163 results about "Thin-film optics" patented technology

The invention discloses an ultra-narrow band gap electron acceptor which is represented by a formula (I) and takes a phenazine structure as a core, a preparation method of the electron acceptor and application of the electron acceptor in an organic solar cell. The phenazine derivative ultra-narrow band gap receptor provided by the invention has an extremely low film optical band gap (-1.2 eV). The organic solar cell prepared by matching with a narrow-band gap polymer donor PTB7-Th as an active layer has high energy conversion efficiency and short-circuit current. In addition, the transparent organic solar cell prepared from the active layer obtains higher energy conversion efficiency on the premise of maintaining higher average visible light transmittance. The phenazine derivative ultra-narrow band gap receptor prepared by the invention has a huge application prospect in the field of transparent organic solar cells. # imgabs0 #

An electro-optic device includes a substrate structure, a first layer, a second layer on the first layer, and a third layer on the second layer. The first layer includes a first thin film lithium-containing (TFLC) electro-optic material and having a first thickness. The second layer includes a second TFLC electro-optic material and has a second thickness. The third layer includes a third TFLC electro-optic material and having a third thickness. Electro-optic structure(s) of the electro-optic device includes the first layer, the second layer, and the third layer. In the electro-optic structure(s), the first layer has a first width, the second layer has a second width, and the third layer has a third width.

The invention discloses a bridge type structure micro-bolometer based on a Mn-Co-Ni-O thin film and a preparation method of the bridge type structure micro-bolometer. According to the method, a Mn-Co-Ni-O post-high-temperature annealing process is considered, annealing is carried out on the suspension structure where the sacrificial layer is released, an organic sacrificial layer material release process is compatible, and the problem that cracks are generated in Mn-Co-Ni-O manufacturing due to tension and compression stress of materials of all layers of a substrate at a high temperature is minimized through annealing of the suspension structure; a bridge type structure based on Mn-Co-Ni-O is provided, and the limitation that traditional Mn-Co-Ni-O can only adopt an organic sacrificial layer and back digging to carry out thermal isolation design is eliminated; the F-P resonant cavity resonance absorption structure based on Mn-Co-Ni-O is successfully manufactured, traditional self-absorption based on a Mn-Co-Ni-O thick film is replaced, and the heat capacity of a device is reduced while absorption is enhanced by adopting a thin film optical structure; the applicable scene of the invention can be expanded to all cantilever or film-suspending micro-nano devices, such as inertial sensors, pressure sensors, chemical / biological sensors and optical detectors of other principles.

An electro-optical modulator includes a substrate and an optical waveguide including an electro-optical thin film disposed on the substrate. The optical waveguide has an input end coupled to receive an optical signal and an output end opposite the input end. First and second electrodes are disposed on the substrate along opposite sides of the waveguide. A differential driver has first and second differential outputs coupled to apply a differential electrical signal between the first and second electrodes to modulate a polarization of the optical signal propagating in the waveguide.

A thin-film optical device disclosed herein includes a metalens able to modulate the phase of incident light. The metalens includes a thin-film layer having a first index of refraction, an embedded layer within the thin-film layer, and the embedded layer having a second index of refraction greater than or equal to 1.5 and less than or equal to 3.0 times the first index of refraction. The embedded layer may fill a plurality of holes formed on the thin film layer, with the depth, width, and spacing of holes all contribute to modulating the phase of light traveling through the metalens.

Provided is a photocurable composition containing a photopolymerization initiator and a polymerizable compound, wherein the photopolymerization initiator includes a compound represented by formula (1-A) or formula (1-B). Also provided are a pixel production method, a film, an optical filter, a solid-state imaging element, and an image display device using said photocurable composition. Further provided is a photopolymerization initiator including said compound.

To provide a photosensitive composition having good storage stability and capable of forming a film which hardly causes development stains and outgassing and is excellent in solvent resistance after a low-temperature curing process.SOLUTION: The photosensitive composition for a color filter contains an alkali-soluble resin (A), a polymerizable compound (B), and a photopolymerization initiator (C). The photopolymerization initiator (C) contains a photopolymerization initiator multimer (C1) bonded via a linking group. The linking group contains an alkyleneoxy group.SELECTED DRAWING: Figure 1

To provide a curable composition which can form a cured film having an excellent resistance to a solvent, to high temperature and high moisture, and to a heat cycle even when the composition is cured at low temperatures.SOLUTION: The curable composition includes: a near-infrared absorption dye (A); a radical polymerizable compound (B); a radical polymerization initiator (C); a thermal curable compound (D); and a hardening accelerator (E). The hardening accelerator (E) includes at least two types of imidazole compounds.SELECTED DRAWING: Figure 1

