94results about "Reflective surface testing" patented technology

A system for providing a contour map of the surface of a heliostat from reflected sunlight using a fly's eye camera. The system includes an entrance screen configured to receive sunlight reflected by said heliostat; an array of imaging apertures extending across the entrance screen, each aperture forming an image of said heliostat from a different viewpoint to provide a plurality of heliostat images; one or more digital cameras configured to view all of said plurality of heliostat images; an image processor configured to map out from the plurality of heliostat images a location of sunlight delivered to the entrance screen to obtain a plurality of maps, and to provide, based on centroids of said maps a tip and tilt of each said subsection The reflecting surface profile of the heliostat is obtained by integration of the subsection tilts across all the subsections.

A system and method for monitoring an optical circuit switch device are provided. The system may include: a first light source that generates a first reference light beam; a first optical device that transmits light and reflects light; a first filter positioned between an input collimator array and a lens structure; the first filter receives the first reference light beam from the first optical device and passes the first reference light beam through a set of a first MEMS array and a second MEMS array; a first monitoring device that receives the first reference light beam that monitors at least a first mirror drift in a first MEMS array; and a second monitoring device that simultaneously receives a second reference light beam that monitors at least a second mirror drift in the second MEMS array.

Provided are a detection circuit and an image generation device capable of accurately generating a detection signal corresponding to a change in a scanning speed. Mirror detection circuit (detection circuit) inputs a voltage generated in a monitoring piezoelectric element for monitoring an operation state of a second scanning part (light deflecting element) to a gate of field effect transistor constituting a source follower circuit, and generates a detection signal corresponding to expansion or contraction of the piezoelectric element from a source voltage of field effect transistor.

The invention relates to a method for measuring the curvature of a reflective surface and a related optical device. The field of the invention relates to a method for measuring a deformation of a reflective surface (10) of an object. The measuring device comprises an illumination pattern (21) comprising light spots (22), a camera device (30, 31) and an image analysis device (40), the illumination pattern and camera device being arranged such that, in the position of measurement, the illumination pattern is visible to the detector of the camera device via a virtual or real image (23) of the surface, said image representing a deformation of the illuminated area (11). The method according to the invention comprises the following steps:-measuring the distance between images of two spots; calculating a ratio between the measured distance and a reference distance; -calculating magnification in a predetermined direction as a function of said ratio; and calculating the deformation of the reflective surface in the predetermined direction.

The present invention relates to a measuring apparatus (10) for measuring the interference shape of the surface (12) of a test object (14-1; 14-2), the measuring apparatus comprising: a diffractive optical element (26-1; 26-2) for generating a test wave (28) from a measurement radiation (18) that has been radiated into the test object, the test wave being configured to radiate onto the surface of the test object; a deflection element (22) upstream of the diffractive optical element in the beam path of the measurement radiation; and a holding device (24, 124) for holding the deflection element, the holding device being configured to change the position of the deflection element (22) by a combination of tilting motion and translational motion.

The field of the invention is that of methods for measuring the deformation of a reflective surface (10) of an object. The measurement device comprises a lighting pattern (21) comprising light points (22), a camera (30, 31) and an image-analysis device (40), the lighting pattern and the camera being arranged so that, in measurement position, the virtual or real image (23) of the lighting pattern is visible by the detector of the camera through the surface, said image representing the deformation of the lit area (11). The method according to the invention comprises the following steps: − Measuring a distance between the images of two light points; − Calculating the ratio between said measured distance and a reference distance; − Calculating, from said ratio, the enlargement in a predetermined direction; and − Calculating the deformation of the reflective surface in said predetermined direction.

The invention relates to a test system (1) having a test chamber (2) in which an object to be tested can be arranged, the test chamber (2) having at least one chamber wall (3) which delimits the test chamber (2), the test chamber (2) being provided with a first vacuum generator (12) in order to be able to generate a vacuum in the test chamber (2), and the chamber wall (3) having an opening (4), according to the invention, the chamber wall (3) is provided with an opening (4) which is provided with a sensor module (5), the sensor module (5) having a carrier element (6) which is arranged on the chamber wall (3) in such a way as to close the opening (4), and a sensor (10), in particular an optical sensor, temperature sensor, pressure sensor, gas sensor or camera sensor, which is arranged on the side of the carrier element (6) facing the test chamber (2). According to the invention, a negative pressure chamber (17) associated with the opening (4) is formed on the side of the chamber wall (3) facing away from the test chamber (2), and the negative pressure chamber (17) is associated with a negative pressure generator (19) in order to be able to generate a negative pressure in the negative pressure chamber (17) independently of a vacuum in the test chamber (2).

