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1473results about "Beam deviation/focusing by electric/magnetic means" patented technology

Apparatus for generating a plurality of beamlets

The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
Owner:ASML NETHERLANDS BV

Objective lens with deflector plates immersed in electrostatic lens field

One embodiment relates to an objective lens utilizing magnetic and electrostatic fields which is configured to focus a primary electron beam onto a surface of a target substrate. The objective lens includes a magnetic pole piece and an electrostatic deflector configured within the pole piece. An electrostatic lens field is determined by the pole piece and the electrostatic deflector, and the electrostatic lens field is configured by adjusting offset voltages applied to plates of the electrostatic deflector. Other embodiments, aspects and features are also disclosed.
Owner:KLA TENCOR TECH CORP

Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device

The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member provided in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributes to cutting a time required for treatment per patient and increasing the number of patients treated.
Owner:HITACHI LTD

System for the Delivery of Proton Therapy

A process for an intensity-modulated proton therapy of a predetermined volume within an object includes discretising the predetermined volume into a number of iso-energy layers each corresponding to a determined energy of the proton beam. A final target dose distribution is determined for each iso-energy layer. The final target dose distribution or at least a predetermined part of this final target dose distribution is applied by parallel beam scanning by controlling the respective beam sweepers, thereby scanning one iso-energy layer after the other using an intensity-modulated proton beam while scanning a predetermined iso-energy layer.
Owner:PAUL SCHERRER INSTITUT

Particle beam processing system

A method for slowing and controlling a beam of charged particles includes the steps of superimposing at least one magnetic field on a mass and passing the beam through the mass and at least one magnetic field such that the beam and the mass slows but does not stop the particles. An apparatus for slowing and controlling a beam of charged particles includes a bending magnetic field superimposed on a focusing magnetic field within a mass.
Owner:HBAR TECH LC

Advanced pattern definition for particle-beam processing

In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures (21) are arranged within a pattern definition field (pf) wherein the positions of the apertures (21) in the pattern definition field (pf) taken with respect to a direction (X, Y) perpendicular, or parallel, to the scanning direction are offset to each other by not only multiple integers of the effective width (w) of an aperture taken along said direction, but also multiple integers of an integer fraction of said effective width. The pattern definition field (pf) may be segmented into several domains (D) composed of a many staggered lines (pl) of apertures; along the direction perpendicular to the scanning direction, the apertures of a domain are offset to each other by multiple integers of the effective width (w), whereas the offsets of apertures of different domains are integer fractions of that width.
Owner:IMS NANOFABTION

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
Owner:CARL ZEISS MICROSCOPY GMBH +1

Charged particle beam irradiation equipment and control method thereof

A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
Owner:HITACHI LTD

RF accelerator method and apparatus used in conjunction with a charged particle cancer therapy system

The invention comprises a radio-frequency accelerator method and apparatus used in conjunction with multi-axis charged particle radiation therapy of cancerous tumors. An RF synthesizer provides a low voltage RF signal, that is synchronized to the period of circulation of protons in the proton beam path, to a set of integrated microcircuits, loops, and coils where the coils circumferentially enclose the proton beam path in a synchrotron. The integrated components combine to provide an accelerating voltage to the protons in the proton beam path in a size compressed and price reduced format. The integrated RF-amplifier microcircuit / accelerating coil system is operable from about 1 MHz, for a low energy proton beam, to about 15 MHz, for a high energy proton beam.
Owner:BALAKIN ANDREY VLADIMIROVICH +1

Method And Software For Irradiating A Target Volume With A Particle Beam And Device Implementing Same

The present invention is related to a method for treating or irradiating a target volume with a particle beam produced by an accelerator, comprising the steps of: deflecting said particle beam with the help of scanning means in two orthogonal (X, Y) directions, thereby constituting an irradiation plane perpendicular to the direction (Z) of the beam, defining in the irradiation plane a scanning field which circumscribes the area of intersection of target volume and irradiation plane and scanning said scanning field by drawing scan lines which form a scan pattern comprising interleaved frames of triangle waves. The scan pattern is preferably continuous and represents contiguous rhombi figures. The invention is equally related to a device and a software program or sequencer implementing the method.
Owner:ION BEAM APPL

Charged particle beam irradiation equipment having scanning electromagnet power supplies

A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
Owner:HITACHI LTD

Integrated beam modifying assembly for use with a proton beam therapy machine

An integrated beam modifying assembly for use with a proton beam therapy machine. Typically the snouts of a proton beam therapy machine are adapted to receive separate apertures and range compensators. Applicants provide an integrated assembly for slotting into the snout of a proton beam therapy machine, which integrated assembly incorporates both aperture material and range compensator material for profiling, shaping, and modulating the beam.
Owner:COMER SEAN +1

High energy polyenergetic ion selection systems, ion beam therapy systems, and ion beam treatment centers

