31results about How to "Improved resistance to laser damage" patented technology

A passivation process for optical processing defects, comprising the following steps: (1) shallow pickling with HF acid solution on the fused quartz element after being polished by a single-axis machine, removing the hydrolyzed layer, exposing subsurface damage, and performing magnetorheological Polishing to passivate the defect; (2) After the magnetorheological polishing is completed, use HF acid to clean the surface of the fused silica element to complete the post-treatment of the magnetorheological passivation defect; (3) The fused silica element after pickling Rinse for 10 minutes and spray with deionized water for 5 minutes to remove residual acid and reaction products, and finally use filtered high-pressure nitrogen to dry the sample to complete the entire process. The invention has the advantages of simple technological process and strong operability, and can meet the requirements of the high-light optical system on the defects of the fused silica element and the accuracy of the surface shape.

The invention discloses a laser preprocessing device and processing method used for an optical element. The laser preprocessing device comprises a laser light source used for emitting laser as well as a light-splitting chopping plate, a reflecting mirror, a light beam shaping system and an electric translation stage used for placing a to-be-processed optical element are sequentially arranged in the laser transmission direction, wherein laser emitted by the laser light source passes through the light-splitting chopping plate and then is transmitted to the light beam shaping system through the reflecting mirror; the light beam shaping system is used for performing light beam shaping on laser; laser spots which are in Gaussian distribution are shaped into square spots which are uniformly distributed flatly; and finally, the laser is irradiated to the surface of the optical element for performing laser preprocessing on the optical element. According to the laser preprocessing device disclosed by the invention, irradiation energy density of the whole preprocessing process is uniform through the uniform square laser pots which are flatly focused, and dimensions of the spots are easily regulated through a multiplying power switching structure, so that the purpose of regulating energy density of laser which reaches the surface of the optical element is achieved.

The invention provides an ultraviolet-cured thin film with an adjustable refractive index and a preparation method of the ultraviolet-cured thin film. The preparation method comprises steps as follows: ethyl orthosilicate, deionized water and an organic solvent are mixed and subjected to a reaction for 12-24 h at 8-12 DEG C, an oligomer is prepared and then is aged for 48-72 h at 45-55 DEG C, andSiO2 porous spheres are prepared by self-assembly clustering of the oligomer; (2), silane methacrylate, deionized water and the organic solvent are mixed and subjected to a reaction for 6-8 h at 110-130 DEG C, an oligomer is prepared, a photoinitiator is added, and UV-curable sol is prepared; (3), the SiO2 porous spheres and the UV-curable sol are mixed, and a to-be-cured thin film is prepared; (4), the to-be-cured thin film is irradiated under ultraviolet light, and the ultraviolet-cured thin film with the adjustable refractive index is prepared. The prepared thin film has wider refractive index regulating range and high resistance to laser damage, and high-energy laser output of an intense laser device can be realized.

The invention provides a quartz watch surface polyvinyl alcohol plated coating layer, a preparation method and application and belongs to the technical field of optical material preparation. The preparation method comprises steps of using a PVDF filtering head with the aperture 0.15-0.30 [mu]m to filter polyvinyl alcohol solution with the mass percent of 0.5%-5% and cooling the solution for standby application; by spinning or pulling-through coating film, plating the polyvinyl alcohol on the back surface of a quartz base sheet with tidy surface; and drying the back surface to obtain the polyvinyl alcohol coating layer. The polyvinyl alcohol coating layer is capable of transferring the distribution of highest electric field intensity from the back surface of the quartz to the coating layer,so the electric field intensity of the back surface of the quartz is reduced. The laser damaged threshold value at the ultraviolet waveband is improved by 10%-20%; and the method is simple in processes, gentle in conditions, easy to control, low in cost, and environmentally friendly and has good application prospects in the field of optical materials.

The invention discloses a micro-milling repair technical method for the laser damage of the surface of a large-diameter KDP crystal element, and belongs to the technical field of repair machining of optical materials and optical elements in order to solve the problems that during repair of laser damage points of the surface of a soft and fragile KDP crystal element, the repair outline is simplex,the repaired surface quality is poor, and the efficiency is low. A geometric model of repairing points is built according to a control equation of the repair outline. A machining tool is selected. A rough machining repair procedure is built. A finish machining repair procedure is built. A tool path source file worked out according to the track of a tool path is converted into common numerical control machining NC codes, and the NC codes are converted into a machining program file capable of being recognized by a repair machine tool controller. A precise micro-milling repair experiment is carried out on a KDP crystal repair machine tool through the rough and finish machining NC codes, and efficient and high-quality machining of different laser friendly repairing outlines is realized. The increase behavior of laser damage points of the surface of the crystal element can be delayed, the laser damage resistance of the crystal element is improved, and the service life of the crystal elementis prolonged.

The invention provides an optical film reinforcing method and a laser reinforcing device, and relates to the technical field of laser. The optical film reinforcing method provided by the invention isapplied to the laser reinforcing device; the laser reinforcing device is prestored with a corresponding relation between the laser power and the surface temperature of an optical film reference sample; the optical film is prepared by an atomic layer deposition method; the optical film reinforcing method comprises the following steps: performing laser scanning on the optical film to be treated at the first power corresponding to the first preset temperature; after completion of the scanning, performing secondary laser scanning on the screened optical film at the second power corresponding to the second preset temperature, wherein the first preset temperature is higher than the second preset temperature. Through the optical film reinforcing method and the laser reinforcing device, laser scanning heat treatment is performed on the optical film prepared by the atomic layer deposition method, so that reliable reinforcement of the film is achieved.

The invention discloses a fused quartz surface nanoscale damage precursor passivation technology. The passivation technology includes the following steps that (1) the surface of a fused quartz element with the RMS roughness Rq smaller than 0.5 nm is subject to plasma washing treatment to remove a hydrolysis layer on the surface of the fused quartz element, and a nanoscale damage precursor on the sub surface of the fused quartz element is exposed out; and (2) the surface of the fused quartz element treated in the step (1) is subject to plasma passivation treatment, and nanoscale damage precursor passivation is carried out. The technology has the beneficial effects that the technological process is simple, the maneuverability is high, the nanoscale damage precursor on the fused quartz surface can be removed, and secondary pollution of the surface of the element can be avoided; and by means of the technology, the optical element with the high accuracy and the high surface quality can be machined, and the laser damage resistant capacity of the fused quartz element is effectively improved.

The invention provides a method for improving the laser damage resistance of an optical thin film element, comprising: first obtaining the functional damage threshold of the optical thin film element; then performing coating treatment and laser-induced plasma impact post-treatment of the optical thin film element: obtaining the The functional damage thresholds of all thin-film elements after laser-induced plasma post-treatment with different scanning parameters; the largest functional damage threshold is selected as the optimal functional damage threshold of optical thin-film elements, and the corresponding pulse width and scanning parameters are the most Optimum parameters; using the optimal parameters to perform laser-induced plasma post-treatment on the optical thin film elements to improve the ability of the optical thin film elements to resist laser damage. The invention can simultaneously reduce the defect density of structural and absorption defects in the film, and can improve the mechanical properties such as the bonding force between the film interfaces, solving the problem that the current post-processing technology is only effective for a small number of film element types and improves the effect There are also limited puzzles.