Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

168results about How to "Eliminate deposits" patented technology

Process for PECVD of silicon oxide using TEOS decomposition

A high pressure, high throughput, single wafer, semiconductor processing reactor is disclosed which is capable of thermal CVD, plasma-enhanced CVD, plasma-assisted etchback, plasma self-cleaning, and deposition topography modification by sputtering, either separately or as part of in-situ multiple step processing. The reactor includes cooperating arrays of interdigitated susceptor and wafer support fingers which collectively remove the wafer from a robot transfer blade and position the wafer with variable, controlled, close parallel spacing between the wafer and the chamber gas inlet manifold, then return the wafer to the blade. A combined RF/gas feed-through device protects against process gas leaks and applies RF energy to the gas inlet manifold without internal breakdown or deposition of the gas. The gas inlet manifold is adapted for providing uniform gas flow over the wafer. Temperature-controlled internal and external manifold surfaces suppress condensation, premature reactions and decomposition and deposition on the external surface. The reactor also incorporates a uniform radial pumping gas system which enables uniform reactant gas flow across the wafer and directs purge gas flow downwardly and upwardly toward the periphery of the wafer for sweeping exhaust gases radially away from the wafer to prevent deposition outside the wafer and keep the chamber clean. The reactor provides uniform processing over a wide range of pressures including very high pressures. A low temperature CVD process for forming a highly conformal layer of silicon dioxide is also disclosed. The process uses very high chamber pressure and low temperature, and TEOS and ozone reactants. The low temperature CVD silicon dioxide deposition step is particularly useful for planarizing underlying stepped dielectric layers, either alone or in conjunction with a subsequent isotropic etch. A preferred in-situ multiple-step process for forming a planarized silicon dioxide layer uses (1) high rate silicon dioxide deposition at a low temperature and high pressure followed by (2) the deposition of the conformal silicon dioxide layer also at high pressure and low temperature, followed by (3) a high rate isotropic etch, preferably at low temperature and high pressure in the sane reactor used for the two oxide deposition steps. Various combinations of the steps are disclosed for different applications, as is a preferred reactor self-cleaning step.
Owner:APPLIED MATERIALS INC

Solid oxide fuel cell with symmetrical electrodes, and preparation method and application thereof

InactiveCN103811789AGood thermal expansion matching performanceGood thermal shock resistanceCell electrodesSolid electrolyte fuel cellsChemistryThermal shock
The invention discloses a solid oxide fuel cell with symmetrical electrodes and a preparation method and application thereof. The solid oxide fuel cell has the following symmetrical structure: an electrocatalysis membrane electrode deposited on the inner wall of the pore of a porous electrolyte, a compact electrolyte layer and another electrocatalysis membrane electrode deposited on the inner wall of the pore of the porous electrolyte. The preparation method comprises the following steps: preparing a porous electrolyte/compact electrolyte/porous electrolyte skeleton structure and an electrocatalysis membrane electrode infiltration precursor solution; infiltrating the prepared porous electrolyte/compact electrolyte/porous electrolyte skeleton structure in the electrocatalysis membrane electrode infiltration precursor solution by using an impregnation method; and carrying out heat treatment. The cell provided by the invention has the advantages of good thermal expansion coupling performance, good thermal shock resistance, low cost, a short preparation period, etc.; and when hydrocarbon is used as a fuel, carbon deposition on the positive electrode of the cell can be effectively prevented, and the cell can be used as an electrolytic bath and has commercialization prospects.
Owner:SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI

Method and equipment for identifying and measuring alternating current interference in buried ducts

This invention, which pertains to the field of testing of the corrosion-resistance of materials, includes devices (a probe formed by a permanent reference electrode with corrosion coupons and an electronic switch) and a measurement method for evaluating the probability of corrosion of buried ducts due to alternating current (AC), and aims at providing a methodology that eliminates ohmic losses and allows the desired measurement to be obtained. For that purpose, a probe formed by a permanent copper or copper sulphate reference electrode (ECSC) with four corrosion coupons was developed, and an electronic switch which was also developed within the scope of this invention is coupled to this probe. This assembly (probe and switch), associated with a preferably portable digital oscilloscope or a data acquisition device with digital signal processing (DSP), makes it possible to obtain the waveform of the pipe/ground potential AC+DC off, and hence the peak potential of this waveform, this value being used to predict the corrosion of buried, cathode-protected ducts due to alternating current, on the basis of the criterion that corrosion due to alternating current will not occur or will be insignificant if the peak of the waveform of the pipe/ground potential AC+DC off is more negative than −0.85 VECSC. The present invention can also be directly used for monitoring external corrosion of ground ducts and to verify the real cathode protection potential of these ducts. In order to ensure the integrity of the ducts, this equipment can be installed at test points, at valve boxes and cathode protection rectifiers, as well as in zones where corrosion is suspected.
Owner:INST DE PESQUISAS TECHCAS DO ESTADO DE SAO PAULO

Lead acid battery charging method and device

The invention relates to a lead acid battery charging method and a device. The lead acid battery charging device charges a lead acid battery, wherein a constant current pulse power is used for charging the lead acid battery; the pulse current Ip of the constant current pulse power is larger than the discharging current If of the lead acid battery when a backup power works; moreover, the pulse current Ip is more than 0.1 C; and C is the nominal capacity of the lead acid battery. The lead acid battery charging method comprises the steps of adopting the pulse current to charge, and adjusting theduty factor of the pulse current according to the voltage of the battery to realize the average charging current variation at different charging periods, and reduce the water loss in the charging process. Meanwhile, charging under a large enough pulse current can eliminate the acid corrosion and oxide precipitate occurring at the bottom part of the battery caused by the long term fixation of the lead acid battery. The invention adopts the form of regularly supplementing to replace the traditional floating charging at constant voltage, which reduces the phenomena caused by long term floating charging such as water loss of the lead acid battery, unit cell unbalance of battery and the like, and prolongs the service life of the lead acid battery.
Owner:SHANGHAI AIKONN INFORMATION TECH +2
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products