31results about How to "Improved resistance to laser damage" patented technology

The invention discloses a surface treatment method for increasing a fused silica element threshold value through wet etching-dry etching combination, belongs to the technical field of optical materials and optical elements, and particularly relates to a surface treatment method for increasing a fused silica element laser damage threshold value. According to the surface treatment method, deionized water is adopted to wash the surface of a fused silica element processed by using the traditional grinding polishing process, dehydrated alcohol is adopted to carry out ultrasonic washing, the obtained fused silica element is subjected to an etching treatment by using a hydrofluoric acid solution, deionized water washing and dehydrated alcohol dehydration are performed, and finally an energetic inert ion beam is adopted to carry out surface polishing to remove the acid etching reaction product SiF6<2-> and improve the surface roughness. According to the present invention, the residual polishing powder on the fused silica element processed by using the traditional process can be removed, the defect can be subjected to passivation, and the good surface roughness can be obtained, such that the laser damage resistance of the fused silica element can be effectively increased.

The invention relates to a high-damage-threshold laser film technological method, and belongs to the field of optical film plating. The invention aims to overcome the defect that the laser damage resistance threshold of a laser film plated in visible light and near-infrared bands by a conventional laser film plating technology is relatively low. Quartz or K9 is used as a coating substrate, sapphire is used as a substrate film material M, HfO2 is used as a high-refractive-index film material H, SiO2 is used as a low-refractive-index film material L, and TFC is used for giving geometric thicknesses and film system sequence calculation results of all layers of film systems; ultrasonic cleaning and heating baking are carried out on the coating substrate; in an optical film layer bonding bottoming process and a stress matching process, three film materials are sequentially put into an electronic gun evaporation source crucible boat, and then a coating process is completed according to the geometric thickness of each layer of film system and the sequence of the film systems; and the coating substrate is bombarded by using an ion source before coating and in the coating process. The filmlayer is hard, firm, excellent in laser damage resistance and good in permeability, and can be used for a long time in a severe field environment.

The present invention discloses one kind of saturable semiconductor absorbing mirror with high destruction threshold for mode locking laser, and belongs to the field of saturable absorbing mirror technology of mode locking laser. The saturable absorbing mirror includes silicon or Ga-As substrate, Bragg refection layer of metal film or Al-As / Ga-As, transparent Al-Ga-As or In-Al-Ga-As semiconductor layer, and saturable absorption layer of Ga-As or In-Ga-As quantum well. The present invention features that the surface of the saturable absorption layer has plated high reflectivity layer and the high reflectivity layer consists of at least three SiO2 film-ZrO2 film pairs in the optical thickness in one quarter of reflecting wavelength. The present invention has the obvious advantages of lowered transmitting light strength, raised capacity of resisting laser damage and the raised reflectivity of the mirror caused by the plated high reflectivity film.

The invention discloses a fused quartz surface nanoscale damage precursor passivation technology. The passivation technology includes the following steps that (1) the surface of a fused quartz element with the RMS roughness Rq smaller than 0.5 nm is subject to plasma washing treatment to remove a hydrolysis layer on the surface of the fused quartz element, and a nanoscale damage precursor on the sub surface of the fused quartz element is exposed out; and (2) the surface of the fused quartz element treated in the step (1) is subject to plasma passivation treatment, and nanoscale damage precursor passivation is carried out. The technology has the beneficial effects that the technological process is simple, the maneuverability is high, the nanoscale damage precursor on the fused quartz surface can be removed, and secondary pollution of the surface of the element can be avoided; and by means of the technology, the optical element with the high accuracy and the high surface quality can be machined, and the laser damage resistant capacity of the fused quartz element is effectively improved.

A passivation process for optical processing defects, comprising the following steps: (1) shallow pickling with HF acid solution on the fused quartz element after being polished by a single-axis machine, removing the hydrolyzed layer, exposing subsurface damage, and performing magnetorheological Polishing to passivate the defect; (2) After the magnetorheological polishing is completed, use HF acid to clean the surface of the fused silica element to complete the post-treatment of the magnetorheological passivation defect; (3) The fused silica element after pickling Rinse for 10 minutes and spray with deionized water for 5 minutes to remove residual acid and reaction products, and finally use filtered high-pressure nitrogen to dry the sample to complete the entire process. The invention has the advantages of simple technological process and strong operability, and can meet the requirements of the high-light optical system on the defects of the fused silica element and the accuracy of the surface shape.

