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1406 results about "Metal membrane" patented technology

Welding-free target capsule for isotope production and manufacturing method thereof

The invention relates to the technical field of isotope production, in particular to a welding-free target capsule for isotope production and a manufacturing method of the welding-free target capsule. The welding-free target capsule comprises a target material used for generating isotopes under bombardment of high-energy particles; the first metal film covers one side of the target material; the second metal film covers the other side of the target material; wherein the first metal film and the second metal film are made of materials with ductility; the edge of the first metal film and the edge of the second metal film are attached to each other on the peripheral side of the target material and are folded into an annular sealing structure. In the invention, the metal film with good ductility is used as a coating material of the target material, and the sealing structure is formed by folding the connecting part of the metal film, so that the target capsule can be ensured to efficiently dissipate heat in a water-cooling environment, the manufacturing mode of the sealing structure can be improved, the manufacturing steps of the sealing structure are simple and easy to implement, and the manufacturing cost of the target capsule is further reduced.
Owner:INST OF MODERN PHYSICS CHINESE ACADEMY OF SCI +1

Crystal film fluidized bed treatment system for high-hardness water treatment

The utility model discloses a crystal film fluidized bed treatment system aiming at high-hardness water treatment, the system mainly comprises a crystallization fluidized bed and a multi-layer flat film microfiltration device, and the crystallization fluidized bed device is of an inner-layer and outer-layer cylinder structure and is provided with a slag discharge pipe, a water inlet pipe, an annular dosing pipe, an inclined pipe enhanced separation device and a water outlet pipe; the multi-layer flat membrane microfiltration equipment is provided with a water inlet pipe, a water outlet pipe, a buffer water tank, a cleaning mechanism, a metal membrane, a sludge tank and the like; when the system runs, high-hardness raw water firstly enters the crystallization fluidized bed for softening treatment, and then enters the multi-layer flat membrane microfiltration equipment for further removing hardness and turbidity after treatment; the adopted system combining the crystallization fluidized bed and the flat membrane microfiltration equipment can effectively remove the hardness and turbidity of water, flocculation and coagulation agents do not need to be added, the adverse effect of the coagulation agents on a subsequent membrane system is effectively avoided while the operation cost of the system is reduced, the hardness and turbidity of the water can be effectively removed, and the service life of the system is prolonged. Various ions in the water are synchronously removed.
Owner:SHANGHAI QINGLAN ENVIRONMENTAL TECHNOLOGY CO LTD

module

A module includes: a substrate having a first surface; a first component mounted on the first surface; a first sealing resin layer disposed to cover a side surface of the first component and the first surface; and a redistribution layer covering a surface of the first sealing resin layer on a side far from the substrate. The redistribution layer includes: a first metal film disposed to correspond to a projection area of the first component; a first insulating film covering a surface of the first metal film on a side far from the substrate; and a first group of conductor vias passing through the first insulating film and protruding from the first metal film in a direction away from the substrate.
Owner:MURATA MFG CO LTD

Optical filter applied to medical communication sapphire window

ActiveCN120195792AOptical filtersSapphire windowRefractive index
The invention relates to the technical field of optical elements, in particular to an optical filter applied to a medical communication sapphire window. The optical filter comprises a substrate, a main film system, a secondary film system and a metal film system, the main film system is located on one side of the substrate, the secondary film system is located on the other side, opposite to the main film system, of the substrate, the metal film system is located on the upper side of the main film system, the secondary film system is located on the other side, opposite to the main film system, of the substrate, and the metal film system is located on the lower side of the main film system. The main film system comprises four high-refractive-index film layers and four low-refractive-index film layers which are sequentially and alternately overlapped from the substrate to the outside according to the structure of the main film system, and the secondary film system comprises four high-refractive-index film layers and four low-refractive-index film layers which are sequentially and alternately overlapped from the substrate to the outside according to the structure of the secondary film system. The metal film system comprises three layers of Ti, Ni and Au metal film layers which are sequentially and alternately overlapped from the main film system to the outside according to the structure of the metal film system, and the optical filter can realize high transmittance and uniform signal intensity within the wavelength range of a communication channel of 1200-1700 nm, so that high communication efficiency is realized.
Owner:SHANGHAI GAONENG YU PLATING TECH CO LTD

