26 results about "Photosensitive glass" patented technology

The invention provides a photosensitive glass ceramic with lower visible light absorption loss, which comprises the following components in molar percentage: cation components: 50-65% of Si < 4 + >; 25 to 38% of Na < + >; 2-6% of Zn < 2 + >; 3-9% of Al < 3 + >; 0.001 to 0.1% of Ag < + >; 0.001 to 0.08% of Ce < 4 + >; 0.02 to 0.2 percent of Sb < 3 + >; the negative ion component comprises 88 to 98 percent of O < 2->, 0.001 to 0.09 percent of Sn < 4 + > and 88 to 98 percent of Sn < 4 + >; f-: 2 to 10%; and 0.05 to 2 percent of Br <->. Through reasonable component design, the obtained photosensitive microcrystalline glass is low in visible light absorption loss and can be used for preparing glass elements such as volume Bragg gratings with low optical loss and high diffraction efficiency.

The invention relates to the technical field of glass materials, in particular to high-strength chemically-strengthened photosensitive microcrystalline glass as well as a preparation method and application thereof. The high-strength chemically strengthened photosensitive microcrystalline glass comprises the following raw materials in percentage by mass: 65%-80% of SiO2, 3%-12% of Al2O3, 5%-15% of Li2O, 0%-5% of Na2O, 0%-3% of K2O, 0%-3% of MgO, 0%-1% of CaO, 0%-1% of SrO, 0%-3% of ZnO, 0%-2% of P2O5, 1%-7% of ZrO2, 0%-1% of TiO2, 0.05%-0.5% of CeO2, 0.05%-0.5% of Ag2O and 0.1%-0.6% of Sb2O3, the ratio of Li2O + Na2O + K2O is 8%-16%, and the ratio of MgO + CaO + SrO + ZnO is 0%-5%.

The invention belongs to the technical field of photosensitive glass, and discloses colored photosensitive microcrystalline glass and a preparation method and application thereof.The preparation method of the colored photosensitive microcrystalline glass comprises the steps that SiO2, Al2O3, B2O3, Li2O, Na2O, MgO, ZnO, ZrO2, CeO2, Ag2O, Sb2O3, F <->, Cl <->, Br <-> and a clarifying agent are mixed to obtain a mixture, the mixture is sequentially melted, clarified and formed, formed glass is obtained, and the colored photosensitive microcrystalline glass is obtained. And carrying out heat treatment on the formed glass to obtain the colored photosensitive microcrystalline glass. According to the preparation method, a'photosensitizer-colorant-nucleating agent 'decoupling doping strategy is innovatively adopted through component gradient design and a multi-stage heat treatment system, so that color development, crystallization and transparency under different heat treatment systems are realized, and the colored photosensitive microcrystalline glass with a color development function and a photosensitive micro-crystallization characteristic can be prepared.

The application discloses a curved photosensitive glass, a preparation method and application thereof, and belongs to the technical field of glass materials.The application meets the specific composition of the curved photosensitive glass, in particular, the content of CeO2, Sb2O3 and Ag2O meets the specific range, so that the exposed area of the curved photosensitive glass has good shielding performance, and the curved photosensitive glass shows uniform black color after heat bending treatment; meanwhile, the non-exposed area of the curved photosensitive glass has good light transmittance; and the curved photosensitive glass can meet the requirements in the fields of mobile phone cover plates, smart watches and the like.

To provide a photosensitive glass material having a low dielectric loss, a photosensitive crystallized glass made therefrom, a photosensitive crystallized glass product and a method for producing a photosensitive crystallized glass product.SOLUTION: The present invention provides a photosensitive glass material, including the following components in percentage by weight: 65 to 78% of SiO2; 2 to 12% of R2O; 5 to 15% of Li2O; 3 to 12% of Al2O3; 1.5 to 10% of ZrO2; 0.01 to 0.6% of CeO2; 0.01 to 0.8% of Ag2O, wherein Li2O / ZrO2 is 1.0 to 7.5, and the R2O is one or two of Na2O and K2O. By reasonable component design, the photosensitive glass material of the present invention has a lower dielectric loss, and photosensitive crystallized glass and a photosensitive crystallized glass product made therefrom also have lower dielectric losses, and can reduce transmission losses of electric signals of application terminals during use.SELECTED DRAWING: None

The invention relates to the technical field of glass cover plates, and provides a glass cover plate, a preparation method of the glass cover plate and electronic equipment, the glass cover plate is prepared from photosensitive glass, photosensitive metal ions in the glass cover plate can be reduced into photosensitive metal atoms, and the photosensitive metal atoms can be reduced into photosensitive metal atoms. The photosensitive metal atoms gather in the photosensitive glass to form the photosensitive metal colloid particles with different concentrations, the photosensitive metal colloid particles have certain sizes, and the photosensitive metal colloid particles with certain sizes and different concentrations present different colors, so that the glass cover plate can present colorful colors, and the service life of the glass cover plate is prolonged. And the photosensitive metal colloid particles are formed in the glass cover plate, so that the influence of the external environment can be isolated, and the color on the glass cover plate is more stable and durable.

