160results about "Reflective surface testing" patented technology

The invention relates to methods for inspecting a reflective surface (200) of an object arranged in a measurement chamber, with a device which has at least one 2-dimensional illumination pattern (201) for reflection on the reflective surface (200) and a plurality of cameras (203) for pixel-by-pixel recording of image information of the illumination pattern (201) reflected on the surface (200), wherein the position and orientation of the plurality of cameras (203) and of the at least one 2-dimensional illumination pattern (201) are known in a common coordinate system and the illumination pattern represents a temporally varying illumination pattern, wherein object image information is generated by applying a measuring sequence in which the cameras capture sections of the measurement chamber. The object image information is processed by means of the evaluation device, in such a way that output data is generated therefrom with regard to an object-related inspection task taking into account determined segmentation information, wherein the inspection task comprises, for example, the generation of defect information on the object and / or the calculation of surface normals for a plurality of points in at least one section of the reflective surface of the object and / or the calculation of the curvature for a plurality of points in at least one section of the reflective surface of the object, as output data. The invention further relates to a corresponding device, a calibration method and a computer program product.

A measuring device (10; 110; 210; 310; 410; 510; 610; 710) for the interferometric determination of a property (50; 52) of a shape (50) of a test surface (12) of a test object (14) comprises an irradiation device (22) for generating an input wave (24), a splitting module (18; 118; 318; 418; 518) configured to generate two plane waves (32, 34) with parallel propagation directions, offset from each other transversely to the propagation directions, a wavefront matching module (20; 720) for generating two measurement waves (44, 46) by matching the respective wavefronts of the offset plane waves to a target shape of the optical test surface, and a detector (56) for detecting at least one interferogram (64). which is generated by superimposing the measuring waves (44r, 46r) after their interaction with the test surface.

The invention relates to a method for reducing aberrations of an optical element (Mi), in particular an optical element (Mi) in a lithography system, comprising: determining a temporal change of an optical property of the optical element (Mi) expected over the operating time of the optical element (Mi), in particular a temporal change of a pass (P(x,y)) of a surface (24a) of a substrate (24) of the optical element (Mi), wherein the temporal change of the optical property causes varying aberrations over the operating time (T) of the optical element (Mi), and reducing the varying aberrations over the operating time of the optical element (Mi) by generating a lead, in particular a pass lead (ΔP). V), which compensates for at least a portion of the total temporal change in the optical property (P(x,y)) expected over the operating lifetime. The invention also relates to an optical element (Mi) and a semiconductor lithography system.

A system for providing a contour map of the surface of a heliostat from reflected sunlight using a fly's eye camera. The system includes an entrance screen configured to receive sunlight reflected by said heliostat; an array of imaging apertures extending across the entrance screen, each aperture forming an image of said heliostat from a different viewpoint to provide a plurality of heliostat images; one or more digital cameras configured to view all of said plurality of heliostat images; an image processor configured to map out from the plurality of heliostat images a location of sunlight delivered to the entrance screen to obtain a plurality of maps, and to provide, based on centroids of said maps a tip and tilt of each said subsection The reflecting surface profile of the heliostat is obtained by integration of the subsection tilts across all the subsections.

A system and method for monitoring an optical circuit switch device are provided. The system may include: a first light source that generates a first reference light beam; a first optical device that transmits light and reflects light; a first filter positioned between an input collimator array and a lens structure; the first filter receives the first reference light beam from the first optical device and passes the first reference light beam through a set of a first MEMS array and a second MEMS array; a first monitoring device that receives the first reference light beam that monitors at least a first mirror drift in a first MEMS array; and a second monitoring device that simultaneously receives a second reference light beam that monitors at least a second mirror drift in the second MEMS array.

Provided are a detection circuit and an image generation device capable of accurately generating a detection signal corresponding to a change in a scanning speed. Mirror detection circuit (detection circuit) inputs a voltage generated in a monitoring piezoelectric element for monitoring an operation state of a second scanning part (light deflecting element) to a gate of field effect transistor constituting a source follower circuit, and generates a detection signal corresponding to expansion or contraction of the piezoelectric element from a source voltage of field effect transistor.

