A 
radiation-sensitive patterning composition comprising:(1) at least one acid generating compound selected from the group of compounds of formulae (I) or (II): wherein R1, R2, R3, R4, R5, and R6, are individually selected from the group consisting of a 
hydrogen atom, nitro group, hydroxyl group, a 
carbonyl group, a 
halogen atom, a cyano group and an unsubstituted or substituted 
alkyl group, an unsubstituted or substituted cycloalkyl group; an unsubstituted or substituted 
alkoxy group, or an unsubstituted or substituted 
aryl group;wherein X+ represents an 
onium ion selected from the group consisting of diazonium, iodonium, 
sulfonium, 
phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium, 
selenium, 
tellurium and arsenium; andwherein n is an integer from 4 to 100;(2) at least one cross-linking agent cross-linkable by an acid;(3) at least one 
polymer compound capable of reacting with the cross-linking agent; and(4) at least one 
infrared absorbing compound.