences to obtain the three-dimensional coordinates of the metal and the actual target reflection point; performing iterative forward calculation based on the three-dimensional coordinates of the metal and the actual target reflection point to obtain a first metal environment image; and performing iterative residual convergence on the first metal environment image to output a second metal environment image. This invention achieves high-precision and reliable three-dimensional imaging of complex metal environments.