A kind of optical processing defect passivation process

An optical processing and defect technology, applied in the field of magnetorheological polishing, can solve problems such as difficulty in controlling the size and depth of defects, and achieve the effects of reducing relative light field intensity, improving laser damage resistance, and simple process flow

Active Publication Date: 2017-11-14
NAT UNIV OF DEFENSE TECH
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Problems solved by technology

The current high-light optical system has an urgent demand for high-threshold and high-surface-precision processing of fused silica components, and the traditional polishing method is difficult to control the size and depth of defects due to its brittle removal principle. Therefore, it is necessary to introduce a new Surface damage and can improve the processing technology of structural defects to solve these technical problems

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  • A kind of optical processing defect passivation process
  • A kind of optical processing defect passivation process
  • A kind of optical processing defect passivation process

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Embodiment

[0022] The processing object is a square fused silica element of 100mm×100mm×10mm. The pre-processing of the element is single-axis machine polishing. After polishing, there is no obvious scratch on the surface of the element. After the hydrolyzed layer is removed by light pickling, subsurface damage is exposed. Performing an optical processing defect passivation process on it, including the following steps:

[0023] (1) Before processing, the fused silica element is first lightly pickled to expose the subsurface scratches, and the initial depth of the scratches is measured to determine the depth of magnetorheological polishing. Pickling with 10% HF acid solution for 3 minutes, the material removal depth is 50nm.

[0024] (2) Carry out magnetorheological polishing on the fused silica element four times. When polishing, the relative speed of the polishing wheel and the fused quartz element is 2-3m / s, the flow rate of the magnetorheological polishing liquid is 150-170L / h, the p...

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Abstract

A passivation process for optical processing defects, comprising the following steps: (1) shallow pickling with HF acid solution on the fused quartz element after being polished by a single-axis machine, removing the hydrolyzed layer, exposing subsurface damage, and performing magnetorheological Polishing to passivate the defect; (2) After the magnetorheological polishing is completed, use HF acid to clean the surface of the fused silica element to complete the post-treatment of the magnetorheological passivation defect; (3) The fused silica element after pickling Rinse for 10 minutes and spray with deionized water for 5 minutes to remove residual acid and reaction products, and finally use filtered high-pressure nitrogen to dry the sample to complete the entire process. The invention has the advantages of simple technological process and strong operability, and can meet the requirements of the high-light optical system on the defects of the fused silica element and the accuracy of the surface shape.

Description

technical field [0001] The invention relates to a magnetorheological polishing method, in particular to a magnetorheological passivation process for structural defects of fused silica, which realizes the passivation of structural defects of fused silica materials. Background technique [0002] As a new optical processing method, magnetorheological polishing (MRF) uses the rheological properties of magnetorheological polishing fluid in a magnetic field to polish workpieces. Since the mechanism of magnetorheological polishing is shear removal, the force on the abrasive grains during the polishing process is much smaller than that of traditional polishing, which can effectively remove cracks and scratches left on the surface and sub-surface during grinding and traditional polishing, and obtain non-destructive Processing the surface can also improve the accuracy of the surface shape and achieve sub-nanometer surface roughness. In the process of magnetorheological polishing, the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C15/02
Inventor 石峰戴一帆隋婷婷胡皓彭小强
Owner NAT UNIV OF DEFENSE TECH
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