392 results about "Dual beam" patented technology

A method comprises: providing FIB and CPB columns with FIB and CPB optical axes coinciding at a wafer surface; in the coincidence arrangement, removing a cross section surface layer of a measurement site of a wafer using the FIB column to make a new cross section accessible for imaging; reducing a working distance between the CPB imaging column and the wafer surface in a direction along the axis of the CPB imaging column; imaging the new cross section at the measurement site of the wafer with the CPB imaging column at the reduced working distance and thus not in the coincidence arrangement; and increasing the working distance between the CPB imaging column and the wafer surface in the direction along the axis of the CPB imaging column until the coincidence arrangement is reached.

The invention discloses a liquid guide laser processing device and method based on double-beam phase adjustment, belongs to the technical field of laser processing, and aims to reduce the width of a laser beam. The device comprises a laser light source, a first polarization state modulator, a beam splitter, a spatial light modulator, a second polarization state modulator, a polarization beam combiner and a coupler. A laser light source emits linearly polarized light, the linearly polarized light is converted into circularly polarized light through a first polarization state modulator, then the circularly polarized light is separated into first linearly polarized light and second linearly polarized light through a light beam separator, and on a second linearly polarized light transmission light path, a spatial light modulator adjusts the marginal region phase of the circularly polarized light to enable the marginal region phase to differ from the marginal region phase of the first linearly polarized light by a half cycle. And the second polarization state modulator adjusts the polarization direction to be the same as that of the first linearly polarized light, the polarization beam combiner combines the two beams of light, the coupler couples the combined laser beams to the liquid jet flow, and the liquid jet flow acts on the workpiece to be machined, so that optimization of the diameter of the laser beams is achieved.

The invention discloses a beam switching antenna system based on a reconfigurable technology. The beam switching antenna system based on the reconfigurable technology comprises a multi-unit antenna array, a Nolan matrix feed network and a reconfigurable power divider. The reconfigurable power divider in the beam switching antenna system based on the reconfigurable technology can switch different working states, and the signal energy is further distributed by the Nolan matrix feed network, so that the output signal meets the amplitude and phase conditions of a single beam, a double beam or a wide beam to feed the multi-unit antenna array; therefore, flexible switching among a single beam, double beams and a wide beam is realized, and the method has the advantages of low system overhead, low power consumption, rich beam types and flexible switching. The method is widely applied to the technical field of wireless communication.

The invention discloses a low-profile dual-circularly polarized wave beam scanning folding reflection array antenna. The low-profile dual-circularly polarized wave beam scanning folding reflective array antenna comprises a lower reflective array antenna and an upper circularly polarized selection metasurface. A circular polarization plane feed source is integrated in the middle of the reflective array antenna, and beam deflection is achieved. The circular polarization selection metasurface introduces opposite phase gradients to a left-hand circular polarization wave beam and a right-hand circular polarization wave beam through spin decoupling, and then introduces opposite wave beam deflection angles. Meanwhile, due to the polarization selection function of the circular polarization selection metasurface, the profile height of the antenna is half of the focal length of a traditional reflective array. By rotating the lower-layer reflective array antenna and the upper-layer circular polarization selection metasurface, the antenna can realize simultaneous + / -42-degree pitch angle scanning and 360-degree azimuth angle scanning of left-hand circular polarization and right-hand circular polarization dual beams, and the aperture efficiency, the axial ratio, the scanning loss and other performances are good. The low-profile dual-circularly-polarized wave beam scanning folding reflection array antenna provided by the invention can realize simultaneous scanning of two circularly-polarized wave beams, and is low in profile, compact in structure, low in cost and novel in function.

