244 results about "Thin-film optics" patented technology

The present invention is directed to the use of a plurality of OLED displays and a diffuser to form a display backlight. Such a backlight can be used as an AMLCD backlight. The OLED displays can support NVIS compatibility by reducing current provided to red sub-pixels, and by limiting transmission of light beyond 630 nm, possibly by material selection or filtering using thin film optical coatings.

An optical thin film can have a refractive index variation along a dimension that is perpendicular to its thickness. Two areas that have equal physical thicknesses can have different optical thicknesses. Including the thin film as a layer in a thin film optical filter can provide a corresponding variation in the filter's spectral properties. Dosing an optical thin film with ultraviolet light can cause the refractive index variation. Subjecting the film to hydrogen can increase the refractive index's response to the dose of light. Dosing a region of a thin film optical filter with ultraviolet light can change the spectral properties of the region, for example shifting an out-of-specification optical filter into specification thereby increasing manufacturing yield. An agent can promote the film's response to the dose.

A method and apparatus is provided for printing using paste like inks such as those used in intaglio printing, wherein the inks include specialty flakes such as thin film optically variable flakes, or diffractive flakes. The invention discloses an apparatus having an energy source such as a heat source for temporarily lessening the viscosity of the ink during alignment of the flakes within the ink.

The present invention provides a compound represented by formula (1) defined in the specification and a liquid crystal composition comprising the compound. The invention further provides a polymer obtained by polymerization of compound or composition above, and further the present invention provides a film, an optical anisotropic material, A ¼ or ½ wavelength functional plate, an optical compensation element, an optical element and a liquid crystal display element employing the polymer.

An optical device including: a substrate with a top surface and a bottom surface and a hole extending through the substrate from the top surface to the bottom surface; and a multilayered thin film structure fabricated on the substrate and forming a membrane over the hole, the multilayered thin film structure including a thermally tunable thin film optical filter structure at least a portion of which is positioned over the hole.

The invention relates to the field of optical thin film spectrum test, and in particular relates to a method for accurately calibrating the optical constant of the visible light waveband of an optical thin film. Particularly, the invention provides an optical coefficient measurement method of the visible light waveband of the thin film, and particularly relates to a method for accurately calibrating the optical constant of the visible light waveband of silicon dioxide thin film material; the method is simple and convenient, and is capable of unifying the physical meaning and mathematical meaning of the constant test of the optical thin film. The method has wide application value in the aspect of accurately calibrating the optical constant of the thin film. Particularly, the invention relates to the accurate calibration of the optical constant of the thin film material; on the basis of elliptic polarization spectrum inversion optical constant, the consequences of physical models of the thin film can be arranged by an orthogonal method, the sequence of the application of the physical models of the thin film can be obtained by mathematical statistics, and finally the physical meaning and mathematical meaning of the final given optical constant calculated result are unified.

The invention relates to a coating method capable of improving a laser induced damage threshold of a high-reflectivity film and belongs to the field of film optics. The coating method mainly aims at two key factors of absorption and defects influencing a laser induced damage threshold of a high-reflectivity laser film, and after electron beam evaporation coating of each film layer is finished, utilizes high-energy ion beams to bombard the film layer. The coating method retains unique and beneficial performances of a laser film coated by electron beam thermal evaporation, improves intrinsic absorption and defect density of a film, greatly improves a laser induced damage threshold of a high-reflectivity film, and has the characteristics of strong pertinence, high coating quality, simpleness and good feasibility.

A method for manufacturing a cellulose ester film comprising the steps of 1) mixing a cellulose ester exhibiting a water content of not greater than 3.0 weight %, at least one plasticizer selected from the groups A and B in an amount of one to thirty weight % of the cellulose ester, and at least one additive selected from the groups of C and D in an amount of 0.01 to 5 weight % of the cellulose ester to obtain a mixture, group A: ester plasticizers formed from a polyhydric alcohol and a monohydric carboxylic acid; group B: ester plasicizers formed from a polyhydlic carboxylic acid and a monohydric alcohol; group C: hindered phenol anti-oxidants; group D: hindered amine light stabilizers, 2) heating to melt the mixture at a temperature (Tm) of between 150 and 300° C., and 3) forming a cellulose ester film with a melt casting method employing the melted mixture.

