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543 results about "Laser damage" patented technology

Anti-LSS-aircraft defensive system

InactiveCN106288964AHandlingWith auxiliary decision-makingDefence devicesCommand and controlModular design
The invention discloses an anti-LSS-aircraft defensive system which comprises a command and control system, a target detection device, a laser damage device, a radio interference device, a catching net launch unmanned aerial vehicle and a net gun. The command and control system is in communication connection with the target detection device, the laser damage device, the radio interference device, the catching net launch unmanned aerial vehicle and the net gun. According to the anti-LSS-aircraft defensive system, signals can be processed to generate intelligence, and then situation awareness display is conducted for providing aid decision making; the laser damage device, the radio interference device, the catching net launch unmanned aerial vehicle and the net gun and other firing units are commanded and controlled to operate through the command and control system, the multi-batch multi-target processing capacity is achieved, and a modular design concept is adopted for the command and control system, so that compatibility of multiple detection means and processing means is achieved; and the utilization rate of weapons can be increased, the effectiveness of the processing means and the environmental suitability of the system can be improved, and diversification demands of anti-LSS-aircraft tactical application can be met.
Owner:THE FIRST RES INST OF MIN OF PUBLIC SECURITY +1

Device and method for measuring laser irradiation optical thin film damage threshold in high-temperature environment

The invention relates to a device and a method for measuring a laser irradiation optical thin film damage threshold in a high-temperature environment. The measuring device comprises a first laser, a second laser for collimating a light path and assisting detection damage, a temperature control box for heating a sample and realizing temperature control, a high temperature resistance movable platform located in the temperature control box, and a test sample on the high temperature resistance movable platform. Different temperatures and holing time are set through the temperature control box, so that an instant damage threshold and damage durability of the thin film are evaluated. The measuring device has the advantages that: 1, the problem that in the prior art, only the laser irradiation optical thin film damage threshold in a normal temperature condition is solved, and the device capable of measuring the laser irradiation optical thin film damage threshold in the high-temperature environment is provided; and 2, the device has the measuring method being simple and easy to realize, and can be used for measuring the instant damage threshold of the laser irradiation optical thin film in the high-temperature environment, measuring the damage threshold of samples with different insulation time, and evaluating the durability of laser damage in the high-temperature environment of the thin film.
Owner:CHINA UNIV OF MINING & TECH

Laser damage resistance testing system

The invention provides a laser damage resistance testing system which comprises a pulse laser, a first light barrier, a first polaroid, a first half wave plate, a first electronic control rotating table, a second light barrier, a second polaroid, an indicating light source, an electronic control zoom system, a first 45-degree partial reflecting mirror, a CCD facula analysis meter, a second 45-degree partial reflecting mirror, an energy meter, a photoelectric detector, a sample room, a monitoring camera, a third light barrier and a control system. Lasers are focused in the sample room, focused faculae can be adjusted continually through the control system, damage strength is formed, video real-time monitoring is available in the sample room so that a tester can monitor a threshold value point when a sample is damaged, the size of the faculae at the position of the sample is monitored in real time by the CCD facula analysis meter, a three-dimensional strength distribution diagram of the faculae is given, pulse energy is monitored in real time by the energy meter, the pulse width of the lasers is detected by the photoelectric detector in real time, real-time peak value power density is provided after detection data are processed through software, and the damage threshold value of the sample is detected accurately.
Owner:11TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP

Preparation method for tantalum oxide film with high laser damage threshold under high-temperature environment

InactiveCN102605333AImprove the characteristics of easy moisture absorptionImprove stabilityVacuum evaporation coatingSputtering coatingCombined methodRoom temperature
The invention relates to a preparation method for a tantalum oxide film with a high laser damage threshold under a high-temperature environment and belongs to the preparation method for an optical film. The preparation method comprises the following steps: plating a tantalum oxide film on a clean substrate according to a double ion beam sputtering method; performing post-processing on a prepared film in laser pre-processing and annealing manner, thereby achieving better functions of repairing film defect and relieving film stress; and preparing a laser film capable of being applied to high-temperature environment. The preparation method provided by the invention has the advantages that: 1) the film prepared according to the double ion beam sputtering method is compact, the characteristic of easiness in moisture absorption of a loosened film prepared according to an electronic beam preparation method is improved, and the stability is better; 2) the laser pre-processing and annealing combined method is adopted, thereby overcoming the limitation caused by traditionally adopting a single method, and being beneficial to greatly increasing the threshold; and 3) the film prepared according to the method can be used under a high-temperature environment with the highest temperature at 350 DEG C, and the problem of the prior art that only the laser film used under room temperature can be prepared is solved.
Owner:CHINA UNIV OF MINING & TECH