The invention relates to a Spin Exchange Relaxation-Free (SERF)-based magnetometer system (100) for detecting ultra- weak magnetic fields, particularly suited for bio¬ sensing applications such as MEG, MCG, and MRI. The system operates at room temperature and includes a VCSEL (101) emitting dual beams tuned to Rubidium-87 transitions, a microfabricated vapor cell (102) with LIAD-based heating (103), and an optical assembly (104) for polarization control. A detection unit (105) converts Faraday rotation into electrical signals, enhanced by lock-in amplification. Magnetic shielding (106), thermal management (107), and relaxation mitigation maintain SERF conditions. A calibration subsystem (109) and embedded machine learning module (110) optimize sensitivity in real time. The compact, cryogen-free architecture enables portable and wearable applications. The invention achieves femtotesla-level sensitivity while overcoming limitations of conventional SQUID-based systems, making it suitable for clinical and field deployments.

According to the SERF magnetic field measuring device closed-loop magnetic compensation method based on double-beam detection, Y-axis direction detection light used for decoupling is added on the basis of X-axis direction detection light, decoupling of three-axis magnetic field signals can be achieved, independent measurement and closed-loop control real-time magnetic compensation of a three-axis magnetic field are achieved, support is provided for further improving compensation precision, and the method is suitable for large-scale popularization and application. Comprising the steps that Y-axis direction detection light penetrating through an alkali metal gas chamber in the Y-axis direction, X-axis direction detection light penetrating through the alkali metal gas chamber in the X-axis direction and pumping light penetrating through the alkali metal gas chamber in the Z-axis direction are arranged in the SERF magnetic field measuring device, the X-axis direction detection light is used for detecting the optical rotation angle, and the Y-axis direction detection light is used for three-axis magnetic field decoupling; the pumping light is used for polarizing atoms in the alkali metal gas chamber; adding a Y-axis calibration signal; controlling the Z-axis coil current to compensate the Z-axis magnetic field according to the Py; controlling the X-axis coil current to compensate the X-axis magnetic field according to the Py; and controlling the Y-axis coil current to compensate the Y-axis magnetic field according to the Px.

The present invention belongs to the technical field of antennas. Provided are a dual-beam antenna, which is used for solving the technical problem of mutual interference of beams. The dual-beam antenna comprises at least one antenna module (1). The antenna module (1) comprises a first polarization port (21), a second polarization port (22), a plurality of radiation units (10) that are arranged in an array, and a plurality of connection lines, wherein the array has at least two columns of radiation units (10) in a first direction and has at least one row of radiation units (10) in a second direction; each radiation unit (10) is connected to the first polarization port (21) and to the second polarization port (22) by means of the connection lines, and in at least one of the first direction and the second direction, the phase difference between every two adjacent radiation units (10) is 180 degrees; and when at least one of the first polarization port (21) and the second polarization port (22) receives a signal input, dual beams relative to the direction of the phase difference are formed. Dual beams can be formed at least by using one polarization port, and beams among the dual beams are independent of each other and do not intersect with each other, thereby avoiding mutual interference.

The invention relates to the field of textile detection. The invention discloses a detection system for textile defect detection, which comprises a light source arranged on one side of a textile and used for outputting a detection light beam; the light path adjusting assembly is located in a light path from the light source to the textile; the image acquisition device is arranged on the other side and is used for acquiring an irradiated image signal; the angle adjusting device adjusts irradiation and acquisition angles of the light source and the image acquisition device; a reflecting component is arranged on one side of the light source and is controlled by a control switch to reflect a detection light beam to the textile; and the image processing unit is connected with the image acquisition device, analyzes the image signal and outputs a defect detection result. According to the detection system, light and shade contrast of flaw edges is enhanced through double-beam interference, and fine defects are accurately captured in combination with angle adjustment and multi-light-source adaptation. The detection method adjusts parameters in stages, automatically matches the optimal detection angle and light source intensity, and improves the adaptability of complex fabric detection.

