24results about How to "High polishing precision" patented technology

The utility model relates to the technical field of polishing machine, concretely relates to a flexible floating connecting device and polishing machine. The flexible floating connecting device and polishing machine, including shell, Z axle floating seat, floating disc, end connecting disc and a plurality of elastic fixing pieces, the shell inside has the space, the shell inside is equipped with fixed disc, the fixed disc will the shell inside space is divided into first installation cavity and second installation cavity, one end of the shell is provided with the first opening that is linked with first installation cavity, and the second opening that is linked with second installation cavity is provided with the other end. The polishing machine installed with the flexible connecting device can have the compensation in the Z axle direction, and has the ability that can be flexibly floated in the X / Y axle direction, thereby making the polishing disc can be along the workpiece curved surface normal adaptive deflection, has the multi -freedom degree polishing processing capacity, improves the polishing precision to workpiece curved surface.

The invention relates to an aero-engine blade polishing parameter interval solving method and a related device, and belongs to the technical field of polishing machining.The aero-engine blade polishing parameter interval solving method comprises the steps that a plurality of multi-objective optimization models of response surface models of polishing parameters to be solved are constructed, the optimal solution of each to-be-solved polishing parameter is obtained; a plurality of binary functions with any two first to-be-solved polishing parameters as independent variables and the roughness of the to-be-polished surface as a dependent variable are constructed, the remaining second to-be-solved polishing parameters in the binary functions take corresponding optimal solutions, the optimal value interval of each second to-be-solved polishing parameter is determined, the binary functions are solved, and the optimal value interval of each second to-be-solved polishing parameter is obtained. And obtaining an optimal value interval of the first to-be-solved polishing parameter. According to the method, the accurate optimal value interval of the to-be-solved polishing parameters can be obtained, the polishing parameters can be conveniently adjusted according to the actual machining condition, and the polishing precision and the polishing efficiency are improved.

The utility model relates to the technical field of valve machining, and discloses an inner cavity polishing device for valve machining, which comprises a fixing plate, an electric sliding rail is fixedly connected to the outer wall of the fixing plate, a sliding block is fixedly connected to the output end of the electric sliding rail, a hydraulic cylinder is fixedly connected to the outer wall of the sliding block, and a protective shell is fixedly connected to the output end of the hydraulic cylinder. A grinding assembly is arranged on the inner wall of the protective shell and comprises a motor, the outer wall of the motor is fixedly connected to the inner wall of the protective shell, and the output end of the motor is fixedly connected with a first rotating shaft. According to the valve inner cavity polishing device, the polishing assembly and the clamping assembly are matched with each other, so that the problems that the use requirement cannot be met during polishing treatment of the valve inner cavity, valves with different inner diameter sizes cannot be polished, and the valve inner cavity is prone to being damaged when the valve is polished are solved; the practical diversity of the device is improved, the polishing precision is improved, and the machining quality is guaranteed.

The utility model relates to the technical field of hardware polishing, and discloses a polishing device for hardware manufacturing, which comprises a sliding seat, a first motor is fixedly connected in the sliding seat, a rotating rod is fixedly connected to the output end of the first motor, a bearing is arranged between the rotating rod and the sliding seat, and a second motor is fixedly connected to the bearing. A rotating sleeve is rotatably connected to the outer wall of the rotating rod, a connecting rod is fixedly connected to the inner wall of the rotating sleeve, a sliding sleeve is fixedly connected to one end of the connecting rod, a rotating shaft is slidably connected to the inner wall of the sliding sleeve, a rotating disc is fixedly connected to one end of the rotating shaft, and a sliding rod is slidably connected to the interior of the rotating disc. According to the polishing device, the problems that during polishing, bolts used for fixing the polishing plate are loosened, and meanwhile dismounting and mounting operation is time-consuming are solved, the polishing plate can be rapidly and conveniently dismounted and mounted, the maintenance and replacement time can be greatly shortened, meanwhile, the stability in the running process is guaranteed, and therefore the polishing quality and the workpiece machining precision are improved.

This utility model discloses a surface polishing device for processing rolled products of ferrous metal smelting, relating to the technical field of polishing devices. The utility model includes two support legs, each equipped with a clamping mechanism and a polishing mechanism. Each clamping mechanism includes a support frame fixedly connected to the top of the two support legs. Trapezoidal grooves are formed on the inner walls of the front and rear sides of the support frame. Trapezoidal sliders are slidably connected to the inner walls of each of the two trapezoidal grooves. A support plate is fixedly connected to the side of the two trapezoidal sliders that are close to each other. This utility model, by setting up the clamping mechanism, solves the problem that existing polishing devices, when polishing ferrous metals, are not easy to quickly adapt to workpieces of different thicknesses and shapes, leading to positional shifts and unstable clamping during workpiece transport and clamping, resulting in reduced polishing accuracy and efficiency.