The invention relates to a method for determining an optical reflectivity of a curved surface (3) of an optical test object (2), in particular a mirror or lens, wherein the reflectivity (R) is determined using a reflectometer (4), in particular an EUV reflectometer, which comprises a light source (5) and a light sensor (6), and wherein, in order to determine the reflectivity, a light beam (7) from the light source (6) reflected on the surface (3) is captured by the light sensor (6) at least at a predetermined distance from the test object (2). According to the invention: the light sensor (6) is displaced at least once for a calibration process such that the reflected light beam (7) is captured at varying distances (x) from the surface (3) of the test object (2), and a reflectivity (R) is determined for each distance (x); and a baseline reflectivity of the surface (3) is determined depending on the captured reflectivities (R).

Measuring system for determining the reflection properties of a test surface (38) of an optical element (41). The measuring system comprises an EUV radiation source (31) for providing a measuring beam (26), a vacuum chamber (27) through which the measuring beam (26) passes from the EUV radiation source (31) towards the test surface (38), a positioning device (37) for variably setting an incidence pose of the measuring beam (26) on the test surface (38), and a detector (33) for detecting a portion of the measuring beam (26) reflected by the test surface (38). The vacuum chamber (27) has a measuring beam opening (30) closed by an EUV-permeable membrane (35), through which the measuring beam (26) passes before it strikes the test surface (38).Due to the EUV-permeable membrane, it is possible to seal off a low pressure prevailing within the vacuum chamber from the environment of the optical element, so that no vacuum is required in the environment of the optical element, which can significantly simplify the construction of the measuring system.

The invention relates to a semiconductor technology system, in particular an EUV lithography system, comprising: a housing (25) in which a plurality of preferably reflective optical elements (M1, M2, ...) are arranged in a beam path (33) of the semiconductor technology system, and an inspection device, in particular a camera (30) which has an imaging optic (31) for imaging at least a partial area (T1, T2, ...) of an optical surface (M1', M2', ...) of at least one optical element (M1, M2, ...) to be inspected in the housing (25) onto a spatially resolving detector (32). The inspection device is designed to inspect at least the partial area (T2, T3, ...) of the optical surface (M2', M3', ...) of the optical element (M2, M3, ...) to be inspected via at least one optical surface (M1', M2', ...) of at least one in the beam path (33) between the optical element (M2, M3, ...) to be inspected.) and the optical element (M1, M2, ...) arranged in the housing (25) of the inspection device. The invention also relates to an associated method.

Methods for determining one or more aberrations of a projection system (e.g., a projection system of a lithographic apparatus), and corresponding systems therefor, are disclosed. One method includes performing a phase-stepping or phase-scanning process using a first patterning device (at object level) that includes a specular diffraction grating. A calibration method is also disclosed for determining calibration data that characterizes differences between the aberrations of the projection system determined at object level using a diffuse grating and the aberrations of the projection system determined at object level using a specular grating.

To determine the imaging quality of the optical system (13) when illuminated by the illumination light (1) within the entrance pupil or exit pupil (11) to be measured, the test structure (5) is initially arranged in the object plane (4) of the optical system (13) and an illumination angular distribution is specified for illuminating the test structure (5) with the illumination light (1). The test structure (5) is illuminated at different distance positions (z m ) of the test structure (5). The intensity I(x, y, z m ) of the illumination light (1) is measured in the image plane (15) of the optical system (13). The spatial image measured in this way is compared with the simulated spatial image, the fitting parameters of the function set used to describe the simulated spatial image are adjusted, and the wavefront of the optical system (13) is determined on the basis of the result of minimizing the difference. The specified illumination angular distribution corresponds to a sub-aperture (10 i ) within the entrance pupil (11) to be measured. For another specified sub-aperture, the steps from "specify" to "determine" are repeated. The wavefront of the optical system is determined by combining the results obtained for the measurement sub-apertures (10 i ) within the entrance pupil (11) to be measured.

To provide a method that evaluates a surface shape of an optical surface of an optical element.SOLUTION: An optical element as a test object is completely arranged within a measuring range of an interferometric test device. Between individual measurements, the test object is rotated around a test object rotation axis. At least two measurement series are recorded that have a rotation position with M or N pieces of equidistances, where the numbers M and N are mutually prime natural numbers. First and second measurement values of the different measurement series are jointly evaluated. An evaluation operation involves using an iterative evaluation method, that is, a process of repeating identical or same evaluation steps a plurality of times in order to approach a sought end result step by step.SELECTED DRAWING: None

A method for reducing aberrations of an optical element (Mi) e.g., in a lithography system includes: determining a temporal change in an optical property of the optical element (Mi), e.g., a temporal change of a surface FIGURE(P(x,y)) of a surface (24a) of a substrate (24) of the optical element (Mi), that is expected over the operational life of the optical element (Mi), with the temporal change in the optical property over the operational life (T) of the optical element (Mi) causing varying aberrations, and reducing the aberrations that vary over the operational life of the optical element (Mi) by generating an allowance, in particular a surface figure allowance (∆PV), which compensates at least a portion of the total temporal change in the optical property (P(x,y)) that is expected over the operational life.

