High-reflection film for 10 kW semiconductor laser and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- DONGGUAN UNIV OF TECH
- Publication Date
- 2019-11-12
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of optical reflection films, in particular to a high reflection film for a 10 kW semiconductor laser and a preparation method thereof. Background technique
[0002] Due to its good coherence, monochromaticity, high brightness and directivity, lasers are widely used in precision measuring instruments, photoelectric pod systems, low-light night vision systems, communications and information transmission, military, national defense and other fields. Optical components are used as One of the key foundations of laser technology has an irreplaceable position in the laser system, and it is also the most vulnerable to laser damage, so the ability of optical components to resist laser damage directly determines the effective output power of the laser in the entire laser system. Low; therefore, with the continuous improvement of laser output power and energy, higher and higher requirements are put forward for the refl...