High-dispersion nano silicon dioxide preparation method
A nano-silica, high-dispersion technology, applied in the preparation of silica, silicon oxide, oxide/hydroxide, etc., can solve the problem of the reduction of the size of the reaction chamber, the influence of the geometric size and shape of the reaction flame, and the influence of continuous production. to improve continuity
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Embodiment 1
[0018] Methyltrichlorosilane at 7.5m 3 / h, hydrogen at 8m 3 / h, air at 85m 3 The supply of / h is continuously sent to the premixer for premixing (the above volume is the standard volume), and it is preheated to 120°C and then enters the burner nozzle. The specific process is as follows figure 1 , the protective gas is air, the temperature in the deacidification furnace is 550°C, and the temperature of water vapor and nitrogen is 200°C. The quality indicators of the prepared silica are as follows: silica content (%) 99.80 average primary particle diameter ( nm) 20 specific surface area (m 2 / g) 153PH value 3.95 Carbon content (%) 0.01
Embodiment 2
[0020] The methyl trichlorosilane of embodiment 1 is replaced with silicon tetrachloride, and silicon tetrachloride is 7m 3 / h, hydrogen at 8.5m 3 / h, air at 72m 3 The supply of / h is supplied, and other process parameters are identical with embodiment 1, and the silicon dioxide quality index of making is as follows: silicon dioxide content (%) 99.85 primary particle mean diameter (nm) 16 specific surface area (m 2 / g) 197PH value 4.05 Carbon content (%) not measured
Embodiment 3
[0022] The methyltrichlorosilane in Example 1 is replaced with 60% methyltrichlorosilane and 40% silicon tetrachloride, and the supply is 10m 3 / h, hydrogen is 12m 3 / h, the air is 96m 3 / h, other process parameters are the same as in Example 1, and the quality index of the obtained silicon dioxide is as follows: silicon dioxide content (%) 99.82 primary particle average particle diameter (nm) 15 specific surface area (m 2 / g) 208PH value 4.03 Carbon content (%) 0.01
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