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56 results about "Semiconductor quantum wells" patented technology

Terahertz wave band wireless transmitting and receiving device and transmitting and receiving method thereof

ActiveCN101713687AImprove transmittanceThe THz frequency point with relatively good transmittance is goodSpectrum investigationElectromagnetic transceiversSemiconductor quantum wellsHigh energy
The invention discloses a terahertz wave band wireless transmitting and receiving device and a transmitting and receiving method thereof. The transmitting and receiving device comprises a transmitting terminal composed of a first cold head, a terahertz quantum-cascade laser and a first polyethylene window plate, an optical path part containing two off-axis parabolic mirrors and air and a receiving terminal composed of a second cold head, a terahertz quantum well detector and a second polyethylene window plate. The invention has the advantage that currently undistributed frequency range of electromagnetic wave is selected to transmit and receive electromagnetic wave, the absorption of the selected frequency point of electromagnetic wave by the air is relatively weaker, thus reducing the attenuation loss of terahertz wave during the transmission process; the semiconductor quantum-cascade laser which has high energy conversion efficiency and small volume, is easy to integrate, and can work for long time and perform mass production is adopted by the transmitting terminal; the semiconductor quantum well detector which has small volume, is stable and reliable and can perform mass production is adopted by the receiving terminal; and the adopted semiconductor laser and detector both can operate at high frequency, thus being suitable for future terahertz communication applications.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

Surface plasmon excimer electrically-induced excitation source with medium-metal near field coupling structure and manufacturing method thereof

The invention discloses a surface plasmon excimer electrically-induced excitation source with a medium-metal near field coupling structure. The surface plasmon excimer electrically-induced excitation source comprises a substrate, semiconductor quantum well epitaxial layer, a metal layer and a coupling output structure. The semiconductor quantum well epitaxial layer is loaded on the surface of the substrate. The metal layer is loaded on the surface of the semiconductor quantum well epitaxial layer. The coupling output structure is located in the metal layer. The invention further discloses a manufacturing method of the surface plasmon excimer electrically-induced excitation source. The method includes the steps that the semiconductor quantum well epitaxial layer is grown on the substrate; a device unit is etched on the grown semiconductor quantum well epitaxial layer; the metal layer is deposited on the etched device unit; the coupling output structure is manufactured in the deposited metal layer. According to the surface plasmon excimer electrically-induced excitation source, the semiconductor quantum well material is adopted to serve as an active medium, based on the near field coupling principle, the quantum efficiency is high, the light emitting wavelength range is wide, the excitation efficiency is high, the manufacturing process is simple, integration is conducted conveniently, and the surface plasmon excimer electrically-induced excitation source and the manufacturing method have great research value and application prospects.
Owner:TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI

Preparation method for bismuth-based non-rectangular group III-V semiconductor quantum well

The invention relates to a preparation method for a bismuth-based non-rectangular group III-V semiconductor quantum well. The preparation method comprises the step of growing a potential well material and a potential barrier material of a group III-V semiconductor quantum well, wherein bismuth is added in the growth processes of both the potential well material and the potential barrier material. According to the preparation method, bismuth beam source shutters are opened simultaneously in the processes of growing the potential well material and the potential barrier material of the quantum well, and a non-rectangular quantum well structure is realized by utilizing the group III element interdiffusion caused by the bismuth. By the method, material components can be controlled effectively; the problem that the conventional growth method is only suitable for growing a rectangular quantum well structure with component mutations is solved; greater freedom is introduced to the design and the implementation of the structure and the functional of quantum; the preparation method disclosed by the invention is suitable for adopting a plurality of material growth means, such as molecular beam epitaxy and atomic layer deposition; and the operation process is simple and convenient.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

Terahertz wave band wireless transmitting and receiving device and transmitting and receiving method thereof

ActiveCN101713687BImprove transmittanceThe THz frequency point with relatively good transmittance is goodSpectrum investigationElectromagnetic transceiversSemiconductor quantum wellsHigh energy
The invention discloses a terahertz wave band wireless transmitting and receiving device and a transmitting and receiving method thereof. The transmitting and receiving device comprises a transmitting terminal composed of a first cold head, a terahertz quantum-cascade laser and a first polyethylene window plate, an optical path part containing two off-axis parabolic mirrors and air and a receiving terminal composed of a second cold head, a terahertz quantum well detector and a second polyethylene window plate. The invention has the advantage that currently undistributed frequency range of electromagnetic wave is selected to transmit and receive electromagnetic wave, the absorption of the selected frequency point of electromagnetic wave by the air is relatively weaker, thus reducing the attenuation loss of terahertz wave during the transmission process; the semiconductor quantum-cascade laser which has high energy conversion efficiency and small volume, is easy to integrate, and can work for long time and perform mass production is adopted by the transmitting terminal; the semiconductor quantum well detector which has small volume, is stable and reliable and can perform mass production is adopted by the receiving terminal; and the adopted semiconductor laser and detector both can operate at high frequency, thus being suitable for future terahertz communication applications.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

Semiconductor quantum well structure capable of modulating microstrip gap by voltage

The invention discloses a semiconductor quantum well structure capable of modulating a microstrip gap by voltage. The semiconductor quantum well structure comprises a first quantum well layer, a second quantum well layer, a third quantum well layer, a fourth quantum well layer and additional gate voltage, wherein materials of the first quantum well layer and the second quantum well layer are AlSb; the material of the second quantum well layer is InAs; the material of the third quantum well layer is GaSb; the thicknesses of the first quantum well layer and the fourth quantum well layer are 5-40nm; the thickness of the second quantum well layer is 5-40nm; and the thickness of the third quantum well layer is 5-20nm. Compared with a method for modulating the microstrip gap by changing the thickness of a quantum well, the method for modulating the microstrip gap by the gate voltage disclosed by the invention is more convenient and reliable; and the position of Fermi energy and the size of the microstrip gap can be accurately determined, so that the modulation range of the Fermi energy is further determined. The semiconductor quantum well structure can be widely applied to the aspects of research on the property of a topological insulator of an InAs / GaSb-based semiconductor quantum well system and a device.
Owner:WEST ANHUI UNIV

Preparation method of non-rectangular III-V semiconductor quantum well based on bismuth element

The invention relates to a preparation method for a bismuth-based non-rectangular group III-V semiconductor quantum well. The preparation method comprises the step of growing a potential well material and a potential barrier material of a group III-V semiconductor quantum well, wherein bismuth is added in the growth processes of both the potential well material and the potential barrier material. According to the preparation method, bismuth beam source shutters are opened simultaneously in the processes of growing the potential well material and the potential barrier material of the quantum well, and a non-rectangular quantum well structure is realized by utilizing the group III element interdiffusion caused by the bismuth. By the method, material components can be controlled effectively; the problem that the conventional growth method is only suitable for growing a rectangular quantum well structure with component mutations is solved; greater freedom is introduced to the design and the implementation of the structure and the functional of quantum; the preparation method disclosed by the invention is suitable for adopting a plurality of material growth means, such as molecular beam epitaxy and atomic layer deposition; and the operation process is simple and convenient.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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