Deposition of films using molybdenum precursors

Provided herein are low resistance metallization stack structures for logic and memory applications and related methods of fabrication. In some embodiments, thin metal oxynitride or metal nitride nucleation layers are deposited followed by deposition of a pure metal conductor. The nucleation layer is amorphous, which templates large pure metal film grain growth and reduced resistivity. Further, certain embodiments of the methods described below convert most or all of the metal oxynitride nucleation layer to a pure metal layer, further lowering the resistivity.
Owner:LAM RES CORP

Multi-mode reconfigurable diamond solar-blind ultraviolet photoelectric transistor and preparation method thereof

The invention discloses a multi-mode reconfigurable diamond solar-blind ultraviolet photoelectric transistor and a preparation method thereof, and aims to solve the problem of separation of sensing, storage and calculation frameworks of an existing artificial vision system. According to the diamond solar blind ultraviolet photoelectric transistor, a terminal is arranged on the surface of a diamond substrate, a first metal film layer is deposited on the upper surface of the diamond substrate to serve as a first contact electrode, the first contact electrode is Schottky contact, and a second contact electrode is a metal probe. The second contact electrode is in needle point contact with the upper surface of the diamond substrate, a second metal film layer is deposited on the lower surface of the diamond substrate to serve as a third contact electrode, and the third contact electrode is Schottky contact. According to the reconfigurable diamond solar blind ultraviolet photoelectric transistor, different functions of an avalanche detector, an optical memory, visual synapse and the like are integrated in one device, and large gain rising of the diamond detector and multi-mode intelligent sensing of a single device are achieved.
Owner:HARBIN INST OF TECH +2

Metal diaphragm capacitor combined type vacuum gauge

The invention discloses a metal diaphragm capacitor composite vacuum gauge, and relates to the technical field of vacuum gauges, the metal diaphragm capacitor composite vacuum gauge comprises a vacuum gauge body and a control module, the lower side of the vacuum gauge body is fixedly connected with a lower sealing block, the lower side of the lower sealing block is fixedly connected with a connecting pipe, and the connecting pipe is communicated with the interior of the vacuum gauge body. The upper side of the inner wall of the vacuum gauge body is fixedly connected with an electrode, the lower side of the electrode is provided with a capacitor diaphragm, the electrode is not in contact with the capacitor diaphragm, a buffer cavity is formed in the connecting pipe, a buffer mechanism is arranged in the buffer cavity, and a detection mechanism is arranged on the outer side of the connecting pipe. According to the invention, through the arrangement of the connecting pipe, the gas channel and the stop block, high-speed gas upwelling can be effectively blocked when gas flow recoil occurs, instantaneous impact on the capacitor diaphragm is relieved, reading deviation or device damage caused by diaphragm deformation quantity overrun is avoided, and the system has the characteristics of high practicability and improvement of the adaptability of the system to complex working conditions.
Owner:BEIJING ACAD OF QUANTUM INFORMATION SCI +1

Metallization deposition method and system for pore structure

The invention relates to the technical field of superconducting quantum computing, and discloses a hole structure metallization deposition method and system, a sacrificial layer is deposited on the surface of a silicon substrate, a hole structure with a preset depth-to-width ratio is etched on a to-be-processed substrate, a substrate with the hole structure is obtained, a first metal material is used for surface deposition of the substrate with the hole structure, and a metallization deposition layer is formed on the surface of the substrate with the hole structure. The preparation method comprises the following steps: forming a hole structure on a substrate, forming a metal induction layer on the surfaces of the substrate and the hole structure to obtain a substrate with the metal induction layer, performing magnetron sputtering on the substrate with the metal induction layer by using a second metal material, and applying a magnetic field around the substrate with the metal induction layer to form a metal film on the surface of the metal induction layer, and obtaining the substrate with the hole structure subjected to metallization deposition. The metal coverage in the holes can be improved by using a metal induction mode, and the deposition uniformity of particles in the holes can be ensured by combining a magnetic field applying mode, so that a deep hole scene can be well dealt with.
Owner:JINAN INST OF QUANTUM TECH +1