The present invention is applicable to the technical field of semiconductor processes, and particularly relates to a manufacturing method for a laterally excited bulk acoustic wave filter, and a radio-frequency module. The manufacturing method uses the respective excellent characteristics of silicon-based glass and photosensitive glass so as to obtain crystallized glass as a sacrificial layer by means of exposing and annealing the photosensitive glass during manufacturing, thereby implementing pattern transfer. This process does not involve cavity lithography, etching or coating, thus reduces process steps, thereby reducing difficulty and costs, and improving the yield and structural stability of a filter; in addition, crystallized glass and uncrystallized photosensitive glass have high etching selectivity and extremely low parasitic resistance and capacitance, so that cavity etching can be simply and accurately controlled so as to obtain an ideal cavity structure, and device insertion loss can be reduced to improve the overall performance of the filter.

Embodiments of the present application provide a curved photosensitive glass, a preparation method therefor, and a use thereof. By means of causing the curved photosensitive glass to satisfy a specific composition, particularly by controlling the contents of CeO2, Sb2O3 and Ag2O within specific ranges, an exposed region of the curved photosensitive glass has good shielding performance and exhibits a uniform black color after hot bending treatment; in addition, an unexposed region thereof has good light transmittance. The glass can meet requirements in fields such as mobile phone cover plates and smart watches.

A method of manufacturing an optical coupler that includes: preparing a light-transmitting substrate having a first main surface and a second main surface aligned in a first direction; applying a first photosensitive glass paste containing a first filler to the first main surface; arranging a grayscale mask formed in a binary pattern on the second main surface; emitting an ultraviolet ray to the second main surface to expose the first photosensitive glass paste; removing the grayscale mask from the second main surface and developing the first photosensitive glass paste; and removing the light-transmitting substrate from the first photosensitive glass paste developed and curing the first photosensitive glass paste, wherein a longest length of the first filler is larger than a wavelength of the ultraviolet ray.

A waveguide package and a method for manufacturing the same are disclosed. The waveguide package includes a package structure including a waveguide opened toward one side surface of a substrate, a semiconductor chip mounted on one surface of the package structure and configured to output an electrical signal to the waveguide. Since an interior of the waveguide is filled with air, electrical loss of the waveguide is minimized. The cavity is formed by processing the substrate made of photosensitive glass. Accordingly, the waveguide may be accurately formed. An electronic circuit may also be formed at the waveguide package. Accordingly, it may be possible to provide a waveguide package enhanced in degree of integration.

An antenna on glass (AOG) device is disclosed having an air cavity formed at least partially in a photosensitive glass substrate. An air cavity structure at least partially surrounds the air cavity and wherein the air cavity structure is at least partially formed from the photosensitive glass substrate. An antenna is formed from a portion of a top conductive layer disposed over a top surface of the air cavity structure and at least partially overlapping the air cavity. A metallization structure is provided having a bottom conductive layer disposed on a bottom surface of the air cavity structure, wherein the bottom conductive layer is electrically coupled to the top metal layer by a conductive pillar disposed through the photosensitive glass substrate. Further, the AOG device can integrate one or more MIM capacitors and / or inductors that allow for RF filtering and impedance matching.

A photosensitive glass, a method for preparing the same, a strengthened photosensitive glass, and a use thereof, by controlling a raw material composition of the photosensitive glass, not only can ensure the stability of the glass composition during melting of the photosensitive glass containing Ag2O, but also can solve the problem of silver atom Ag 0 The problem of loss and damage of noble metal containers, and also can ensure that the optical transmittance of the exposed region of the photosensitive glass in the visible light and near-infrared wavelength range is extremely low after radiation treatment and heat treatment, and the shielding of the optical signal can be realized.

The application belongs to the technical field of photosensitive glass, and discloses a kind of color photosensitive glass-ceramics and its preparation method and application, wherein the preparation method of the color photosensitive glass-ceramics includes mixing SiO2, Al2O3, B2O3, Li2O, Na2O, MgO, ZnO, ZrO2, CeO2, Ag2O, Sb2O3, F ‑ , Cl ‑ , Br ‑ , clarifying agent, to obtain a mixture, sequentially melting, clarifying and forming the mixture to obtain a formed glass, and heat treating the formed glass to obtain the color photosensitive glass-ceramics; the application adopts a decoupling doping strategy of "photosensitizer-coloring agent-crystal nucleus agent" through component gradient design and multi-stage heat treatment system innovation, realizes color development, crystallization and transparency under different heat treatment systems, and can prepare color photosensitive glass-ceramics with color development function and photosensitive crystallization characteristics.

