104results about "Polishing compositions" patented technology

A pressure sensitive adhesive electrolyte (PSAE) was prepared by polymerizing in two steps, e.g., (a) UV syrup preparation and (b) curing by UV web polymerization or UV polymerization of a mixture comprising at least the following components: • 4 – 86 wt % of acrylate monomer (a1) from the group of the (meth)acrylic esters having 4 – 44 carbon atoms and containing at least one oxygen atom, • 0.5 – 50 wt % of acrylate monomer (a2) from the group of the (meth)acrylic esters or amides having 4 – 25 carbon atoms and containing at least one nitrogen atom, • 0.005 – 10 wt % of at least one initiator, wherein the at least one initiator is preferably a thermal initiator and / or a photoinitiator, especially preferably at least one photoinitiator, • 0 – 35 wt % of conducting salt, • 2 – 60 wt % of ionic liquid, wherein the ionic liquid is preferably a room temperature ionic liquid (RTIL), • optionally further additives like plasticizer, antioxidant, tackifier, chain transfer agent, filler, corrosion inhibitor, oxygen scavenger, additional monomers, as for example 0 to 50 wt %, wherein optionally one or more of the components are added at least proportionally, as for example completely, only during or after the polymerization. With such PSAE conductivities according to the invention an ionic conductivity by test B of more than 10-6 S / cm up to at least 10-3 S / cm, can be achieved and the PSAE is suitable for applications like electrochromic cells / dimming foils and PSA with electrically debonding function. Especially, with such PSAE conductivities according to the invention, an ionic conductivity by test B of more than 10-8 S / cm up to at least 10-3 S / cm and peel adhesion by test A up to around 9 N / cm can be achieved.

A method comprises planarizing a substrate material with a functionalized chemical planarization pad. The functionalized chemical planarization pad includes a plurality of functional groups bonded to a material of the pad. The functional groups are configured to chemically react with the substrate material such that a portion of substrate material bonds to the functional groups. The pad is regenerated by applying a regeneration solution configured to break bonds between the functional groups and substrate material bonded to the functional groups to form removed material. The removed material is complexed in a dissolved complexing agent to form dissolved material in an effluent phase.

The invention relates to the field of solar cell manufacturing, and particularly discloses a polishing additive for solving the black core problem in the BC cell pre-rough polishing process and a use method of the polishing additive. 0.1-5% of a defoaming agent; 0.1 to 0.5 percent of pH (Potential of Hydrogen) regulator; and the balance of deionized water. According to the method, the accelerant, the defoaming agent and the pH regulator in a specific ratio are combined, so that the oxidation reaction on the surface of the silicon wafer is more uniform and controllable; the accelerant accelerates formation and dissolution of a surface oxide layer, and generation of black cores is effectively avoided; the synergistic effect of the defoaming agent ensures that bubbles generated by the reaction can be quickly desorbed, the problem of uneven local corrosion caused by bubble retention is prevented, the surface of the polished silicon wafer is completely free of black nuclei, and ideal surface conditions are provided for subsequent processes.

To provide a flattening agent for organic film formation from which a composition for organic film formation having high flattening characteristics is given, a composition for organic film formation containing the flattening agent, an organic film formation method using the composition, and a pattern formation method.SOLUTION: A flattening agent for organic film formation is composed of an aromatic-containing compound having a molecular weight represented by the molecular formula of 200-500, wherein the flattering agent for organic film formation is blended with a composition containing a resin for organic film formation and a solvent having complex viscosity of 1.0 Pa s or more in a temperature range of 175°C or higher, and thereby the complex viscosity of the composition becomes less than 1.0 Pa s in the temperature range of 175°C or higher.SELECTED DRAWING: Figure 2

The invention discloses a device and method for efficiently polishing the surface of a 3D printing stainless steel straight hole, and the device comprises a rack, a workpiece clamping module, a multi-axis movement module, a polishing module, an auxiliary module and a control module; the multi-axis movement module drives the surface of the straight hole to be attached to and conduct circumferential and up-down reciprocating motion around the polishing line, the polishing line rotates at a high speed, hard abrasive particles on the polishing line cooperate with polishing liquid supplied by the auxiliary module, and a powder adhesion layer on the surface of the straight hole is efficiently and evenly removed through the strong mechanical action and the strong chemical action. According to the method, a fine polishing line is used as a polishing tool, and the method can be suitable for a straight hole with the hole diameter as small as 0.5 mm; similar to sub-aperture polishing (different from full-aperture polishing in the prior art), a single polishing line is utilized, the method can be suitable for different apertures through path planning, and the universality is high; and high polishing efficiency can be realized by utilizing the strong chemical action of the polishing solution and the strong mechanical action of the polishing line.