The invention relates to a method for measuring the curvature of a reflective surface and a related optical device. The field of the invention relates to a method for measuring a deformation of a reflective surface (10) of an object. The measuring device comprises an illumination pattern (21) comprising light spots (22), a camera device (30, 31) and an image analysis device (40), the illumination pattern and camera device being arranged such that, in the position of measurement, the illumination pattern is visible to the detector of the camera device via a virtual or real image (23) of the surface, said image representing a deformation of the illuminated area (11). The method according to the invention comprises the following steps:-measuring the distance between images of two spots; calculating a ratio between the measured distance and a reference distance; -calculating magnification in a predetermined direction as a function of said ratio; and calculating the deformation of the reflective surface in the predetermined direction.

A measuring device (10; 110; 210; 310; 410; 510; 610; 710) for the interferometric determination of a property (50; 52) of a shape (50) of a test surface (12) of a test object (14) comprises an irradiation device (22) for generating an input wave (24), a splitting module (18; 118; 318; 418; 518) configured to generate two plane waves (32, 34) with parallel propagation directions, offset from each other transversely to the propagation directions, a wavefront matching module (20; 720) for generating two measurement waves (44, 46) by matching the respective wavefronts of the offset plane waves to a target shape of the optical test surface, and a detector (56) for detecting at least one interferogram (64). which is generated by superimposing the measuring waves (44r, 46r) after their interaction with the test surface.

The invention discloses an in-situ detection-based mechanical-thermal coupling evaluation system and method for a reflector assembly, and belongs to the technical field of mechanical stability evaluation of precise optical elements in a dynamic environment. The problems of coupling effect distortion caused by separation of mechanical loading and thermal environment simulation in an existing reflector assembly experiment process, lack of a multi-dimensional deformation synchronous monitoring means and poor test repeatability caused by insufficient automation degree in the experiment process are solved. Comprising a central control system, a shell, and a conveying belt, a mechanical loading platform, an automatic clamping assembly, a laser interferometer, an autocollimator, an optical monitoring assembly and a high-speed camera monitoring assembly which are arranged in the shell and are in signal connection with the central control system, the optical monitoring assembly and the high-speed camera monitoring assembly achieve real-time monitoring of the experiment process and deformation monitoring of the reflector assembly, and vibration is applied to the optical system assembly through the mechanical loading platform. The device and the method are used for mechanical-thermal coupling detection and evaluation of the reflector assembly.

The present invention relates to a measuring apparatus (10) for measuring the interference shape of the surface (12) of a test object (14-1; 14-2), the measuring apparatus comprising: a diffractive optical element (26-1; 26-2) for generating a test wave (28) from a measurement radiation (18) that has been radiated into the test object, the test wave being configured to radiate onto the surface of the test object; a deflection element (22) upstream of the diffractive optical element in the beam path of the measurement radiation; and a holding device (24, 124) for holding the deflection element, the holding device being configured to change the position of the deflection element (22) by a combination of tilting motion and translational motion.

The field of the invention is that of methods for measuring the deformation of a reflective surface (10) of an object. The measurement device comprises a lighting pattern (21) comprising light points (22), a camera (30, 31) and an image-analysis device (40), the lighting pattern and the camera being arranged so that, in measurement position, the virtual or real image (23) of the lighting pattern is visible by the detector of the camera through the surface, said image representing the deformation of the lit area (11). The method according to the invention comprises the following steps: − Measuring a distance between the images of two light points; − Calculating the ratio between said measured distance and a reference distance; − Calculating, from said ratio, the enlargement in a predetermined direction; and − Calculating the deformation of the reflective surface in said predetermined direction.

