Method for repairing fused quartz optical damage component

Abstract

The invention discloses a method for repairing a fused quartz optical damage component, which belongs to the technical field of the optical material and the optical component, in particular to a method for repairing and processing laser damage of a fused quartz optical component. The method comprises the following steps: firstly adopting infrared carbon dioxide laser to carry out laser fusion repair on the damage part of the fused quartz optical damage component; and then carrying out annealing treatment on the fused quartz optical damage component subjected to laser fusion repair. The method can carry out complete repair on the fused quartz optical damage component and eliminate residual stress caused by the laser fusion repairing process. The fused quartz optical component repaired by the method can revert to the state of the ideal fused quartz optical component. And the method also can inhibit the increase of the damage points of the fused quartz optical component. The method can prolong the service life of the fused quartz optical component, greatly reduces operation cost and has the characteristics of strong process controllability, high repetitiveness and stable performance.

Description

technical field [0001] The invention belongs to the technical field of optical materials and optical elements, and in particular relates to a repairing method for laser damage of fused silica optical elements. Background technique [0002] Fused silica is the most commonly used optical material in large-scale high-power laser systems. Fused silica optical materials are widely used in the preparation of optical components such as lenses, windows, and shielding sheets in laser systems. Under the action of strong laser light, the fused silica optical element is easily damaged. When the total area of ​​the damage points exceeds a certain percentage, the fused silica optical element will be considered completely damaged and cannot be used any longer. In the National Ignition Facility (NIF) of the United States, when the damage area of ​​the fused silica optical element accounts for more than 3%, the use of the fused silica optical element will be discontinued. If the damage poin...

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Problems solved by technology

Among them, plasma etching and micro-flame processing methods need to pass carbon tetrafluoride gas during the processing process, which will pollute the optical components; hydrofluoric acid etching can passivate the internal structure of the defect to repair the damage or inhibit it to a certain extent. Damage growth, however, increases the overall roughness of the optical element while passivating the defect, and in severe cases will reduce the laser damage threshold of the element; carbon dioxide laser repair is the best way to inhibit damage growth, but due to the low thermal conductivity of the fused silica material, the element The local high temperature in the repair area is likely to generate large residual stress, which will cause the components to crack during subsequent use, thus affecting the normal operation of the laser system and causing huge economic losses

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