Method for realizing lossless evaluation for damage performance of optical element

InactiveCN107063641AAchieve non-destructive evaluationFluorescence/phosphorescenceTesting optical propertiesTest sampleFluorescence
The invention discloses a method for realizing lossless evaluation for damage performance of an optical element. A continuous laser device can transmit continuous laser. After a first energy regulator, a first lens, a reflector and the front surface of a sample, the continuous laser is irradiated to the back surface of the sample. The reflecting direction of the continuous laser after reflection by the sample is provided with a residual laser collector. The pulse laser can transmit pulse laser. After a second energy regulator, a beam compressing system, a split board and a second lens, the pulse laser is irradiated to the back surface of the sample. According to the method of the invention, multiple-sample and multiple-position testing is performed on the elements which are same with a to-be-tested optical element for obtaining a correlation relation between fluorescent defect data and a laser damage threshold and a damage density in the optical elements of this kind, thereby calculating the damage threshold and the damage density in measurement of the to-be-tested sample through measuring the fluorescent defect data. According to the method of the invention, a damage performance level of the optical element can be obtained through lossless testing for the fluorescent defect of the optical element, thereby realizing lossless evaluation to the damage performance of the optical element.
Owner:LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS

Preparation method for waterproof laser film

The invention relates to a preparation method for a waterproof laser film. According to the requirement in practical application of normal incidence 800nm pumping transmission and back incidence 1064nm fundamental frequency light reflection, an HfO2 and SiO2 film is prepared by a vacuum electron beam evaporation sedimentation technology and is taken as the film which has a large electric filed and is easy to damage due to being close to a base plate when being used as the back incidence, so as to obtain higher laser damage resistance threshold; aiming at the working condition of a water cooling system, for the films close to the water side and easy to be permeated and corroded, Ta2O5 and SiO2 films are prepared by an ion beam auxiliary sedimentation technology, so that the microstructure of the film is improved, higher stacking density is obtained, and good waterproof performance is realized; HfO2, Ta2O5 and SiO2 of high or low refractive index are deposited alternately so as to form a multi-layer film, and the optical thickness of each layer is controlled so as to obtain the needed spectral characteristic. The preparation method can well take advantages of the three characteristics and can apply the characteristics to a neodymium glass substrate of a diode pumping solid laser system, so that the diode pumping solid laser system can work in a water cooing system normally, and has good laser damage resistance performance and the spectral characteristic needed by the system.
Owner:润坤(上海)光学科技有限公司

Automatic testing device and testing method for laser damage threshold value

The invention discloses an automatic testing device and an automatic testing method for a laser damage threshold value. The automatic testing device comprises a laser, a light splitting attenuation system, a focusing system, an energy acquisition system, a beam acquisition system and a processing system, wherein the light splitting attenuation system comprises a high reflective mirror, a high transmitting mirror, a linkage mechanism and a splay compensation high transmitting mirror; and the high reflective mirror and the high transmitting mirror are transposed under the action of the linkage mechanism, and in the transposition process, the front mirror surfaces of the high reflective mirror and the high transmitting mirror are positioned on the same plane. The testing method comprises the following steps of: a) calculating damage energy on the unit area of a laser beam; b) dotting a lens to be tested to form a plurality of test dots by using the laser beam, and observing the damage condition of the surface of the lens to be tested by using the beam acquisition system; and c) regulating the energy of the laser beam, and repeating the steps a and b until the damage threshold value is measured. The structure and the testing method provided by the invention are low in test errors and high in applicability and accuracy.
Owner:BEIJING GK LASER TECH