According to the single-fiber coupling type double-beam miniaturized high-sensitivity atom magnetometer device, pumping laser and detection laser are orthogonally coupled into a single polarization maintaining fiber through a polarization beam splitter, and miniaturization of a light source light path is achieved. Besides, the polarization maintaining optical fiber and the polarization beam splitter are adopted to combine and decouple the light beams, so that the problems that the miniaturization difficulty of the magnetometer probe is increased due to light guide of multiple collimating heads and extra noise is introduced by multiple optical fibers are avoided, and high sensitivity is realized in a small detection volume; and a great promotion effect is achieved in related detection application of high-density multi-atom magnetometer array type heart and brain magnetism.

An antenna and method for using the same having a hybrid feed approach. In some embodiments, the metasurface antenna with dual beam capabilities is feed with feed waves from a center-fed waveguide structure and an edge-fed waveguide structure. In some embodiments, the antenna comprises an array of radio-frequency (RF) radiating antenna elements and operable to generate two beams simultaneously in response to interacting with two propagating waves at a same time; and a feed structure coupled to feed the two waves to the array of RF radiating antenna elements, the feed structure having a first waveguide beneath the RF radiating antenna elements in which the two waves propagate in opposite directions.

The invention provides a dual-mode gravitational acceleration precision measurement system and method based on a light floating effect. According to the system, a 1064nm laser double-beam correlation structure is adopted, a strong focusing light trap is formed in a gravity orthogonal direction, and micron-sized silicon dioxide particles are stably captured. In the absolute measurement mode, the acousto-optic modulator is used for controlling the on-off of the laser, the high-speed position detection module is used for detecting and recording the free falling motion trail of the particles and the displacement amplitude showing the resonance state after re-capturing, and the absolute gravitational acceleration parameter is inverted. In a relative measurement mode, weak focusing 532nm laser is configured along the gravity direction to construct a gravity compensation light trap, and after absolute gravitational acceleration reference measurement is completed, the laser is modulated by an acoustic optical modulator to accurately balance the gravity of particles, so that the particles enter a quasi-balance state. When the external gravitational field changes slightly, the characteristic displacement of the particles in the gravity direction is extracted, and the change of the relative gravitational acceleration can be monitored continuously.

The invention discloses a double-beam laser interference detection device and a detection method, the double-beam laser interference detection device is used for semiconductor etching and thin film process end point detection, and the double-beam laser interference detection device comprises an imaging unit, a detection unit and a reference unit; the detection unit comprises a first emitting part used for emitting detection light rays, and the detection light rays are focused to the wafer through the imaging unit; the first detector outputs a first reflection signal; the reference unit comprises a second emitting part and is used for emitting reference light to the imaging unit, so that the reference light is focused on the semiconductor equipment window; the second detector outputs a second reflected signal. And in the detection process, performing difference calculation on the first reflection signal and the second reflection signal to obtain a light intensity signal after interference elimination, and calculating the etching depth or the film deposition thickness of the wafer according to the light intensity signal after interference elimination. According to the invention, the problem of insufficient accuracy of detection of the wafer etching depth and the thin film deposition thickness end point caused by factors of vibration of semiconductor equipment and unstable environment can be eliminated.

Scalable decentralized redistributors and methods of redistributing signals in accordance with various embodiments of the invention are illustrated. One embodiment includes an array of channels configured to receive and retransmit a signal, where each of a plurality of independently operating channels in the array includes: at least one antenna element; an RF chain configured to apply a time delay to the received signal prior to retransmission; control circuitry configured to control the time delay applied to the received signal by the RF chain; and a reference oscillator. In addition, the array of channels is configured to steer a signal of a first frequency in a first direction and steer a signal of a second frequency in a second direction different from the first direction to create a dual beam redistributor.

System for performing chemical spectroscopy on samples from the scale of nanometers to millimeters or more with a multifunctional platform combining analytical and imaging techniques including dual beam photo-thermal spectroscopy with confocal microscopy, Raman spectroscopy, fluorescence detection, various vacuum analytical techniques and / or mass spectrometry. In embodiments described herein, the light beams of a dual-beam system are used for heating and sensing.