This film comprises an elastomer layer (11) on a base material (30), and the elastomer layer has a stress relaxation rate of 70% or more in at least one direction, as calculated using formula 1. [Formula 1] Stress relaxation rate (%) = (A-B) / A×100 Taking at least one direction as a length direction, the elastomer layer is cut to a length of 10 mm and a width of 30 mm to obtain a strip-shaped test piece. The strip-shaped test piece is pulled in the length direction at a tension speed of 200 mm / min in an environment of a temperature of 25°C and a relative humidity of 45% using a tensile tester, and pulling is stopped when an elongation of 50% is reached. The stress value of the elastomer layer is measured continuously from the start of pulling until 30 seconds after extension has stopped. Defining the stress value indicating the highest stress during the measurement time as "A" (N), and the stress value 30 seconds after extension has stopped as "B" (N), the stress relaxation rate (%) of the elastomer layer is calculated on the basis of formula 1.

A resin composition includes a coloring material, a resin, and a solvent. The resin includes a graft polymer which has a main chain including a molecular chain having a structure derived from a compound having an ethylenically unsaturated bond-containing group and a graft chain, and the graft chain includes a repeating unit p1 having an oxetane group. The resin composition may be employed in a film formed of the resin composition; an optical filter; a solid-state imaging element; and an image display device.

This invention relates to the field of thin-film optics, and particularly to a protective film. To address the problem of light stabilizer precipitation at high concentrations, this invention provides a protective film. The protective film sequentially comprises an anti-glare film, an adhesive layer, and a barrier film; the adhesive layer is formed from an adhesive layer coating liquid; the adhesive layer coating liquid comprises an acrylate copolymer, a light stabilizer, an isocyanate curing agent, and a solvent; the light stabilizer has isocyanate groups. The light stabilizer in the adhesive layer of the protective film will not precipitate or migrate.

The present invention provides compositions, films, optical filters, solid-state image sensors, and compounds that can form films with excellent heat resistance and suppressed color transfer. [Solution] A composition comprising a compound represented by formula (1) or formula (2), a curable compound, and a solvent. JPEG2026054591000046.jpg46170

The present invention relates to the field of lighting technology, and specifically discloses a light control component and a lamp, comprising a mounting plate, a focusing lens, a light-emitting unit and a dimming bracket, wherein the dimming bracket and the light-emitting unit are respectively arranged on the mounting plate, and the light-emitting unit is located below the dimming bracket, and the dimming bracket is used to divide the light of the light-emitting unit, and the focusing lens is fixed on the light-emitting unit through the dimming bracket, and the focusing lens is used to focus the light of the light-emitting unit, and a thin film optical lens is arranged on the dimming bracket, and the thin film optical lens is used to form a light spot of the light of the light-emitting unit; the present application focuses the light of the light-emitting unit through the focusing lens to avoid light scattering, and divides the light using the dimming bracket, so that the light is divided into narrow light beams of different lengths, thereby reducing the light blocking area, thereby improving the light effect, and does not need to configure a special lens, which greatly reduces the manufacturing cost of the lamp.

The invention discloses a method for improving the photoelectric property of a transparent conductive oxide film and application, and belongs to the field of optoelectronic devices. The method comprises the following steps: growing a transparent conductive oxide film (TCO), a glass substrate or a silicon substrate by using a magnetron sputtering technology (or a reaction plasma deposition technology); and growing a gradient refractive index SiNyOx / SiOx thin film on the TCO thin film by using a radio frequency magnetron sputtering technology so as to construct the composite thin film (TCO / SiNyOx / SiOx) and improve the optical transmittance and the electrical stability of the TCO thin film. According to the invention, the optical and electrical properties of the transparent conductive oxide film can be improved, the transmission of the film is enhanced, the reflection is reduced, and the transparent conductive oxide film can be applied to crystalline silicon heterojunction solar cells or other optoelectronic devices and the like.

The present invention aims to provide an optical functional film, optical laminate, functional glass, and head-up display system that can suppress the occurrence of double images and exhibit excellent interlayer adhesion, windshield safety, and appearance stability in heat resistance tests. [Solution] An optical functional film comprising at least one optical functional layer, two transparent substrates, and an adhesive layer, wherein one or more optical functional layers and an adhesive layer are between the two transparent substrates, the transparent substrate is triacetylcellulose, the pure water contact angle between the front and back surfaces of the optical functional film is within a certain range, and the adhesive layer contains a nitrogen-containing monofunctional vinyl monomer, for use with a head-up display.