The present invention provides a method, device, medium and equipment for testing the deviation of the light concentration efficiency of a heliostat, belonging to the field of solar power generation. The method includes: adjusting the positions of the heliostat structure model and the Lambert target; applying wind loads with various parameters to the heliostat structure model, and obtaining the positions of the reflected light spots at a preset frequency; determining the light concentration efficiency of the Lambert target according to the positions of the light spots; and determining the deviation effect of the wind load on the light concentration efficiency of the heliostat structure model according to the light concentration efficiency and the parameters of the wind load. In this way, the deviation effect of the wind load on the light concentration efficiency of the heliostat is obtained, and further the light concentration deviation of the heliostat under wind-induced vibration is traced, which is beneficial to improving the structure transmission system and the tracking control system of the heliostat, reducing the influence of the actual working environment of the heliostat on the light concentration deviation of the heliostat, improving the tracking accuracy of the heliostat structure, and having important engineering value for promoting the popularization and application of the solar thermal power generation technology.

The invention relates to a test system (1) having a test chamber (2) in which an object to be tested can be arranged, the test chamber (2) having at least one chamber wall (3) which delimits the test chamber (2), the test chamber (2) being provided with a first vacuum generator (12) in order to be able to generate a vacuum in the test chamber (2), and the chamber wall (3) having an opening (4), according to the invention, the chamber wall (3) is provided with an opening (4) which is provided with a sensor module (5), the sensor module (5) having a carrier element (6) which is arranged on the chamber wall (3) in such a way as to close the opening (4), and a sensor (10), in particular an optical sensor, temperature sensor, pressure sensor, gas sensor or camera sensor, which is arranged on the side of the carrier element (6) facing the test chamber (2). According to the invention, a negative pressure chamber (17) associated with the opening (4) is formed on the side of the chamber wall (3) facing away from the test chamber (2), and the negative pressure chamber (17) is associated with a negative pressure generator (19) in order to be able to generate a negative pressure in the negative pressure chamber (17) independently of a vacuum in the test chamber (2).

The invention relates to a method for determining an optical reflectivity of a curved surface (3) of an optical test object (2), in particular a mirror or lens, wherein the reflectivity (R) is determined using a reflectometer (4), in particular an EUV reflectometer, which comprises a light source (5) and a light sensor (6), and wherein, in order to determine the reflectivity, a light beam (7) from the light source (6) reflected on the surface (3) is captured by the light sensor (6) at least at a predetermined distance from the test object (2). According to the invention: the light sensor (6) is displaced at least once for a calibration process such that the reflected light beam (7) is captured at varying distances (x) from the surface (3) of the test object (2), and a reflectivity (R) is determined for each distance (x); and a baseline reflectivity of the surface (3) is determined depending on the captured reflectivities (R).

The approach presented here provides a test device (100) for an optical test specimen (105), wherein the test device (100) comprises a beam source (145) for emitting a beam of light (115) along an optical axis (117). Furthermore, the test device (100) includes an optical element configured as a filter element (125) for imprinting or filtering a specific polarization direction of the light from the beam of light (115) or of light reflected or transmitted by the test specimen (105). The test device (100) also includes a rotation unit (135) configured to rotate the test specimen (105) lying on the optical axis (117) relative to the filter element (125) by an angle of rotation (140).Finally, the test device (100) includes a detector unit (147) configured to determine a polarization axis of the test specimen (105) from the rotation angle (140) and a light beam of the beam (115) reflected by or transmitted through the test specimen (105), as well as a measure of the decentering of the test specimen.

Measuring system for determining the reflection properties of a test surface (38) of an optical element (41). The measuring system comprises an EUV radiation source (31) for providing a measuring beam (26), a vacuum chamber (27) through which the measuring beam (26) passes from the EUV radiation source (31) towards the test surface (38), a positioning device (37) for variably setting an incidence pose of the measuring beam (26) on the test surface (38), and a detector (33) for detecting a portion of the measuring beam (26) reflected by the test surface (38). The vacuum chamber (27) has a measuring beam opening (30) closed by an EUV-permeable membrane (35), through which the measuring beam (26) passes before it strikes the test surface (38).Due to the EUV-permeable membrane, it is possible to seal off a low pressure prevailing within the vacuum chamber from the environment of the optical element, so that no vacuum is required in the environment of the optical element, which can significantly simplify the construction of the measuring system.

The invention relates to pressure sensitive paint compositions comprising Pt or Pd metalloporphyrins of Formula I or Formula II and an oxygen permeable binder where Formula I is and Formula II is with Ar and R groups as defined herein.

