The invention discloses a high-
voltage SiC
MOSFET cellular structure. The high-
voltage SiC
MOSFET cellular structure comprises an N + type
silicon carbide power substrate, an N type drift region and a current expansion layer which are stacked in sequence, the
electric field modulation regions are arranged on the left side and the right side of the current expansion layer, the P-
body region is arranged above the current expansion layer, and the N + type source region and the P + type source region are arranged above the P-
body region; the gate trench is arranged in the middle of the current expansion layer, a P + type shielding region is arranged at the bottom of the gate trench, a gate is arranged in the gate trench, and the gate is located above the P + type shielding region; and the
gate oxide layer covers the upper surfaces of the gate, the N + type source region and the P + type source region. According to the structure, the
electric field modulation areas are arranged on the two sides of the current expansion layer, the peak
electric field intensity of the bottom of the groove of the UMOSFET device is reduced, the reverse
breakdown voltage of the device is greatly improved, and meanwhile, the N-type areas in the
electric field modulation areas also effectively reduce the characteristic on-resistance when the power device is conducted.