Front cutting technology of light emitting diode

The invention provides a front cutting technology of a light emitting diode. The technology comprises the steps of 1) forming a light emitting epitaxy structure at least comprising N-type layers, quantum well layers and P-type layers on the surface of a semiconductor substrate, 2) defining a plurality of light emitting units and etching a plurality of passages up to the semiconductor substrate among the light emitting units, 3) forming N electrode preparation areas in the light emitting units, 4), forming transparent conductive layers on the surfaces of the P-type layers of the light emitting units, preparing P electrodes on the surfaces of the transparent conductive layers and preparing N electrodes in the N electrode preparation areas, 5) performing laser front cutting technologies on the passages and forming a plurality of cutting marks corresponding to the light emitting units in the semiconductor substrate, and 6) splitting according to the cutting marks. The invention provides a laser front cutting method of the light emitting diode. The method can effectively avoid laser damage to the light emitting diode; the brightness and the yield of the light emitting diode are improved and increased; and the method is simple in technology and is suitable for technology production.
Owner:EPILIGHT TECH

Method for prolonging service life of semiconductor laser device

The invention belongs to the technical field of an optoelectronics technology of a semiconductor and relates to a method for prolonging the service life of a semiconductor laser device, namely an integrated technology of plasma technology, passivation technology, ion auxiliary technology and optical film technology. The method comprises a semiconductor laser device bar 1, a semiconductor laser device bar 2 processed by the plasma technology, a passivation film 3, a front cavity surface film 4 and a rear cavity surface film 5. The method comprises the following steps of: orderly stacking the sorted semiconductor laser device bar 1 on a special bar clamp; putting into a vacuum coating machine; and extracting vacuum. When a pre-set vacuum degree is realized, the plasma technology is firstly adopted to carry out cavity surface washing to wash cavity surface oxides and an unstable surface state to form the semiconductor laser device bar 2 processed by the plasma technology; then the passivation technology is adopted to deposit one layer of the passivation film 3 on the cavity surface to inhibit the cavity surface from being oxidized; and finally, the ion auxiliary technology and the optical film technology are adopted to prepare the front cavity surface film 4 and the rear cavity surface film 5, which have high-laser damage threshold values, so as to improve a cavity surface damage threshold value of the semiconductor laser device. With the adoption of the method disclosed by the invention, the service life of the semiconductor laser device can be effectively prolonged.
Owner:CHANGCHUN UNIV OF SCI & TECH

Polarized Airy liquid crystal formwork, preparation method and generating system

The invention discloses a polarized Airy liquid crystal formwork, a preparation method and a generating system. The polarized Airy liquid crystal formwork comprises a first substrate, a second substrate and a liquid crystal layer located between the first substrate and the second substrate, wherein the first substrate and the second substrate are oppositely arranged. Interval particles are arranged between the first substrate and the second substrate so as to support the liquid crystal layer. Light-controlled orientation films are arranged on the sides of the first substrate and the second substrate adjacent to the liquid crystal layer and are provided with cubic phase control graphs with molecular director directions in periodic gradual change distribution, the widths in each period of the cubic phase control graphs are gradually reduced from the center areas of the control graphs to two sides, the control graphs of the light-controlled orientation films control liquid crystal molecular directors in the liquid crystal layer to be in periodic 0-180-degree gradual change distribution, so that incident light shining the polarized Airy liquid crystal formwork is converted into Airy light beams, and the laser-damaged threshold of the polarized Airy liquid crystal formwork and the stability of the polarized Airy liquid crystal formwork in the presence of hard light are improved.
Owner:NANJING UNIV

Method for repairing laser damage of fused quartz without thermal residual stress

ActiveCN105948519AControlling High Temperature Structural RelaxationThermal Residual Stress SuppressionRepair timeOptoelectronics
The invention provides a method for repairing laser damage of fused quartz without thermal residual stress. According to the method, rectangular laser pulses with high-peak power are acquired by intercepting peak segments of pulses output from a laser device; the rectangular laser pulses with high-peak power are focused, and single laser pulses with super-high-peak power density are acquired; the single laser pulses are used for peeling a material at a single point of a damaged part on a fused quartz substrate through transient gasification; the interval of the single laser pulses is controlled, so that the substrate is cooled sufficiently; gasification peeling is performed repeatedly through the single laser pulses until the material at the whole damaged part is removed. With the adoption of the method, high-temperature structural relaxation of the fused quartz substrate is effectively controlled, the damage of the fused quartz is repaired without thermal residual stress, the anti-damage capacity of damage points of a fused quartz optical element is improved, surface damage and development of surface damage of the fused quartz optical element are inhibited, the service life of the fused quartz optical element is prolonged, and the method has the advantages of short repair time, simple and efficient process, good process stability, high controllability and high repeatability.
Owner:LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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