The invention discloses a laser preprocessing device and processing method used for an optical element. The laser preprocessing device comprises a laser light source used for emitting laser as well as a light-splitting chopping plate, a reflecting mirror, a light beam shaping system and an electric translation stage used for placing a to-be-processed optical element are sequentially arranged in the laser transmission direction, wherein laser emitted by the laser light source passes through the light-splitting chopping plate and then is transmitted to the light beam shaping system through the reflecting mirror; the light beam shaping system is used for performing light beam shaping on laser; laser spots which are in Gaussian distribution are shaped into square spots which are uniformly distributed flatly; and finally, the laser is irradiated to the surface of the optical element for performing laser preprocessing on the optical element. According to the laser preprocessing device disclosed by the invention, irradiation energy density of the whole preprocessing process is uniform through the uniform square laser pots which are flatly focused, and dimensions of the spots are easily regulated through a multiplying power switching structure, so that the purpose of regulating energy density of laser which reaches the surface of the optical element is achieved.

The invention provides an ultraviolet-cured thin film with an adjustable refractive index and a preparation method of the ultraviolet-cured thin film. The preparation method comprises steps as follows: ethyl orthosilicate, deionized water and an organic solvent are mixed and subjected to a reaction for 12-24 h at 8-12 DEG C, an oligomer is prepared and then is aged for 48-72 h at 45-55 DEG C, andSiO2 porous spheres are prepared by self-assembly clustering of the oligomer; (2), silane methacrylate, deionized water and the organic solvent are mixed and subjected to a reaction for 6-8 h at 110-130 DEG C, an oligomer is prepared, a photoinitiator is added, and UV-curable sol is prepared; (3), the SiO2 porous spheres and the UV-curable sol are mixed, and a to-be-cured thin film is prepared; (4), the to-be-cured thin film is irradiated under ultraviolet light, and the ultraviolet-cured thin film with the adjustable refractive index is prepared. The prepared thin film has wider refractive index regulating range and high resistance to laser damage, and high-energy laser output of an intense laser device can be realized.

The invention discloses a method and device for testing the nonlinear effect I*L value of an optical element. The method focuses a laser beam in the body of the optical element by using a lens with a focal length smaller than the thickness of the optical element and adjusting the position of the optical element. At the same time, the laser energy density of the laser irradiated on the incident surface of the optical element to be tested is adjusted to be less than the laser damage threshold of the incident surface of the optical element to be tested, and the disturbance-induced small-scale self-focusing effect under non-focusing conditions is simulated, which solves the traditional In the test method, since the damage of the incident surface of the optical element occurs before the self-focusing filament damage in the body, the problems of laser loss such as scattering and defect absorption caused by the damage of the incident surface of the optical element not only improve the test accuracy, but also provide for the optical element in the test method. Safe use in high-power laser installations and improving the resistance of materials to laser damage provide additional assistance.

The invention provides a quartz watch surface polyvinyl alcohol plated coating layer, a preparation method and application and belongs to the technical field of optical material preparation. The preparation method comprises steps of using a PVDF filtering head with the aperture 0.15-0.30 [mu]m to filter polyvinyl alcohol solution with the mass percent of 0.5%-5% and cooling the solution for standby application; by spinning or pulling-through coating film, plating the polyvinyl alcohol on the back surface of a quartz base sheet with tidy surface; and drying the back surface to obtain the polyvinyl alcohol coating layer. The polyvinyl alcohol coating layer is capable of transferring the distribution of highest electric field intensity from the back surface of the quartz to the coating layer,so the electric field intensity of the back surface of the quartz is reduced. The laser damaged threshold value at the ultraviolet waveband is improved by 10%-20%; and the method is simple in processes, gentle in conditions, easy to control, low in cost, and environmentally friendly and has good application prospects in the field of optical materials.

