Positive type radiation-sensitive composition, cured film, interlayer insulating film, method for forming method interlayer insulating film, display element and siloxane polymer

一种层间绝缘膜、显示元件的技术，应用在电气元件、非线性光学、电固体器件等方向，能够解决低介电性、没有记载硅烷化合物使用量等问题，达到耐干蚀性优良、表面硬度改善、耐热性改善的效果

Active Publication Date: 2011-01-05
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is not described that by controlling the amount of silane compounds with phenyl groups, various properties such as heat resistance, transparency and low dielectric properties generally required as interlayer insulating films can be improved, especially the refractive index and ITO film can be improved. Resist stripping liquid resistance and dry etching resistance in the etching step, etc.

Method used

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  • Positive type radiation-sensitive composition, cured film, interlayer insulating film, method for forming method interlayer insulating film, display element and siloxane polymer
  • Positive type radiation-sensitive composition, cured film, interlayer insulating film, method for forming method interlayer insulating film, display element and siloxane polymer
  • Positive type radiation-sensitive composition, cured film, interlayer insulating film, method for forming method interlayer insulating film, display element and siloxane polymer

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0166] In a vessel with a stirrer, 161.4 g propylene glycol monomethyl ether was added, followed by 128.9 g phenyltrimethoxysilane (0.65 moles), 72.9 g tetraethoxysilane (0.35 moles) and 0.8 g triisopropoxy base aluminum, the solution temperature was heated to 60 °C. After the solution temperature reached 60°C, 54g of ion-exchanged water was added, heated to 75°C, and kept for 3 hours. Next, 159 g of methyl orthoformate was added as a dehydrating agent, and stirred for 1 hour. Furthermore, the temperature of the solution was controlled at 40° C., and the temperature was maintained for evaporation to remove ion-exchanged water and methanol produced by hydrolysis and condensation. The hydrolysis-condensation product (A-1) was obtained as above. The solid content concentration of the hydrolytic condensate (A-1) was 40.3% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1500, and the molecular weight distribution (Mw / Mn) was 2. Further...

Synthetic example 2

[0168] In a container with a stirrer, 139.4 g of diacetone alcohol was added, followed by 128.9 g (0.65 mol) of phenyltrimethoxysilane and 47.7 g (0.35 mol) of methyltrimethoxysilane, and stirred at room temperature. Next, an oxalic acid aqueous solution in which 0.18 g of oxalic acid was dissolved in 54 g of ion-exchanged water was added dropwise, and the temperature of the solution was heated to 75°C. After the temperature of the solution reached 75°C, it was kept for 3 hours. Next, 159 g of methyl orthoformate was added as a dehydrating agent, and stirred for 1 hour. Furthermore, the temperature of the solution is controlled at 40° C., and the temperature is maintained for evaporation to remove ion-exchanged water and methanol produced by hydrolysis and condensation. The hydrolysis condensate (A-2) was obtained as above. The solid content concentration of the hydrolytic condensate (A-2) was 40.5% by mass, the number average molecular weight (Mn) of the obtained hydrolytic...

Synthetic example 3

[0170] In a container with a stirrer, 139.4 g of diacetone alcohol was added, followed by 128.9 g (0.65 mol) of phenyltrimethoxysilane and 47.7 g (0.35 mol) of methyltrimethoxysilane, and stirred at room temperature. Next, a phosphoric acid aqueous solution in which 0.18 g of phosphoric acid was dissolved in 54 g of ion-exchanged water was added dropwise, and the temperature of the solution was heated to 75°C. After the temperature of the solution reached 75°C, it was kept for 3 hours. Next, 159 g of methyl orthoformate was added as a dehydrating agent, and stirred for 1 hour. Furthermore, the temperature of the solution was controlled at 40° C., and the solution was evaporated while maintaining the temperature to remove ion-exchanged water and methanol produced by hydrolytic condensation. The hydrolysis-condensation product (A-3) was obtained as above. The solid content concentration of the hydrolytic condensate (A-3) was 40.5% by mass, the number average molecular weight (...

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Abstract

The present invention relates to a positive-type radiation-sensitive composition, a cured film, an interlayer insulating film, a method for forming the interlayer insulating film, a display element and a siloxane polymer. The invention provides a polysiloxane series positive-type radiation-sensitive composition having high compatibility with a quinone diazide compound and capable of forming the interlayer insulating film having excellent corrosion inhibitor stripping liquid resistance in an ITO film etching step. The composition contains (A) a siloxane polymer, and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole. The (A) siloxane polymer is a hydrolytic condensation containing a hydrolytic silane compound represented by formula (1).

Description

technical field [0001] The present invention relates to a positive-type radiation-sensitive composition suitable as a material for forming a cured film such as an interlayer insulating film of a display element such as a liquid crystal display element (LCD) or an organic EL display element. A film, an interlayer insulating film, a method for forming the interlayer insulating film, and a siloxane polymer for forming an interlayer insulating film. Background technique [0002] Color TFT liquid crystal display elements and the like are made by overlapping color filter substrates and TFT array substrates. In a TFT array substrate, generally, an interlayer insulating film is provided in order to insulate interconnections arranged in layers. As a material for forming an interlayer insulating film, it is preferable that the number of steps necessary for obtaining a pattern shape is small and that it has sufficient flatness, so positive radiation-sensitive compositions are widely u...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/075G03F7/00G02F1/1333H01L21/768H01L23/532C08G77/04
CPCC08G77/20G03F7/0757G02F2202/42C08G77/18G03F7/40C08G77/12G02F1/136286G03F7/0233G03F7/0395H01L21/0274
Inventor 一户大吾花村政晓高濑英明
Owner JSR CORPORATIOON
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