ArF laser film element irradiation damage test device with high irradiation density uniformity

A laser thin film and testing device technology, applied in the measurement of scattering characteristics, etc., can solve the problems of differentiation, complex damage mechanism, and many factors of damage to ArF laser thin film components, and achieve reduced uncertainty, high uniformity, and improved accuracy Effect

Inactive Publication Date: 2012-03-28
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0005] For the laser thin film damage test of the existing ArF laser optical thin film components, the non-uniformity of the radiation laser beam will cause linear absorption, medium ionization, multiphoton absorption and other nonlinear absorption and ArF laser thin film component damage. There are more and more specific factors. The damage mechanism is more complex, and the consistency of local surface laser radiation damage is differentiated. The present invention provides an ArF laser thin film element damage test device with high uniformity of radiation density to solve the problems existing in the prior art

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  • ArF laser film element irradiation damage test device with high irradiation density uniformity
  • ArF laser film element irradiation damage test device with high irradiation density uniformity
  • ArF laser film element irradiation damage test device with high irradiation density uniformity

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Embodiment Construction

[0015] Depend on figure 1 As shown, the ArF laser thin film element damage test device with high uniformity of irradiation density, the device includes: ArF laser transmission module, real-time monitoring module of ArF laser radiation energy density on the sample surface, real-time monitoring and discrimination module of optical film sample surface damage, Motorized sample console and experimental synchronization control and data acquisition module;

[0016] The ArF laser transmission module emits and transmits the ArF laser with high uniformity of radiation energy density, and radiates to the sample surface through two beam splitter mirrors in the ArF laser radiation energy density real-time monitoring module;

[0017] The real-time monitoring module of the ArF laser radiation energy density on the sample surface is used to obtain the ArF laser radiation energy density of the sample surface, control its measurement action through the experiment synchronization control module,...

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Abstract

An ArF laser film element irradiation damage test device with high irradiation density uniformity relates to the technical field of ArF excimer laser film element application. The device comprises an ArF laser transmission module, a real-time sample surface laser irradiation energy density monitoring module, a real-time optical film sample surface damage monitoring and judging module, an electricsample control platform and a synchronous experiment control and data collection module. The device has the following obvious characteristics: the sample surface ArF laser irradiation energy density has extremely high uniformity, the accuracy, reliability and comparability of the optical film element laser damage threshold testing result can be improved effectively, the measurement on the damage of the ArF laser optical film elements with different irradiated light spot sizes and different irradiated energy densities can be realized, and the demands on different types of ArF laser optical film element damage tests and damage mechanism researching can be met.

Description

technical field [0001] The invention relates to the technical field of application of ArF excimer laser thin film elements, in particular to an ArF laser thin film element damage testing device with high uniformity of irradiation density. Background technique [0002] The strong 193nm pulsed laser produced by the ArF excimer laser is very important in many fields such as fine microprocessing of materials, deep ultraviolet lithography, material processing, laser marking, etc., excimer laser medical treatment, and scientific research. application. Whether it is for the ArF excimer laser itself or the ArF excimer laser application system, it is an indispensable optical thin film component, and it is the most vulnerable basic component. Laser damage to optical thin film components will directly reduce the beam quality of the system, rapidly degrade the performance of the laser application system, until the entire system function collapses. Improving the anti-laser damage thres...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/47
Inventor 邓文渊金春水常艳贺靳京城
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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