The invention relates to the technical field of semiconductor detection, in particular to a method and a system for measuring the thickness of a semiconductor epitaxial layer based on multi-beam interference correction. Acquiring infrared reflection spectrum data of the wafer under different incident angles, and performing double-stage smoothing preprocessing on the data by using a moving least square fitting algorithm; an interference extreme point is accurately identified by adopting a self-adaptive extreme value feature extraction strategy; the method comprises the following steps of: calculating the dynamic refractive index and the initial thickness estimation value of the epitaxial layer, constructing a multi-beam interference intensity distribution model, and finally providing a hybrid nonlinear optimization algorithm to invert the accurate thickness d of the epitaxial layer, thereby overcoming the measurement error caused by neglecting the multi-beam effect and the refractive index change in the traditional double-beam interference, and improving the accuracy of the multi-beam interference. And the precision and the reliability of epitaxial layer thickness measurement are remarkably improved through the combination of data preprocessing and a nonlinear optimization algorithm. The objective of the invention is to solve the problem of how to correct measurement errors caused by multi-beam effect and refractive index change.

The invention relates to the field of quantum measurement, and provides a CPT magnetometer magnetic measurement signal-to-noise ratio improving method and device based on a differential EIT-EIA signal. The CPT magnetometer solves the problem that a traditional CPT magnetometer is low in magnetic measurement signal-to-noise ratio due to the influence of environment temperature noise, laser stability and atomic gas chamber buffer gas. According to the main scheme, the CPT magnetometer comprises a laser generation module, a reference correction module, a differential detection module, a non-magnetic heating module and a signal processing module. The laser generation module generates reference / measurement double beams through the laser and the polarization regulation and control assembly; the reference correction module performs polarization conversion and optical path regulation and control on the reference light; the differential detection module divides the measurement light into two paths by adopting polarization beam splitting, the first path is subjected to polarization state conversion through an interference light path after frequency modulation, the second path is converted into circularly polarized light after optical fiber transmission, the two paths of light are coupled and then enter an atomic gas chamber for interaction, and differential detection is realized through a polarization beam splitting detector; and the non-magnetic heating module accurately controls the temperature of the air chamber by using a non-contact photo-thermal conversion technology.

The present invention relates to an optical system and a method for chromatic confocal spectral-domain optical coherence tomography or for chromatic confocal two-beam interferometry. The optical system comprises a multispectral light source unit configured to generate a plurality of spatially coherent multispectral light beams with spectra having a respective centroid wavenumbers, an achromatic focusing unit configured such that in at least a paraxial region around a common point located on an optical axis at the output of the achromatic focusing unit, the wavefronts of the respective spatially coherent multispectral light beams have different radii of curvatures, a chromatic confocal dual-beam interferometer having an non-zero optical path difference arranged downstream of the multispectral light source unit and a detection unit for detecting light returned from the dual-beam interferometer. The reference arm of the double-beam interferometer is configured to be achromatic and the object arm to have chromatic depth slitting of foci. In the reference arm, a plurality of depth separated reference light spots are formed. In the object arm, a plurality of at least partially colinear and overlapping multispectral stretches of diffraction limited light spots extended in a depth direction of the object arm is formed. The light reflected by a current sharply focused diffraction limited object light spot of each of the multispectral stretches of diffraction limited light spots is combined with a respective reference light spot, is confocally discriminated by a confocal discrimination unit of the detection unit and subsequently detected by at least one spectrometer, evaluation dual-beam interferometer or fast detector detects the confocally discriminated light.

The present invention relates to a dual-beam laser welding device and method, belonging to the field of material processing engineering, and comprising a structured light sensor, a front-side laser control system, a rear-side laser control system, a front-side laser, a rear-side laser, and a galvanometer system; the structured light sensor is arranged at the starting position of the welding joint of the base body, and the front-side laser control system is respectively connected to the structured light sensor and the front-side laser; the rear-side laser control system is respectively connected to the structured light sensor and the rear-side laser; the galvanometer system is arranged on the output optical paths of the front-side laser and the rear-side laser; the rear-side laser and the front-side laser are sequentially arranged along the welding direction; the present invention can achieve high-quality connection of complex structural parts that are difficult to weld by conventional lasers, and achieve the comprehensive control purpose of simultaneously reducing the porosity of the weld seam, improving the working condition adaptability, and improving the weld seam forming quality.

