82 results about "Excimer laser" patented technology

Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A).In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

The invention belongs to the technical field of a laser, in particular relates to a single-cavity dual-electrode discharging cavity and a quasimolecule laser adopting the same. The single-cavity dual-electrode discharging cavity comprises a cavity body and two sets of main discharging electrodes, wherein the cavity body comprises a left chamber and a right chamber to form a symmetrical dual-chamber structural shape, the cross section of each chamber is shaped like a pear with small top and large bottom, the left chamber and the right chamber are intersected on a symmetric surface of the entire discharging cavity and communicated with each other, and the two sets of main discharging electrodes are respectively arranged on the upper sides of the left and the right chambers. A dual-cavity function of a master oscillator power amplifier (MOPA), master oscillator power oscillator (MOPO) and master oscillator power regenerative amplifier (MOPRA) structure can be realized, and not only is the complexity of the system reduced, but also the discharging synchronism of the discharging cavity is guaranteed.

The present invention provided a no-glue packing structure and method and for completing the metallized packing structure of sensitive fiber element via plating metal film and welding. The outer coating of hydrogen carrying fiber is eliminated and grating of specific wavelength is written to naked fiber position with quasi-molecular laser; the fiber grating is then surface cleaned, activated and plated first with metal nickel and then with metal gold; and the fiber grating is penetrated into metal tube before fixed on operation table or fixed directly on metal sheet, applied with pre-stress, and heated to weld onto metal tube or metal sheet. The sensor of the present invention has excellent linearity and repeatability.

To provide an excimer lamp device suitably coping with enlargement of a substrate, reducing running cost, and surely treating the surface of the substrate. The excimer lamp device related to the present invention is provided with a lamp house storing excimer lamps; a gas supply pipe having gas jetting ports disposed in the lamp house and located in parallel and alternately with the excimer lamps; and a gas supply means introducing inert gas containing steam to the gas supply pipe. The inert gas with the absolute humidity controlled to a given value is supplied to the gas supply pipe by the gas supply means. The absolute humidity is preferably controlled to 0.5-6.5 g / kg in terms of the weight absolute humidity.

The present invention seeks to provide an excimer lamp enhanced in the radiation output of excimer rays, the excimer lamp having at least an optical radiation window provided on the exit side of radiation of rays and a plurality of excimer discharge plates electrodes opposed to one another and having a constitution in which excimer discharge gas present in discharge spaces formed in the said opposed electrodes causes a discharge to radiate excimer rays, said excimer discharge electrodes being flat-plate electrodes, a plurality of said discharge spaces being provided, each of which is between flat-plate electrodes, said optical radiation window being provided in parallel with discharge channels of said discharge spaces.

A decomposition apparatus is provided that includes an excimer lamp emitting UV light for decomposing an organic compound and a decomposition container provided with the excimer lamp for decomposing the organic compound in a liquid or a gas. In the decomposition apparatus, since the UV light irradiated from the excimer lamp is emitted to the liquid or the gas, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method. The decomposition apparatus and method are effective to decompose the organic compound, such as dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychiorinated biphenyl), trichloroethylene or the like, polluting the air or water to purify the environment.

The invention provides a device for the online preparation of an FBG (fiber bragg grating) array and automatic wavelength switching, and the device comprises a photoelectric encoder which is used for transmitting a pulse signal according to the rotating angle of a driving traction wheel of a wire drawing tower; a pulse counter; a phase mask plate array; a mobile mechanism which is used for adjusting the position of the phase mask plate array, enabling phase mask interference regions to be sequentially aligned with molecular lasers for grating scribing according to a sequence. When a count value of the pulse counter reaches a set value, the laser emits the laser pulse, and a linear motor moves the phase mask plate. According to the invention, the phase mask interference regions are arranged according to the sequence. Through obtaining a fiber drawing length, the device controls the laser emission of the molecular lasers and the movement of the moving mechanism, enables the phase mask plate array to move accurately according to the design requirements. The device is high in switching speed, is good in repeatability, and is high in precision.

