Film coating method for improving optical thin-film laser injure threshold

A laser damage threshold and optical thin film technology, applied in sputtering coating, vacuum evaporation coating, ion implantation coating, etc., can solve problems such as time-consuming, low processing efficiency, and film damage, and avoid low scanning efficiency , High processing efficiency, reduce the effect of weak absorption

Inactive Publication Date: 2005-05-11
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method is still controversial, and the results obtained by different research institutions are not exactly the same, especially for small spot scanning laser pretreatment. If the laser energy is not selected properly, the pretreatment itself may cause damage to the film.
Due to the continuous scanning line by line, it takes a lot of time to process a sample, and the processing efficiency is very low

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Using K9 glass as the substrate, first put it into petroleum ether solution and ultrasonically clean it for 5 minutes, take it out and blow it dry with high-purity nitrogen, and then put it on the fixture in the coating chamber; deposit ZrO by electron beam thermal evaporation 2 Thin film, the equipment is ZZSX-800F vacuum coating machine. Zirconia bulk in thin film deposition. The substrate was kept at a temperature of 300°C for 2 hours. The background vacuum is 3.5×10 -3 Pa, evaporation vacuum 5.0×10 -3 Pa, the gas type is oxygen. During deposition, the electron beam current is 110mA, and the film thickness is 450nm.

[0020] The ion source is the new End-Hall 1000 Hall source. The ions emitted by the ion source not only have the common characteristics of low energy, high beam current and wide beam of ordinary Hall sources, but also have the characteristics of no grid and no filament, which can Avoid tungsten contamination from filament sublimation during ion pro...

Embodiment 2

[0023] Using K9 glass as the substrate, first put it into petroleum ether solution and ultrasonically clean it for 5 minutes, take it out and blow it dry with high-purity nitrogen, and then put it on the fixture in the coating chamber; use electron beam thermal evaporation to deposit HfO 2 Thin film, the equipment is ZZSX-800F vacuum coating machine. Hafnium oxide was used as bulk material in thin film deposition. The substrate was kept at 300°C for 2 hours. The background vacuum is 3.5×10 -3 Pa, evaporation vacuum 5.0×10 -3 Pa, the gas type is oxygen. During deposition, the electron beam current is 110mA, and the film thickness is 500nm.

[0024] The ion source is the new End-Hall 1000 Hall source. The ions emitted by this ion source not only have the common characteristics of low energy, high beam current and wide beam of ordinary Hall sources, but also have the characteristics of no grid and no filament, so that Avoid tungsten contamination from filament sublimation du...

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Abstract

The invention was involved in one coated method of improving laser damage threshold of optical thin-film. The process consist of the following steps: a) The substrate was put into petroleum benzin or de-ionized water for ultrasonic cleaning. b) The substrate was evaporated to dryness under highly pure nitrogen stream after cleaning was over. c) The substrate was coated in the vacuum chamber. d) After treatment of the deposited thin-film was done by using plasma (oxygen). The method could improve the laser damage threshold of optical thin-film obviously and was found to be effective, rapid, simple and cheap.

Description

technical field [0001] The invention relates to an optical thin film, in particular to a coating method for improving the laser damage threshold of the optical thin film. technical background [0002] With the development of laser technology, the requirements for laser damage threshold of thin-film components in laser systems are getting higher and higher. The laser damage of thin films has become one of the main bottlenecks restricting the development of lasers in the direction of high power and high energy. A large number of experiments now show that the laser damage of thin films is closely related to the micro-defects of thin films. Micro-defects are the source of laser damage to thin films, and laser damage generally occurs and develops from defect points. In general, the lower the defect density of a film, the higher the laser damage threshold of the film. How to reduce the microdefects of thin films is one of the most concerned issues in the research of strong laser...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/58
Inventor 张东平范正修邵建达张大伟范树海齐红基赵元安
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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