The invention discloses a confocal alignment device and method for correlation beams of double-beam optical tweezers, and belongs to the technical field of optical tweezers. A laser light source of the device is subjected to beam expansion, then passes through a linear polarizer for polarization and a # imgabs0 # wave plate, and then enters a polarization splitting prism for beam splitting; reflected light S of the polarization splitting prism enters a first objective lens after being reflected by a first reflector and a first dichroscope, and emergent light P enters a second objective lens after being reflected by a second dichroscope; the second reflecting mirror is arranged in an S light path passing through the second dichroscope; the plano-convex lens is arranged in front of the imaging camera and is coaxial with the imaging camera; an imaging sheet fixed on the single-axis displacement platform can be moved in and out in a light path; according to the method, an imaging sheet is moved out or introduced between objective lenses which are coaxially mounted, and a light blocking sheet is moved out and introduced in an S light path, so that respective imaging of two beams of light can be realized, the radial space center position of a correlation light beam can be directly observed, and the alignment adjustment efficiency of the light trap is improved.

The invention discloses a coaxial double-beam welding method and coaxial double-beam welding equipment, and relates to the technical field of metal laser welding methods.The coaxial double-beam welding method comprises the following steps that S1, a to-be-welded workpiece is pretreated, and then the to-be-welded workpiece is fixed; s2, the continuous laser beam and the pulse laser beam are coaxially coupled into a composite laser beam, the spraying direction of molten pool shielding gas is adjusted, and the sprayed molten pool shielding gas is aligned to a molten pool; s3, the composite laser beam is adjusted, and the spot diameter d of the composite laser beam irradiating the molten pool is controlled; s4, the average output power and the defocusing amount of the continuous laser are set to be delta z2, the average output power and the defocusing amount of the pulse laser are set to be delta z2, and the frequency is f and the pulse width; and S5, welding is conducted, and meanwhile molten pool shielding gas is sprayed to the molten pool till welding is finished. Continuous laser and pulse laser are coaxially coupled to form a composite laser beam, the composite laser beam jointly acts on a molten pool, the temperature distribution gradient is accurately controlled by regulating and controlling the coaxial double-beam heat source state, and therefore the problem of thin plate welding deformation is solved.

The invention relates to the technical field of optical design, and discloses a double-beam differential measurement device and method for the polarization sensitivity of a metasurface grating, and the method comprises the steps: dividing a pre-generated light beam into a first light beam and a second light beam through an optical fiber coupler, carrying out the dynamic switching of the polarization state of the second light beam, and obtaining a second incident light beam, adjusting the first light beam based on the second incident light beam to obtain a first incident light beam; enabling the first incident light beam to pass through a first path without the metasurface grating, enabling the second incident light beam to pass through a second path comprising the metasurface grating, and obtaining a first output light beam and a second output light beam; performing time domain difference on the first output light beam and the second output light beam, and calculating to obtain a multi-polarization-state differential signal; correcting the multi-polarization-state differential signal through a preset differential correction mechanism to obtain a corrected differential signal; calculating the polarization sensitivity of the metasurface grating according to the corrected differential signal; according to the invention, the accuracy of the calculated polarization sensitivity of the metasurface grating can be improved.

The invention relates to the technical field of laser welding, in particular to a 6-series aluminum alloy welding method and device with a magnetic field cooperating with time-sharing double-beam scanning, and the method comprises the steps that in the welding process, a blue light laser beam is used for scanning along a to-be-welded path in a spiral path, and a micro molten pool array is formed; after the blue laser beam stops scanning, a near-infrared laser beam concentric with a light spot of the blue laser beam is emitted at a preset time interval, and welding is conducted along a linear path deviating from the center line of the micro-molten pool array by a preset deviation amount; and during emission of the near-infrared laser beam, a constant magnetic field perpendicular to the welding surface is applied to the welding surface. The welding stability and the joint consistency of the 6-series aluminum alloy are improved, and the welding effect is effectively improved.