Provided is an excimer lamp having a simple and small structure, which can be used in, for example, a refrigerator, and can emit ultraviolet light at a wavelength effective in disinfection processing without generating ozone in a surrounding atmosphere, without leaving gas impurities and moisture in an electrical discharge vessel, and without causing a steep illuminance decrease. A fluorescent substance is disposed on an inner face of the electrical discharge vessel for converting ultraviolet light emitted upon excimer electrical discharge of a light emitting gas to ultraviolet light having a longer wavelength. An inner electrode has a coil shape. A tight winding portion is formed at a certain area of the interior electrode which extends in the center axial direction of the interior electrode such that the coil is tightly wound in the tight winding portion. A getter is attached to the tight winding portion.

Provided is a small-sized less expensive light-intensity measuring apparatus for measuring a xenon excimer lamp that radiates a light beam having a central wavelength of 172 nm for an intensity.The light-intensity measuring apparatus of the present invention comprises a photoelectric converting means 23, preferably a photodiode, having photosensitivity in the range of from 800 to 1,000 nm, an operating means 25 for relatively determining the intensity of a light beam having a central wavelength of 172 nm depending upon an output of the photoelectric converting means 23 and a transmitting means 26 for transmitting the light intensity determined with the operating means 25.

Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A).In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

A light irradiation apparatus is provided and restricts the air to flow between a processed object substrate and a lamp, so that light can irradiate the processed object substrate in high efficiency. The light irradiation apparatus is provided with a chimney, an excimer lamp irradiating light to one surface of the processed object substrate transmitted along a substrate transmission path arranged in the chimney, and a gas supply unit for supplying inert gases between the processed object substrate and the excimer lamp. On an upper side of the chimney of the substrate transmission path, a pressure buffer space is formed near the chimney. The light irradiation apparatus is characterized in that an air exhaust unit is disposed on the upper side of the pressure buffer space of the substrate transmission path and is used for exhausting the air flowing along a surface irradiated by the light.

The invention is a method for making polarization maintaining optical fiber apodized gratings, for obtaining fiber gratings with bandwidth less than 1.0nm and side lobe suppression ratio greater than 25dB, comprising the steps of: using quasi-molecular laser to generate UV light, and using flat reflector to make 90 deg parallel refraction on the UV light; then using columnar lens with radius of curvature of 101.7mm to vertically compress facula of the UV light after beam expansion; using the compressed UV light to vertically irradiate Hanning window function amplitude template and making amplitude modulation on the incident parallel UV light and obtaining a beam of UV light whose luminous flux is distributed according to the required apodized function; and finally using the phase template to expose photosensitive polarization maintaining optical fiber. And the invention mainly applies to pumping amplifiers and polarization maintaining optical fiber sensors in 860nm-1610nm wavelength range.

The present invention provides systems and methods for filtering particles and assisting gas flow management within laser systems. In one embodiment, a laser apparatus (100) includes an elongate laser chamber defining a chamber cavity (130) and an electrode structure (140) disposed therein. The electrode structure includes an anode (148) spaced apart from a cathode (146). The laser includes an elongate baffle (174) disposed in the laser chamber. The baffle is adapted to arrest a plurality of particles generated within the chamber. In this manner, the baffle operates as a passive filtration system to help filter particles generated within the chamber during laser operation, and may further provide gas flow management capabilities.

The present invention avoids a decline in the reflectivity of an ultraviolet reflection film caused by lighting for an extended period of time and providing a uniform illuminance an excimer lamp has a silica glass discharge vessel with electrodes on opposite sides of the discharge vessel, wherein excimer discharge is generated in the discharge space of the discharge vessel, wherein an ultraviolet reflection film made of silica particles and alumina particles is formed on a surface exposed to the discharge space and wherein the mean particle diameter of silica particles is at least 0.67 times as large as the mean particle diameter of the alumina particles. The alumina particles in the ultraviolet reflection film preferably constitute at least 5 wt % and more preferably at least 10 wt % of the sum of silica particles and alumina particles.

