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Method for preparing polyurethane polishing disc

A production method and polyurethane technology are applied in the production field of polyurethane polishing sheets, which can solve the problems of uneven micropores of polishing sheets, low machining accuracy, low polishing efficiency, etc., and achieve good wear resistance, high cutting rate, and polishing efficiency. high effect

Inactive Publication Date: 2010-12-01
张海龙
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, in the field of optical cold processing, polyurethane polishing sheets have been widely used, but the polishing sheets produced by the traditional polyurethane polishing sheet production method have uneven micropores, low polishing efficiency, low processing accuracy, and high cost

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] Step (1): Weighing, successively weigh 10kg of toluene diisocyanate (TDI-80 / 20), 20kg of polyether polyol (330E), 4.5kg of chain extender (1,4-butanediol), and crosslinking agent (3,3'-dichloro-4,4'-diaminodiphenylmethane, namely MOCA, commonly known as Moka in Chinese) 1.6kg, foaming spirit (chemical name is polysiloxane-polyalkoxy ether copolymerization material) 0.15kg, cerium oxide (fineness greater than 12000 mesh) 9kg;

[0016] Step (2): pre-polymerization of component A, the toluene diisocyanate and polyether polyol weighed according to step (1) are pre-polymerized in a vacuum state to make component A, so that component A can Not affected by adverse factors such as external air and moisture, avoiding the reaction of toluene diisocyanate and moisture to produce miscellaneous chains, so as to reduce the tear strength of the finished product;

[0017] Step (3): Prepare component B, and uniformly mix the chain extender, crosslinking agent, foaming agent, and cerium...

Embodiment 2

[0021] Press step (1) among the embodiment 1 and weigh successively toluene diisocyanate 10kg, polyether polyol 24kg, chain extender 6kg, crosslinking agent 2.5kg, foaming spirit 0.25kg, cerium oxide 11kg;

[0022] Polyurethane polishing sheet was prepared according to step (2), step (3), step (4) and step (5) in Example 1.

Embodiment 3

[0024] Press step (1) among the embodiment 1 and weigh successively toluene diisocyanate 10kg, polyether polyol 22kg, chain extender 5kg, crosslinking agent 2kg, foaming spirit 0.2kg, cerium oxide 10kg;

[0025] Polyurethane polishing sheet was prepared according to step (2), step (3), step (4) and step (5) in Example 1.

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PUM

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Abstract

The invention relates to a method for preparing a polyurethane polishing disc, in particular to a proportioning and a preparing process of the polyurethane polishing disc. The method comprises the following steps: taking toluene diisocynate, polyether polyol, a chain extender, a cross-linking agent, a copolymer of polysiloxane and polyalkoxy-ether and cerium oxide as raw materials based on the weight ratio of 100:200-240:45-60:16-25:1.5-2.5:90-110; and pre-polymerizing the toluene diisocynate and the polyether polyol to form component A, mixing the chain extender, the cross-linking agent, the copolymer of polysiloxane and polyalkoxy-ether and the cerium oxide to form component B, adding the component A and the component B to a vacuum closed mixing vessel to mix quickly for 5-15 seconds, infusing the components into a die, cooling and curing into polyurethane blank, and then cutting the blank into slices to finally obtain the polyurethane polishing disc. The polyurethane polishing disc obtained by the method of the invention has good elasticity and good microcellular structure and can be used in high-precision grinding and polishing process of various lenses, glasses, prisms, mirror surfaces, optical parts and other glass products. The method of the invention has the advantages of good wear resistance, high polishing efficiency, high polishing precision, high cutting rate, no passivation, simple and convenient operation, low cost and the like.

Description

technical field [0001] The invention relates to a method for manufacturing a polyurethane polishing sheet, and relates to a proportion and a manufacturing process of the polyurethane polishing sheet. Background technique [0002] At present, in the field of optical cold processing, polyurethane polishing sheets have been widely used, but the polishing sheets produced by the traditional polyurethane polishing sheet production method have uneven micropores, low polishing efficiency, low processing accuracy, and high cost. Contents of the invention [0003] The object of the present invention is to provide a method for producing a polyurethane polishing sheet, which can make the produced polyurethane polishing sheet have uniform micropores, high polishing efficiency, good processing accuracy and low cost. [0004] A method for making a polyurethane polishing sheet, (1) the raw materials used for making are toluene diisocyanate, polyether polyol, chain extender, crosslinking a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L75/08C08K3/22C08G18/48C08G18/10C08G101/00
Inventor 张海龙
Owner 张海龙
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