31 results about "Mask inspection" patented technology

The invention relates to a device (1) for holding an optical element (2), in particular an optical element of a mask inspection system or a lithography system, comprising a mounting point (3) for connection with the optical element (2), a support (4), and a support base (5). The mounting point (3) is connected to the support (4). The support (4) has at least one leg (6) and an ankle joint (7), wherein the ankle joint (7) pivotally connects a lower end (6a) of the leg (6), facing away from the mounting point (3), to the support base (5). According to the invention, the ankle joint (7) has a support joint (7a) and a transverse joint (7b), wherein the support joint (7a) pivotally connects the lower end (6a) of the leg (6) directly to the support base (5).

PURPOSE: To provide an inspection device with which it is possible to suppress background reflections of a ghost image.CONSTITUTION: An inspection device 100 in one embodiment of the present invention is characterized by having: a lens array 304 for dividing inspection light into multiple rays of light upon receiving radiation of the inspection light; a lens array stage 320 for supporting the lens array and capable of moving in a plane orthogonal to the optical axis of the inspection light; an objective lens 104 for irradiating a mask substrate on which a diagram pattern is formed, with at least some of the multiple rays of light; an imaging sensor 105 for capturing an optical image of the mask substrate that is obtained by irradiating the mask substrate with light; a luminous quantity sensor 324 for measuring the luminous quantity of the inspection light; and a stage control circuit 140 for controlling a stage so that the position of the lens array is changed when the integral amount of measured luminous quantities increases to a threshold or greater.SELECTED DRAWING: Figure 1

A mask inspection machine includes a platform unit for carrying a transparent container. The transparent container includes a lower window and an upper window. The platform unit includes a platform and a carrier. The platform includes a slot. The carrier is movable on the platform along the slot. The carrier includes a plate and guiding elements. The plate includes a support face including an inspection window corresponding to the lower window of the transparent container. The guiding elements are connected to the support face for guiding the transparent container onto the support face.

A method for operating a mask inspection device, in which a photomask illuminated with EUV radiation is imaged onto an image sensor of an EUV camera by a projection lens. The photomask is borne by a positioning system, the positioning system being designed to change the position of the photomask relative to the projection lens. The photomask is moved relative to the projection lens during an exposure process of the EUV camera so that an image line is captured. An image structure included in the image line is compared with a reference structure and a variance between the image structure and the reference structure results in the positioning system being actuated in order to perform a corrective movement of the photomask. The invention also relates to a mask inspection device, a control system and a computer program product.

This invention provides a high-resolution, low-energy electron microscope and a mask inspection method for providing topographic information. [Solution] A corrected scanning electron microscope (CSEM) and a method for operating the CSEM are presented for selectively separating material contrast from topographic contrast. The microscope and method enable high imaging resolution by backscattered electrons generated from low-energy primary electrons. The CSEM and method are applicable to mask modification and circuit editing processes having resolution requirements in the low nm range or even lower range.

An inspection system includes a stage for positioning a substrate to be inspected, one or more reticle-based diagnostic targets positioned on the stage, and a reticle inspection sub-system having a field of view encompassing the stage. The system includes a controller configured to move the field of view between portions of the stage to selectively perform substrate and run time diagnostics (RTD) of predefined image quality metrics. In embodiments, the system may be an APMI system for EUV mask inspection and the diagnostic targets may be EUV reticle-based diagnostic targets having predefined EUV performance patterning. In embodiments, the diagnostic targets may be positioned adjacent to the mask to be inspected to permit contiguous scanning to perform inspection and RTD.