The invention relates to a semiconductor technology system, in particular an EUV lithography system, comprising: a housing (25) in which a plurality of preferably reflective optical elements (M1, M2, ...) are arranged in a beam path (33) of the semiconductor technology system, and an inspection device, in particular a camera (30) which has an imaging optic (31) for imaging at least a partial area (T1, T2, ...) of an optical surface (M1', M2', ...) of at least one optical element (M1, M2, ...) to be inspected in the housing (25) onto a spatially resolving detector (32). The inspection device is designed to inspect at least the partial area (T2, T3, ...) of the optical surface (M2', M3', ...) of the optical element (M2, M3, ...) to be inspected via at least one optical surface (M1', M2', ...) of at least one in the beam path (33) between the optical element (M2, M3, ...) to be inspected.) and the optical element (M1, M2, ...) arranged in the housing (25) of the inspection device. The invention also relates to an associated method.

Methods for determining one or more aberrations of a projection system (e.g., a projection system of a lithographic apparatus), and corresponding systems therefor, are disclosed. One method includes performing a phase-stepping or phase-scanning process using a first patterning device (at object level) that includes a specular diffraction grating. A calibration method is also disclosed for determining calibration data that characterizes differences between the aberrations of the projection system determined at object level using a diffuse grating and the aberrations of the projection system determined at object level using a specular grating.

A measuring apparatus (10; 110; 210; 310; 410; 510; 610; 710) for interferometric determination of a property (50; 52) of a shape (50) of a test surface (12) of an object under test (14) comprises an irradiation device (22) for generating an input wave (24), a splitting module (18; 118; 318; 418; 518) configured to generate, from the input wave, two plane waves (32, 34) with parallel directions of propagation and with an offset from one another across the directions of propagation, a wavefront adaptation module (20; 720) for generating two measurement waves (44, 46) by adapting the respective wavefront of the plane waves with an offset from one another to a target shape of the optical test surface, and a detector (56) for capturing at least one interferogram (64) generated by superposition of the measurement waves (44r, 46r) following their interaction with the test surface.

Methods, devices and systems describe compact and simple deflectometry configurations that can measure complex shapes of freeform surfaces. One deflectometry system includes a first panel and a second panel positioned at an offset position from each other to provide illumination for an object. The second panel, positioned closer to the object, is operable as a substantially transparent panel, and as a pixelated panel to provide structured light patterns. The system also includes two or more cameras positioned on the second panel an is operable in a first mode where the first panel provides a first structured illumination and the second panel is configured as a substantially transparent panel that allows the first structured illumination from the first panel to transmit toward the object. The system is also operable in a second mode where the second panel is configured to provide a second structured illumination for illuminating the object.

The invention relates to a miniaturized portable white light mirror zero position instrument and a use method thereof. The zero position instrument mainly comprises a collimator assembly 1, an observation group 2, a main frame group 3, a miniature light source group 4, a white light mirror to be detected, visual equipment and the like, wherein the miniature light source group 4, the collimator assembly 1, the white light mirror to be detected and the observation group 2 are sequentially fixed on the main frame group 3 along a straight line. During working, the miniature light source group 4 is electrified to emit light, and light rays penetrate through the collimator assembly 1 and the white light mirror to be detected and then enter the observation group 2, and are imaged on visual equipment of the observation group 2 to be observed by an operator. The zero position instrument has the advantages of being small in size, light in weight, convenient to carry, easy to operate and the like, can be easily disassembled and transferred, can complete assembling and product testing in a short time, and can adapt to rapid inspection and correction tasks of optical sighting telescope products in different sites and environments.