This application discloses a planar vibration-based deterministic magnetorheological micropolishing device, belonging to the field of precision machining technology. The device comprises a high-frequency vibration mechanism that drives a magnetic field response element to reciprocate in a first and second direction, with an amplitude of less than 1 mm. One of the mounting base of the high-frequency vibration mechanism and the workpiece fixing mechanism is connected to a feeding mechanism, while the other is mounted on the base along with the feeding mechanism. The workpiece to be polished, fixed to the workpiece fixing mechanism, is positioned opposite the magnetic field response element in a third direction. The feeding mechanism drives the high-frequency vibration mechanism and the workpiece fixing mechanism to move relative to each other in a third direction, with the first, second, and third directions being mutually perpendicular. A magnetorheological fluid nozzle is fitted to the magnetic field response element and is used to deliver magnetorheological fluid to the focused magnetic field generated by the magnetic field response element. This device possesses the capability to deterministically polish microstructured surfaces with microscale features.

The utility model discloses a polishing device for high-brightness machining of a titanium alloy surface, and relates to the technical field of polishing. The polishing device for high-brightness machining of the titanium alloy surface comprises a bottom plate, and a placing mechanism and a polishing mechanism are arranged above the bottom plate; the placing mechanism comprises a placing part and a dust collection part; the placing part comprises a placing plate and two clamping plates, the dust suction part comprises a connecting box and a collecting box, and the technical effects are that the placing mechanism realizes stable fixation of titanium alloy workpieces with different sizes through an adjustable clamping structure composed of a double-shaft threaded rod, a wedge block and the clamping plates, and meanwhile, a motor is utilized to drive fan blades to rotate to generate negative pressure, so that the titanium alloy workpieces with different sizes can be stably placed. And a dust removal system consisting of a dust collection frame, a connecting box, a hose and a filter screen is matched, so that the adaptability to diversified workpieces is guaranteed, polishing dust is efficiently collected, the working environment is improved, the health of operators is protected, damage of dust to equipment is reduced, the service life of the equipment is prolonged, and stable operation of the machining process is guaranteed.

The present application relates to the technical field of forging manufacturing, in particular to a kind of corrosion-resistant forging manufacturing equipment and preparation process thereof, including workbench, clamping device and polishing device, clamping device is rotatably installed in the middle of the upper end surface of workbench, polishing device is arranged above clamping device, polishing device lower end is fixedly connected to the upper end of workbench, by rough grinding and fine grinding twice polishing treatment to the corrugated compensator after clamping and fixing, and then cooperate with air blowing treatment, solve the problem that existing corrugated compensator is difficult to clean in polishing and grinding process, which leads to the decline of polishing and grinding quality, and solve the problem that polishing dust is easily splashed and adhered to the inner wall of corrugated compensator after polishing and grinding, which leads to process extension and cost increase.

The invention relates to a polishing solution suitable for chemical mechanical polishing of a Cu wiring Co barrier layer integrated circuit. The polishing solution comprises the following components: silica sol, an oxidizing agent, a complexing agent, a corrosion inhibitor and deionized water, the pH value of the polishing solution is 8.0 to 10.0. According to the polishing solution, an amino acid reagent harmless to the environment is selected as a complexing agent, reagents such as imidazoline and imidazolidinyl urea are adopted as inhibitors, H2O2 is adopted as an oxidizing agent, silica sol is adopted as a grinding material, and the chemical dissolution effect and the mechanical effect are combined together to achieve global planarization of the wafer surface. Efficient CMP of a Cu / Co barrier layer is achieved, after the polishing solution is used for polishing the surface of a wafer, the Cu / Co removal rate selection ratio is close to 1: 1, and the effect that the surface roughness reaches the nanoscale can be achieved, so that the strict requirement of integrated circuit manufacturing for the CMP process is met, and the preparation process is simple and suitable for industrial production.

The utility model relates to motor stator polishing processing technical field, the utility model discloses a kind of motor stator polishing processing's limiting mechanism, including mounting seat, press -fitting block, installation foot, protective frame and driving motor, protective frame top is fixedly connected on mounting seat surface, installation foot left side surface is fixedly connected on press -fitting block right side surface, driving motor surface is fixedly connected in protective frame inner wall, limiting mechanism is provided on mounting seat, auxiliary mechanism is provided below mounting seat, limiting mechanism is used to limit motor stator, auxiliary mechanism is used to fix motor stator, the utility model is provided with limiting mechanism and auxiliary mechanism, solve the current motor stator polishing processing lack of limiting mechanism, cannot be positioned according to the width, thickness and inner ring of different stator, it is easy to lead to stator displacement, vibration or eccentricity and other defects when polishing, cause polishing wheel wear, equipment operation is not stable, reduce the problem of production efficiency and yield.