Disclosed is an optical system for mask inspection, comprising an objective lens, a first beam splitter, a second beam splitter, a primary tube lens, and a tube lens switching mechanism. The objective lens, the first beam splitter, the primary tube lens, the tube lens switching mechanism, and the second beam splitter are sequentially arranged along an inspection optical path. At least two secondary tube lenses are connected into the tube lens switching mechanism. The tube lens switching mechanism is used to drive the secondary tube lenses to move, so as to switch different secondary tube lenses into the inspection optical path. Consequently, light, after passing through the objective lens, is transmitted to the primary tube lens through the first beam splitter, then passes through the primary tube lens and the secondary tube lens positioned in the inspection optical path, and then enters the second beam splitter. In the present utility model, optical magnification can be adjusted by means of switching tube lenses, thereby enabling inspection of masks with different line widths and improving inspection efficiency.

The invention relates to a manipulable platform for mounting a camera on a vacuum housing, as well as a mask inspection device and a method for adjusting a mask inspection device. A manipulable platform according to the invention comprises a first assembly (110, 210, 310) which provides a first adjustment mechanism for tilting the platform, wherein the first assembly (110, 210, 310) has a first double wedge arrangement consisting of two wedge-shaped ring disks (111, 112, 211, 212, 311, 312) which are rotatably mounted on one another about a predetermined axis via a first ball bearing (115, 215, 315).

The utility model relates to the technical field of mask detection machines, in particular to a double-sided polishing mask detection machine which comprises a detection machine body, a dust cover is fixedly mounted at the top of the detection machine body, inlet and outlet holes are formed in the front side and the rear side of the bottom of the dust cover, and four fixed triangular blocks are fixedly connected to the top of the detection machine body. The four fixed triangular blocks are arranged in pairs and are distributed in a bilateral symmetry mode, a side edge plate is fixedly connected between the two fixed triangular blocks in the same group, and two rollers are rotationally connected between the two side edge plates in a front-back symmetry mode. According to the facial mask detection device, the mode of double-face lighting and double-face shooting collection is adopted, the accuracy of collected images is improved, meanwhile, the detection accuracy is improved, when a defective facial mask is detected, suction is conducted through the suction mechanism, the defective facial mask is sucked into the collection box to be collected, and automatic removal of the defective facial mask is achieved.

The invention relates to an assembly (30) for semiconductor technology, comprising a module (32) and a module frame (33). The module (32) is connected to the module frame (33) by means of a support element (34) and is positioned relative to the module frame (33) by means of the support element (34). The connecting piece (35) comprises a clamping device (56, 58) which prevents the module (32) from being lifted from the module frame (33). According to the invention, the support element (34) has a clamping force element (50) for transmitting a clamping force generated by the clamping device (56, 58) and a positioning element (60) for positioning the module (32) relative to the module frame (33). Furthermore, the invention relates to a projection exposure system (1, 101) and a mask inspection device comprising the assembly according to the invention.

A mask inspection device, comprising a vacuum housing, an EUV camera and, arranged in the interior of the vacuum housing, a projection lens for imaging at least one portion of an EUV photomask onto an image sensor of the EUV camera. The EUV camera is mounted on the vacuum housing. The mask inspection device comprises an actuator for adjusting the position of the EUV camera, wherein the actuator acts on a conversion member arranged between the vacuum housing and the EUV camera. The conversion member converts an actuation travel of the actuator into an adjusting travel of the EUV camera, wherein the actuation travel is longer than the adjusting travel. The invention also relates to a method for adjusting a mask inspection device.

The invention relates to a mask inspection device, a vacuum sealing component and a method for adjusting a mask inspection device. A mask inspection device according to the invention comprises a vacuum housing (106, 306, 406), an EUV camera (310, 410) attached to the vacuum housing (106, 306, 406), and a projection lens (460) arranged in a vacuum chamber (330, 430) of the vacuum housing for imaging at least a section of an EUV mask (470) onto an image sensor (311, 411) of the EUV camera, wherein a vacuum sealing component having a flexible wall section (103, 303) is arranged between the vacuum housing and the EUV camera or a camera mount (107, 307) of this EUV camera, and wherein this flexible wall section is arranged radially outside a central axis (140, 340) of the EUV camera or the camera mount.