The invention discloses a monocrystalline silicon wafer alkali polishing additive and a preparation method and application thereof, and the alkali polishing additive comprises the following components by mass content: 0.5-4% of a reaction accelerator, 2-5% of a corrosion and scale inhibitor, 1.5-3% of a chelating agent, 1-3% of a pH regulator, 1-5% of a surfactant, 3-10% of a cosolvent and the balance of water according to the total mass of 100%. The alkali polishing additive is obvious in performance gain, good in etching selectivity and small in silicon wafer weight loss; the back polishing effect can be improved, the reflectivity of the silicon wafer is high, and the photoelectric conversion efficiency of a photovoltaic cell is improved; the anti-crystallization performance is excellent, and the environment is protected.

The invention relates to the technical field of brighteners, and discloses an environment-friendly tire brightener and a preparation method thereof.The environment-friendly tire brightener is obtained by adding waterborne silicone oil, polyurethane emulsion, water, nano-zinc oxide modified imidazoline and modified polyurethane into a stirrer and stirring. Aminated zinc oxide and imidazole groups in nano-zinc oxide modified imidazoline have a better self-cleaning effect and can effectively remove oil stains on the surface of a tire, and a polyphenylene sulfide structure in the nano-zinc oxide modified imidazoline also has better oil resistance, so that the surface of the tire does not adsorb oil, and better brightness is kept; after the chloromethylated polyphenylene sulfide reacts with the intermediate 1, the substitution degree of the polyphenylene sulfide is improved, and the oil-resistant effect of the tire is further improved. The fluorine element in the modified polyurethane is introduced into the tire brightener and is applied to the surface of a tire, so that a smooth fluorine carbonization layer which is not easy to adhere to an object is formed on the surface of the tire, and the tire brightener has a better self-cleaning effect.

A pad for performing abrasive-free chemical planarization of a polycrystalline silicon (polysilicon) surface, the pad comprising a polymer layer incorporating a functional group reactive with polysilicon to remove silicon from the polysilicon surface.

Compositions and methods that impart a hydrophobic finish to surfaces, such as, for example, automotive surfaces. The compositions comprise an amino functional silicone emulsion, an amphoteric surfactant, and, a non-ionic surfactant.

The invention provides a film coating device for polishing film preparation and a preparation method, and relates to the technical field of polishing film preparation, the film coating device comprises a rack, a feeding mechanism is arranged at the top of the rack, the feeding mechanism is used for conveying a base material, a film coating mechanism is arranged on one side of the top of the feeding mechanism, and a drying mechanism is arranged on one side of the film coating mechanism; and the drying mechanism is mounted on the feeding mechanism. According to the film coating device for preparing the polishing film, a base material to be coated with a film is conveyed to the film coating mechanism through the feeding mechanism, the base material is evenly coated with a polishing material in cooperation with the film coating mechanism, the coated base material is dried, the polishing material coated on the surface of the base material is rapidly cured, and then the dried finished polishing film is wound. According to the polishing film preparation device, automatic polishing film preparation is achieved, manual intervention is reduced, and the production efficiency and the product quality are improved.

The invention discloses easy-to-polish leather maintenance cream which comprises the following components: deionized water, a modified palm wax emulsion, an environment-friendly penetrant, a resin emulsion, metal complex dye water, a synthetic grease emulsion and an additive, the preparation method comprises the following steps: weighing deionized water, and adding the penetrant, the synthetic grease emulsion and the modified resin emulsion; adding the modified palm wax emulsion to be uniformly mixed; adding metal complex dye water; adding an additive; packaging; wherein the modified palm wax emulsion is prepared by the following steps: adding concentrated sulfuric acid and palm wax, melting the palm wax, and adding a hydrogen peroxide solution for complete oxidation; heating and re-melting, adding water, continuously stirring, and standing; repeating the washing step; adding zinc oxide, heating and melting; and adding high-molecular polyethylene glycol, slowly cooling to normal temperature after the reaction is finished, and filtering to obtain the modified palm wax emulsion. After the easy-to-polish leather product maintenance paste is used, a layer of compact wax film can be formed on the surface layer of a leather product, so that the maintained leather product has excellent polishing performance.