A substrate configured for an electro-optic device and an electro-optic device formed using the substrate are described. The substrate includes a semiconductor substrate, an insulating layer, and at least one thin film optical material. The semiconductor substrate includes a trap-rich layer and an underlying substrate layer. The insulating layer is on the semiconductor substrate, The trap-rich layer is between the underlying substrate layer and the insulating layer. The thin film optical material(s) have an electro-optic effect and are on the insulating layer.

The application discloses a kind of titanium modified molybdenum-doped tungsten oxide nanoparticles, electrochromic film, electrochromic device and preparation method.Nanoparticle chemical composition is, x=0.05~0.15, y=0.05~0.15, x+y=0.10~0.20, with Porous or mesoporous structure, specific surface area 50~150 m² / g.Sol-gel method is used to prepare, and is obtained by heat treatment at 400~600 DEG C.Electrochromic film is made by the nanoparticle by spraying method, thickness 200~800 nm, porosity 20%~50%.All-solid-state electrochromic device includes transparent conductive substrate, the electrochromic film, solid electrolyte layer, ion storage layer and second transparent conductive substrate, and is assembled by hot-pressing composite.The application widens lithium ion transmission channel by Ti-Mo binary synergic doping, electrochromic film optical modulation range 4%~75%, response time ≤60 seconds, cycle life ≥50,000 times, and suitable for large-area production.

This composition contains a coloring material, a curable compound, and a solvent. The coloring material contains a compound represented by formula (1). Also provided are a film, an optical filter, a solid-state image sensing device, an image display, an infrared sensor, and a camera module, each comprising the composition.

The present invention provides a composition which contains a compound represented by formula (1) or formula (2), a curable compound, and a solvent. In formula (1), M1 and X1 are bonded through a single bond or a divalent linking group, and in formula (2), M11 and X11 are bonded through a single bond or a divalent linking group. The present invention also provides a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module, in each of which the composition is used.

The invention relates to the technical field of biodegradable materials, in particular to a high-transparency ultralow-haze PBAT-based flexible film and a preparation method and application thereof, and the high-transparency ultralow-haze PBAT-based flexible film is composed of poly (butylene adipate-co-butylene terephthalate), poly (butylene succinate-co-butylene terephthalate), an antioxidant, an anti-hydrolysis agent, an anti-blocking agent and a dispersing agent in parts by weight. The polyethylene terephthalate-butylene adipate is used as a main component, the polyethylene terephthalate-butylene adipate can be added as required, and a small amount of other assistants are added to guarantee the performance of the film. According to the invention, PBAT and PBST are blended to improve the optical performance of the film, casting cooling inhibits the formation of a large crystal region, and the transparency is synergistically increased; the problems of low transparency and high haze of the PBAT-based film are solved, the use requirement of the packaging field on the film material is met, and the application of the PBAT material is further widened.

To provide a photosensitive composition capable of forming a film having superior line width stability and having superior bending resistance and heat cycle resistance.SOLUTION: The problem can be solved by a photosensitive composition comprising: a colorant (A), an alkali-soluble resin (B), a polymerizable compound (C), and a polymerization initiator (D), wherein the colorant (A) comprises a phthalocyanine compound (A1) of a specific structure, and the polymerizable compound (C) comprises a polymerizable compound (C1) of an amine structure, and a polymerizable compound other than the polymerizable compound (C1) of an amine structure.SELECTED DRAWING: Figure 1

This plasma treatment system and method can be widely applied to any type or shape of object being treated with plasma, and eliminates the problems of cutting and attaching indicators during plasma treatment, as well as the problems of disposing of release paper and used indicators, while also providing flexibility to handle various plasma intensities. [Solution] A plasma processing system that irradiates an object to be processed with plasma, (1) A direct-liquid marker, which is a device loaded with plasma indicator ink, that applies an ink coating film whose optical properties change due to plasma irradiation to the workpiece and / or a peripheral member that is plasma-irradiated together with the workpiece, inside a plasma irradiation device, (2) A plasma irradiation device that irradiates the object to be processed and the surrounding members with plasma, (3) A measuring device for measuring the optical properties of the ink coating film that has been irradiated with plasma, (4) A removal device for removing the plasma-irradiated ink coating, A plasma processing system characterized by comprising the following features.

A resin composition containing a coloring material A and a resin B, wherein: the coloring material A contains a pigment; the resin B contains a resin b1 that comprises a repeating unit b1-1 having an acid group, a repeating unit b1-2 having a functional group b selected from among a group containing two or more aromatic rings, a group containing a heterocyclic group, and a group containing a fused ring, and a repeating unit b1-3 differing from the repeating units b1-1 and b1-2; and the content of the coloring material A in the total solid content of the resin composition is 55 mass% or more. A film, an optical filter, a solid-state imaging element and an image display device, each using the resin composition.