A mask inspection apparatus, a vacuum seal component and a method for adjusting a mask inspection apparatus. A mask inspection apparatus comprises a vacuum housing, an EUV camera mounted on the vacuum housing, and a projection lens, arranged in a vacuum chamber of the vacuum housing, for imaging at least one section of an EUV mask onto an image sensor of the EUV camera, wherein a vacuum seal component having a flexible wall portion is arranged between the vacuum housing and the EUV camera or a camera holder of this EUV camera, and wherein this flexible wall portion is arranged radially outside of a central axis of the EUV camera or of the camera holder.

An inspection system includes a stage for positioning a substrate to be inspected, one or more reticle-based diagnostic targets positioned on the stage, and a reticle inspection sub-system having a field of view encompassing the stage. The system includes a controller configured to move the field of view between portions of the stage to selectively perform substrate and run time diagnostics (RTD) of predefined image quality metrics. In embodiments, the system may be an APMI system for EUV mask inspection and the diagnostic targets may be EUV reticle-based diagnostic targets having predefined EUV performance patterning. In embodiments, the diagnostic targets may be positioned adjacent to the mask to be inspected to permit contiguous scanning to perform inspection and RTD.

An optical device (10) includes: an illumination optical system (12) that illuminates a surface of an object (20) with illumination light (L1) from a light source (11); and an image forming optical system (13) that forms light from the surface illuminated by the illumination optical system (12) into an image. The image forming optical system (13) includes a concave reflection mirror (PM1) that has formed therein an opening (15) which allows therethrough illumination light from a final optical member (IOF), which is disposed closest to the object (20) side among optical members constituting the illumination optical system (12) in an illumination optical path of the illumination optical system (12), and that condenses light (L2) from the surface. A reflection surface (16) of the concave reflection mirror (PM1) is formed around the opening (15).

A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.

A method for interferometer alignment in an apparatus for sample inspection with an inspection means and a sample stage, wherein at least a portion of at least one interferometer for monitoring a sample stage position is mechanically coupled to the inspection means, comprises aligning the interferometer relative to an optical alignment means coupled to the inspection means.

The utility model relates to the technical field of solar cell manufacturing, in particular to a mask detection device. The mask detection device provided by the embodiment of the utility model comprises a fixed frame; the rotary clamping piece is rotatably arranged on the fixing frame and rotates around a rotating shaft to drive the mask to rotate; the first thermal imaging unit is used for shooting a temperature hologram of the mask; according to the mode, the rotary clamping piece drives the mask plate and the pollutants attached to the mask plate to rotate, the mask plate and the pollutants generate friction with air in the rotating process to cause temperature rise, and due to the fact that the base plate of the mask plate, the shading film of the mask plate and the pollutants are made of different materials, the temperature rise is caused. After the substrate of the mask plate, the shading film of the mask plate and the pollutants are rubbed and heated, the temperatures are different, the temperature difference is generated, the temperature difference can be reflected through the temperature hologram collected by the first thermal imaging unit, detection of the pollutants on the mask plate is achieved, and the timeliness and accuracy of mask pollution detection are improved.

There is provided a system and method of a method of mask inspection, comprising: obtaining a plurality of aerial images of a mask; generating a plurality of image coresets corresponding to the aerial images, comprising, for each given aerial image: applying a printing threshold on the given aerial image to obtain a binary image representative of printable features thereof; extracting a contour for each feature of interest (FOI) from the printable features, and generating a descriptor characterizing the contour, giving rise to a group of contours associated with respective descriptors; and creating an image coreset for the group of contours based on the respective descriptors thereof, the image coreset comprising one or more families, each comprising at least one representative contour representing one or more similar contours of a respective type from the group of contours. The plurality of image coresets can be merged to obtain a mask coreset.

