53 results about "Far ultraviolet" patented technology

The present invention relates to a radiation generating system (1) comprising a radiation unit (2), wherein the radiation unit (2) comprises a light source (3), a first collimator (4), and an optical arrangement (5). The light source (3) is configured to generate light source radiation (100) having a first spectral power distribution having an intensity I1,1 at a first wavelength λ1 and an intensity I1,2 at a second wavelength λ2. The first collimator (4) is configured in a light receiving relationship with the light source (3), wherein the first collimator (4) is configured to collimate the light source radiation (100) into collimated light source radiation (101) having an initial spatial light distribution (ISLD). The optical arrangement (5) is arranged downstream of the first collimator (4) and comprises an optical filter (6) and a diffuser (7). The optical filter (6) has a higher transmission for the first wavelength λ1 than for the second wavelength Xi when irradiated under a predefined angle 0. The first wavelength Xi is selected from the range of 190-230 nm and the second wavelength Xi is selected from the range of 100-190 nm and / or 230-300 nm. The optical filter (6) is configured to filter at least part of the collimated light source radiation (101) into filtered radiation (102) comprising at least portion of the light source radiation (100) of the first wavelength Xi having a first spatial light distribution (SLD1) and at least portion of the light source radiation (100) of the second wavelength λ2 having a second spatial light distribution (SLD2) different from the first spatial light distribution (SLD1). The diffuser (7) is configured downstream of the optical filter (6). The diffuser (7) is configured to diffuse at least part of the filtered radiation (102) into diffused radiation (103) comprising at least a portion of the light source radiation (100) of the first wavelength λ1 having a third spatial light distribution (SLD3) and at least portion of the light source radiation (100) of the second wavelength λ2 having a fourth spatial light distribution (SLD4) different from the second spatial light distribution (SLD2).

The invention belongs to the technical field of water treatment, and relates to a method for removing new pollutants in water by using a far ultraviolet assisted sodium hypochlorite system. The method comprises the following steps: S1, adjusting the pH value of a to-be-treated aqueous solution containing new pollutants to 4-10; s2, adding a sodium hypochlorite oxidizing agent into the aqueous solution to be treated and continuously stirring; and S3, carrying out a reaction under the ultraviolet wavelength of 200 to 230 nm. Compared with the prior art, the method has the advantages that the far ultraviolet light source and the sodium hypochlorite are jointly applied, so that the oxidation capacity of the sodium hypochlorite is improved, meanwhile, the high-energy characteristic of far ultraviolet light is fully played, efficient photocatalytic degradation of new pollutants difficult to degrade is realized, and the overall water treatment efficiency is remarkably improved.

Systems and methods for treating an object, in particular, for disinfecting and / or drying objects and / or surfaces are provided. One or more of an air delivery system, an electromagnetic emitter (e.g., a Far ultraviolet (UV) light source), and / or an air treatment device (e.g., a gaseous hydrogen-peroxide generator) may be used to condition ambient air to treat a surface or container for use (e.g., prior to filling the container, applying a surfactant, etc.). An ionizer may be employed with one or more of the emitter or air treatment device to additionally remove static from air within or provided to a treatment area.

The invention discloses a method for synchronously removing bromate and new pollutants in water by using a far ultraviolet light / bromate process. The method comprises the following steps: radiating a water body containing the bromate and the new pollutants by using far ultraviolet light; the bromate can be efficiently degraded by utilizing an far ultraviolet light source with a high molar absorption coefficient, so that new pollutants can be further degraded by generated oxidizing free radicals and reducing species, and the bromate and the new pollutants can be synchronously and efficiently removed. Under the condition of 800 mJ cm <-2 >, the degradation rate of bromate can reach 54%; under the condition of 200 mJ cm <-2 >, the removal rate of new pollutants can reach 90% or above; according to the method, collaborative purification of the two pollutants is achieved, compared with removal of new pollutants by independently using far ultraviolet light, the far ultraviolet light / bromate technology is higher in new pollutant removal efficiency, and the method has the advantages of being efficient, environmentally friendly and free of chemicals; according to the method, the bromate-containing water body generated after ozone or ultraviolet / chlorine disinfection of a water plant can be utilized in situ, so that the water treatment cost can be saved.

