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Optical film strengthening method and laser strengthening device

An optical thin film and laser strengthening technology, applied in the laser field, can solve problems such as difficult to meet the application requirements of strong laser components, laser-induced damage, etc., and achieve the effect of improving the anti-laser damage performance of the film, reducing residual stress, and meeting application requirements

Active Publication Date: 2020-03-10
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The thin film deposited by ALD method has internal defects in the film layer. Under the condition of strong laser action, it may face the problem of laser-induced damage. Therefore, the thin film components deposited by ALD method are difficult to meet the application requirements of strong laser components.

Method used

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  • Optical film strengthening method and laser strengthening device
  • Optical film strengthening method and laser strengthening device
  • Optical film strengthening method and laser strengthening device

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Embodiment Construction

[0046] The technical solutions in the present disclosure will be clearly and completely described below in conjunction with the drawings in the present disclosure. Obviously, the described embodiments are only some of the embodiments of the present disclosure, not all of them. The components of the present disclosure generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the present disclosure provided in the accompanying drawings is not intended to limit the scope of the claimed disclosure, but merely represents selected embodiments of the present disclosure. Based on the embodiments of the present disclosure, all other embodiments obtained by those skilled in the art without creative effort shall fall within the protection scope of the present disclosure.

[0047] It should be noted that like numerals and letters denote similar items...

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Abstract

The invention provides an optical film reinforcing method and a laser reinforcing device, and relates to the technical field of laser. The optical film reinforcing method provided by the invention isapplied to the laser reinforcing device; the laser reinforcing device is prestored with a corresponding relation between the laser power and the surface temperature of an optical film reference sample; the optical film is prepared by an atomic layer deposition method; the optical film reinforcing method comprises the following steps: performing laser scanning on the optical film to be treated at the first power corresponding to the first preset temperature; after completion of the scanning, performing secondary laser scanning on the screened optical film at the second power corresponding to the second preset temperature, wherein the first preset temperature is higher than the second preset temperature. Through the optical film reinforcing method and the laser reinforcing device, laser scanning heat treatment is performed on the optical film prepared by the atomic layer deposition method, so that reliable reinforcement of the film is achieved.

Description

technical field [0001] The present disclosure relates to the field of laser technology, in particular, to an optical thin film strengthening method and a laser strengthening device. Background technique [0002] The traditional thermal annealing treatment is mainly carried out by slow heating in a high-temperature furnace. Heating is carried out through heat convection and conduction, and the temperature rise rate is relatively slow. At the same time, heating in the furnace may introduce pollution on the surface of the component. Laser heat treatment is a high-efficiency, non-contact and pollution-free heat treatment method. Laser heat treatment of optical thin films can quickly reduce the internal defects of the film. [0003] Atomic layer deposition (Atomic layer deposition, ALD) is a new type of thin film preparation method. The ALD method coating based on self-limiting chemical adsorption reaction can realize the atomic level controllable thickness of optical thin film d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/10
CPCG02B1/10
Inventor 许乔李亚国耿锋欧阳升王度袁志刚刘志超金会良王健张清华
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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