The invention discloses an aluminum alloy frame polishing device with an overturning structure and a using method, and relates to the technical field of aluminum alloy frame production, the aluminum alloy frame polishing device comprises a polishing base, a polishing inner seat and a driving push plate, a guide vertical frame is mounted at the output end of an electric lifting seat, and an aperture butt joint column is movably mounted on the opposite side of the driving push plate through a rotating shaft; the overturning motor is installed in the center of the outer side of the driving push plate, and the inner diameter arc abutting frame is movably installed on the outer side of the aperture butt joint column. A vehicle frame initial limiting assembly is arranged on the inner side of a guide vertical frame, two sets of aperture butt joint columns are inserted into a circular ring hole of a center main rod, and an outer abutting hand rod drives an inner diameter arc abutting frame to expand outwards to abut against the inner diameter of the circular ring hole of the center main rod; the expanding diameter of the inner-diameter arc abutting frame is adjusted according to the diameter of the circular ring hole of the aluminum alloy frame so as to ensure that the inner-diameter arc abutting frame can be accurately fixed in the circular ring hole, the aluminum alloy frame is prevented from sliding or deviating in the overturning process of the aluminum alloy frame, and therefore the stability of the polishing process is improved.

The utility model relates to polishing device technical field, specifically disclose a polishing device for sheet metal part, including equipment body, the equipment body is connected with a bearing plate through the vertical sliding connection of pneumatic cylinder on, and the bearing plate is installed with a polishing assembly through servo mechanism on, the equipment body is rotatably connected with a rotating disc, the rotating disc is installed with a plurality of clamping blocks through the guide piece, and a plurality of clamping blocks form the clamping space for clamping work piece, the rotating disc bottom is provided with the power element for providing power. In the bearing plate movement process linkage piece links the lifting movement of bearing plate with the rotation of rotating disc and rotates and moves, so that the clamping / loosening action of clamping block does not need additional motor or cylinder drive, only relies on original polishing assembly lifting power and can be completed simultaneously. Compared with the prior art, the independent clamping drive source is saved, the whole machine structure is simplified, and the energy consumption and manufacturing cost are significantly reduced.

The application provides a polishing endpoint detection method, a chemical mechanical polishing device and a storage medium, and belongs to the field of chemical mechanical polishing. The method comprises the following steps: acquiring a reflection spectrum of a wafer surface in a chemical mechanical polishing process; correcting the reflection spectrum by using a preset correction coefficient to obtain a corrected reflection spectrum; dividing the corrected reflection spectrum into a dark noise spectrum and a to-be-detected spectrum based on a comparison result of the corrected reflection spectrum and a corresponding threshold value; determining the reflectivity of the wafer surface based on the to-be-detected spectrum, the dark noise spectrum, a reference spectrum and a preset reference spectrum reflectivity; and determining the polishing endpoint based on the wafer thickness by using the reflectivity of the wafer surface to determine the wafer thickness. The application improves the accuracy of endpoint detection.

The utility model discloses a kind of medical titanium and titanium alloy bar polishing automatic limiting device, belong to polishing and grinding technical field.Device includes the first shock stop component, polishing component and second shock stop component sequentially arranged on mounting base along polishing process;Shock stop component structure is same, all include the support frame fixed in base, V type guide slot, the electric telescopic rod with pressure wheel in top and side proximity switch, receive proximity switch signal by PLC controller and control electric telescopic rod telescoping, dynamic regulation pressure wheel and bar contact pressure;Polishing component includes the polishing thousand feather wheel and polishing support wheel separately arranged in the both sides of bar, and they are driven by same motor by synchronous belt.The utility model cooperates through shock stop component, V type guide slot accurate guidance, synchronous drive polishing component and smooth material feeding, effectively reduce bar vibration deviation, improve polishing uniformity and surface finish, significantly improve the polishing precision and consistency of medical titanium alloy bar.

