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Excimer lamp device

A technology for excimer lamps and lampshades, applied in lighting devices, discharge lamps, lighting applications, etc., can solve problems such as difficult substrate processing, and achieve the effects of avoiding electrode oxidation, stabilizing cleaning effects, and suppressing excessive attenuation

Active Publication Date: 2008-02-27
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, it is more difficult to perform stable substrate processing by controlling the relative humidity

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0104] According to the structure of Fig. 1, the experimental machine of the excimer lamp device (10) was made. The specific structure of the excimer lamp device (10) is as follows.

[0105] The excimer lamp (20) has the structure shown in Fig. 2, has an outer diameter of 18.5 mm, an inner diameter of 16.5 mm, and a cylindrical discharge vessel (21) made of quartz glass with a total length of 2470 mm, and is arranged in the center of the tube. One electrode (22), and another electrode (23) in a semi-cylindrical shape is provided on the outer surface of the discharge vessel (21). Moreover, excimer generation gas with a pressure of 60 kPa was sealed inside this discharge vessel (21), and the excimer lamp whose rated power consumption was 600 W was produced.

[0106] Four excimer lamps ( 20 ) fabricated in this way were used and mounted on the excimer lamp device according to the structure of FIG. 1 .

[0107] The gas supply piping provided adjacent to the excimer lamp (20) is ...

Embodiment 2

[0129] The gas supply device shown in FIGS. 4 and 5 was installed on the excimer lamp device used in the above-mentioned Example 1 to constitute an experimental device. As the object to be processed, a substrate having the same structure as the substrate used in the above-mentioned Example 1 was used, and the absolute humidity (weight absolute humidity) in the inert gas was changed between 0 and 8.0 g / kg to perform cleaning, and the The contact angle of pure water on the substrate surface was measured. In addition, the driving conditions of the device are also the same as those in the above-mentioned embodiments.

[0130] Fig. 10 shows the results of Example 2.

[0131] The contact angle of pure water on the substrate decreases as the water vapor increases from the weight absolute humidity of 0 g / kg, and the lowest contact angle is obtained around 3.0 to 3.5 g / kg. If the weight absolute humidity is greater than this, the contact angle will gradually increase, and if the weig...

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Abstract

To provide an excimer lamp device suitably coping with enlargement of a substrate, reducing running cost, and surely treating the surface of the substrate. The excimer lamp device related to the present invention is provided with a lamp house storing excimer lamps; a gas supply pipe having gas jetting ports disposed in the lamp house and located in parallel and alternately with the excimer lamps; and a gas supply means introducing inert gas containing steam to the gas supply pipe. The inert gas with the absolute humidity controlled to a given value is supplied to the gas supply pipe by the gas supply means. The absolute humidity is preferably controlled to 0.5-6.5 g / kg in terms of the weight absolute humidity.

Description

technical field [0001] The present invention relates to an excimer lamp device, which irradiates ultraviolet light on the surface of glass, semiconductor, resin, ceramic, metal, etc., such as liquid crystal panel substrate, semiconductor wafer, magnetic disk substrate, and optical disk substrate, and their composite substrates, thereby cleaning , Etching and other substrate processing. Background technique [0002] An excimer lamp device equipped with a known excimer lamp such as Patent Document 1, irradiates the surface of the object to be processed with ultraviolet light emitted from the excimer lamp in the range of 200 nm or less and 100 nm or more in an atmosphere where a trace amount of oxygen exists , through the enhanced effect of the generated active oxygen and the transmitted ultraviolet light, the organic matter on the surface of the object to be treated is decomposed and scattered, thereby cleaning. [0003] That is, the surface of the substrate is irradiated wit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F21S2/00H01L21/00F21W131/403
CPCB08B7/0057H01J65/04H01L21/67011
Inventor 菱沼宣是远藤真一
Owner USHIO DENKI KK
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