The invention relates to an apparatus (1) for holding an optical element (2), in particular an optical element of a mask inspection system or of a lithography system, comprising a holding point (3) for connection to the optical element (2), a support (4) and a support foot (5). The holding point (3) is connected to the support (4). The support (4) has at least one rod leg (6) and a foot joint device (7), wherein the foot joint device (7) articulatedly connects a lower end (6a) of the rod leg (6) facing away from the holding point (3) to the support foot (5). The invention provides for the foot joint device (7) to have a supporting joint (7a) and a transverse joint (7b), wherein the supporting joint (7a) articulatedly connects the lower end (6a) of the rod leg (6) directly to the support foot (5).

The invention relates to a manipulable platform for mounting a camera on a vacuum housing, to a mask inspection apparatus and to a method for adjusting a mask inspection apparatus. A manipulable platform according to the invention comprises a first assembly (110, 210, 310) which provides a first adjustment mechanism for tilting the platform, the first assembly (110, 210, 310) having a first double-wedge arrangement of two wedge-shaped annular discs (111, 112, 211, 212, 311, 312) which are rotatably mounted one on the other about a predefined axis via a first ball bearing (115, 215, 315).

The invention relates to a mask inspection device, a vacuum sealing component and a method for adjusting a mask inspection device. A mask inspection device according to the invention comprises a vacuum housing (106, 306, 406), an EUV camera (310, 410) attached to the vacuum housing (106, 306, 406), and a projection lens (460) arranged in a vacuum chamber (330, 430) of the vacuum housing for imaging at least a section of an EUV mask (470) onto an image sensor (311, 411) of the EUV camera, wherein a vacuum sealing component having a flexible wall section (103, 303) is arranged between the vacuum housing and the EUV camera or a camera mount (107, 307) of this EUV camera, and wherein this flexible wall section is arranged radially outside a central axis (140, 340) of the EUV camera or the camera mount.

The present disclosure relates to an EUV light source device for EUV mask inspection, including: an IR laser source for emitting an IR laser beam; a condenser lens for collecting the IR laser beam emitted from the IR laser source; a collector mirror having a hole formed at the center thereof in such a way as to pass the IR laser beam collected onto the condenser lens therethrough, the collector mirror being adapted to collect EUV light reflected onto a liquid target if the IR laser beam reacts with the liquid target to produce the EUV light; a target feeder for continuously feeding the liquid target to allow the IR laser beam passing through the hole formed on the collector mirror to react with the liquid target; and a plurality of heaters located on the collector mirror.

Method for inspecting a microlithographic photomask (17), wherein with the aid of a mask inspection device comprising an illumination lens (16) and a projection lens (22), the image of a photomask (17) illuminated by means of the illumination lens (16) is projected by the projection lens (22) onto an image sensor (24) of a camera (23) arranged in the image plane of the projection lens (22). The photomask (17) is placed on a positioning system (26) that is designed to displace the photomask (17). The photomask (17) is displaced using the positioning system (26) such that the image sensor (24) captures a first image line (101) that corresponds to a first region on the photomask (17). The photomask (17) is displaced using the positioning system (26) such that the image sensor (24) captures a second image line (102) that corresponds to a second region on the photomask (17). There is an overlap (200) between the first region and the second region such that the first and the second image line (101, 102) comprise a piece of image information regarding a structure of the photomask (17) arranged within the overlap (200). A defect detection method is applied to the piece of image information in the first image line (101) in order to determine a first piece of defect information. A defect detection method is applied to the piece of image information in the second image line (102) in order to determine a second piece of defect information. The first piece of defect information is compared with the second piece of defect information in order to determine a piece of information regarding the correctness of the structure of the photomask (17) arranged within the overlap (200). The invention also relates to a system for inspecting a microlithographic photomask, a computer program product, a method for repairing a microlithographic photomask and a method of microlithography.

An apparatus for inspection of a sample, the apparatus comprises a sample stage, an inspection means configured to inspect the sample on the sample stage in a line-wise scanning pattern, a position measurement means configured to measure a relative position of the inspection means and the sample stage while scanning, and a synchronization means configured to repeatedly provide a synchronization signal for synchronizing the inspection means, while scanning, based at least partly on the measured relative position.

