Single-cavity dual-electrode discharging cavity and quasimolecule laser

A discharge cavity and two-electrode technology, applied in the field of lasers, can solve the problems of complex manufacturing process and operation method, high laser price, complex system structure, etc., and achieve the effect of ensuring discharge synchronization, reducing complexity, and reducing complexity.

Inactive Publication Date: 2012-12-05
ACAD OF OPTO ELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
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Problems solved by technology

[0017] Aiming at the disadvantages of MOPA, MOPRA, and MOPO system structures used in existing dual-cavity excimer lasers, the technical problem to be solved by the present invention is to propose a new type of single-cavity double-electrode discharge cavity and corresponding lasers to solve the problem based on dual-cavity The structural laser has the disadvantages of high price, large volume, complicated manufacturing process and operation method, and can achieve narrow linewidth and high-power high-quality laser beam output

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  • Single-cavity dual-electrode discharging cavity and quasimolecule laser
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  • Single-cavity dual-electrode discharging cavity and quasimolecule laser

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Embodiment Construction

[0055] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0056] 1. Basic structure of a single-chamber double-electrode discharge chamber

[0057] Figure 4 It is a structural diagram of a single-chamber double-electrode discharge chamber according to an embodiment of the present invention. Such as Figure 4 As shown, the discharge chamber mainly includes a discharge chamber body 1 , two sets of main discharge electrodes, two sets of gas circulation systems, a heat dissipation system, a dust removal device and a high-voltage pulse charging module 4 .

[0058] The discharge chamber body 1 is a closed gas container, which is designed to implement the relevant standards of pressure vessels, and is used to store 3-6 atm corrosive mixed gases, such as halogen gases that produce ex...

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Abstract

The invention belongs to the technical field of a laser, in particular relates to a single-cavity dual-electrode discharging cavity and a quasimolecule laser adopting the same. The single-cavity dual-electrode discharging cavity comprises a cavity body and two sets of main discharging electrodes, wherein the cavity body comprises a left chamber and a right chamber to form a symmetrical dual-chamber structural shape, the cross section of each chamber is shaped like a pear with small top and large bottom, the left chamber and the right chamber are intersected on a symmetric surface of the entire discharging cavity and communicated with each other, and the two sets of main discharging electrodes are respectively arranged on the upper sides of the left and the right chambers. A dual-cavity function of a master oscillator power amplifier (MOPA), master oscillator power oscillator (MOPO) and master oscillator power regenerative amplifier (MOPRA) structure can be realized, and not only is the complexity of the system reduced, but also the discharging synchronism of the discharging cavity is guaranteed.

Description

technical field [0001] The invention belongs to the technical field of lasers, and in particular relates to a single-cavity double-electrode discharge chamber for photolithography and an excimer laser including the discharge chamber. The discharge chamber of the invention can also be applied to other devices that generate energy radiation when gas is excited. Background technique [0002] Excimer laser is a conventional gas laser for ultraviolet characteristic applications. It is currently considered to be the best light source choice for lithography, and it is the main working light source in the integrated circuit lithography lithography industry. [0003] Traditional discharge excited excimer lasers are designed with a single-cavity single-electrode structure. With the further development of optical lithography technology, the light source is required to have narrower spectral width (linewidth), higher repetition rate and higher average power. Traditional single-cavity s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/03H01S3/23
CPCH01S3/0388H01S3/08H01S3/225H01S3/005H01S3/0384H01S3/2383H01S3/03H01S3/09713H01S3/076H01S3/0385H01S3/2333H01S3/036H01S3/08068H01S3/10092H01S3/235H01S3/038H01S3/097
Inventor 王宇周翊丁金滨刘斌张立佳赵江山沙鹏飞
Owner ACAD OF OPTO ELECTRONICS CHINESE ACAD OF SCI
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