The utility model discloses a polishing device for hardware, which belongs to the technical field of hardware polishing and comprises a counter, a slider groove is arranged at the top of the counter, a pushing device is arranged in the counter and comprises a bidirectional threaded rod, two ends outside the bidirectional threaded rod are in threaded connection with transmission blocks, and the transmission blocks are in threaded connection with the slider groove. The top of the transmission block is fixedly connected with a supporting block. According to the polishing device for the hardware, by arranging a rocker, a rotating disc, a transmission block, a supporting block, a connecting column, a supporting seat, rubber pads and a bidirectional threaded rod, when the hardware needs to be polished, the hardware is firstly placed between the two rubber pads, then the rotating disc is rotated by holding the rocker, the transmission block is made to move along the bidirectional threaded rod, and the transmission block drives the supporting block to move; the supporting block drives the connecting column to move, the connecting column drives the supporting base to move, the supporting base drives the rubber pad to move, the hardware is prevented from shaking in the polishing process, and the polishing precision is improved.

The utility model discloses a kind of stable, high-precision polishing equipment, it is related to polishing equipment technical field, including rack, the polishing wheel being set on rack, rotatably set on the auxiliary wheel of the rack and the driving assembly for driving the rotation of the polishing wheel, the polishing wheel is oppositely arranged with the auxiliary wheel upside down, the rack is equipped with inverted "N" type single side hanging, the driving assembly is set in one end of the single side hanging, the output shaft of the driving assembly is connected with one end of the polishing wheel, the other end of the polishing wheel rotatably connects the other end of the single side hanging;The utility model is relative to the setting of polishing wheel one end suspension, more stable when polishing wheel works, so that polishing precision is higher, and polishing effect is also better.

This invention relates to the field of chemical mechanical polishing (CMP) pad technology, specifically to a highly hydrophilic and wear-resistant CMP polishing pad, its preparation method, and its application. The invention uses cyanosiloxane monomers as raw materials, preparing highly active carboxylate silsesquioxane powder through one-step alkaline hydrolysis, and achieving nanoscale uniform dispersion of this powder in polyurethane. After pre-treating the base fabric with an acid-base oscillating impregnation agent, the nanoscale uniformly dispersed slurry is coated onto the base fabric, and then solidified to obtain the target product. This invention solves the technical problems of difficulty in balancing hydrophilicity and wear resistance, and poor polishing uniformity in existing hydrophilic modification polishing pads. The polishing pad produced is used for wafer polishing, exhibiting less than 3% intra-wafer non-uniformity, fewer surface defects, and extended service life. The process of this invention is fully compatible with existing wet production lines for polyurethane polishing pads, requiring no additional equipment. The process is simplified, batch stability is strong, and industrial mass production is possible, adapting to the high-precision, low-defect polishing requirements of advanced semiconductor processes below 14nm.

The application discloses a force control floating spindle device, which comprises an electric spindle, a spindle mounting plate and an electric cylinder mounting plate, the spindle mounting plate is fixedly sleeved outside the electric spindle, the electric cylinder mounting plate is slidably sleeved outside the electric spindle, a vertical servo electric cylinder floating mechanism for realizing vertical floating of the electric spindle is arranged between the spindle mounting plate and the electric cylinder mounting plate, and a horizontal servo electric cylinder floating mechanism for realizing horizontal floating of the electric spindle is connected to the electric cylinder mounting plate. The application further provides a polishing device. The force control floating spindle device comprises the vertical servo electric cylinder floating mechanism and the horizontal servo electric cylinder floating mechanism, the floating effect can be divided into horizontal floating and vertical floating, and thus more abundant and various polishing processes can be covered.

This utility model belongs to the field of tooling and fixture technology, specifically relating to a polishing clamping fixture for a return wheel. It includes a frame, a mounting bracket fixedly connected to the top of the frame, a lifting cylinder vertically fixedly connected to the top of the mounting bracket, a lifting plate horizontally slidably connected to the inner side of the mounting bracket, an upper clamping electric cylinder vertically fixedly connected to the bottom of the lifting plate, an upper limit block on the piston rod of the upper clamping electric cylinder, a lifting platform directly below the upper clamping electric cylinder, a lower clamping electric cylinder vertically fixedly connected to the inner side of the frame, a lower limit block at the top axis of the lifting platform, and a polishing mechanism on the side of the lifting platform. The beneficial effect of this utility model is that, by incorporating the upper clamping electric cylinder, the lower clamping electric cylinder, and the polishing mechanism, all-around polishing of the return wheel can be achieved in a single clamping operation, effectively improving polishing efficiency and precision.

