Measurement device and measurement method of optical parameters of dielectric film

A technology for dielectric thin films and optical parameters, applied in the field of optical measurement, can solve the problems of high price, complicated measurement process, and inability to measure the refractive index and thickness of dielectric thin films.

Inactive Publication Date: 2013-09-04
NINGBO UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

At the same time, people have also designed corresponding measuring instruments for the optical parameters of dielectric films, such as spectrophotometers, ellipsometers, Abbe refractometers, etc. However, most of these measuring instruments have a single function
Among them, the spectrophotometer can accurately measure the transmittance and reflectance of the dielectric film, but cannot measure the refractive index and thickness

Method used

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  • Measurement device and measurement method of optical parameters of dielectric film
  • Measurement device and measurement method of optical parameters of dielectric film
  • Measurement device and measurement method of optical parameters of dielectric film

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Embodiment 1

[0050] A kind of measuring device of the optical parameter of dielectric thin film that present embodiment proposes, such as figure 1 , figure 2 , image 3 , Figure 4 with Figure 5 As shown, it includes a refractive index and thickness measurement component, a transmittance and a reflectance measurement component, a sample stage component 5 for placing samples, a support component 7 , a controller 22 , a fixing base 21 and a computer terminal 23 . The refractive index and thickness measurement assembly is composed of a laser light source assembly 1, a polarizer 2, a half mirror 3, a circular aperture diaphragm 4, an autocollimation detector 6 and a measurement detector 10, a polarizer 2, a half mirror 3 and circular aperture stop 4 are sequentially arranged on the light propagation path of the laser light emitted by the laser light source assembly 1, and the laser light emitted by the laser light source assembly 1 passes through the polarizer 2 to form polarized light, a...

Embodiment 2

[0061] This embodiment proposes a method for measuring optical parameters of a dielectric thin film corresponding to the measuring device described in Embodiment 1, which includes two parts: measurement of the refractive index and thickness of the dielectric thin film, and measurement of the transmittance and reflectivity of the dielectric thin film.

[0062] Wherein, the measurement steps of the refractive index and thickness of the dielectric film are:

[0063] ①-1. Choose a piece of double-sided polished quartz glass as the substrate and clean it to prepare a polymethyl methacrylate (PMMA) solution, and coat a layer of PMMA film on the surface of the quartz glass by spin coating. After baking at 80°C for 5 hours, the sample is formed; the sample is placed on the first sample holder, and the dielectric film of the sample is closely attached to the bottom surface of the prism in the first sample holder, and then the first sample is adjusted. The micrometer screw in the sample...

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Abstract

The invention discloses a measurement device and a measurement method of optical parameters of a dielectric film. The measurement device comprises a sample platform assembly for placing a sample, a refractive index and thickness measurement assembly, a transmissivity and refractive index measurement assembly and a controller, wherein the refractive index and thickness measurement assembly is formed by a laser light source assembly, a polarizer, a semi-permeability and semi-reflection mirror, a circular hole diaphragm, an automatic-collimation detector and a measurement detector; and the transmissivity and refractive index measurement assembly is formed by a white-light light source, a collimation lens set which is connected with the white-light light source and is used for a collimation light path, an integrating sphere which is used for collecting light transmitted or reflected by the sample placed on the sample platform assembly, and a spectrograph connected with the integrating sphere. The measurement device disclosed by the invention has the advantages that the refractive index and thickness measurement assembly can measure the reflective index and the thickness of the sample, and the transmissivity and refractive index measurement assembly can measure the transmissivity and the refractive index of the sample, so that the measurement of various optical parameters is realized and the measurement precision is high.

Description

technical field [0001] The invention relates to an optical measurement technology, in particular to a measurement device and a measurement method for the optical parameters of a dielectric thin film. Background technique [0002] As early as 1817, Fraunhofer used acid etching to make anti-reflection coatings on optical lenses. After more than a century of development, by 1930, due to the emergence of vacuum evaporation equipment, various dielectric films began to be widely used in the optical field. Especially in recent decades, with the continuous emergence and vigorous development of new technologies such as microelectronic devices, optoelectronic devices, and biosensor devices, dielectric thin film technology is not only widely used in traditional optical engineering fields, but also more and more widely used It is used in different fields such as microelectronics technology, communication engineering, biological engineering, aerospace engineering, and medical engineerin...

Claims

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Application Information

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IPC IPC(8): G01N21/25G01N21/41
Inventor 宋鹏宇谭龙袁恩杨周骏
Owner NINGBO UNIV
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