The invention relates to a silicon material high-flatness CMP (chemical mechanical polishing) processing mode, which belongs to the technical field of semiconductors, and comprises the following operation steps of: 1, before a CMP mechanical polishing process, optimizing the structure and the material of polishing cloth, and manufacturing the polishing cloth by using a material with better elasticity and wear resistance, so that the stability and the durability of the polishing cloth in the polishing process can be improved; and secondly, in the CMP mechanical polishing process, polishing parameters are adjusted to improve flatness, increase polishing pressure and improve the material removal rate, but the polishing rotating speed and time need to be adjusted at the same time so as to prevent the surface roughness from being increased. And thirdly, the formula of the polishing solution is optimized, the chemical reaction rate and the material removal rate in the polishing process are adjusted, and therefore higher flatness is achieved. The structure, the material, the mechanical action and the chemical action of the polishing cloth are deeply analyzed, and a new perspective is provided for understanding physical and chemical mechanisms in the polishing process.

A method using silicon dioxide improves the cathodic anticorrosion effect of ground coats, preferably of a zinc primer, based on epoxy-functional polymers and at least one metal particle.

The invention relates to the technical field of chemical engineering and equipment, and discloses a continuous feeding reaction device for lignin photodegradation, which comprises a reaction tube, an LED light source array and a transducer arranged outside the reaction tube, and a rotating shaft arranged inside the reaction tube and driven by a rotation driving mechanism. A composite scraping mechanism is mounted on the rotating shaft and is used for forcibly scraping reaction liquid on the inner wall of the reaction tube to form a thin film. The transducer is used for generating an ultrasonic standing wave field to drive photocatalyst particles to form a high-density array; the LED light source array works in a pulse mode, and the triggering time of light pulses of the LED light source array is matched with the time when the density of the catalyst array reaches a peak value. Through the synergistic effect of dynamic film scraping self-cleaning, the sound field tissue catalyst and pulsed light synchronous irradiation, the problems of light shielding, easy blockage and slow mass transfer in a high-viscosity dark multiphase system are solved, and the reaction efficiency and stability are improved.

The invention discloses a small tower footing monocrystalline silicon alkali polishing additive and a use method thereof, and belongs to the technical field of alkali polishing, the small tower footing monocrystalline silicon alkali polishing additive comprises the following raw materials by weight: 0.3-2% of a polishing agent, 0.5-2% of a corrosion and scale inhibitor, 0.5-1% of a defoaming agent, 0.1-0.5% of a surfactant, 0.1-0.5% of a eutectic solvent, and the balance of deionized water. The small-tower-footing monocrystalline silicon alkali polishing additive provided by the invention can effectively protect a non-polished surface and control the reaction rate of a polished surface in a silicon wafer polishing process, ensures that a uniform small-size tower footing structure is formed after alkali polishing, improves the contact effect of back slurry, improves a filling factor and improves the performance of a battery piece.

The invention discloses a green and environment-friendly processing method of low-emission rice, relates to the technical field of rice processing, and solves the problems of large emission of dust and wastewater, high energy consumption and low resource utilization rate in traditional processing. The method comprises the steps of raw grain pretreatment and purification, graded low-temperature grinding, biodegradable additive polishing, by-product resource recycling, tail gas multi-stage purification, wastewater treatment circulation and process regulation and control in combination with a multi-parameter optimization model. Results show that dust emission, wastewater reuse rate and unit energy consumption are reduced, byproduct utilization rate is increased, no chemical additive is left, rice safety is guaranteed, and the method is suitable for large-scale green processing.

The invention relates to the field of slow pulling additives, in particular to a slow pulling additive for producing a crystalline silicon cell and a method for producing a silicon wafer for the crystalline silicon cell by using the slow pulling additive. The invention relates to a slow pulling additive for producing a crystalline silicon battery. The slow pulling additive consists of the following substances in percentage by weight: 5-10% of a surface cleaning agent; 0.5-2% of a stabilizer; 0.05-1% of a dispersant; 0.05 to 1% of a surfactant; and the balance of water. According to the technical scheme, the surface cleaning agent contained in the additive can remove impurities on the surface of the silicon wafer, and the surface smoothness is improved. And the stabilizer is beneficial to maintaining the uniform dispersibility of the additive, so that the stability of the performance of the additive in the whole manufacturing process is ensured. The addition of the dispersant and the surfactant further improves the fluidity of the additive and the distribution of the additive in the liquid, reduces the generation of bubbles, reduces the surface pollution caused by water residue, and improves the yield of the battery piece.