The invention discloses a micro-milling repair technical method for the laser damage of the surface of a large-diameter KDP crystal element, and belongs to the technical field of repair machining of optical materials and optical elements in order to solve the problems that during repair of laser damage points of the surface of a soft and fragile KDP crystal element, the repair outline is simplex,the repaired surface quality is poor, and the efficiency is low. A geometric model of repairing points is built according to a control equation of the repair outline. A machining tool is selected. A rough machining repair procedure is built. A finish machining repair procedure is built. A tool path source file worked out according to the track of a tool path is converted into common numerical control machining NC codes, and the NC codes are converted into a machining program file capable of being recognized by a repair machine tool controller. A precise micro-milling repair experiment is carried out on a KDP crystal repair machine tool through the rough and finish machining NC codes, and efficient and high-quality machining of different laser friendly repairing outlines is realized. The increase behavior of laser damage points of the surface of the crystal element can be delayed, the laser damage resistance of the crystal element is improved, and the service life of the crystal elementis prolonged.

The invention relates to a method and device capable of improving laser damage resistance capacity of a diamond-like thin film. The method and device aim at effectively improving the laser damage resistance capacity of a DLC thin film and a dielectric thin film on the basis of not affecting any optical constants and physical properties of the DLC thin film and the dielectric thin film. According to the technical scheme, through the method capable of improving the laser damage resistance capacity of the diamond-like thin film, magnetic continuity with a closed loop is formed on the surface of the DLC thin film and the dielectric thin film, and the magnetic flux of the closed loop has the maximum gradient. The device comprises a magnetic conductive outer frame. A pair of permanent magnets including a first permanent magnet and a second permanent magnet are arranged in the outer frame, and the distance between the first permanent magnet and the second permanent magnet is adjustable. Through the method, the damage threshold value of the DLC thin film is improved to 1.23 J / cm<2> from 0.57 J / cm<2>. For the dielectric thin film, the laser damage area is reduced by about 50%.

The invention discloses a method for generating a tool track for variable-step-pitch micro-milling repair aimed at damage points on the surface of optical crystals, belonging to the technical field of optical materials and optical element surface repair. The invention aims to delay the modulation effect of the constant-period knife marks produced in the micro-milling repair of the soft and brittle KDP crystal on the incident laser, so as to improve the anti-laser damage ability of the KDP crystal element and prolong its service life. Technical points: establish a mathematical model of the repair contour; use the GPR trajectory generation method to determine the discrete contact points between the tool and the contour when the tool mills the repair contour to control the movement trend of the pseudo-random trajectory; use the established mathematical model of the repair contour and the selected micro Milling cutter size; use NURBS modeling method to interpolate the tool position control point set into a space curve; establish a curve in UG software according to the curve model, and use this curve as the repair track to simulate the machining process. It has been verified that the invention has a good effect on eliminating constant-period knife marks and helps to improve its ability to resist strong laser damage.

The invention provides an optical film reinforcing method and a laser reinforcing device, and relates to the technical field of laser. The optical film reinforcing method provided by the invention isapplied to the laser reinforcing device; the laser reinforcing device is prestored with a corresponding relation between the laser power and the surface temperature of an optical film reference sample; the optical film is prepared by an atomic layer deposition method; the optical film reinforcing method comprises the following steps: performing laser scanning on the optical film to be treated at the first power corresponding to the first preset temperature; after completion of the scanning, performing secondary laser scanning on the screened optical film at the second power corresponding to the second preset temperature, wherein the first preset temperature is higher than the second preset temperature. Through the optical film reinforcing method and the laser reinforcing device, laser scanning heat treatment is performed on the optical film prepared by the atomic layer deposition method, so that reliable reinforcement of the film is achieved.

The invention discloses a fused quartz surface nanoscale damage precursor passivation technology. The passivation technology includes the following steps that (1) the surface of a fused quartz element with the RMS roughness Rq smaller than 0.5 nm is subject to plasma washing treatment to remove a hydrolysis layer on the surface of the fused quartz element, and a nanoscale damage precursor on the sub surface of the fused quartz element is exposed out; and (2) the surface of the fused quartz element treated in the step (1) is subject to plasma passivation treatment, and nanoscale damage precursor passivation is carried out. The technology has the beneficial effects that the technological process is simple, the maneuverability is high, the nanoscale damage precursor on the fused quartz surface can be removed, and secondary pollution of the surface of the element can be avoided; and by means of the technology, the optical element with the high accuracy and the high surface quality can be machined, and the laser damage resistant capacity of the fused quartz element is effectively improved.