The invention provides an epitaxial growth control method and device, computer equipment and a storage medium. The epitaxial growth control method comprises the following steps: irradiating a wafer to be measured and the surface of a reference irradiation surface by adopting a super-continuum spectrum laser light source to obtain a reflected light signal; synchronously scanning and filtering the reflected light signal to output two paths of narrow-band light; the two paths of narrow-band light are converted into electric signals and then differential operation is carried out, and the reflectivity of the wafer to be measured is calculated according to a differential result; and determining growth parameters of the epitaxial layer based on the reflectivity, and adjusting process parameters of the reaction cavity according to the growth parameters so as to control epitaxial growth of the wafer to be tested. According to the super-continuum spectrum laser light source, multiple characteristic wavelengths can be scanned in one process step, synchronous monitoring of multiple growth parameters is achieved, and the monitoring requirement of a complex epitaxial structure is met; in addition, common-mode noise in the measurement process is eliminated in real time through the double-beam differential measurement technology, the signal-to-noise ratio is greatly increased, the measurement precision is improved, and accurate control over epitaxial growth is achieved.

The invention relates to a reflective double-beam interference exposure system reticle density and aberration considered adjustment method, which comprises the following steps: constructing a reticle density standard module, and generating a standard reference beam for adjusting the reticle density of an exposure system; a reflection type double-beam interference exposure system is built, points formed after + / -1-level standard reference beams are focused through an off-axis parabolic mirror serve as nominal focuses of all off-axis mirrors in a double-beam light path, the spatial position of the off-axis parabolic mirror is continuously adjusted, wavefront measurement is combined with a spherical interferometer, and the reflection type double-beam interference exposure system is obtained. And enabling the nominal focus of the off-axis mirror to coincide with the spatial position of the real focus, thereby completing the construction of the double-beam interference exposure system. According to the invention, the problem that the aberration and the scribed line density are difficult to accurately control at the same time in the adjustment process of the reflective double-beam interference exposure system is solved, and a new idea is provided for the high-precision adjustment of the meter-scale large-aperture reflective interference exposure system.

The invention discloses a device for realizing in-situ tuning of photo-induced dipole-dipole interaction between particles. The device comprises a light source module, a light trap modulation module, a vacuum cavity module, a detection module and a control module, the light source module provides reference light for the detection module while providing high-power laser for the light trap modulation module; the optical trap modulation module is used for modulating the laser beam to generate double beams with phase coherence; the vacuum cavity module provides a vacuum environment for the optical suspension nanoparticles; the detection module is used for detecting the movement of the nanoparticles; the control module is used for analyzing and processing the detection signal, inverting the interaction intensity of the particles, generating a control signal, controlling an intensity modulator in the light trap modulation module to apply alternating-current high-frequency modulation to a light beam, and realizing control on oscillation amplitudes of the two nanoparticles by utilizing feedback control; therefore, in-situ tuning and control of photo-induced dipole-dipole interaction among the nanoparticles are realized. According to the invention, stable suspension of double nanoparticles under high vacuum can be provided.

The utility model provides a coaxial double-vision control device for double-beam laser processing, which comprises a welding frame and a laser beam generator, a suspension beam close to the top is connected in the welding frame in an up-down sliding manner, a rotating shaft is arranged at the bottom of the suspension beam, a transverse plate is fixedly connected to the bottom of the rotating shaft, and a lead screw is rotatably connected to the bottom of the transverse plate. According to the utility model, the transverse plate is arranged, the screw sleeve I and the screw sleeve II of which the distance is controlled by the lead screw are arranged below the transverse plate, and the adapter seats for mounting the laser beam generators are arranged at the bottoms of the screw sleeve I and the screw sleeve II, so that compared with the prior art, the laser beam generator has a function of adjusting the distance between the two laser beam generators; the double-beam laser welding device is suitable for laser welding of two welding positions with different distances, and the application range of double-beam welding is enlarged.