A method for preparing photosensitive glass and a use of photosensitive glass. A process for preparing photosensitive glass is controlled and improved, masking treatment is performed on two opposite main surfaces of a first region of a substrate glass comprising the first region and a second region, and the second region is not subjected to the masking treatment, so as to obtain double-sided masked substrate glass having the same structure; and radiation treatment is performed on the two main surfaces of the double-sided masked substrate glass having the same structure, such that an edge halo phenomenon of an exposed area of the photosensitive glass can be significantly improved, and good light shielding performance of the exposed area can be achieved.

The application provides a photosensitive glass material, which contains, in percentage by weight, SiO2: 65-78%; R2O: 2-12%; Li2O: 5-15%; Al2O3: 3-12%; ZrO2: 1.5-10%; CeO2: 0.01-0.6%; Ag2O: 0.01-0.8%, wherein Li2O / ZrO2 is 1.0-7.5, and the R2O is one or both of Na2O and K2O. Through reasonable component design, the photosensitive glass material has low dielectric loss, and the photosensitive glass ceramic and the photosensitive glass ceramic product made of the photosensitive glass material also have low dielectric loss, so that the transmission loss of electric signals in the use process of an application terminal can be reduced.

The present invention relates to a photosensitive glass which deposits Li2SiO3 crystals by exposure and heat treatment, the value of the formula (A): [Li2O] / ([Li2O]+[Na2O]+[K2O]) is 0.50 to 0.75, and the dielectric loss tangent at 20°C, 10 GHz is 0.0090 or less.

The present disclosure relates to a glass substrate and a photosensitive glass wafer and discloses a glass substrate, a glass ceramic substrate, a photosensitive glass wafer provided with a photosensitive property, a photosensitive glass ceramic wafer, and an optically processed article, wherein the glass substrate is composed of SiO2-Li2O-Al2O3-based glass and include 65.0 to 75.0 wt% of SiO2, 5.0 to 9.0 wt% of Al2O3, and 10.0 to 13.5 wt% of Li2O, with the SiO2 / Li2O molar ratio being 2.30 to 3.50 and the SiO2 / Al2O3 molar ratio satisfying 14.50 to 20.50, and has a coefficient of thermal expansion of up to 9 ppm / K and a surface roughness (Ra) of up to 10 nm. The glass substrate has a surface roughness suitable for forming fine patterns, exhibits excellent thermal properties, and is advantageous for use as semiconductor core substrates. The substrate allows fabrication as large-area thin-film, facilitates the formation of fine via holes, and enables the adjustment of physical properties according to intended applications through variation in heat treatment conditions, thereby being useful as an interposer.

The present invention provides a photosensitive glass material, including the following components in percentage by weight: 65-78% of SiO2; 2-12% of R2O; 5-15% of Li2O; 3-12% of Al2O3; 1.5-10% of ZrO2; 0.01-0.6% of CeO2; 0.01-0.8% of Ag2O, wherein Li2O / ZrO2 is 1.0-7.5, and the R2O is one or two of Na2O and K2O. By reasonable component design, the photosensitive glass material of the present invention has a lower dielectric loss, and photosensitive microcrystalline glass and a photosensitive microcrystalline glass product made therefrom also have lower dielectric losses, and can reduce transmission losses of electric signals of application terminals during use.

The present invention relates to a photosensitive glass in which a Li2SiO3 crystal is precipitated by exposure and heat treatment, in which the photosensitive glass has a value of Formula (A) described below of 0.50 or more and 0.75 or less, and the photosensitive glass has a dielectric loss tangent at 20° C. and 10 GHz of 0.0090 or less, [Li2O] / ([Li2O]+[Na2O]+[K2O]) Formula (A), in Formula (A), [Li2O], [Na2O], and [K2O] respectively indicate contents of Li2O, Na2O, and K2O in the photosensitive glass in terms of mole percentage based on oxides.

