82 results about "Excimer laser" patented technology

The present invention provided a no-glue packing structure and method and for completing the metallized packing structure of sensitive fiber element via plating metal film and welding. The outer coating of hydrogen carrying fiber is eliminated and grating of specific wavelength is written to naked fiber position with quasi-molecular laser; the fiber grating is then surface cleaned, activated and plated first with metal nickel and then with metal gold; and the fiber grating is penetrated into metal tube before fixed on operation table or fixed directly on metal sheet, applied with pre-stress, and heated to weld onto metal tube or metal sheet. The sensor of the present invention has excellent linearity and repeatability.

To provide an excimer lamp device suitably coping with enlargement of a substrate, reducing running cost, and surely treating the surface of the substrate. The excimer lamp device related to the present invention is provided with a lamp house storing excimer lamps; a gas supply pipe having gas jetting ports disposed in the lamp house and located in parallel and alternately with the excimer lamps; and a gas supply means introducing inert gas containing steam to the gas supply pipe. The inert gas with the absolute humidity controlled to a given value is supplied to the gas supply pipe by the gas supply means. The absolute humidity is preferably controlled to 0.5-6.5 g/kg in terms of the weight absolute humidity.

The present invention seeks to provide an excimer lamp enhanced in the radiation output of excimer rays, the excimer lamp having at least an optical radiation window provided on the exit side of radiation of rays and a plurality of excimer discharge plates electrodes opposed to one another and having a constitution in which excimer discharge gas present in discharge spaces formed in the said opposed electrodes causes a discharge to radiate excimer rays, said excimer discharge electrodes being flat-plate electrodes, a plurality of said discharge spaces being provided, each of which is between flat-plate electrodes, said optical radiation window being provided in parallel with discharge channels of said discharge spaces.

A decomposition apparatus is provided that includes an excimer lamp emitting UV light for decomposing an organic compound and a decomposition container provided with the excimer lamp for decomposing the organic compound in a liquid or a gas. In the decomposition apparatus, since the UV light irradiated from the excimer lamp is emitted to the liquid or the gas, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method. The decomposition apparatus and method are effective to decompose the organic compound, such as dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychiorinated biphenyl), trichloroethylene or the like, polluting the air or water to purify the environment.

The invention provides a device for the online preparation of an FBG (fiber bragg grating) array and automatic wavelength switching, and the device comprises a photoelectric encoder which is used for transmitting a pulse signal according to the rotating angle of a driving traction wheel of a wire drawing tower; a pulse counter; a phase mask plate array; a mobile mechanism which is used for adjusting the position of the phase mask plate array, enabling phase mask interference regions to be sequentially aligned with molecular lasers for grating scribing according to a sequence. When a count value of the pulse counter reaches a set value, the laser emits the laser pulse, and a linear motor moves the phase mask plate. According to the invention, the phase mask interference regions are arranged according to the sequence. Through obtaining a fiber drawing length, the device controls the laser emission of the molecular lasers and the movement of the moving mechanism, enables the phase mask plate array to move accurately according to the design requirements. The device is high in switching speed, is good in repeatability, and is high in precision.

A light irradiation apparatus is provided and restricts the air to flow between a processed object substrate and a lamp, so that light can irradiate the processed object substrate in high efficiency. The light irradiation apparatus is provided with a chimney, an excimer lamp irradiating light to one surface of the processed object substrate transmitted along a substrate transmission path arranged in the chimney, and a gas supply unit for supplying inert gases between the processed object substrate and the excimer lamp. On an upper side of the chimney of the substrate transmission path, a pressure buffer space is formed near the chimney. The light irradiation apparatus is characterized in that an air exhaust unit is disposed on the upper side of the pressure buffer space of the substrate transmission path and is used for exhausting the air flowing along a surface irradiated by the light.

The invention is a method for making polarization maintaining optical fiber apodized gratings, for obtaining fiber gratings with bandwidth less than 1.0nm and side lobe suppression ratio greater than 25dB, comprising the steps of: using quasi-molecular laser to generate UV light, and using flat reflector to make 90 deg parallel refraction on the UV light; then using columnar lens with radius of curvature of 101.7mm to vertically compress facula of the UV light after beam expansion; using the compressed UV light to vertically irradiate Hanning window function amplitude template and making amplitude modulation on the incident parallel UV light and obtaining a beam of UV light whose luminous flux is distributed according to the required apodized function; and finally using the phase template to expose photosensitive polarization maintaining optical fiber. And the invention mainly applies to pumping amplifiers and polarization maintaining optical fiber sensors in 860nm-1610nm wavelength range.

The present invention avoids a decline in the reflectivity of an ultraviolet reflection film caused by lighting for an extended period of time and providing a uniform illuminance an excimer lamp has a silica glass discharge vessel with electrodes on opposite sides of the discharge vessel, wherein excimer discharge is generated in the discharge space of the discharge vessel, wherein an ultraviolet reflection film made of silica particles and alumina particles is formed on a surface exposed to the discharge space and wherein the mean particle diameter of silica particles is at least 0.67 times as large as the mean particle diameter of the alumina particles. The alumina particles in the ultraviolet reflection film preferably constitute at least 5 wt % and more preferably at least 10 wt % of the sum of silica particles and alumina particles.