The utility model discloses a kind of plastic workpiece polishing dust suction platform, comprising: polishing platform, the polishing platform end side is equipped with hollow vertical plate of built-in polishing middle dust suction and filter component, and hollow vertical plate is equipped with dust suction filter mechanism of polishing dust suction and filter respectively in it, the hollow vertical plate front end is equipped with transparent polishing guard frame in closed space in manual polishing in polishing platform to plastic rearview mirror shell workpiece in polishing platform by detachable hinge, the utility model adopts transparent polishing guard frame and sealing rubber strip to form closed polishing space, and set up the arched hole of fitting arm on soft transparent sealing plate, effectively reduce the dust leakage when operator hand enters and exits.This further, the dust is prevented by elastic sealing rubber sleeve in threading hole through lead wire gap and enters equipment interior, solve the problem of poor sealing of traditional polishing platform from many aspects, significantly improve the air quality of working environment.

The utility model relates to the technical field of polishing pads, in particular to a micropore polishing pad suitable for infrared materials, which comprises a polishing pad base body, a plurality of heat conduction columns arranged along the thickness direction of the polishing pad base body are arranged on the polishing pad base body, and a micropore pad is fixedly arranged on the surface of the polishing pad base body. A plurality of micropores formed in the thickness direction of the micropore pad are formed in the micropore pad, a first stud is fixedly installed on the bottom face of the polishing pad base body, a sliding base is further fixedly installed on the bottom face of the polishing pad base body, a second stud is connected into the sliding base in a sliding mode, a sliding groove is formed in the sliding base, and a penetrating hole is formed in the top wall of the sliding groove; and a limiting disc is fixedly installed at the bottom end of the second stud, the limiting disc is located in the sliding groove and is in sliding connection with the sliding groove, the second stud penetrates out of the penetrating-out hole, and the first stud and the second stud are both in threaded connection with nuts. The polishing device facilitates timely heat conduction operation, improves the polishing precision and is convenient to use.

This application discloses a rotary polishing machine with a small-sized sheet metal pressing function, relating to the field of sheet metal processing machinery technology. It includes: a conveyor and a polishing mechanism mounted on the conveyor for polishing workpieces; the polishing mechanism includes a polishing mounting base mounted on the conveyor, which is driven to move laterally along the conveyor by a lateral movement force component mounted on the conveyor; several polishing head supports are arranged below the polishing mounting base, and polishing heads are arranged horizontally on both sides of the polishing head supports. Two of the polishing heads are driven to rotate by a self-rotation power component mounted on the polishing mounting base, and the polishing head supports are driven to rotate by a revolution power component mounted on the polishing mounting base; several pressing roller assemblies are mounted on the conveyor for pressing workpieces on the conveyor. This solves the problems of traditional polishing equipment, enables polishing of small-sized sheets, improves polishing uniformity, and reduces operating costs.

The utility model relates to the technical field of glass processing, and discloses a quartz glass tube end face flame polishing device which comprises a supporting assembly, the supporting assembly comprises a bearing frame, a limiting clamp is fixedly installed at the top of the bearing frame, a servo motor is fixedly installed in the bearing frame, and the servo motor is connected with the limiting clamp. And the output end of the servo motor is fixedly connected with a driving gear. The movable seat is pushed to move, the connecting rod is used for driving the connecting disc, and the clamping plate outside the connecting disc is influenced by vertical force of the connecting disc and is limited by the limiting block and the guide groove to expand outwards or contract inwards. In this way, the quartz glass tube can be arranged on the clamping plate in a sleeving mode, so that the effects that the quartz glass tube is stably fixed, the position of the quartz glass tube is accurate and the quartz glass tube does not shake in the polishing process are achieved, and the polishing quality of the end face of the quartz glass tube can be improved easily; accurate control over the rotating speed and the rotating direction of the quartz glass tube in the polishing process is achieved.

This utility model discloses a polishing device with good operational stability, low wear of the positioning structure, and high positioning accuracy. It includes a base, a lower plate assembly, an upper plate assembly, and a safety hook assembly. The base is equipped with a mounting bracket. The lower plate assembly includes a lower grinding disc and a first drive motor housed within the base and driving the lower grinding disc to rotate. A grinding zone is formed on the upper surface of the lower grinding disc. The upper plate assembly includes a telescopic drive component mounted on the mounting bracket, a connecting plate driven to the telescopic end of the telescopic drive component, a tension / compression sensor electrically connected to the telescopic drive component, a mounting plate fixedly connected to the lower part of the connecting plate, a displacement sensor fixed to the lower surface of the connecting plate and electrically connected to the first drive motor, and an upper grinding disc fixed to the lower surface of the mounting plate. A detection hole is provided on the mounting plate. The safety hook assembly includes two hook mechanisms symmetrically arranged on both sides of the telescopic drive component. Each hook mechanism includes a drive mechanism and a hook driven to the drive mechanism and having a support arm at its bottom.