The present invention relates to the technical field of radio frequency communications. Provided are a bulk acoustic resonator, and a preparation method therefor. The preparation method comprises the following steps: step S1, performing mask-aligned ultraviolet exposure on a photosensitive glass substrate; step S2, annealing the photosensitive glass substrate to form a crystallized sacrificial layer; step S3, growing and forming a seed layer on the photosensitive glass substrate; step S4, growing a bottom electrode on the seed layer; step S5, growing and forming a piezoelectric material layer on the upper surface of the bottom electrode and the upper surface of the seed layer; step S6, growing a top electrode on the upper surface of the piezoelectric material layer; step S7, etching the piezoelectric material layer to expose the bottom electrode; step S8, performing etching to form a through hole; and step S9, releasing an etching gas or solution via the through hole to etch the sacrificial layer, so as to form a cavity. The present invention can reduce process steps, lower the process difficulty and costs, decrease the insertion loss of a resonator, and improve the structural stability.

Photosensitive lithium zinc aluminosilicate glasses that can be selectively irradiated and cerammed to provide patterned regions of glass and lithium-based glass ceramic, and composite glass articles made from such glasses and glass ceramics are provided. The lithium zinc aluminosilicate glass can be negatively photosensitive or positively photosensitive to radiation having a wavelength in a range from about 248 nm to about 360 nm.

The present invention relates to a photosensitive glass, wherein in a case where the photosensitive glass is irradiated with ultraviolet light having a wavelength of 300 nm to 330 nm, then subjected to a heat treatment at a temperature in a range of (glass transition temperature Tg + 20 °C) to (glass transition temperature Tg + 65 °C) so that a colloid is produced when a colloid absorbance at an ultraviolet exposure dose of 0 J / cm 2 , 1 J / cm 2 and 2 J / cm 2 on a coordinate system with the ultraviolet exposure dose (J / cm 2 ) on a horizontal axis and the colloid extinction (mm -1 ) is plotted on a vertical axis (slope at an ultraviolet exposure dose of 1 J / cm 2 up to 2 J / cm 2 ) / (slope at an ultraviolet exposure dose of 0 J / cm 2 up to 1 J / cm 2 ) is greater than 1.0.

The application provides a pigment dispersion liquid, a photoresist composition, a photosensitive glass and a liquid crystal display device, and relates to the field of liquid crystal display devices. The pigment dispersion liquid comprises a black colorant; the black colorant comprises carbon black A and carbon black B; the oil absorption value of the carbon black A is 80 mL / 100 g-100 mL / 100 g; and the oil absorption value of the carbon black B is 50 mL / 100 g-70 mL / 100 g. By using the carbon black A and the carbon black B with different oil absorption values as the colorant, even in the case of a higher pigment filling amount and a narrower line width, a black matrix pixel with excellent pixel edge collimation and a good cross-section slope angle can be obtained.

The invention relates to the technical field of heterogeneous integration, three-dimensional integration and advanced packaging, and discloses a novel glass mid-layer and a manufacturing method thereof, and the manufacturing method comprises the following steps: based on a first set parameter, exciting ultraviolet laser to carry out through hole area scanning on a photosensitive glass substrate; based on a second set parameter, exciting the ultraviolet laser to carry out shallow slot area scanning on the photosensitive glass substrate; performing heat treatment on the photosensitive glass substrate; a hydrofluoric acid solution is adopted to etch the sample subjected to heat treatment, ultrasonic vibration is applied during etching, and a glass mid-layer sample is obtained; cleaning and drying the glass middle layer sample, and mounting a chip on the surface of the glass middle layer to obtain a packaging body; and filling the silicon through hole, the redistribution layer and the through hole in the chip with conductive adhesive to obtain the novel glass middle layer. The invention provides the embedded redistribution layer, and the embedded redistribution layer and the glass through hole are integrally filled with the conductive adhesive, so that the processing efficiency and the cost of the glass middle layer are optimized.

The present invention includes a ceramic phase capacitor device and methods of making the same, where the ceramic phase capacitor is formed in or on a light sensitive glass substrate and comprises a first capacitor electrode formed in or on the light sensitive glass substrate, a glass crystalline dielectric formed in situ from the light sensitive glass substrate adjacent to the first capacitor electrode, and a second capacitor electrode formed in or on the light sensitive glass substrate adjacent to the glass crystalline dielectric and opposite the first electrode.

Embodiments of the present application provide photosensitive glass and a preparation method therefor, reinforced photosensitive glass, and a use. By controlling the raw material composition of the photosensitive glass, not only can the photosensitive glass containing Ag2O be ensured to have stable glass components during melting, but also the problem of wear of and damage to a precious metal container caused by silver atoms Ag0 generated by the decomposition of Ag2O can be solved, and it can also be ensured that the exposed area of the photosensitive glass obtained after radiation treatment and heat treatment has extremely low optical transmittance in visible light and near-infrared wavelength ranges, thereby achieving optical signal shielding.