Finite element analysis method and system for geometric design of flow regulating valve

The invention provides a finite element analysis method and system for geometric design of a flow regulating valve, and relates to the technical field of data processing.The method comprises the steps that 1, spatial geometric feature analysis is conducted on each data point in a discrete contour coordinate dataset, the principal curvature value of each data point on the sealing surface of a metal diaphragm is solved, and the principal curvature value of each data point is calculated; determining a point with the maximum average curvature value on the sealing surface of the metal diaphragm as a core morphology reference point; step 2, establishing a local coordinate system by taking the core morphology reference point as an original point, screening four sealing state points from the discrete contour coordinate data set, solving a corresponding space plane equation, and calculating a space intersection line between the space plane and the sealing surface of the metal diaphragm; according to the method, through accurate positioning of the core reference point, definition of the analysis sub-domain, grid division, mechanical solution, leakage rate calculation and parameter optimization, the dynamic particulate matter problem is effectively improved, and the sealing performance and the micro flow adjusting precision are improved.
Owner:SHANGHAI JUKE FLUID CONTROL CO LTD

Miniaturized ultrahigh-temperature water-cooled high-temperature pressure sensor

The invention discloses a miniaturized superhigh-temperature water-cooled high-temperature pressure sensor, which belongs to the technical field of pressure sensors and comprises a lead column, a shell, a conduction beam, a ceramic circuit board and a pressure-sensitive unit, and the conduction beam, the ceramic circuit board and the pressure-sensitive unit are arranged in the shell. The shell comprises a pressure sensing metal diaphragm, a threaded base, a protective sleeve and a packaging bottom cover which are fixedly connected in sequence; the pressure sensitive beam comprises a conduction beam base, the two sides of the conduction beam base are fixedly connected with a supporting beam base through beam island structures, pressure sensitive units are arranged on the beam island structures, and a supporting beam is fixedly connected with a threaded base. The pressure sensing metal diaphragm is fixedly connected with the conduction beam base through the conduction beam; the voltage-sensitive unit is electrically connected with the ceramic circuit board; the lead columns penetrate through the packaging bottom cover and the ceramic circuit board and are fixedly connected with the ceramic circuit board. The temperature tolerance of the pressure sensor is improved, and the defects that a high-temperature pressure sensor is poor in anti-interference capacity, low in response frequency, low in measurement sensitivity and the like are overcome.
Owner:XI AN JIAOTONG UNIV

Magnetron sputtering coating method with uniform coating and high target utilization rate

The invention discloses a magnetron sputtering coating method with uniform coating and high target material utilization rate, and belongs to the technical field of film preparation, and the method realizes high-precision coating through whole-process collaborative optimization of pretreatment, sputtering, deposition and post-treatment. The substrate is cleaned in cooperation with radio-frequency pulse focusing bombardment; an electromagnetic coil group containing a temperature compensation coil is used for target sputtering, a magnetic field is dynamically adjusted in combination with laser profile sensing and a PID self-adaptive algorithm, and a direct current pulse-radio frequency composite power supply is matched to solve the target problem; in the deposition stage, a quartz crystal instrument is used for closed-loop film thickness control, metal film pulse gas supply and compound film reaction gas phase adjustment; gradient temperature rise is carried out according to data of an X-ray stress meter in post-treatment, and argon is used for dynamic protection and impurity prevention. According to the magnetron sputtering coating method with uniform coating and high target material utilization rate, the uniformity of coating and the target material utilization rate are improved, and the technological adaptability and stability of coating are improved.
Owner:SHENZHEN ZHICHUANGGU TECH CO LTD