The invention provides a method for improving the laser damage resistance of an optical thin film element, comprising: first obtaining the functional damage threshold of the optical thin film element; then performing coating treatment and laser-induced plasma impact post-treatment of the optical thin film element: obtaining the The functional damage thresholds of all thin-film elements after laser-induced plasma post-treatment with different scanning parameters; the largest functional damage threshold is selected as the optimal functional damage threshold of optical thin-film elements, and the corresponding pulse width and scanning parameters are the most Optimum parameters; using the optimal parameters to perform laser-induced plasma post-treatment on the optical thin film elements to improve the ability of the optical thin film elements to resist laser damage. The invention can simultaneously reduce the defect density of structural and absorption defects in the film, and can improve the mechanical properties such as the bonding force between the film interfaces, solving the problem that the current post-processing technology is only effective for a small number of film element types and improves the effect There are also limited puzzles.

The invention provides a broadband dispersion mirror structure with a high laser damage threshold. The broadband dispersion mirror structure sequentially comprises a substrate, a chirp layer and an electric field modulation layer from bottom to top; the substrate is a substrate material of the dispersion mirror; the chirp layer is a multi-layer dielectric film layer of which the film layer thickness is gradually changed in a chirp manner; the electric field modulation layer is a multi-layer dielectric film layer with the film layer thickness changing periodically and arranged repeatedly. The bottom of the broadband dispersion mirror structure with the high laser damage threshold is a traditional chirp structure, and the electric field modulation layer structure is creatively introduced into the top of the broadband dispersion mirror structure with the high laser damage threshold; according to the novel dispersion mirror structure, the electric field modulation layer is a multi-layer dielectric film layer of which the film layer thickness changes periodically and is arranged repeatedly, so that standing wave field peak values of wavelength components in the electric field modulation layer are mutually staggered, and the maximum peak electric field intensity is greatly reduced. The total peak electric field intensity is reduced by modulating the standing wave field distribution of all wavelengths in the dispersion mirror at the same time, and finally the laser damage threshold can be effectively improved.

The invention relates to high erbium-doped lead-free fluoride (halide) tellurate glass, and a preparation method and application thereof. The high erbium-doped lead-free fluoride (halide) tellurate glass is prepared from the following components in percentage by mol: 20-35% AlF3, 20-35% of BaF2, 10-20% of CaF2, 10-20% of ZnBr2, ZnCl2 and / or ZnI2, 15-30% of TeO2, 2-8% of YF3+LaF3 and 3-7% of ErF3, wherein the sum of the mol percents of all the components is 100%. The fluoride (halide) phosphate glass prepared by a fusion method is transparent, causes no crystallization, and has high infrared transmittance around 3mu m and fine physicochemical property. The glass can be used for a 3mu m fiber laser, and is hopefully used in the fields of national defense industry, military and civilian use.

The invention relates to a method for cleaning LBO crystals before surface coating. The following steps are sequentially conducted on the LBO crystals and include that the surfaces of the LBO crystals are wiped with a mixed solution of absolute ethyl alcohol and diethyl ether; ultrasonic cleaning is conducted on the LBO crystals with a weak alkalinity solution, the weak alkalinity solution comprises NH4OH and H2O2, and the volume ratio of the NH4OH to the H2O2 to the H2O is 1:8:50; the LBO crystals are rinsed with the absolute ethyl alcohol; the LBO crystals are placed in a sealed container containing the absolute ethyl alcohol, and ultrasonic heating cleaning is conducted on the LBO crystals; the LBO crystals are taken out and rinsed again; and a dry nitrogen knife dries the LBO crystals in a positive pressure container environment. Compared with the prior art, the method for cleaning the LBO crystals before surface coating has the advantages of being good in cleaning effect, capable of improving the laser damage resistance of the LBO crystals after the LBO crystals are coated with film and also improving the film adhesive force and anti-crack feature of the LBO crystals after the LBO crystals are coated with the film and the like.