The invention belongs to the related technical field of thin film optical online measurement, and discloses a reflective linear scanning hyperspectral online measurement system and method based on a flickering light source, the measurement system comprises a linear scanning adaptive control module, the linear scanning adaptive control module is used for carrying out linear scanning adaptive control on a to-be-measured sample, and the linear scanning adaptive control module is used for carrying out linear scanning adaptive control on the to-be-measured sample; the three-dimensional hyperspectral data of the whole breadth is obtained; the line scanning self-adaptive module comprises a line scanning sample speed detection unit and a line scanning control unit, and the line scanning sample speed detection unit is used for detecting the conveying speed of a to-be-detected sample in real time and sending the conveying speed information of the sample to the line scanning control unit; the line scanning control unit is used for receiving the transmission speed information of the sample to be detected in real time, and adaptively calculating the light source flicker period, the single flicker duration and the camera exposure time. The single measurement time of the measurement system is in a microsecond level, and accurate online detection and process control feedback of the thickness of a full-width film in roll-to-roll and sheet-to-sheet processes are realized.

To provide a film with which warping is suppressed.SOLUTION: A film has an elastomer layer on a substrate, and a stress relaxation rate of the elastomer layer in at least one direction, which is calculated by the following formula 1, is 70% or more: [Formula 1] stress relaxation rate(%)=(A-B) / A×100. A stripe-shaped test piece is obtained by cutting out the elastomer layer to length 10 mm×width 30 mm taking at least one direction of the elastomer layer as a length direction. This stripe-shaped test piece is stretched in the length direction at a tensile speed of 200 mm / minute under an environment of temperature 25°C and relative humidity 45% by using a tensile test machine and stopped after being drawn to 50% of elongation. The stress value of the elastomer layer is continuously measured until 30 seconds after stoppage of elongation from the start of stretching. The stress relaxation rate (%) of the elastomer layer is calculated on the basis of formula 1 where A (N) represents the stress value that exhibited the highest stress within the measurement time and B (N) represents the stress value 30 seconds after stoppage of elongation.SELECTED DRAWING: Figure 5A

A method of fabricating a photonics stack includes providing a silicon photonics structure (302, 362) including a silicon substrate (306, 366), an oxide layer (308, 368), and an epitaxial silicon layer (310, 370) having one or more active devices (128, 228). The method also includes providing an interposer structure (106, 206, 304, 364) and attaching the silicon photonics structure and the interposer structure. The method further includes removing the silicon substrate from the silicon photonics structure and removing at least a portion of the oxide layer from the silicon photonics structure. Additionally, the method includes disposing a thin-film lithium niobate coupon (104, 204, 320, 380) on or within the silicon photonics structure and encapsulating the thin-film lithium niobate coupon with an optical material (108, 208, 332, 392).

A method for detecting the optical properties of a multilayer thin film based on the combination of transmission Goos-Hanchen shift and spectrum, characterized by comprising: S1: measuring the position information of a light spot of a TM polarized wave transmitted through the multilayer thin film; S2: obtaining an incident wavelength-transmission Goos-Hanchen shift relationship curve through data processing; S3: measuring the spectral information of the multilayer thin film; S4: determining the type of the multilayer thin film: if it is an anti-reflection film, proceed to S5; if it is an anti-reflection film, proceed to S6; if it is a beam splitter film, proceed to S7; S5: establishing an anti-reflection film target function, and calculating the anti-reflection film parameter vector when the anti-reflection film target function is minimized; S6: establishing an anti-reflection film target function, and calculating the anti-reflection film parameter vector when the anti-reflection film target function is minimized; S7: establishing a beam splitter film target function, and calculating the beam splitter film parameter vector when the beam splitter film target function is minimized; effect: improving the measurement efficiency and accuracy of the optical properties of the multilayer thin film.

A pixel for an image sensor is disclosed that includes a photodiode, a thin-film layer and a reflective layer. The photodiode includes a first side and a second side that is opposite the first side, and receives incident light on the first side. The thin-film layer is formed on the first side of the photodiode and provides a unidirectional phase-shift to light passing from the photodiode to the thin-film layer. The thin-film layer has a refractive index that less than a refractive index of material forming the photodiode. The unidirectional phase-shift may be a unidirectional π phase shift at a target near-infrared light wavelength. The reflective layer is formed on the second side of the photodiode and reflects light passing from the photodiode to the reflective layer toward the first side of the photodiode. The reflective layer may be a thin-film layer, a Distributed Bragg Reflector layer, or a metal.