Metal film thickness measuring method for reducing stray capacitance effect

The invention provides a metal film thickness measuring method capable of reducing a parasitic capacitance effect, and a device adopted by the method comprises a sensor coil, a front signal processing module, a data acquisition module, a communication module and an upper computer, the method comprises the following steps: respectively inputting alternating voltage to a sensor coil and a preposed signal processing circuit through a crystal oscillator in a signal generator, outputting a measured impedance value corresponding to the thickness of a metal film through the preposed signal processing circuit, inputting the impedance value into an upper computer through a data acquisition module and a communication module, and performing fitting operation in the upper computer to obtain the thickness of the metal film. Calculating to obtain a corresponding metal film thickness characteristic value; according to the invention, a single-coil sensor system is taken as a core part, and the measurement method adopts a characteristic slope method combined with differential evolution algorithm fitting, so that the nano-scale thickness resolution can be obtained, and the parasitic capacitance effect can be remarkably reduced.
Owner:FUZHOU UNIV

Amorphous high-entropy alloy multilayer film and preparation method and application thereof

The invention discloses a preparation method of an amorphous high-entropy alloy multilayer film, which comprises the following steps of: S1, coating a film on a substrate by adopting a TiVZrNb alloy target material through a magnetron sputtering method to form a TiVZrNb alloy film layer; s2, adopting a transition metal target material or a light metal target material to continuously coat the TiVZrNb alloy film layer through a magnetron sputtering method to form an interlayer metal film layer; s3, continuously coating a film on the interlayer metal film layer by adopting a TiVZrNb alloy target material through a magnetron sputtering method to form a TiVZrNb alloy film layer; s4, circularly repeating the step S2 and the step S3; and S5, after the step S4 is completed, the amorphous high-entropy alloy multilayer film is prepared. According to the preparation method, non-crystallization of the refractory high-entropy alloy is achieved through the magnetron sputtering technology, the TiVZrNb alloy multilayer film containing the transition metal interlayer or the light metal interlayer is prepared and has excellent hydrogen storage performance and good structural stability, and effective application of the refractory high-entropy alloy in the field of hydrogen storage materials is achieved.
Owner:JINAN UNIVERSITY

Biaxially stretched polypropylene film, metallized film, and capacitor

The present invention provides a biaxially stretched polypropylene film exhibiting a high dielectric breakdown strength even at high temperatures, and a metallized film using the biaxially stretched polypropylene film. The present invention provides a biaxially stretched polypropylene film, wherein an average value of ultrasonic wave propagation velocities in an omni direction at room temperature measured by using an ultrasonic wave orientation tester is 1.60 Km / see or more.
Owner:OJI HLDG CORP

All-metal progressive impedance edge scattering control material compatible with lightning protection

The invention relates to the field of electronic material technology and lightning protection, in particular to an all-metal progressive impedance edge scattering control material compatible with lightning protection. The passive protection method based on the Faraday cage concept is applied to lightning stroke protection of a typical edge scattering suppression structure, the surface of the edge scattering suppression structure is covered with the whole full-covering periodic hollow full-metal membrane, and the gradual hollow metal sheet is formed by carving a gradual change hole unit structure on the metal sheet. Therefore, the propagation characteristic of the electromagnetic wave on the metal surface is changed, and the electromagnetic wave adjusting effect is achieved. According to the invention, no negative influence is generated on the original electrical performance, strong lightning protection is compatible, and lightning current injected into a target body can be efficiently guided away, so that the lightning current smoothly flows into a conductor to well protect a wave-absorbing material below the conductor, and a good lightning protection effect is achieved. The method is simple in process, high in operability, easy to implement industrially and suitable for popularization.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Aerogel composite metal film thermal insulation material and preparation method thereof