The application discloses a thermoelectric pile structure for calibrating a far ultraviolet ultraviolet detector based on MEMS, which comprises a silicon substrate, a support layer, an absorption layer, a thermocouple pair, aluminum wires, aluminum electrodes and a single crystal silicon material structure on the silicon substrate. The double-layer thermocouple stacking structure is adopted to improve the device duty ratio, more thermocouple pairs can be laid in the case of keeping the size of the one-layer structure unchanged, and the response rate of the detector is improved. The circular structure conforms to the distribution trend that the temperature is radially diffused from the center of the absorption layer to the periphery in a decreasing manner, the hot end of the thermocouple pair can be closer to the area with higher temperature, the temperature of the hot end of the thermocouple pair is more uniform, and the response rate of the detector is improved. The radiant energy of the far ultraviolet ultraviolet radiation source is converted into an output thermoelectric electromotive force, a mathematical model of Fourier's law and the Seebeck effect is established for calculation, and the heat flux density of the far ultraviolet ultraviolet radiation source is measured.

1. Name of the Design Product: Far Ultraviolet Lamp. 2. Use of the Design Product: To emit far ultraviolet rays. 3. Design Key Points of the Design Product: Lies in the shape. 4. Picture or Photograph that Best Illustrates the Design Key Points: Perspective View of Design 1. 5. Design 1 is designated as the basic design.

The invention discloses a far ultraviolet micro-LED photocatalyst monolithic integrated chip and a preparation method of the far ultraviolet micro-LED photocatalyst monolithic integrated chip. According to the chip, an AlGaN-based micro-LED array with the emission peak position of 220-230 nm is adopted as a far ultraviolet light source, a conformal composite layer structure with optical shaping and photocatalysis dual functions is integrated on the light emitting face of the AlGaN-based micro-LED array in a monolithic mode, and a composite layer is composed of a high-transmittance framework layer and a porous catalytic skin layer; the catalytic skin layer conformally deposits a porous membrane with the thickness of 50-300 nm on the surface of the lens, the aperture is 10-200 nm, the porosity is 20-60%, and degradation of organic pollutants and inactivation of microorganisms in air are achieved under the wave band of 220-230 nm. And a transition layer with the thickness of 50-200 nm is arranged between the light emitting surface of the chip and the composite layer, so that the adhesive force is improved and the thermal stress is relieved. The device is compact in structure, low in energy consumption, free of mercury, environmentally friendly and suitable for the fields of far ultraviolet disinfection, air purification, healthy illumination in closed space and the like.

The utility model relates to an ultraviolet oxidation combined sewage treatment device which comprises a dosing tank, a water distribution tank, a treatment tank and a water outlet tank which are connected in sequence, the bottom of the dosing tank is communicated with the upper part of the water distribution tank, and the dosing tank is used for inputting an oxidizing agent added into the dosing tank into the water distribution tank; the treatment pond comprises a pipeline area, a reaction area and a sludge hopper area from top to bottom, the lower part of the water distribution pond is communicated with the bottom of the reaction area and is used for feeding water into the reaction area, the top of the reaction area is communicated with the water outlet pond, and treated water is input into the water outlet pond; a plurality of far ultraviolet lamps are uniformly arranged in the reaction area and are used for performing photolysis treatment on new pollutants in sewage, a plurality of telescopic cleaning sleeves are arranged in the pipeline area, cleaning brushes are arranged on the inner walls of the bottoms of the cleaning sleeves, the positions of the cleaning sleeves and the far ultraviolet lamps are in one-to-one correspondence up and down, and when the cleaning sleeves extend, the bottoms of the cleaning sleeves can be sleeved outside the far ultraviolet lamps; and the cleaning brush is used for cleaning dirt on the outer side wall of the far ultraviolet lamp while descending along with the cleaning sleeve, so that the light energy transmittance is improved.

The invention relates to an onium salt, a chemically amplified resist composition and a pattern forming method. The present invention addresses the problem of providing: a chemically amplified resist composition which has excellent LWR and resolution and is capable of suppressing collapse of a resist pattern in optical lithography using high-energy rays such as far ultraviolet lithography, EUV lithography, and electron beam (EB) lithography; an onium salt using the chemically amplified resist composition; and a pattern forming method using the chemically amplified resist composition. The onium salt is represented by the following formula (1). # imgabs0 #

The onium salt can be used for a chemically amplified resist composition. The resist composition exhibits a high sensitivity, high resolution, having improved lithography properties such as LWR of line patterns, CDU of hole patterns, exposure latitude (EL), and depth of focus (DOF), and capable of suppressing collapse of resist patterns in photolithography using high-energy radiation such as a far ultraviolet ray, EUV, or an electron beam (EB) independent of whether it is of positive or negative tone, and to provide a pattern forming process. The onium salt having the formula (1).

The invention discloses a breeding wastewater purification method and system based on far ultraviolet / micro-nano ozone combination, and relates to the technical field of wastewater purification treatment. The breeding wastewater purification method comprises the following steps: introducing ozone and first wastewater into the micro-nano bubble generation unit to generate fluid containing ozone micro-nano bubbles; the fluid containing the ozone micro-nano bubbles and second wastewater are input into a multi-phase reactor to be evenly mixed, far ultraviolet light is adopted in the multi-phase reactor to radiate the fluid, the wavelength of the far ultraviolet light comprises 222nm, and discharging is conducted to obtain purified water. According to the invention, an efficient gas-liquid mass transfer interface and an enhanced photochemical oxidation process are constructed, so that compound pollutants such as antibiotics, pathogenic microorganisms and disinfection byproducts can be efficiently and safely removed, and the generation of toxic byproducts is effectively controlled, thereby ensuring the safe, green and sustainable development of the breeding industry.

The invention discloses a 222 nanometer far ultraviolet ray and X virus disinfection epidemic prevention light source and a special filtering lens for equipment. Comprising but not limited to six parts, namely a light incident surface 1, a concentric circle gear ring 2, a convex lens 3, a filter film 4, a light emergent surface 5 and a mounting ring 6. The transmission distance of 222 nanometer far ultraviolet rays in air or other media is increased, energy is saved, and effective disinfection and epidemic prevention space is enlarged.

Systems, methods, and devices for the generation and execution of an environmental protection plan may be deployed to aid with a reduction of, for example, air-borne and / or surface pathogens within an environment. The environmental protection plan may use one or more sanitizing devices to emit sanitizing radiation (e.g., far UVC light) into the environment to kill or otherwise neutralize pathogens such as viruses and bacteria within the environment. At times, the environmental protection plan may be responsive to one or more aspects (size, objects contained therein) of the environment, a use for the environment, a modeled and / or actual pathogen load within the environment, desired levels of pathogen reduction within the environment, and / or human and / or animal safety limits for the sanitizing radiation.

The present invention relates to a pest repelling, killing, and / or damaging UV light-emitting device (100) comprising—a housing (200),—a control element (110) configured to output a control signal (111), and—a UV light-emitting element (115) configured to emit, in response to the control signal (111), far-UVC light (125) thereby repelling, killing, and / or damaging one or more pests, e.g. or in particular mosquitos, irradiated by the emitted far-UVC light (125).

The invention discloses a method for removing pollutants in sewage. The method comprises the following steps: S1, mixing sewage, a ferric iron-containing compound and peracetic acid to obtain a mixed solution; s2, irradiating the mixed solution with 222-230nm ultraviolet light to react to remove pollutants; the pollutants comprise at least one of carbamazepine, sulfamethoxazole, benzodiazole and trimethoprim. According to the method, far ultraviolet light (FUV, 222-230 nm) is introduced to strengthen Fe (III) to activate PAA, so that the problem of insufficient reaction activity of a Fe (III) / PAA system is solved.

A system for eradicating pathogens is disclosed. A lamp is provided that emits a far-ultraviolet C (far-UVC) light generates an irradiation zone. A biometric sensor determines whether an individual is present in the irradiation zone. The biometric sensor signals a processor to determine whether the individual has been exposed to a threshold limit of far-UVC light. The processor determines whether the time an individual has been in the irradiation zone exceeds a threshold limit. If the individual has been in the irradiation zone a period of time exceeds the threshold, the lamp is deactivated. A pathogen detection sensor provides user feedback of the existence pathogens and signals the processor to terminate irradiation or provide user feedback to terminate irradiation. The system and method are included in a passenger compartment of a vehicle to eradicate pathogens on surfaces and aerosol. Threshold limits allow eradication while the vehicle is occupied.

The invention relates to the technical field of wastewater treatment, in particular to a method for degrading and detoxifying unsymmetrical dimethylhydrazine wastewater by activating persulfate through far ultraviolet, and aims to solve the problems of low free radical yield, limited UDMH mineralization and detoxification effects, serious secondary pollution and the like in a traditional advanced oxidation process. On the basis that 222nm far ultraviolet light (UV222) is adopted as an ultraviolet light source to activate persulfate and a UV222 / PS system is formed to degrade UDMH, an alkali activator is added into a reaction system to construct a'light-alkali-oxidant 'ternary synergistic system, the number of active free radicals generated by persulfate activation is increased, further mineralization and deep degradation of UDMH are promoted, and the UDMH degradation efficiency is improved. The degradation reaction is carried out at normal temperature and normal pressure, the reaction condition is mild, a metal catalyst does not need to be added, the whole degradation process is green and pollution-free, the degraded water body is safe and non-toxic, the reaction process is safe and reliable, and green and efficient degradation and detoxification of UDMH are realized.

To provide a method and a facility for producing a steel sheet by which gas adsorbed on the surface of the steel sheet carried into a vacuum tank can be removed without heating and / or cooling the steel sheet in the production facility having the vacuum tank through which the steel sheet is passed.SOLUTION: In a method for producing a steel sheet, in a production line having a vacuum tank through which a steel sheet is passed, the steel sheet is irradiated with far ultraviolet rays having wavelengths below 200 nm at integrated irradiance of 150 mJ / cm2 or more on the upstream side of the vacuum tank. A facility for producing a steel sheet includes the vacuum tank through which a steel sheet passes, and a far ultraviolet irradiation device that is installed upstream of the vacuum tank and irradiates the steel sheet with far ultraviolet rays.SELECTED DRAWING: Figure 1

The present invention relates to a pest repelling, killing, and / or damaging UV light-emitting device (100) comprising—a housing (200),—a control element (110) configured to output a control signal (111), and—a UV light-emitting element (115) configured to emit, in response to the control signal (111), far-UVC light (125) thereby repelling, killing, and / or damaging one or more pests, e.g. or in particular mosquitos, irradiated by the emitted far-UVC light (125).

The invention belongs to the technical field of water treatment, and particularly relates to a method for deeply treating organic pollutants in lignite gasification biochemical wastewater by using a far ultraviolet light activated oxidant. The method comprises the following steps: mixing lignite gasification biochemical wastewater with an oxidizing agent, and carrying out photocatalytic degradation reaction on the obtained reaction liquid to obtain effluent; the oxidizing agent comprises one or more of H2O2, persulfate and periodate; the photocatalytic degradation reaction is carried out under far ultraviolet light. The method provided by the invention can effectively degrade organic pollutants in lignite gasification biochemical wastewater, especially refractory organic pollutants, the removal rate of organic matters is greater than or equal to 90%, up-to-standard discharge can be realized, the treatment period is shortened (the total reaction time is 2-4 hours), the environmental adaptability is strong, and the method is suitable for industrial production. The problems that in a traditional Fenton method, the agent adding amount is large, the wastewater pH value adaptability is poor, the treatment efficiency of low-concentration refractory organic matter is unstable, the process reaction period is long, and the operation and maintenance cost is high are solved.

Systems, methods, and devices for the generation and execution of an environmental protection plan may be deployed to aid with a reduction of, for example, air-borne and / or surface pathogens within an environment. The environmental protection plan may use one or more sanitizing devices to emit sanitizing radiation (e.g., far UVC light) into the environment to kill or otherwise neutralize pathogens such as viruses and bacteria within the environment. At times, the environmental protection plan may be responsive to one or more aspects (size, objects contained therein) of the environment, a use for the environment, a modeled and / or actual pathogen load within the environment, desired levels of pathogen reduction within the environment, and / or human and / or animal safety limits for the sanitizing radiation.

To solve the problem in which improvement in a SE measurement tool is continuously demanded and even if a target feature is different, these SE data can be readily separated.SOLUTION: An ellipsometer device includes: a high-luminance light source 106 that provides an irradiation beam of selectable multiple wavelengths within a range from a far ultraviolet wavelength to an infrared wavelength; an irradiation optical system 102 that, in order to provide a spectroscopic ellipsometry, guides the irradiation beam toward a sample at selectable each set of an angle of incidence (AOI) or azimuth angle (AZ) and a polarization state, and includes an apodizer for controlling a spot diameter of the illumination beam hitting the sample at each selectable set of the angle of incidence or the azimuth angle; a collection optical system 104 that, in each selectable set of the angle of incidence or azimuth angle and polarization state, guides an output beam from the sample responding to the irradiation beam toward a detector generating an output signal or output image on the basis of the output beam; and a control unit that characterizes a feature of the sample on the basis of the output signal or output image.SELECTED DRAWING: Figure 1

The invention discloses a transcriptomics analysis-based far ultraviolet-peracetic acid disinfection effect evaluation method and an application of the transcriptomics analysis-based far ultraviolet-peracetic acid disinfection effect evaluation method. Specifically, it is found through transcriptomics analysis that related genes such as SAOUHSC00277, SAOUHSC02283, lacF, dnaK, mreC and Slp family genes and F-type ATP enzyme coding genes can serve as markers to be used for evaluating the far ultraviolet-peracetic acid disinfection effect, and the SAOUHSC00277 genes, the SAOUHSC02283 genes and the lacF genes are specific genes of a UV222 / PAA treatment group. Besides, the invention further provides a transcriptomics analysis-based far ultraviolet-peracetic acid disinfection effect evaluation method and device, the method and device are applied to disinfection detection equipment, automatic and intelligent real-time monitoring and feedback control of the disinfection effect in the water treatment process can be achieved, and the method and device have excellent application prospects.

The present disclosure relates to a far ultraviolet light emitting device and a home appliance having the same. The present disclosure may include a first electrode part 130A and a second electrode part 130B spaced apart from the first electrode part 130A. A barrier may be arranged between the first electrode part 130A and the second electrode part 130B. An ultraviolet lamp 140 may have an electrode connection surface 141B arranged toward the surface of the first electrode part 130A, the surface of the second electrode part 130B, and the surface of the barrier 126, and a light extraction surface 141A arranged toward the opposite side of the electrode connection surface 141B. In this case, at least one of the surfaces of the first electrode part 130A or second electrode part 130B and the surface of the barrier 126 may be spaced apart from each other to form a gap part 136. The gap part 136 may be opened toward the electrode connection surface 141B.

