Low-dielectric loss sensitized photosensitive glass and production method

Abstract

The invention discloses low-dielectric loss sensitized photosensitive glass and a production method belonging to the technical field of glass production. The photosensitive glass is prepared from the following chemical components in percentage by weight: 63-72wt% of SiO2, 6-12wt% of Li2O, 1-5wt% of Na2O, 3-9wt% of K2O, 2-5wt% of Al2O3, 1-4wt% of ZnO, 0.5-0.9wt% of Sb2O3, 0.02-0.06wt% of Ce2O3, 0.09-0.16wt% of Ag2O, 2-5wt% of B2O3, 0.5-2wt% of BaO and / or 0.5-3wt% of CaO and 1-5wt% of MgO. The production method comprises the steps of material preparation, primary preparation of a mixture, ball-mill mixing, melting, molding and annealing treatment. According to the photosensitive glass, the dielectric coefficient at a room temperature or above 1MHz is 4.2-5.6 and the dielectric loss is 2*10<-3> to 4*10<-3>. The low-dielectric loss sensitized photosensitive glass has the characteristics that the strength and the photochemical stability of a glass body of the un-sensitized part are high, the dielectric coefficient and the dielectric loss during high-frequency working are low, the stability during working is high, the etching depth-to-width ratio of the sensitized glass is high and the production process is simple and convenient.

Description

technical field [0001] The invention relates to the technical field of photosensitive glass production, in particular to a sensitizable photosensitive glass with low dielectric loss and a production method. Background technique [0002] Photosensitive glass is a special functional material. After being irradiated with ultraviolet light of a specific wavelength, a photochemical reaction will occur in the exposed part of the glass. After exposure, heat treatment at a specific temperature can form microcrystals. Compared with the initial amorphous glass, microcrystals The part exhibits distinct optical, mechanical and chemical properties; compared with the unexposed and heat-treated part, the exposed heat-treated part of the glass is easily etched away in some etching solutions, and the unexposed part is etched away easily. The eclipse ratio can reach more than 20:1, so that glass can be made into various complex three-dimensional graphics we need in a very simple and effective...

AI Technical Summary

Problems solved by technology

However, due to the presence of alkali metal ions in this type of photosensitive glass, which can move in the network (stripes) of the glass body to generate polarization and the vibration of different structures (phases) in the glass at high frequencies, the dielectric constant of the glass becomes larger, Increased loss; this type of photosensitive glass has been tested, and the dielectric coefficient at room temperature and 1-100MHz unsensitized area is about 6.5, and the dielectric loss is about 6.5×10 -3 And the stability is poor; thus, this kind of photosensitive glass is difficult to meet the application in the field of electronic devices