The invention relates to the technical field of thermal insulation material preparation, and discloses an aerogel composite metal film thermal insulation material and a preparation method thereof, and the preparation method comprises the following steps: metal film surface treatment; performing fiber-metal film needling; through mold forming and porosity control, a fiber-metal film prefabricated part with a specific shape and a high-porosity structure is prepared; soaking and aging the sol, realizing efficient permeation and filling of the sol in the fiber-metal film prefabricated member through staged pressure control, and completing conversion from the sol to gel in a low-temperature aging stage, so that a uniform and stable nano-particle continuous phase is constructed in the fiber-metal film prefabricated member, and a gel-containing fiber-metal film prefabricated member is formed; the preparation method comprises the following steps: preparing a fiber-metal film preform, performing supercritical drying, thoroughly removing a solvent under the condition of not damaging a gel network structure by utilizing the characteristic that alcohol fluid has no gas-liquid interface surface tension in a supercritical state aiming at the fiber-metal film preform containing gel, and further preparing the aerogel composite metal film heat insulation material.
Owner:CHANGSHA RONGLAN MACHINERY

Liquid discharge head manufacturing method and processing method

To suppress generation of residue when forming an open hole by performing metal assist chemical etching from both surfaces of a substrate.SOLUTION: A liquid discharge head manufacturing method includes: a first etching process in which a first metal film is formed on a first face which is one plate face of a semiconductor substrate, and a first hole is formed at a position of a first flow path by metal assist chemical etching using the first metal film; and a second etching process in which after the first etching process, a second metal film is formed on a second face which is a plate face opposite to the first face of the semiconductor substrate, and a second hole is formed at a position of a second flow path by metal assist chemical etching using the second metal film. A first region, in which the first metal film is provided, involves a second region in which the second metal film is provided when viewed in a thickness direction of the semiconductor substrate.SELECTED DRAWING: Figure 3
Owner:SEIKO EPSON CORP

Hydrogen detection element and hydrogen detection device

To provide a technology to improve a hydrogen occlusion time (response speed) while suppressing a cost in a hydrogen detection element.SOLUTION: A hydrogen detection element of the present invention is an electromagnetic meta-material obtained by periodically arranging meta structures composed of a hydrogen occlusion metal film and having a predetermined shape and size on a substrate at a predetermined pitch having 1,000 nm or less and controls a reflection, transmission or absorption spectrum of incident electromagnetic wave. The hydrogen occlusion metal film contains no precious metal and palladium can be used as hydrogen occlusion metal. Further, a spectrum of an incident wave can remove near-infrared light from visible light. Further, the present invention provides a hydrogen detection device including: the hydrogen detection element; a light source unit that can emit incident electromagnetic wave; a light-receiving unit that receives light reflected by or transmitted through the hydrogen detection element; and a detection unit that detects hydrogen on the basis of a light-receiving result of the light-receiving unit.SELECTED DRAWING: Figure 5
Owner:TOPPAN HOLDINGS INC +1

Preparation method of flexible infrared metasurface absorber based on MDM

The invention discloses a preparation method of a flexible infrared super-surface absorber based on MDM, and belongs to the field of micro-nano machining patterning. The method comprises the following steps: pretreating a polymer material; depositing a layer of bottom metal film on the pretreated substrate by adopting magnetron sputtering; a metal reflecting layer, a dielectric insulating layer and a metal surface functional layer are sequentially deposited through magnetron sputtering, a periodic nano microstructure is constructed on the surface of a flexible composite film, a nano round pit array is etched in situ on a surface metal layer of an MDM structure by using a femtosecond laser selective etching process, and an MDM laminated structure is formed. According to the invention, stable integration of the MDM structure and the flexible substrate can be realized, and meanwhile, high absorptivity and good flexibility of the device in an infrared band are ensured. The absorber prepared by the invention can generate resonance absorption on incident infrared electromagnetic waves through a surface plasmon and F-P cavity resonance coupling mechanism, and meanwhile, the characteristic size variation is changed through physical excitation, so that effective absorption and frequency regulation of the electromagnetic waves at the infrared band of 3-14 microns are realized.
Owner:BEIJING INFORMATION SCI & TECH UNIV

Deposition method of metal seed layer in TGV metallization and magnetron sputtering equipment