A polycrystalline silicon manufacturing method comprises the steps that S11 a solid-state laser device is used for emitting lasers to irradiate the lower surface of a non-crystalline silicon layer so as to preheat the non-crystalline silicon layer; S12 a quasimolecule laser device is used for irradiating the upper surface of the non-crystalline silicon layer so as to crystallize the non-crystalline silicon layer to form polycrystalline silicon, wherein the step S11 is executed earlier than the step S12 by preset time or simultaneously with the step S12. The polycrystalline silicon manufacturing method can greatly shorten the time for melting and crystallizing the non-crystalline silicon to form the polycrystalline silicon, and therefore the yield of the polycrystalline silicon is effectively increased; due to the fact that the temperature gradient during melting and crystallizing of the non-crystalline silicon is reduced, the crystallization rate of the polycrystalline silicon can be increased, and the crystallization quality of the polycrystalline silicon can be effectively improved; in addition, the emitting frequency of the expensive quasimolecule laser device can be reduced, the service life of the quasimolecule laser device is prolonged accordingly, and the cost is further reduced.

The present invention provides an excimer lamp which can provide high illumination with high illumination stability when the gas of sulfur hexafluoride, carbon tetrafluoride or nitrogen trifluoride with stable chemical property is used. The excimer lamp is enveloped with noble gas and fluoride. The external surface of light emitting diode is at least configured with one electrode (10, 11). The invention is characterized in that the gross pressure of gas in the light emitting diode (2) is larger than 13.3kPa. The fluoride is one object selected from sulfur hexafluoride, carbon tetrafluoride and nitrogen trifluoride. The molar ratio of fluoride relatively to the gross gas is 0.001%-10%. The noble gas is composed of a random gas and helium and/or neon, wherein the random gas is selected from argon, krypton and xenon. The molar ratio of helium and/or neon relatively to the whole mixture of noble gas is 90%-99.5%.

The invention provides an excimer lamp which can extend the lifetime of a lamp by preventing occurrence of cracks due to deterioration by ultraviolet rays on a quartz glass discharge container of an excimer lamp. A solvent containing an ultraviolet absorption substance is coated on the outside cylindrical face of an internal tube (1) made of quartz glass of an excimer lamp. By drying the solvent, a film of the ultraviolet absorption substance is formed, then, a heat treatment is applied with a temperature of 900 DEG C or more and softening point or less of the internal tube, thereby, the ultraviolet absorption substance is diffused inside the quartz glass from the outside cylindrical face of the internal tube. The film of the ultraviolet absorption substance is removed by performing hydrofluoric acid cleaning. The substance diffused is any one kind or more of Ti, Ce, Zr. The density of diffusion is thicker on the side closer to the discharge space. Since it prevents entering of ultraviolet rays into the internal tube (1), lifetime of the lamp can be extended.

The invention relates to a manufacturing method of the gate insulation layer of laser annealing polycrystalline silicon film transistor, belonging to the semi-conductor material. The invention first arranges the non-crystalline silicon (a-Si) film with the growth thickness is 150 nm into the vacuum chamber for the dehydrogenation process; the sample after dehydrogenation process is arranged into the sample chamber; under the condition of oxygen, utilizing the quasi-molecular laser to generate the laser with energy density of 350 mJ and the frequency of 3 Hz via the light-uniform system to be transformed into the facula of 50mmí‡1mm for scanning the surface of non-crystalline silicon (a-Si) film to form a SiO2 layer in the thickness of 100 mm on said surfaceú¼ and scanning the surface of sample with the energy density of 350 mJ and under the vacuum degree is over 1 Pa to melt 50 mm a-Si film to be recrystallized into P-Si film. Said growth method via the laser annealing continuously transforms the a-Si film into the SiO2 and P-Si film on one a-Si film which can keep lower interface state density between the SiO2 and the P-Si layers.

The present invention is one kind of excited quasi-molecular lamp with double-layered lamp bulb joint not to become fragile in ultraviolet ray. In the excited quasi-molecular lamp, in the inner tube and the outer tube between the effective light emitting part and the joint part, there is shading part to block ultraviolet ray and made of opaque quartz glass or Vicol heat resisting high-boron silicate glass with dispersed ultraviolet ray absorbing or scattering material. The present invention can suppress the concentration of ultraviolet ray to the joint part caused by fiber effect and prevent the production of micro crack in the joint. In addition, painting adhesive material and other hardening agent to the surface part except effective light emitting part of the double-layered lamp bulb can raise mechanical strength and suppress the expansion of micro crack.

The embodiment of the invention discloses a Chinese medicinal composition for treating juvenile myopia and a preparation method thereof. The Chinese medicinal composition for treating juvenile myopiacomprises radix codonopsis, radix astragali, radix angelicae sinensis, rhizoma atractylodis, rhizoma dioscoreae, semen cuscutae, fructus lycii, fructus schisandrae chinensis, semen plantaginis, flos chrysanthemi, poria, cortex et radix polygalae, radix salviae miltiorrhizae, rhizoma ligustici chuanxiong, rhizoma acori graminei and radix glycyrrhizae. By organically combining the raw materials of the Chinese medicinal composition, the Chinese medicinal composition has the effects of calming the mind and the nerves, nourishing blood, softening the liver, supplementing qi, invigorating the spleen, replenishing essence, replenishing the kidney, reducing turbidity and improving the eyesight, can radically cure myopia, takes a curative effect quickly without toxic or side effects, does not bright a relapse after patients are healed, and fundamentally solves the problem in western medicine that patients under the age of 18 years old cannot receive excimer laser surgery. The Chinese medicinalcomposition has an obvious effect on juvenile myopia and can take effect after being used for two weeks in general. It is proved by hundreds of thousands of clinical cases in 29 years that the effective rate of the composition reaches 98% or above.

It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond.