A method for manufacturing a multi-component target for magnetron
sputtering is that the technological process is conducted using
powder materials, the components of which are selected from powders:
tungsten (W), in an amount in the range of 69.9 to 84.6 wt%, advantageously 78.4 wt%,
boron (B) in an amount in the range of 13.5 to 24.3 wt%, advantageously 15.2 wt% and an intermediate
metal, advantageously
titanium (Ti), in an amount in the range of 1.7 to 6.4 wt%, advantageously 6,4 wt%, which are placed in a high-energy
ball mill in a
shielding gas atmosphere, advantageously
argon, and then the obtained mixture of powders (5) is compacted in a tool set constructed according to the invention, placed in the
vacuum chamber of a
spark plasma sintering (SPS) device, where the compacting process is conducted in a
sintering temperature from 1600 °C to 1800 °C, advantageously 1650 °C, with a heating rate from 10°C / min to 400 °C / min, over a time of 2 min to 30 min, under a pressure of 30 MPa to 50 MPa, advantageously 32 MPa, in a vacuum of more than 5 x10-2 mbar, advantageously 5 x10-2 mbar, to obtain a multi-component circular magnetron target with a
diameter within a range of from 80 mm to 100 mm, advantageously 100 mm. A tool set for the manufacturing of multi-component target placed in a
vacuum chamber of the
spark plasma sintering (SPS) device, characterised in that
graphite sintering tools containing cylindrical punches: lower (1) and upper (2) form with a circular die (3) a feeding chamber with an internal
diameter in the range of 80 to 100 mm, advantageously 100 mm for placing a mixture of powders (5). Moreover, the entire tool set has in a horizontal plane, centric in respect to its
vertical axis, sequentially placed elements. Proper selection of materials for individual elements of the tool set in the form of
graphite and CFRC composite and updated design of the tool set, as well as the use of complete
thermal insulation with the use of
graphite felt enabled significant reduction of
energy demand by the
spark plasma sintering device. Multi-component magnetron target, characterized in that it has the form of a circular target with a
diameter in the range of 80-100 mm, advantageously 100 mm and contains
tungsten (W) in an amount of 69.9 to 84.6 wt%, advantageously 78.4 wt% and
boron (B) in an amount from 13.5 to 24.3 wt%, advantageously 15.2 wt% and an intermediate
metal, advantageously
titanium (Ti), in an amount in the range from 1.7 to 6.4 wt%, advantageously 6.4 wt%.