The present invention belongs to the field of laser fine machining technology. The preparation process includes determining light spot area; setting work voltage; setting machining parameters and mask pattern based on the size and cross section shape of micro flow passage; drawing based on the micro flow passage structure and creating and storing the data file; reading out the data file and machining parameters and driving the bench and laser to complete the substrate machining; perforating in the foregoing steps or in conventional process to machining cover plate; and bonding the substrate and the cover plate. The preparing system includes computer, the computer controlled quasi-molecular laser and driving motor, bench, workpiece set on the bench, reflector to alter the optical path the laser beam of the quasi-molecular laser, mask rotating platform and imaging objective. The present invention can fast forming biochip in high flexibility, high reliability and low cost.

A method of manufacturing a color filter, includes forming a colored coated film on a substrate using a colored composition containing a pigment, a monomer having an ethylenic unsaturated double bond and photo-polymerization initiator, irradiating a filter segment-forming region or a black matrix-forming region of the colored coated film with an excimer laser beam having a wavelength of 308 nm (XeCL) at a dosage sufficient to achieve a cumulative light exposure of 1-150 mJ / cm2, thereby curing the irradiated region, removing uncured portions of the colored coated film to form the filter segment or the black matrix, and repeating the above-described steps plural times, thereby forming filter segments of at least two colors and / or a black matrix.

A polycrystalline silicon manufacturing method comprises the steps that S11 a solid-state laser device is used for emitting lasers to irradiate the lower surface of a non-crystalline silicon layer so as to preheat the non-crystalline silicon layer; S12 a quasimolecule laser device is used for irradiating the upper surface of the non-crystalline silicon layer so as to crystallize the non-crystalline silicon layer to form polycrystalline silicon, wherein the step S11 is executed earlier than the step S12 by preset time or simultaneously with the step S12. The polycrystalline silicon manufacturing method can greatly shorten the time for melting and crystallizing the non-crystalline silicon to form the polycrystalline silicon, and therefore the yield of the polycrystalline silicon is effectively increased; due to the fact that the temperature gradient during melting and crystallizing of the non-crystalline silicon is reduced, the crystallization rate of the polycrystalline silicon can be increased, and the crystallization quality of the polycrystalline silicon can be effectively improved; in addition, the emitting frequency of the expensive quasimolecule laser device can be reduced, the service life of the quasimolecule laser device is prolonged accordingly, and the cost is further reduced.

The present invention provides an excimer lamp which can provide high illumination with high illumination stability when the gas of sulfur hexafluoride, carbon tetrafluoride or nitrogen trifluoride with stable chemical property is used. The excimer lamp is enveloped with noble gas and fluoride. The external surface of light emitting diode is at least configured with one electrode (10, 11). The invention is characterized in that the gross pressure of gas in the light emitting diode (2) is larger than 13.3kPa. The fluoride is one object selected from sulfur hexafluoride, carbon tetrafluoride and nitrogen trifluoride. The molar ratio of fluoride relatively to the gross gas is 0.001%-10%. The noble gas is composed of a random gas and helium and / or neon, wherein the random gas is selected from argon, krypton and xenon. The molar ratio of helium and / or neon relatively to the whole mixture of noble gas is 90%-99.5%.

The invention provides an excimer lamp which can extend the lifetime of a lamp by preventing occurrence of cracks due to deterioration by ultraviolet rays on a quartz glass discharge container of an excimer lamp. A solvent containing an ultraviolet absorption substance is coated on the outside cylindrical face of an internal tube (1) made of quartz glass of an excimer lamp. By drying the solvent, a film of the ultraviolet absorption substance is formed, then, a heat treatment is applied with a temperature of 900 DEG C or more and softening point or less of the internal tube, thereby, the ultraviolet absorption substance is diffused inside the quartz glass from the outside cylindrical face of the internal tube. The film of the ultraviolet absorption substance is removed by performing hydrofluoric acid cleaning. The substance diffused is any one kind or more of Ti, Ce, Zr. The density of diffusion is thicker on the side closer to the discharge space. Since it prevents entering of ultraviolet rays into the internal tube (1), lifetime of the lamp can be extended.