A system and method for monitoring an optical circuit switch device are provided. The system may include: a first light source that generates a first reference light beam; a first optical device that transmits light and reflects light; a first filter positioned between an input collimator array and a lens structure; the first filter receives the first reference light beam from the first optical device and passes the first reference light beam through a set of a first MEMS array and a second MEMS array; a first monitoring device that receives the first reference light beam that monitors at least a first mirror drift in a first MEMS array; and a second monitoring device that simultaneously receives a second reference light beam that monitors at least a second mirror drift in the second MEMS array.

A test system (1) having a test chamber (2) for a test object, wherein the test chamber has at least one chamber wall (3) delimiting the test chamber. The test chamber is assigned a first vacuum generator (12) generating a vacuum in the test chamber. The chamber wall has an opening (4) to which a sensor module (5) is assigned. The sensor module has a carrier element (6), which is arranged on the chamber wall, to close the opening. A sensor (10) is arranged on a side of the carrier element facing toward the test chamber. A negative-pressure chamber (17) assigned to the opening is formed on the side of the chamber wall facing away from the test chamber. The negative-pressure chamber is assigned a negative-pressure generator (19) generating a negative pressure in the negative-pressure chamber independently of a vacuum in the test chamber.

The invention relates to a method for characterizing an object having at least one reflective property, the method comprising: providing an optical system comprising a panel displaying a first model having asymmetric patterns and a second model having irregular patterns, and at least one sensor, the object to be characterized comprising a first surface; detecting, by the sensor, the first model and the second model in reflection on the first surface of the object; the detection being a single image capture by the sensor; determining coefficients of deformation of the first model reflected on the first surface and detected by the sensor, relative to the first model displayed on the panel; establishing a unique relationship between the patterns of the second model detected by the sensor after reflection on the first surface and the patterns of the second model displayed on the panel.

The present disclosure provides an optical element inspection method, system and application. The method includes: collecting point cloud data of an optical element under inspection; performing fitting and reconstruction according to the point cloud data to obtain freeform surface data; performing simulation calculation on the freeform surface data to obtain a virtual image tested pattern; and performing quality inspection according to the virtual image tested pattern to obtain a quality inspection result of the optical element under inspection. By performing simulation calculation on the freeform surface of the optical element under inspection to obtain the virtual image tested pattern, obtaining the quality inspection result of the optical element under inspection through the virtual image tested pattern, and replacing optical elements and cameras actually used for inspection using the simulation technique, the inspection process can be simplified, the system deviation accumulated by a plurality of components can be reduced or even eliminated, the inspection accuracy and efficiency can be improved, thereby realizing the low-cost and high-precision optical element inspection.

An apparatus (1) for measuring a component (2) of a lithography system, having a vibration isolator device (3), a measuring system (4) mounted on the vibration isolator device and a supply device (5) supplying the measuring system via a data connection (6) transferring data between the supply device and the measuring system, a current connection (7) transferring electrical energy between the supply device and the measuring system, a gas connection (8) transferring a gas between the supply device and the measuring system, a liquid connection (9) transferring a liquid between the supply device and the measuring system, and / or a vacuum connection (10) transferring a vacuum between the supply device and the measuring system. A decoupling device (11) mechanically at least partially decouples the measuring system from the supply device at least during the measurement of the component.

A deflectometry device comprising a kinematic spot part holder, a display, an imaging optic, a stop, and a camera imaging assembly including a camera lens and a camera having a detector. Additionally is described, a deflectometry device that is part of a deterministic finishing machine comprising a display, an imaging optic, a stop, and a camera imaging assembly including a camera lens and a camera. Additionally, a method for characterizing material removal created by a deterministic finishing machine is provided.