The invention relates to the technical field of wastewater treatment, in particular to a membrane distillation system and method for pretreating breeding wastewater by activating sulfite, and the method comprises the following steps: step 1, obtaining breeding wastewater to be treated, adding sulfite into the breeding wastewater to be treated, and uniformly stirring to obtain first sewage; step 2, putting the first sewage into a far ultraviolet reaction device, performing far ultraviolet irradiation treatment, and synchronously stirring to obtain second sewage; and 3, introducing the second sewage into a direct contact type membrane distillation system, and carrying out advanced treatment and concentration. According to the method disclosed by the invention, sulfite in water is selectively and efficiently activated by taking far ultraviolet light as a high-energy photon source, and a reaction system dominated by sulfate free radicals and hydrated electrons is constructed at normal temperature and normal pressure in the presence of dissolved oxygen, so that efficient degradation of organic pollutants in aquaculture wastewater and fundamental inhibition of membrane pollution potential are realized.

The present application relates to a kind of far ultraviolet photolysis and oxidation coupling sewage treatment device, including treatment pool body, the side of treatment pool body is equipped with water inlet pipe and oxidant pipe, respectively for input sewage and oxidant, opposite side is equipped with overflow effluent weir, the inside of treatment pool body includes shallow clear zone from top to bottom, turbidity zone, heavy turbidity zone and hopper zone;Shallow clear zone is uniformly provided with several vertical far ultraviolet lamp one, turbidity zone and heavy turbidity zone are uniformly provided with several rotatable photolysis components, photolysis component includes center shaft and the upper photolysis part and lower photolysis part on center shaft, upper photolysis part is in turbidity zone, lower photolysis part is in heavy turbidity zone;Upper photolysis part includes several far ultraviolet lamp two around center shaft, lower photolysis part includes several horizontal far ultraviolet lamp three around center shaft;Far ultraviolet lamp one and photolysis component provide light source for the region of different sludge content in treatment pool body, for photolysis pollutant in sewage.

A system for inactivating a pathogen in air, the system including a far-UV radiation source and an air filtration system. The far-UV radiation source and the air filtration system are operationally linked. The air filtration system can be configured for removing PM2.5 particles from air. The disclosure also provides a far-UV apparatus and a method for inactivation of a pathogen in air.

A fully transparent ultraviolet (UV) or far-ultraviolet (FUL) LED is disclosed, wherein all semiconductor layers except the active region are transparent to radiation emitted in the active region. A key technology enabling this invention is a transparent tunnel junction, which replaces the light-absorbing p-GaN and metal mirror p-contact regions currently found in all commercially available UV LEDs. This tunnel junction also allows for the use of a second n-AlGaN current-diffusing layer above the active region (on the p-side of the device), similar to the current-diffusing layer already present below the active region (on the n-side of the device). Therefore, small-area and / or remote p-contact and n-contact regions can be used, and light can be extracted from both the top and bottom sides of the device. This fully transparent semiconductor device can then be encapsulated using a transparent material to form a fully transparent UV or FUL LED with high brightness and high efficiency.

To enhance transmission and reflection in an EUV / SX wavelength range.SOLUTION: Coatings for use in an extreme ultraviolet / soft X-ray spectrum / DUV from 0.1 nm to 250 nm include one or more sub-wavelength "A-layers" alternately aligned with sub-wavelength "B-layers". The A-layers may include Group 1 material, Group 2 material, and Group 18 material. The B-layers may include transition metal, lanthanide, actinide, or one of combinations thereof. The A-layers and / or the B-layers may include nanostructures with features sized or shaped similarly to predicted defects. Additional top layers may include higher-atomic-number A-layer materials, hydrophobic materials, or charged materials.SELECTED DRAWING: Figure 1

A disinfection device system of a building comprising: a controller comprising at least one processor and at least one memory having instructions stored thereon that, when executed by the at least one processor, are configured to cause the at least one processor to: monitor one or more conditions of a space in the building; and selectively activate and deactivate at least one Far UV-C disinfection device installed in the space using the conditions of the space and one or more of an energy budget, a target total operating cost, or a net emissions target, wherein the Far UV-C disinfection device comprises at least one Far UV-C light source structured to output disinfecting light at a wavelength between 200 nm and 230 nm.