The invention discloses a
green light Micro-LED epitaxial structure, a preparation method of the
green light Micro-LED epitaxial structure and a
green light Micro-LED, and relates to the field of
semiconductor photoelectric devices. The epitaxial structure sequentially comprises a substrate, a buffer layer, a non-doped GaN layer, an N-type GaN layer, an
electron transport layer, a multi-
quantum well layer and a P-type GaN layer; the
electron transport layer sequentially comprises a first sub-layer, a second sub-layer, a third sub-layer, a fourth sub-layer, a fifth sub-layer and a sixth sub-layer; the first sub-layer comprises a non-doped Al-containing
nitride layer and a Si-doped Al-containing
nitride layer which are alternately stacked; the second sub-layer, the third sub-layer and the fourth sub-layer are all C and Si co-doped Ga-containing
nitride layers, the fifth sub-layer is a Si-doped AlGaN layer, and the sixth sub-layer comprises Si-doped GaN
layers and InGaN
layers which are alternately stacked; the Si
doping concentration of the second sub-layer, the third sub-layer and the fourth sub-layer is greater than the Si
doping concentration of the Si-doped Al nitride layer; and the Si
doping concentrations of the second sub-layer, the third sub-layer and the fourth sub-layer are respectively greater than the C doping concentrations thereof. By implementing the invention, the lighting effect and the
wavelength uniformity can be improved.