Device and method for measuring laser irradiation optical thin film damage threshold in high-temperature environment

Abstract

The invention relates to a device and a method for measuring a laser irradiation optical thin film damage threshold in a high-temperature environment. The measuring device comprises a first laser, a second laser for collimating a light path and assisting detection damage, a temperature control box for heating a sample and realizing temperature control, a high temperature resistance movable platform located in the temperature control box, and a test sample on the high temperature resistance movable platform. Different temperatures and holing time are set through the temperature control box, so that an instant damage threshold and damage durability of the thin film are evaluated. The measuring device has the advantages that: 1, the problem that in the prior art, only the laser irradiation optical thin film damage threshold in a normal temperature condition is solved, and the device capable of measuring the laser irradiation optical thin film damage threshold in the high-temperature environment is provided; and 2, the device has the measuring method being simple and easy to realize, and can be used for measuring the instant damage threshold of the laser irradiation optical thin film in the high-temperature environment, measuring the damage threshold of samples with different insulation time, and evaluating the durability of laser damage in the high-temperature environment of the thin film.

Description

Technical field [0001] The invention relates to a device and method for measuring the optical performance of an optical film, in particular to a device and method for measuring the damage threshold of an optical film under a high temperature environment. Background technique [0002] Optical film damage is the main factor limiting the high power and high energy of laser systems, so the research on damage threshold has been a hot issue for many years. Since most lasers are used under normal temperature environment, the laser damage threshold of the optical film is tested at normal temperature, and the result is the normal temperature laser damage threshold. However, with the expansion of laser applications, the influence of temperature factors on thin film laser damage has become more and more prominent. For example, in the context of the rapid development of space technology, space lasers need to consider the influence of temperature factors, because the temperature of the direc...

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Problems solved by technology

[0003] The object of the present invention is to provide a device and method for measuring the damage threshold of optical thin films irradiated by laser light in a high-temperature environment, so as to solve the problem that the laser damage threshold of optical thin films is tested at room temperature, and the high-temperature laser damage threshold cannot be obtained.

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