Devices and methods are provided for generating laser-accelerated high energy polyenergetic positive ion beams that are spatially separated and modulated based on energy level. The spatially separated and modulated high energy polyenergetic positive ion beams are used for radiation therapy. In addition, methods are provided for treating patients in radiation treatment centers using therapeutically suitable high energy polyenergetic positive ion beams that are provided by spatially separating and modulating positive ion beams. The production of radioisotopes using spatially separated and modulated laser-accelerated high energy polyenergetic positive ion beams is also provided.
Owner:INST FOR CANCER RES

Multi beam charged particle device

The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.
Owner:ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUER HALBLEITERPRUEFTECHNIK GMBH

Integrated sub-nanometer-scale electron beam systems

A solid state sub-nanometer-scale electron beam emitter comprising a multi-layered structure having a nano-tip electron emitter and tunnel emission junction formed on substrate, an initial electron beam extraction electrode, a “nano-sandwich Einzel” electrode, and a topmost protective layer.
Owner:BIOMED SOLUTIONS

Advanced pattern definition for particle-beam exposure

InactiveUS20050242303A1Performance issuesRisk issuesThermometer detailsNanoinformaticsParticle beamEngineering
In a pattern definition device for use in a particle-beam exposure apparatus a plurality of blanking openings (910) are arranged within a pattern definition field (bf) composed of a plurality of staggered lines (b1) of blanking openings, each provided with a deflection means controllable by a blanking signal (911); for the lines of blanking openings, according to a partition of the blanking openings of a line into several groups (g4,g5,g6), the deflection means of the blanking openings of each group are fed a common group blanking signal (911), and the group blanking signal of each group of a line is fed to the blanking means and connected to the respective blanking openings independently of the group blanking signals of the other groups of the same line.
Owner:CARL ZEISS SMT GMBH

Charged particle cancer therapy imaging method and apparatus

The invention relates to a method and apparatus for treatment of a solid tumor. More particularly, the invention comprises a multi-axis and / or multi-field charged particle cancer therapy system. In one embodiment, the tumor is imaged from multiple directions in phase with patient respiration. The two-dimensional images are combined to produce a three-dimensional picture of the tumor relative to patient features. The resulting three-dimensional image is used in generation of a radiation treatment plan and subsequent radiation therapy with the radiation beam in terms of control of two-dimensional beam trajectory, delivered beam energy, delivered beam intensity, and / or beam velocity each as a function of patient vertical translation position, patient rotation position, and / or patient respiration.
Owner:BALAKIN ANDREY VLADIMIROVICH +1

Monolayer and/or Few-Layer Graphene On Metal or Metal-Coated Substrates

Graphene is a single atomic layer of sp2-bonded C atoms densely packed into a two-dimensional honeycomb crystal lattice. A method of forming structurally perfect and defect-free graphene films comprising individual mono crystalline domains with in-plane lateral dimensions of up to 200 μm or more is presented. This is accomplished by controlling the temperature-dependent solubility of interstitial C of a transition metal substrate having a suitable surface structure. At elevated temperatures, C is incorporated into the bulk at higher concentrations. As the substrate is cooled, a lowering of the interstitial C solubility drives a significant amount of C atoms to the surface where graphene islands nucleate and gradually increase in size with continued cooling. Ru(0001) is selected as a model system and electron microscopy is used to observe graphene growth during cooling from elevated temperatures. With controlled cooling, large arrays of macroscopic single-crystalline graphene domains covering the entire transition metal surface are produced. As the graphene domains coalesce to a complete layer, a second graphene layer is formed, etc. By controlling the interstitial C concentration and the cooling rate, graphene layers with thickness up to 10 atomic layers or more are formed in a controlled, layer-by-layer fashion.
Owner:BROOKHAVEN SCI ASSOCS

Multi-Field Charged Particle Cancer Therapy Method and Apparatus

The invention relates generally to treatment of solid cancers. More particularly, the invention relates to a multi-field charged particle cancer therapy method and apparatus coordinated with negative ion beam creation, ion beam focusing, charged particle acceleration, patient rotation, and / or patient respiration. Preferably, the charged particle therapy is performed on a patient in a partially immobilized and repositionable position. Proton delivery is preferably timed to patient respiration via control of charged particle beam injection, acceleration, and / or targeting methods and apparatus.
Owner:BALAKIN VLADIMIR EGOROVICH

Advanced pattern definition for particle-beam processing

In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures (21) are arranged within a pattern definition field (pf) wherein the positions of the apertures (21) in the pattern definition field (pf) taken with respect to a direction (X, Y) perpendicular, or parallel, to the scanning direction are offset to each other by not only multiple integers of the effective width (w) of an aperture taken along said direction, but also multiple integers of an integer fraction of said effective width. The pattern definition field (pf) may be segmented into several domains (D) composed of a many staggered lines (pl) of apertures; along the direction perpendicular to the scanning direction, the apertures of a domain are offset to each other by multiple integers of the effective width (w), whereas the offsets of apertures of different domains are integer fractions of that width.
Owner:IMS NANOFABTION
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