The invention belongs to the technical field of coated glass, and particularly provides a deposition method of a metal seed layer in TGV metallization and magnetron sputtering equipment. The invention aims to solve the problem of serious surface discharge phenomenon caused by low adhesive force between a metal film and a glass substrate, low metal coverage rate and step rate in a through hole and high accumulated charge on the surface of glass in the existing TGV metallization process. The independent and controllable ion source is introduced to assist deposition, the ion source is started at different stages of metal film deposition, and directional and high-energy positive ion flow generated by the ion source is utilized to bombard the surface of the glass substrate so as to assist the magnetron sputtering process, so that the surface of the glass substrate is subjected to magnetron sputtering. Through shallow ion implantation, enhancement of surface migration energy of deposited metal atoms and neutralization of negative charges accumulated on the glass surface, the adhesive force between metal and a glass substrate is improved, the metal coverage rate and the step rate in a through hole are improved, surface discharge is inhibited, and therefore the process stability is improved.
Owner:ARISON SURFACE TECH SUZHOU

Micro-hemispherical gyro structure of a curved surface electrode and its preparation method

The present invention relates to the technical field of microelectromechanical system manufacturing, and particularly relates to a micro-hemispherical gyro structure with a curved surface electrode and a preparation method thereof; the method includes coating the outer surface of a micro-hemispherical resonator, coating the inner and outer surfaces of the micro-hemispherical curved surface electrode and spraying photoresist; aligning a photomask plate with an optical lens structure with the inner surface of the micro-hemispherical curved surface electrode, performing photolithography and development to pattern the photoresist of the curved surface structure; using the photoresist as a mask to pattern the metal film on the micro-hemispherical curved surface electrode to form excitation detection electrodes, shielding electrodes, and anchor electrodes; coaxially aligning the micro-hemispherical resonator with the micro-hemispherical curved surface electrode, curing and conducting the resonator anchor points and the curved surface electrode anchor points, and fixing the reference surface of the outer edge of the curved surface electrode on a buffer plate to form a micro-hemispherical gyro structure with a curved surface electrode; the present invention can effectively reduce the process difficulty and cost of manufacturing the curved surface electrode and has better thermal adaptation performance.
Owner:CHINA ELECTRONICS TECH GRP NO 26 RES INST

Flexible graphene film heat-conducting cable and preparation method thereof

The invention belongs to the technical field of graphite metal composite heat dissipation devices, and provides a flexible graphene film heat conduction cable and a preparation method thereof.The preparation method comprises the steps that the surface of a graphene film is cleaned and punched, and the graphene film with micron-sized pores in the surface is obtained; sequentially plating a layer of active metal film and a layer of heat-conducting metal film on the surface of the graphene film, and cutting to obtain a graphene film; graphene films are overlaid layer by layer to obtain a laminated material, and the two ends of the laminated material are clamped to a hot-pressing mold to be subjected to hot-pressing welding treatment, so that a locally connected flexible heat conduction section is obtained; and the flexible heat conduction section and the heat conduction metal shell are assembled, a soldering lug is placed for brazing and finish machining, and the flexible graphene film heat conduction cable is obtained. According to the method, the internal connection problem of the flexible section is solved by establishing a synergistic process of surface punching, double-layer coating and hot pressing, the heterogeneous connection problem of the flexible section and the shell is solved in a manner of sampling coating and brazing, and through the synergistic effect of all links, the overall performance and reliability of the heat-conducting cable are remarkably improved.
Owner:TAIYUAN AERO INSTR

Composite functional porous metal membrane and detection system for monitoring and identifying airborne microorganisms, and method for monitoring and identifying airborne microorganisms