The invention discloses a method for determining the surface roughness, an optical constant and the thickness of an optical thin film simultaneously. The method includes adopting a spectrophotometer to measure spectroscopic data of the optical thin film, creating an accurate thin film structure model capable of reflecting thin film physics according to the actually measured spectroscopic data of the thin film, inverting the actually measured spectroscopic data of the thin film according to the accurate thin film structure model, and determining the surface roughness, the optical constant and the thickness of the thin film simultaneously through multi-parameter fitting. The method has the advantages that the optical constant and the thickness of the thin film can be acquired accurately, the surface toughness of the thin film can be determined precisely, and the method is particularly applicable to parameter determination of vacuum ultraviolet/deep ultraviolet thin films.

The invention discloses a measurement device and a measurement method of optical parameters of a dielectric film. The measurement device comprises a sample platform assembly for placing a sample, a refractive index and thickness measurement assembly, a transmissivity and refractive index measurement assembly and a controller, wherein the refractive index and thickness measurement assembly is formed by a laser light source assembly, a polarizer, a semi-permeability and semi-reflection mirror, a circular hole diaphragm, an automatic-collimation detector and a measurement detector; and the transmissivity and refractive index measurement assembly is formed by a white-light light source, a collimation lens set which is connected with the white-light light source and is used for a collimation light path, an integrating sphere which is used for collecting light transmitted or reflected by the sample placed on the sample platform assembly, and a spectrograph connected with the integrating sphere. The measurement device disclosed by the invention has the advantages that the refractive index and thickness measurement assembly can measure the reflective index and the thickness of the sample, and the transmissivity and refractive index measurement assembly can measure the transmissivity and the refractive index of the sample, so that the measurement of various optical parameters is realized and the measurement precision is high.

A dielectric multi layer thin film type band-pass filter provided with the function of transmitting a predetermined wavelength band, the function of reflecting a predetermined wavelength band or both functions, where a film structure of the dielectric multi layer thin film optical filter is configured of, with respect to the center wavelength λ as a reference of the optical film thickness, (1) mirror layers each comprised of alternately layered layers (H) of high refractive index material and layers (L) of low refractive index material each with an optical film thickness of λ/4, and (2) spacer layers each of which is configured in a combination of a layer (nH: n is an integer) of high refractive index material and a layer (nL: n is an integer) of low refractive index material each with an optical film thickness of λ/4 and has a total optical film thickness of an integral multiple of λ/2.

An optical measurement system for evaluating a reference sample, having at least a partially known composition, includes a reference ellipsometer and at least one non-contact optical measurement device. The ellipsometer includes a light generator, an analyzer, and a detector. The light generator generates a beam of quasi-monochromatic light of known wavelength and polarization, which is directed at a non-normal angle of incidence relative to the reference sample. The analyzer creates interference between S and P polarized components in the beam after interaction with the sample. The detector then measures the intensity of the beam, which a processor uses to determine the polarization state of the beam and, subsequently, an optical property of the reference sample. The processor then can calibrate an optical measurement device by comparing a measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

Provided is an optically anisotropic sheet that gives a thin optically anisotropic film that can be transferred to a display device. The optically anisotropic sheet includes a substrate, a liquid crystal cured film, and a sticky adhesive layer in this order. The liquid crystal cured film is a film that has a thickness of 5 μm or less and is cured with a polymerizable liquid crystal compound aligned. The sticking force (El) between the liquid crystal cured film and the sticky adhesive layer is greater than the substrate sticking force (F4).

The invention is specially directed towards intermittent motion packaging machines where the packages are momentarily immobilized at a forming station for the time duration of the package sealing and cutting. The polymeric sheets or films are sealed and cut after being exposed to a laser beam in a controlled and optimized manner. The laser beam is shaped with appropriate optical elements to provide a desired intensity profile in the section of the films to be sealed or sealed and cut. With this method, a package can be sealed and cut simultaneously in one exposure step. An optical clamp holds the films together while they are being sealed by the laser. The optical clamp can reflect back to the films, partially or totally, the laser beam intensity that has not been previously absorbed. The optical clamp further allows to monitor the sealing and cutting process while the process is being performed.

The present invention provides an optimal design method of subwavelength metal polarization beam splitting grating, which can effectively settles the parameter confirming problem of subwavelength metal polarization beam splitting grating. Firstly the splitter period lambada is confirmed according to the period condition of subwavelength beam splitting grating. Then the variation relationship of effective refractive index and duty cycle of grating of TE polarization and TM polarization are confirmed with an effective medium theory, and the duty cycle f of grating is confirmed according to the required effective refractive index. Finally, the groove depth h of grating is confirmed according to the 1/4 wavelength matching principle of film optical anti-reflection. The optimal design method of subwavelength metal polarization beam splitting grating provided by the invention settles the problem for optimizing multi-grating parameter combination in designing, and increases the scientificity, reliability and timeliness of designing.