To determine the imaging quality of the optical system (13) when illuminated by the illumination light (1) within the entrance pupil or exit pupil (11) to be measured, the test structure (5) is initially arranged in the object plane (4) of the optical system (13) and an illumination angular distribution is specified for illuminating the test structure (5) with the illumination light (1). The test structure (5) is illuminated at different distance positions (z m ) of the test structure (5). The intensity I(x, y, z m ) of the illumination light (1) is measured in the image plane (15) of the optical system (13). The spatial image measured in this way is compared with the simulated spatial image, the fitting parameters of the function set used to describe the simulated spatial image are adjusted, and the wavefront of the optical system (13) is determined on the basis of the result of minimizing the difference. The specified illumination angular distribution corresponds to a sub-aperture (10 i ) within the entrance pupil (11) to be measured. For another specified sub-aperture, the steps from "specify" to "determine" are repeated. The wavefront of the optical system is determined by combining the results obtained for the measurement sub-apertures (10 i ) within the entrance pupil (11) to be measured.

An optical measurement system includes a hemispherical mirror including a planar portion and a spherical portion having a hemispherical recessed shape in the planar portion. In the spherical portion are latitude markers formed with a different reflectance from the rest of the spherical portion. The system includes an optical unit with an objective lens and at least one beam splitter. The optical unit transmits light reflected from the hemispherical mirror through the objective lens to a first sensor. A controller measures a numerical aperture of the objective lens by aligning the hemispherical mirror to be at the focus of the objective lens, detecting a back focal image of the objective lens in which the latitude markers appear as darker circular lines, and performing calculations on the image.

The invention relates to a method for determining the condition of a component (1) of a lithography system, in particular a projection exposure system (100, 200), wherein the component (1) is subjected to a reprocessing cycle after a use cycle in a lithography system. During the reprocessing cycle, images of the component (1) are automatically created and archived using a camera. The images of the component (1) are compared and evaluated with identical comparison images from at least one previous reprocessing cycle of the component (1) and reference images of at least one structurally identical component and / or reference images generated from a plurality of images using artificial intelligence, at least with regard to one feature of the component (1).

To provide a method that evaluates a surface shape of an optical surface of an optical element.SOLUTION: An optical element as a test object is completely arranged within a measuring range of an interferometric test device. Between individual measurements, the test object is rotated around a test object rotation axis. At least two measurement series are recorded that have a rotation position with M or N pieces of equidistances, where the numbers M and N are mutually prime natural numbers. First and second measurement values of the different measurement series are jointly evaluated. An evaluation operation involves using an iterative evaluation method, that is, a process of repeating identical or same evaluation steps a plurality of times in order to approach a sought end result step by step.SELECTED DRAWING: None

A method for reducing aberrations of an optical element (Mi) e.g., in a lithography system includes: determining a temporal change in an optical property of the optical element (Mi), e.g., a temporal change of a surface FIGURE(P(x,y)) of a surface (24a) of a substrate (24) of the optical element (Mi), that is expected over the operational life of the optical element (Mi), with the temporal change in the optical property over the operational life (T) of the optical element (Mi) causing varying aberrations, and reducing the aberrations that vary over the operational life of the optical element (Mi) by generating an allowance, in particular a surface figure allowance (∆PV), which compensates at least a portion of the total temporal change in the optical property (P(x,y)) that is expected over the operational life.

A system and method for monitoring an optical circuit switch device are provided. The system may include: a first light source that generates a first reference light beam; a first optical device that transmits light and reflects light; a first filter positioned between an input collimator array and a lens structure; the first filter receives the first reference light beam from the first optical device and passes the first reference light beam through a set of a first MEMS array and a second MEMS array; a first monitoring device that receives the first reference light beam that monitors at least a first mirror drift in a first MEMS array; and a second monitoring device that simultaneously receives a second reference light beam that monitors at least a second mirror drift in the second MEMS array.

A test system (1) having a test chamber (2) for a test object, wherein the test chamber has at least one chamber wall (3) delimiting the test chamber. The test chamber is assigned a first vacuum generator (12) generating a vacuum in the test chamber. The chamber wall has an opening (4) to which a sensor module (5) is assigned. The sensor module has a carrier element (6), which is arranged on the chamber wall, to close the opening. A sensor (10) is arranged on a side of the carrier element facing toward the test chamber. A negative-pressure chamber (17) assigned to the opening is formed on the side of the chamber wall facing away from the test chamber. The negative-pressure chamber is assigned a negative-pressure generator (19) generating a negative pressure in the negative-pressure chamber independently of a vacuum in the test chamber.