The application discloses a mask inspection machine precision calibration sample, which comprises a substrate, a position calibration area and a precision calibration area are arranged on the substrate; a contrast pattern unit and a defect pattern unit are arranged in the precision calibration area; a plurality of mask sample contrast patterns are arranged in a horizontal and vertical array in the contrast pattern unit, the mask sample contrast patterns in the same row in the contrast pattern unit are consistent, and only the size is increased or decreased; a plurality of mask sample defect patterns are arranged in a horizontal and vertical array in the defect pattern unit, the mask sample defect patterns in the same row in the defect pattern unit are consistent, and only the size is increased or decreased; the mask sample contrast patterns and the mask sample defect patterns in the same row and column position in the contrast pattern unit and the defect pattern unit are consistent, and the sizes are the same, and only a defect feature is additionally arranged in the mask sample defect pattern; the mask inspection machine precision calibration sample solves the problem of full inspection of calibration and defects of the mask inspection machine precision.

A method for inspecting a microlithographic photomask (17), in which, using a mask inspection device comprising an illumination lens (16) and a projection lens (22), the image of a photomask (17) illuminated by the illumination lens (16) is projected by the projection lens (22) onto an image sensor (24) of a camera (23) arranged in the image plane of the projection lens (22). The photomask (17) is placed on a positioning system (26) designed to move the photomask (17). The photomask (17) is moved with the positioning system (26) such that the image sensor (24) detects a first image line (101) corresponding to a first area on the photomask (17). The photomask (17) is moved by the positioning system (26) so that the image sensor (24) captures a second image line (102) which corresponds to a second area on the photomask (17).There is an overlap (200) between the first and second regions, such that the first and second image lines (101, 102) contain image information about a structure of the photomask (17) arranged within the overlap (200). A defect detection method is applied to the image information in the first image line (101) to determine first defect information. A defect detection method is applied to the image information in the second image line (102) to determine second defect information. The first defect information is compared with the second defect information to determine information about the defect-free status of the structure of the photomask (17) arranged within the overlap (200). The invention also relates to a system for inspecting a microlithographic photomask, a computer program product, a method for repairing a microlithographic photomask, and a method for microlithography.

This invention provides a mask inspection device, relating to the field of mask inspection technology. It includes a marble vibration damping platform, a gantry support, and an XY-axis motion module. A light source assembly is located on one side of the top of the marble vibration damping platform. An equipment frame is located in the middle of the gantry support. A mask inspection fixture for precise positioning of the mask is mounted on the XY-axis motion module. A ring light connecting plate is fixedly connected to one end of the equipment frame, and a ring light fixing plate is fixedly connected to the end of the ring light connecting plate away from the equipment frame. A ring-shaped dark-field xenon lamp is fixedly connected to the bottom end of the ring light fixing plate. The mask inspection fixture achieves precise positioning and stable support of the mask, ensuring that the mask will not shift or deform during inspection, thereby guaranteeing the accuracy of the inspection results. The ring light fixing plate and the light source module provide stable and uniform illumination to the surface, avoiding false or missed detections due to uneven or insufficient illumination.

This application discloses a mask inspection method and apparatus for detecting defects in a mask after screen stretching. The method includes acquiring an initial image of the mask to be inspected; standardizing the initial image to obtain a standardized image; inputting the standardized image into a defect detection model for inspection to obtain a detection result; and generating a process adjustment instruction based on the detection result (if the result is not satisfactory), and feeding the process adjustment instruction back to the mask processing equipment to adjust the processing parameters of the processing equipment. According to the mask inspection method of this invention, process adjustment instructions can be generated in real time based on the detection result and fed back to the mask processing equipment, realizing a closed-loop linkage between the processing steps and defect detection. This allows for timely warning and correction of processing deviations, avoiding the generation of batch defective products and further reducing manufacturing costs.