The present application relates to the technical field of biological sensing, and discloses a composite functional porous metal membrane and detection system for monitoring and identifying airborne microorganisms, and a method for monitoring and identifying airborne microorganisms. The monitoring and identification method comprises: applying an electric field to the composite functional porous metal membrane, causing the membrane to freely switch charge and capture airborne microorganisms to be tested; adding a fluorescent probe to the composite functional porous metal membrane, which binds with the microorganisms to be tested to obtain a fluorescent sample, and collecting imaging of light emitted after irradiation of excitation light, to achieve preliminary determination and addressing of the microorganisms to be tested; performing Raman spectroscopy scanning on individual bacteria, and comparing with a standard Raman spectrum library to achieve species identification of the individual bacteria. Relying on the "composite functional porous metal membrane," an integrated process of "selective enrichment-total bacteria monitoring-species identification" is realized; the present invention takes selective enrichment of the microorganisms to be tested as an entry point, lays the foundation for preliminary judgment accuracy and species identification accuracy, and improves the efficiency and precision of monitoring and identifying airborne microorganisms.
Owner:INSTITUTE OF PROCESS ENGINEERING CHINESE ACADEMY OF SCIENCES

Process cartridge, and electro-photographic image formation device

To suppress occurrence of fogging in a high temperature and high humidity environment and roughness in a low temperature and low humidity environment, through an endurance use in a system in which a processing speed is fast.SOLUTION: A process cartridge has: developer; a developer carrier; and a developer layer thickness restriction member of which at least a part restricts a layer thickness of the developer to be carried on the developer carrier. The process cartridge is detachably attached to a main body of an electro-photographic image formation device, and the developer carrier has: a substrate; and a resin layer that exists on an outermost surface side of the substrate. A metal film is directly provided on an outer surface of the developer carrier, and measured impedance is equal to or more than 1.00*106 Ω, and let ionization potential of the developer be I(T), and ionization potential of the outer surface of the developer carrier be I(R), the I(T) and I(R) satisfy a specific relationship, and a maximum value of electric potential when measuring the outer surface of the developer carrier is less than 20.0 V.SELECTED DRAWING: Figure 1
Owner:CANON KK

Electrochemical sensor based on porous silicon-platinum nanoflower-DNA composite material and preparation method and application thereof

The invention belongs to the field of nano sensors, and discloses an electrochemical sensor based on a porous silicon-platinum nanoflower-DNA composite material and a preparation method and application thereof. A porous silicon layer is prepared on a polished surface of a silicon wafer, then platinum nanoflowers and a T-rich sulfhydrylation DNA probe are modified, a metal film is plated on the other surface of the silicon wafer, and the electrochemical sensor is prepared and applied to melamine detection. The DNA probe can adsorb melamine on the surface of a material through a hydrogen bond and generate current response linearly related to the concentration of the melamine; hydroxyl on the surface of the porous silicon can enhance the adsorption effect on melamine; the platinum nanomaterial with the flower-shaped structure can enhance the sensitivity of the sensor; in addition, negative charges carried on the surface of the porous silicon and common coexisting substances of melamine have an electrostatic repulsion effect, so that the sensor has good selectivity. The high-performance nano sensor provides a novel method with practicability for on-site rapid detection of melamine.
Owner:CHANGZHOU VOCATIONAL INST OF ENG

Method of forming electrode with multi-dielectric layers

A method of forming an electrode with multi-dielectric layers includes: forming a metal pattern on a substrate, in which the metal pattern includes a first metal film on the substrate and a second metal film on a top surface of the first metal film, and the first and second metal films have different metal compositions; and anodizing the metal pattern in a liquid electrolyte to form a covering anodized portion which covers an unanodized portion, in which the covering anodized portion includes a sidewall oxide dielectric structure and a top oxide dielectric structure, the sidewall oxide dielectric structure is in contact with a side surface of the unanodized portion, the top oxide dielectric structure is in contact with top surfaces of the unanodized portion and the sidewall oxide dielectric structure, and the sidewall and top oxide dielectric structures have different effective permittivities.
Owner:MIKRO MESA TECH