This invention relates to one method to measure coating glass film optical parameters, which comprises the following steps: establishing film thickness h, reflection rate n, dissipation parameter k and film transparency rate and reflection rate function relationship; forming curve matching by real coat film glass visible transparency and reflection spectrum; solving the curve matching problem by analogue annealing and Newton iteration method to get the measurement results of film optical parameters.

The invention belongs to the technical field of optical thin film optical constant measurement, and particularly relates to a method for measuring optical constants of a Gel-xCx thin film infrared spectroscopy area. The method for measuring the optical constants of the Gel-xCx thin film infrared spectroscopy area comprises the following steps: measuring a thin film infrared transmitted spectrum so as to confirm the position of an absorption peak, establishing a thin film optical constant physical model according to the position of the absorption peak, and calculating by using an infrared transmitted spectrum and elliptical polarization spectrum combined composite target retrieval method to obtain optical constants such as the refractive index, the extinction coefficient and the physical thickness of a Gel-xCx thin film. Specifically, according to the scheme, the accurate position and the absorption magnitude of the absorption peak are confirmed according to the transmitted spectrum of a single-layer infrared thin film, on the basis, and regression calculation on an ellipsometry spectrum is performed, so that the optical constants of the thin film are obtained. The method has the advantages that the long optical constants of the thin film, particularly the optical constants of infrared thin films with absorption peaks, can be accurately obtained.

Disclosed is a substrate film for an optical sheet, an optical sheet and a backlight unit capable of markedly enhancing utilization efficiency of rays of light and improving luminance. The substrate film for an optical sheet is made of a transparent resin and is formed into a rectangular shape, which substrate film for the optical sheet has an optical anisotropy, and having an absolute value of the angle of the crystal orientation with respect to the short side orientation being π/16 or greater and 3π/16 or less. The crystal orientation preferably follows the phase advancing axial orientation. The substrate film for the optical sheet has a retardation value such that average intensity of transmitted beam I_A becomes equal to or greater than 0.75 so as to be capable of converting polarization orientation of outgoing rays of light of the optical waveguide plate or the like to the transmission axial orientation of the polarizing plate or the like. The retardation value is preferably 140 nm or greater and 390 nm or less. The transparent resin is preferably polyethylene terephthalate or polycarbonate. The optical sheet has the substrate film for the optical sheet, and an optical layer.

An oblique angle deposition is used to provide an A-plate optical retarder having at least one dense, form-birefringent layer. According to one embodiment, the dense, form-birefringent layer(s) are deposited as part of an FBAR stack to provide an all-dielectric full-function A/−C-plate trim retarder for LCD birefringence compensation. Advantageously, the dense structure of the full-function A/−C-plate trim retarder offers high durability and/or stability, thus making it well suited for providing polarization compensation in high light flux polarization-based projection systems.

There is provided a liquid crystal panel and a liquid crystal display apparatus each allowing excellent viewing angle compensation and having excellent contrast and small color shift in an oblique direction. The liquid crystal panel of the present invention includes: a first polarizer; a first cellulose-based film; an optical compensation layer having an Nz coefficient represented by an equation (1) of 2≦Nz≦20; a liquid crystal cell; a second cellulose-based film; and a second polarizer in the order given from a backlight side to a viewer side, in which: the first cellulose-based film has a thickness direction retardation (Rth) represented by an equation (2) of 10 nm or less; and the second cellulose-based film has a thickness direction retardation (Rth) represented by the equation (2) of 10 nm or less.

Nz=(nx−nz)/(nx−ny)  (1)

Rth=(nx−nz)×d  (2)

The invention discloses a method for processing an electron transmission layer in a perovskite solar cell via ultraviolet laser. A hard ITO/FTO substrateor a flexible PI/PEN substrate can be selected, an electron transmission layer can select ZnO, TiO2, Al-doped ZnO (AZO), Ga-doped ZnO (GZO) and SnO2 films, and a magnetron sputtering method and a spin coating method can be used for preparation. Laser annealing uses UV laser of 308, 248 and 355 nanometers and the like. Optical and electrical performances of the processed films are improved, the films as the electron transmission layer are applied to the perovskite solar cell, the processing temperature of the electron transmission layer can be reduced effectively, and the photoelectric conversion efficiency of the cell is improved.