According to one embodiment, the polishing pad can reduce noise and vibration in a specific frequency range. Therefore, the polishing pad has excellent sound absorption characteristics because the maximum sound absorption coefficient thereof measured at a frequency of 500 Hz to 4,000 Hz according to Equation 1 satisfies 0.1 or more. Accordingly, the present invention has an excellent polishing rate because it can minimize energy loss due to thermal energy or vibration energy in a CMP polishing process.

The invention discloses a production process of a hydrofluoric acid polishing solution for touch screen processing, and particularly relates to the technical field of polishing solution production.The production process comprises the following steps that firstly, high-purity hydrofluoric acid is selected as a basic raw material to ensure the initial quality of the polishing solution, ingredients are selected and screened, impurities in the ingredients are removed, and a hydrofluoric acid solution is obtained; then adjusting the concentration of the ingredients; 2, hydrofluoric acid and other ingredients are sequentially added into the reaction container, the feeding speed is controlled, and dangerous accidents caused by violent reaction are prevented; 3, adding a proper amount of deionized water into the reaction container, and heating to a proper temperature; the hydrofluoric acid polishing solution is filtered three times from coarse to fine in a triple filtering mode, solid particles and impurities in the polishing solution are almost completely removed, the cleanliness and transparency of the polishing solution are remarkably improved, scratches and defects in the polishing process are greatly reduced, and the prepared polishing solution is good in quality.

The invention provides an alkaline polishing and etching additive for monocrystalline silicon of a photovoltaic solar cell and application of the alkaline polishing and etching additive. The alkaline polishing and etching additive comprises the following components: chitosan, inorganic base, quercetin, resveratrol, tannic acid, inositol hexaphosphate and water. The alkaline polishing etching additive can effectively improve the etching uniformity, a layer of compact hydrophobic film is formed on the surface of the etched and polished silicon wafer, secondary pollution is avoided, the pickling process is not needed, and the yield and efficiency of solar cells can be improved.

The invention relates to the technical field of brighteners, and discloses an environmentally friendly tire brightener and a preparation method thereof. The invention provides an environmentally friendly tire brightener by adding water-based silicone oil, polyurethane emulsion, water, nano zinc oxide modified imidazoline, and modified polyurethane into a stirrer and stirring. The aminated zinc oxide and imidazole groups in the nano zinc oxide modified imidazoline have good self-cleaning effects, and can effectively remove oil stains on the tire surface. The polyphenylene sulfide structure itself also has good oil resistance, so that the tire surface does not absorb oil, thereby maintaining good brightness; after the chloromethylated polyphenylene sulfide reacts with the intermediate 1, the substitution degree of the polyphenylene sulfide is increased, and the oil resistance of the tire is further improved. The fluorine element in the modified polyurethane is introduced into the tire brightener and applied to the tire surface, so that a smooth fluorocarbon layer that is not easy to adhere to objects is formed on the surface, so that it has a good self-cleaning effect.

The application discloses a kind of high etching rate and high flatness silicon wafer chemical polishing liquid and application, the silicon wafer chemical polishing liquid is by following mass percentage raw materials: 20-60% nitric acid, 3-15% hydrofluoric acid, 1-20% sulfuric acid, 5-30% phosphoric acid, 0.01-5% additive, the rest is water;Wherein additive is by rate stabilizer and flow regulator composition.The silicon wafer chemical polishing liquid prepared by the application can be chemically polished to silicon wafer below 35 DEG C, eliminate the residual stress and damage layer generated after polishing, reduce the risk of broken piece, and after chemical polishing treatment, the surface of silicon wafer is mirror surface, roughness (Ra) is less than 1nm, TTV is less than 0.2 μm.

