Cerium oxide polishing powder and preparation method thereof

A technology of cerium oxide and polishing powder, which is applied in chemical instruments and methods, polishing compositions containing abrasives, inorganic chemistry, etc., can solve the problems of complex preparation process, high cost, complex production process, etc., and achieve high polishing precision, The effect of low cost and simple process

Active Publication Date: 2014-02-12
方复(上海)新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The wear resistance and polishing precision stability of this kind of polishing powder products composed of aggregate particles are difficult to control, and due to the complex production process, the cost increases and impurity ions have been introduced, causing quality fluctuations and is not conducive to particle size distribution control
[0007] Chinese patent application CN1939990A discloses a production method of cerium-rich rare earth polishing powder, which utilizes the addition of specific grain size seeds to increase the grain size of carbonate precipitates and avoid the formation of agglomerates. Although this method can improve carbon However, in this document, dimethyl oxalate or diethyl oxalate is used to heat and decompose oxalic acid to react with cerium particles to form single-phase oxalate precipitation. This method of preparing seed crystals is expensive and not conducive to industry Large-scale efficient production
[0013] However, the cerium oxide nanopowder prepared at present has complicated preparation process and high cost, and is not suitable for the industrialization of cerium oxide polishing powder.

Method used

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  • Cerium oxide polishing powder and preparation method thereof
  • Cerium oxide polishing powder and preparation method thereof
  • Cerium oxide polishing powder and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0043] In 400kg pure water, add 100kg cerium carbonate (TREO is 45%, CeO 2 / TREO is 99.96%), slowly add hydrochloric acid under stirring conditions, until pH is 1.5, filter to obtain a clear and transparent aqueous solution of cerium chloride, then add 5kg of polyethylene glycol with a molecular weight of 3000 to obtain solution A;

[0044] Slowly add 5% sodium carbonate aqueous solution into solution A heated to 65°C until the pH is 6.5, and continue stirring for 4 hours after the addition.

[0045] Then dehydrated by centrifugation and washed to Na 2 O≤400ppm, then calcined at 800° C. for 5 hours, and pulverized by air flow until D50 is 1.0 μm to obtain the rare earth polishing powder. figure 1 It is an XRD schematic diagram of the rare earth polishing powder obtained in Example 1 of the present invention. figure 2 SEM schematic diagram of the rare earth polishing powder obtained in Example 1 of the present invention.

Embodiment 2

[0047] In 234kg of pure water, add 100kg of cerium carbonate (TREO is 50%, CeO 2 / TREO is 99.99%), slowly add hydrochloric acid under agitation, until the pH is 2.5, filter to obtain a clear and transparent aqueous solution of lanthanum cerium chloride, then add 10kg of molecular weight polyethylene glycol to obtain solution A;

[0048] Slowly add 10% aqueous sodium carbonate solution into solution A heated to 85°C, and continue stirring for 2 hours after the addition. Then it was dehydrated by plate and frame filter press, calcined at 1000°C for 3 hours, and pulverized by air flow until D50 was 2.0 μm to obtain the rare earth polishing powder.

Embodiment 3

[0050] In 400kg pure water, add 100kg cerium carbonate (TREO is 45%, CeO 2 / TREO is 99.98%), slowly add hydrochloric acid under stirring conditions, until the pH is 2.0, filter to obtain a clear and transparent aqueous solution of cerium chloride, and then add 7kg of polyethylene glycol with a molecular weight of 6000 to obtain solution A.

[0051] Slowly add 7% sodium carbonate aqueous solution into solution A heated to 65°C until the pH is 7.0, and continue stirring for 4 hours after the addition.

[0052] Then dehydrated by centrifugation and washed to Na 2 O≤400ppm, then calcined at 900° C. for 4 hours, and pulverized by air flow until D50 is 1.5 μm to obtain the rare earth polishing powder.

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Abstract

The invention discloses cerium oxide polishing powder. The purity TREO of cerium oxide CeO2 is more than or equal to 99.95%; cerium oxide is CeO2 powder with crystal form being a uniphase cubic crystal system; cerium oxide is shaped like a round cake with the average particle size of 1mum. The invention further discloses a preparation method for the cerium oxide polishing powder. The preparation method comprises the steps of preparation of cerium chloride, precipitation, dehydration, roasting, smashing and the like. Compared with the existing preparation method, the polishing powder prepared by adopting the method is cerium oxide powder, F is not required for introduction in the preparation process, and the preparation method has the advantages of being simple in process, low in cost, and free from waste water; the cerium oxide polishing powder has the advantages of having no scratch in the polishing process of products, being high in polishing precision and the like.

Description

technical field [0001] The invention relates to a cerium oxide polishing powder and a preparation method thereof, in particular to a cerium oxide polishing powder for integrated circuits and liquid crystal displays and a preparation method thereof. Background technique [0002] Rare earth polishing powder is used for polishing lenses, flat glass, glass bulbs, glasses, watch cases, etc. It has the characteristics of fast polishing speed and high precision. Since the invention of rare earth polishing powder in the 1940s, the production volume and application volume have gradually increased. The production process of rare earth polishing powder has changed with the progress of rare earth separation process. In recent years, with the rapid development of the information industry, liquid crystal displays, flat-panel displays, optical components, etc. have more and more demands for polishing powder, and the requirements for polishing precision are getting higher and higher. [0...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02C09K3/14C01F17/00
Inventor 赵月昌高玮陈曦蒙素玲郝祥杨筱琼
Owner 方复(上海)新材料科技有限公司
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