The invention relates to a manufacturing method of the gate insulation layer of laser annealing polycrystalline silicon film transistor, belonging to the semi-conductor material. The invention first arranges the non-crystalline silicon (a-Si) film with the growth thickness is 150 nm into the vacuum chamber for the dehydrogenation process; the sample after dehydrogenation process is arranged into the sample chamber; under the condition of oxygen, utilizing the quasi-molecular laser to generate the laser with energy density of 350 mJ and the frequency of 3 Hz via the light-uniform system to be transformed into the facula of 50mmí‡1mm for scanning the surface of non-crystalline silicon (a-Si) film to form a SiO2 layer in the thickness of 100 mm on said surfaceú¼ and scanning the surface of sample with the energy density of 350 mJ and under the vacuum degree is over 1 Pa to melt 50 mm a-Si film to be recrystallized into P-Si film. Said growth method via the laser annealing continuously transforms the a-Si film into the SiO2 and P-Si film on one a-Si film which can keep lower interface state density between the SiO2 and the P-Si layers.

To avoid a decline in the reflectivity of an ultraviolet reflection film caused by lighting for an extended period of time and providing a uniform illuminance an excimer lamp has a silica glass discharge vessel with electrodes on opposite sides of the discharge vessel, wherein excimer discharge is generated in the discharge space of the discharge vessel, wherein an ultraviolet reflection film made of silica particles and alumina particles is formed on a surface exposed to the discharge space and wherein the mean particle diameter of silica particles is at least 0.67 times as large as the mean particle diameter of the alumina particles. The alumina particles in the ultraviolet reflection film preferably constitute at least 5 wt % and more preferably at least 10 wt % of the sum of silica particles and alumina particles.

The present invention is one kind of excited quasi-molecular lamp with double-layered lamp bulb joint not to become fragile in ultraviolet ray. In the excited quasi-molecular lamp, in the inner tube and the outer tube between the effective light emitting part and the joint part, there is shading part to block ultraviolet ray and made of opaque quartz glass or Vicol heat resisting high-boron silicate glass with dispersed ultraviolet ray absorbing or scattering material. The present invention can suppress the concentration of ultraviolet ray to the joint part caused by fiber effect and prevent the production of micro crack in the joint. In addition, painting adhesive material and other hardening agent to the surface part except effective light emitting part of the double-layered lamp bulb can raise mechanical strength and suppress the expansion of micro crack.

The embodiment of the invention discloses a Chinese medicinal composition for treating juvenile myopia and a preparation method thereof. The Chinese medicinal composition for treating juvenile myopiacomprises radix codonopsis, radix astragali, radix angelicae sinensis, rhizoma atractylodis, rhizoma dioscoreae, semen cuscutae, fructus lycii, fructus schisandrae chinensis, semen plantaginis, flos chrysanthemi, poria, cortex et radix polygalae, radix salviae miltiorrhizae, rhizoma ligustici chuanxiong, rhizoma acori graminei and radix glycyrrhizae. By organically combining the raw materials of the Chinese medicinal composition, the Chinese medicinal composition has the effects of calming the mind and the nerves, nourishing blood, softening the liver, supplementing qi, invigorating the spleen, replenishing essence, replenishing the kidney, reducing turbidity and improving the eyesight, can radically cure myopia, takes a curative effect quickly without toxic or side effects, does not bright a relapse after patients are healed, and fundamentally solves the problem in western medicine that patients under the age of 18 years old cannot receive excimer laser surgery. The Chinese medicinalcomposition has an obvious effect on juvenile myopia and can take effect after being used for two weeks in general. It is proved by hundreds of thousands of clinical cases in 29 years that the effective rate of the composition reaches 98% or above.

It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond.

It is an object of the present invention to provide a method for forming a resist pattern, in which ArF excimer laser light can be utilized as the exposure light for the patterning, the resist patterns can be thickened stably to an intended thickness independently of the sizes of the resist patterns, and the fineness of the fine space patterns can surpass the limit in terms of exposure or resolution of exposure devices.The method for forming a resist pattern of the present invention comprises at least forming a resist pattern, coating a resist pattern thickening material to cover the surface of the resist pattern, baking the resist pattern thickening material, and developing and separating the resist pattern thickening material, wherein at least one of the coating, the baking and the developing is carried out plural times.