A
radiation-sensitive patterning composition comprising:(1) at least one acid generating compound selected from the group of compounds of formulae (I) or (II): wherein R1, R2, R3, R4, R5, and R6, are individually selected from the group consisting of a
hydrogen atom, nitro group, hydroxyl group, a
carbonyl group, a
halogen atom, a cyano group and an unsubstituted or substituted
alkyl group, an unsubstituted or substituted cycloalkyl group; an unsubstituted or substituted
alkoxy group, or an unsubstituted or substituted
aryl group;wherein X+ represents an
onium ion selected from the group consisting of diazonium, iodonium,
sulfonium,
phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium,
selenium,
tellurium and arsenium; andwherein n is an integer from 4 to 100;(2) at least one cross-linking agent cross-linkable by an acid;(3) at least one
polymer compound capable of reacting with the cross-linking agent; and(4) at least one
infrared absorbing compound.