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High-dispersion nano silicon dioxide preparation method

A nano-silica, high-dispersion technology, applied in the preparation of silica, silicon oxide, oxide/hydroxide, etc., can solve the problem of the reduction of the size of the reaction chamber, the influence of the geometric size and shape of the reaction flame, and the influence of continuous production. to improve continuity

Inactive Publication Date: 2003-06-11
ZHEJIANG KAIHUA SYNTHETIC MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The production process of fumed silica was first developed by German Degussa company in 1941. However, only a few countries in the world, such as Germany, the United States, Japan, Ukraine and China, have mastered the industrial production technology of fumed silica. Traditional The production process of fumed silica is basically similar. First, the vaporized halosilane is mixed with hydrogen and oxygen, and then burned in a combustion chamber (reaction chamber) to obtain silica aerogel, which is then aggregated through an aggregator. Then through gas-solid separation (such as gravity sedimentation, cyclone separator separation, centrifugal separator separation, impact separator separation) to separate the solid product from the reaction waste gas and unreacted gas, and then through the deacidification process, the adsorbed on the silica The hydrogen halide gas on the surface is removed, so as to obtain the finished product. For specific methods, see U.S. Patent 418964, 3954945 and 4048290 and Chinese Patent CN 1043633C, etc. However, in the traditional method, the fumed silica particles are easy to deposit on the reaction chamber wall. With the extension of time, the deposited silica particles will reduce the size of the reaction chamber, which will affect the geometric size and shape of the reaction flame, and finally affect the uniformity and quality of the product. Sometimes during the production process, the mechanical cleaning reaction must be stopped room, affecting the continuity of production

Method used

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Examples

Experimental program
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Embodiment 1

[0018] Methyltrichlorosilane at 7.5m 3 / h, hydrogen at 8m 3 / h, air at 85m 3 The supply of / h is continuously sent to the premixer for premixing (the above volume is the standard volume), and it is preheated to 120°C and then enters the burner nozzle. The specific process is as follows figure 1 , the protective gas is air, the temperature in the deacidification furnace is 550°C, and the temperature of water vapor and nitrogen is 200°C. The quality indicators of the prepared silica are as follows: silica content (%) 99.80 average primary particle diameter ( nm) 20 specific surface area (m 2 / g) 153PH value 3.95 Carbon content (%) 0.01

Embodiment 2

[0020] The methyl trichlorosilane of embodiment 1 is replaced with silicon tetrachloride, and silicon tetrachloride is 7m 3 / h, hydrogen at 8.5m 3 / h, air at 72m 3 The supply of / h is supplied, and other process parameters are identical with embodiment 1, and the silicon dioxide quality index of making is as follows: silicon dioxide content (%) 99.85 primary particle mean diameter (nm) 16 specific surface area (m 2 / g) 197PH value 4.05 Carbon content (%) not measured

Embodiment 3

[0022] The methyltrichlorosilane in Example 1 is replaced with 60% methyltrichlorosilane and 40% silicon tetrachloride, and the supply is 10m 3 / h, hydrogen is 12m 3 / h, the air is 96m 3 / h, other process parameters are the same as in Example 1, and the quality index of the obtained silicon dioxide is as follows: silicon dioxide content (%) 99.82 primary particle average particle diameter (nm) 15 specific surface area (m 2 / g) 208PH value 4.03 Carbon content (%) 0.01

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Abstract

The invention discloses a method to prepare high-disperse nano SiO2, imputting O2-H2 organic halogen silane in a certain proportion into reaction room to make burning reaction, at the same time inputting a protective gas, vapor and inert gases, adopting the produced water and heat to make high-temperature hydrolytic condensation reaction and making the late process such as aggregative gas-solid separation deacidification on the reaction product to obtain it, primary particle dimaeter 7-40 nm, ratio surface area 100-400 m2 / g, pH value 3.8-4.5, SiO2 receiving rate >99%.

Description

Technical field [0001] The invention relates to a preparation method of highly dispersed nano silicon dioxide. Background technique [0002] Due to its unique physical and chemical properties, highly dispersed nano-silica is widely used in the fields of rubber, plastics, coatings, paint inks, adhesives, cosmetics, medicine, agriculture, etc., to strengthen, thicken, thixotropy, extinction, Anti-settling, anti-sagging and anti-aging effects. At present, the methods for preparing highly dispersed nano-silica can be divided into two types, one is the wet method, which uses a silicate solution (such as sodium silicate) to hydrolyze under acidic or alkaline conditions, and then undergoes a series of post-treatments. Process to obtain silica, also known as precipitated white carbon black, the other is dry method, using organosilicon halides (such as silicon tetrachloride, methyl trichlorosilane, etc.) to obtain silica by flame high temperature hydrolysis Airgel, and then through...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B13/14C01B33/12C01B33/18
Inventor 段先健王跃林杨本意李亚静
Owner ZHEJIANG KAIHUA SYNTHETIC MATERIAL
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