The invention discloses a collaborative method and device for laser-assisted three-rotating-shaft six-linkage milling of blade disc parts. According to the technical scheme, the overall layout of the machine tool is the overall layout of mature flat machine tool body and stand column movement, a movable column linear guide rail is provided with six sliding blocks, a sliding table moves left and right along a machine tool body (X axis), the stand column moves front and back along the sliding table (Z axis), a swing head moves up and down along the stand column (Y axis), and the swing head is installed on a sliding saddle at the horizontal angle of 45 degrees and can rotate around the A axis of the swing head. A rotary table B shaft is installed on the sliding table, and a workpiece shaft C shaft is vertically installed on the workpiece shaft. The double-beam collaborative laser auxiliary device adopts a symmetrical layout, positioning devices are mounted on two sides of a swinging head, and real-time dynamic compensation of a laser incident angle is realized by combining an electric push rod adjusting mechanism, so that a to-be-processed area can be fully covered by double-beam collaboration. The milling cutter has the advantages that the swinging head can rotate, so that transition is smoother when the milling cutter works, and meanwhile, the machining performance of blade disc type materials is improved under laser cooperative machining.

The invention relates to a nanometer photoetching method based on a focused ion beam-scanning electron microscope double-beam system, and relates to the technical field of etching processes, and the method comprises the following steps: providing a substrate; forming a glue layer on the substrate; forming a conductor layer on the adhesive layer; placing the substrate in a focused ion beam-scanning electron microscope double-beam system, determining a graphic window setting area through a scanning electron microscope, and etching the conductor layer in the graphic window setting area through a focused ion beam to form a graphic window; and performing an etching process by taking the conductor layer as a mask, and etching the adhesive layer through the pattern window until the substrate is exposed so as to form a first etching opening. Therefore, the accuracy of the graph is improved.

The invention provides a silicon carbide epitaxial layer thickness infrared light measurement method and system, a medium and equipment, and relates to the technical field of thickness measurement. Based on a double-beam interference model, considering air-epitaxial layer and epitaxial layer-substrate interface reflection, deducing an optical path difference and a total phase difference, and constructing a general thickness solving model according to a refractive index relationship between an epitaxial layer and a substrate; dividing spectral intervals by adopting a sliding window, calculating the thickness of each interval by utilizing different dispersion models, and distributing weights according to relative standard deviation for weighted fusion to obtain a comprehensive thickness solving model; expanding to a multi-beam interference model, deducing a total reflectivity formula, and analyzing necessary conditions and thickness errors of multi-beam interference; and acquiring a silicon carbide epitaxial wafer to be measured, and building a fitting model by combining an Airy formula and the dispersion model to eliminate errors so as to obtain a thickness measurement result. High-precision and high-reliability non-destructive measurement of the thickness of the silicon carbide epitaxial layer is achieved, and the problems of systematic errors and insufficient result reliability caused by a traditional simplified model are solved.

The invention discloses a double-beam link vortex light correction system and method based on a model method, and the system comprises a double-beam common-path light path which is used for enabling vortex light and planar light to be transmitted in a common path, to pass through a turbulent flow or optical distortion region together, and to carry the same wavefront distortion information; the wavefront correction unit is used for dynamically compensating wavefront distortion information; the image acquisition and control unit is used for acquiring a corrected far-field light spot image after the planar light passes through a distortion area, and generating a driving instruction of the wavefront correction unit according to far-field light spot information to realize closed-loop control; and the topological charge detection module is used for carrying out topological charge detection on the corrected vortex light. According to the invention, indirect correction of the turbulence aberration of the common-path vortex light is realized, so that the correction efficiency and stability of the vortex light are improved.