Maskless femtosecond laser manufacturing method for super-hydrophobic and anti-reflective surface

A femtosecond laser and femtosecond laser processing technology, which is applied in the field of hydrophobic and anti-reflection material preparation, can solve the problems of high price, poor controllability of the preparation process, complex mask plate preparation, etc., and achieves low cost, good superhydrophobicity and The effect of self-cleaning properties

Active Publication Date: 2017-10-13
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, some of these methods require vacuum equipment in the preparation process, which is expensive, such as electron beam etching and ion beam sputtering; some preparation processes have poor controllability, such as chemical etching, etc.; The preparation of masks and masks is complicated and expensive, such as photolithography, etc.; these shortcomings greatly limit the commercial application of superhydrophobic materials

Method used

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  • Maskless femtosecond laser manufacturing method for super-hydrophobic and anti-reflective surface
  • Maskless femtosecond laser manufacturing method for super-hydrophobic and anti-reflective surface
  • Maskless femtosecond laser manufacturing method for super-hydrophobic and anti-reflective surface

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Embodiment 1

[0036] Taking the copper base as an example below, that is, the material 7 to be processed is copper, illustrating the implementation process of a method for manufacturing a super-hydrophobic and anti-reflective surface by a femtosecond laser without a mask of the present invention, including the following steps:

[0037] (1) build as figure 1 The femtosecond laser processing system shown; the femtosecond laser processing system consists of a femtosecond laser 1, an aperture 2, an attenuation plate 3, an optical shutter 4, and a dichromatic mirror 5; an objective lens 6, a material to be processed 7, and a six-degree-of-freedom translation stage 8 , lighting lamp 9, beam splitter 10, charge coupled device (CCD) 11, and computer 12. The femtosecond laser with a wavelength of 800nm, a pulse duration of 35fs, and a repetition rate of 1kHz is generated by the femtosecond laser 1, passes through the diaphragm 2, the attenuation plate 3, and the optical shutter 4, and is reflected b...

Embodiment 2

[0045] A method for manufacturing super-hydrophobic and anti-reflection surfaces with maskless femtosecond laser, the steps are as follows:

[0046] (1) build as figure 1 The femtosecond laser processing system shown;

[0047] (2) if figure 2 As shown in (b), a film with a thickness of one nanometer is plated on the copper substrate by using the magnetron sputtering coating method; in this embodiment, a silicon dioxide film is plated, and the thickness of the film is 100nm. However, those skilled in the art know that in order to obtain different super-hydrophobic and anti-reflection effects, it is not limited to coating silicon dioxide films here, and this method can be used to coat gold, silver and other thin films of different thicknesses;

[0048] (3) if figure 2 As shown in (c), in air, a femtosecond laser is used to selectively ablate and remove silicon dioxide on a copper substrate coated with a silicon dioxide film to process a linear array structure. However, tho...

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Abstract

The invention relates to a maskless femtosecond laser manufacturing method for a super-hydrophobic and anti-reflective surface and belongs to the field of preparation of super-hydrophobic and anti-reflective materials. The maskless femtosecond laser manufacturing method for the super-hydrophobic and anti-reflective surface comprises the following steps that (1) a copper substrate is plated with a film of a nanometer thickness through electron beam evaporation or a magnetron sputtering coating method; (2) through a femtosecond laser direct writing method, patterning is conducted on the copper substrate plated with the film of the nanometer thickness, and the shape of patterning can be controlled through a program; (3) a heating device is used for conducting thermal oxidation treatment on the substrate obtained after femtosecond laser patterning, and then a micro-nanometer composite structure is prepared. Compared with the prior art, the maskless femtosecond laser manufacturing method for the super-hydrophobic and anti-reflective surface has the advantages that the manufacturing process does not need a vacuum device or an optical mask, and the manufactured substrate is controllable in shape and has the super-hydrophobic performance, the self-cleaning performance, the anti-reflective performance and other performances.

Description

technical field [0001] The invention belongs to the field of preparation of hydrophobic and anti-reflection materials, in particular to a method for manufacturing super-hydrophobic and anti-reflection surfaces by femtosecond laser. Background technique [0002] Surface micro-nanostructures have a wide range of applications in the fields of self-cleaning, superhydrophobicity, oil-water separation, anti-reflection, and Raman detection. In recent years, surface micro-nanostructures have attracted extensive attention from the scientific and industrial circles due to their wide application value. Surfaces with static contact angles greater than 150° and sliding angles less than 10°, represented by lotus leaf surfaces, are called superhydrophobic surfaces. Current research shows that the hydrophobicity of materials is determined by the chemical composition and surface structure of the material surface. The chemical composition of the material surface is the basis of the hydrophi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/354B23K26/064C23C14/30C23C14/35C23C14/58
CPCB23K26/064B23K26/354C23C14/30C23C14/35C23C14/5806C23C14/5846
Inventor 姜澜胡洁曹伟毛振威芦勇
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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