Method for improving aperture uniformity of TGV through hole

The invention provides a method for improving the uniformity of the aperture of a TGV through hole, relates to the technical field of communication packaging, and provides a TGV glass substrate with the thickness of 500 microns. A laser reflecting layer pattern is manufactured on the substrate, the laser reflecting layer is a metal film layer, the pattern is in a circular ring shape, the inner diameter of the pattern ranges from 5 micrometers to 200 micrometers, and the outer diameter of the pattern is 10%-30% larger than the inner diameter of the pattern. According to the method, the annular laser reflecting layer pattern is firstly manufactured on the TGV glass substrate, the diameter of a laser induction light spot is between the inner diameter and the outer diameter of the laser reflecting layer pattern, and when laser induction is carried out on the TGV glass substrate, the light spot of a laser induction area coincides with the center position of the annular laser reflecting layer. Therefore, due to the limitation of the laser reflection pattern, the size of the laser induction area is consistent, and even if the spot size of the induction laser slightly fluctuates, the uniformity of the finally formed TGV through hole can be ensured.
Owner:SHENZHEN ARRAYED MATERIALS TECH CO LTD

A process for patterning a high-flatness chromium protective layer

The present invention discloses a process method for patterning a high-flatness chromium protective layer, comprising the following steps: preparing a substrate wafer and wet cleaning it, sputtering an adhesion layer and a seed layer on the substrate wafer in sequence as the bottom metal; evaporating or sputtering metal chromium on the seed layer as a barrier layer to form a composite metal film structure; spin coating a photoresist on the composite metal film structure and exposing and developing it, and performing a post-baking treatment; using a medium-concentration wet mixed solution to pre-etch the chromium, remove the surface passivation layer and coarsen the chromium protective layer; using a low-concentration wet mixed solution for secondary etching to remove the complex and obtain a chromium mask layer with smooth graphic lines; electroplating a metal layer on the seed layer and removing the photoresist; using a high-concentration wet mixed solution for full-surface etching to remove the chromium mask layer and obtain the desired metal surface. The present invention can realize a patterning process of different precision sizes and obtain the desired clean surface.
Owner:NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD

High-binding-force composite current collector, preparation method and lithium ion battery

The invention discloses a high-binding-force composite current collector, a preparation method and a lithium ion battery, the high-binding-force composite current collector comprises a polymer base film layer, adhesive layers and a metal layer, the adhesive layers are respectively arranged on two sides of the polymer base film layer, and the metal layer is arranged on the two sides of the polymer base film layer. The metal layers are respectively arranged on one side, far away from the macromolecular base film layer, of the adhesive layer; wherein the adhesive layer is prepared by preparing a coating on the surface of the macromolecular base film layer by using an adhesive through a spraying or coating technology and curing the coating; the metal layer comprises a first metal film and a second metal film. According to the high-binding-force composite current collector disclosed by the embodiment of the invention, the additive is bonded with the metal layer on the basis of the emulsion and the filler additive in the adhesive, so that the binding force between the macromolecular base film layer and the metal layer is improved, the phenomenon that the metal layer falls off is effectively avoided, and meanwhile, the energy density and the safety performance of the composite current collector are further improved; and the yield of products is increased.
Owner:FAR EAST COPPER FOIL (YIBIN) CO LTD

Inspection method for polymer electrolyte membrane

To provide an inspection method for a polymer electrolyte membrane that can determine whether the polymer electrolyte membrane has been boiled under boiling conditions suitable for forming a metallic film.SOLUTION: An inspection method comprises: preparing a polymer electrolyte membrane 13; boiling the polymer electrolyte membrane 13; attaching the boiled polymer electrolyte membrane 13 to an apparatus body 10; pressurizing the polymer electrolyte membrane 13 with a plating solution L for a predetermined time while the polymer electrolyte membrane 13 is in contact with a base material B; and depressurizing the pressurized plating solution L. The method further comprises measuring an amount of the plating solution that seeps from the polymer electrolyte membrane 13 to the base material B and determining whether a metallic film F can be formed using the polymer electrolyte membrane 13 based on the amount of seepage.SELECTED DRAWING: Figure 1
Owner:TOYOTA JIDOSHA KK