The invention relates to an electrolyte, a method and a device for metal surface treatment. An electrolyte for metal surface treatment includes: a plurality of free solid bodies having the ability to retain an amount of liquid; an amount of conductive liquid retained by the free solid body; and at least one sulfonic acid group contained within the free solid body.

The present invention relates to a polishing composition and its use. Specifically, it relates to a highly efficient, stable, and high-precision polishing composition. The polishing composition comprises an acid, an oxidizing agent, and water, wherein the acid is selected from inorganic acids and the oxidizing agent is selected from inorganic oxidizing agents, and the pH value of the polishing composition is 1 or less. The polishing composition of the present invention is suitable for polishing medical devices, particularly for polishing medical devices requiring a relatively large removal rate. When used for polishing, the composition has the advantages of high polishing precision, simple and convenient operation, and low cost. Furthermore, the polished product has relatively good mechanical properties, surface properties, and biological safety.

Disclosed are a polyurethane for use in a polishing layer, and a polishing layer and a polishing pad using the same, the polyurethane including a terminal group represented by the following formula (I): R-(OX)n- (I) wherein R represents a monovalent hydrocarbon group having 1 to 30 carbon atoms that may be substituted with a heteroatom or may be interrupted by a heteroatom, X represents an alkylene group having 2 to 4 carbon atoms, 90 to 100% of the alkylene group being an ethylene group, and n represents a number from 8 to 120.

A composition for planarizing the surface of a semiconductor device includes a silicon-based material including siloxane, silsesquioxane, polysiloxane, polysilsesquioxane and / or polysiloxane resin; together with at least one solvent, a catalyst and a crosslinking agent, the crosslinking agent including a siloxane compound.

Provided are a polishing composition and application thereof. Particularly, an efficient, stable, and high-precision polishing composition is related. The polishing composition includes an acid, an oxidizing agent, and water, where the acid is selected from inorganic acids, the oxidizing agent is selected from inorganic oxidizing agents, and a pH value of the polishing composition is ≤ 1. The polishing composition provided by the present invention is suitable for the polishing of medical devices, especially for the polishing of medical devices with a relatively large removal amount. The polishing composition is applied to polishing with the advantages of high polishing precision, simple and convenient operations, and low costs. Meanwhile, a polished product has good mechanical properties, surface properties, and biosafety.

Disclosed in the present invention is a solar photovoltaic silicon wafer polishing liquid additive, comprising a reaction promoter, a corrosion and scale inhibitor, a surfactant, a calcium salt and deionized water; the amount of the reaction promoter is 3-5%, the amount of the corrosion and scale inhibitor is 1-2%, the amount of the surfactant is 0.2-0.4%, the amount of the calcium salt is 0.15-0.25%, and the balance is deionized water. The calcium salt can cooperate with the corrosion and scale inhibitor to significantly reduce the corrosion rate of alkali on silicon dioxide, protect a PN junction on a front side of a battery from being destroyed during an etching process, and promote a polishing effect of alkali on a silicon wafer. It is green and environmentally friendly, not only reducing the use of HF, but also improving battery conversion efficiency, significantly reducing wastewater and waste gas treatment costs and the material costs of battery production, and achieving the goal of reducing environmental pollution while improving efficiency and reducing costs.

The invention belongs to the field of semiconductors, and particularly discloses a method for improving the surface quality of a gallium arsenide wafer. According to the method, the specific polishing solution is adopted for chemically and mechanically polishing the gallium arsenide, chemical and mechanical actions in the polishing process are matched with each other, the wafer falling rate in the gallium arsenide polishing process is increased, the wafer surface roughness is reduced, and the polishing quality is improved. And the surface of the polished gallium arsenide wafer is free of obvious corrosion pits, obvious lines, polishing solution residues, scratches and other defects, and the purpose of improving the overall quality of the surface of the gallium arsenide wafer is achieved.

To provide a floor coating whitening restoration agent that can simply repair and restore the coating whitened from alcohol adhesion back to its original condition.SOLUTION: A floor coating whitening restoration agent comprises (A component) 50 wt.%-90 wt.% of an alcohol and (B component) 10 wt.%-50 wt.% of one or more selected from ethylene glycol monoalkyl ether, methoxy butanol, diethylene glycol monoalkyl ether, diethylene glycol diethyl ether, triethylene glycol dialkyl ether, propyleneglycol alkyl ether, and dipropyleneglycol alkyl ether.SELECTED DRAWING: None