The invention relates to a device (100) for determining an imaging quality of at least one image for an inspection item (105), the device comprising at least one projection unit (115) for outputting light (120) toward the inspection item (105) in order to project at least one luminous and / or illuminating object structure through the inspection item (105), an optical receiving unit (110) for receiving light beams (130) of the light (120), which represent at least one image of the projected object structure, a holding unit (145), which is located between the projection unit (115) and the optical receiving unit (110), and a computing unit (150) for simultaneously evaluating a first light parameter, which represents at least one optical light parameter, and a second light parameter, which represents at least one colorimetric or photometric light parameter, of light beams (130) transmitted by or reflected off the inspection item (105), in order to determine the imaging quality of the at least one image, wherein the computing unit (150) is connected to the projection unit (115), to the receiving unit (110) and / or to the holding unit (145).

Method (80) for interferometric measurement of the shape of a surface (12) of a test object (14), comprising the steps: - respective measurement of the surface shape using an interferometric measuring device (10) in at least two different measuring configurations, - Differentiation (92) of the measurement results (82, 84) and separation (96) of measurement artifacts attributable to the respective measurement configuration (88, 90), - Subtracting (98) the associated measurement artifacts (88, 90) from at least one of the measurement results (82, 84).

An apparatus (10) for interferometrically measuring a surface shape (12) of a test object (14) in relation to a reference shape (41) includes (a) a diffractive optical element (30) generating a test wave (32) from measurement radiation (22), whereas a wavefront (42) of the test wave is adapted to a target shape (43) of the surface (12) of the test object (14) and the target shape is configured as a first non-spherical surface, (b) a reference element (38) with a reference surface (40) having the reference shape (41), the reference shape being configured as a further non-spherical surface, (c) a first holder (60) configured to arrange the test object (14) in the beam path of the test wave (32) in a measurement configuration, and (d) a further holder (62) configured to arrange the reference element (38) in the beam path of a reference wave (34) in the measurement configuration.

Provided are a detection circuit and an image generation device capable of generating a detection signal in accordance with a change in scanning speed with high accuracy. A mirror detection circuit (45) (detection circuit) inputs, to a gate of a field effect transistor (301) constituting a source follower circuit, a voltage generated in a monitoring piezoelectric element for monitoring the operating state of a second scanning unit (light deflection element), and generates a detection signal according to the expansion and contraction of the piezoelectric element on the basis of the source voltage of the field effect transistor (301).

The invention relates to a method for estimating a geometry of a reflective surface, which method comprises the steps of measuring (10) a slope field (I) of the surface by means of a deflectometry device (1) connected to a measurement processing computer, then integrating (20) the slope field by modelling the presence of a rotational component (II) in the field, and by jointly searching for a gradient component (ϕ) of said field and alignment errors (III), which consist of rotational components, of the deflectometry device.

Method for the interferometric determination of a spatial distribution of an optical property of a test object (14) by means of an interferometric measuring system (10), comprising the steps: - irradiating a test wave (34) generated by a diffractive optical element (32) onto the test object and generating a plurality of interferograms (46) in chronological sequence by superimposing a reference wave (30) with the test wave (34) generated by the diffractive optical element after its interaction with the test object, wherein during the generation of the interferograms a first system parameter (54) of the measuring system is changed to vary a phase difference between the test wave generated by the diffractive optical element and the reference wave and wherein, furthermore, during the generation of the interferograms, at least one further system parameter (56) of the measuring system is varied, wherein a change in the at least one further system parameter (56) has an influence on a phase difference distribution on a detection surface (43) of a detector (43) serving to detect a generated interferogram (46), and - Determining the local distribution of the optical property by evaluating the generated interferograms, wherein during the evaluation, error influences attributable to the varied system parameters (54, 56) are eliminated by taking into account changes in the interferograms caused by the variation of the system parameters when determining the local distribution of the optical property, wherein the evaluation of the generated interferograms (46) is based on at least one sensitivity (58) of the further system parameter (56), which indicates a relationship between the further system parameter (56) and at least one property of the interferograms.

Device (100) for determining the image quality of at least one image for a test specimen (105), wherein the device (100) has the following features: - at least one projection unit (115) for emitting light (120) in the direction of the test object (105) in order to project at least one luminous and / or illuminated object structure (300) onto the test object (105); - optical receiving unit (110) for receiving light rays (130) of the light (120) transmitted through or by the test object (105) or reflected, which represent at least one image of the projected object structure (300), wherein the receiving unit (110) comprises an optical device (135) and an optical detector (140) and wherein the receiving unit (110) is adjustable or variable in its spectral sensitivity; - a mounting unit (145) for holding the test specimen (105), wherein the mounting unit (145) is arranged between the projection unit (115) and the optical receiving unit (110); and - a computing unit (150) for simultaneously evaluating a first light parameter (825), representing at least one optical light parameter, and a second light parameter (830), representing at least one colorimetric and / or photometric light parameter, of light rays (130) of the light (120) transmitted through or on the test object (105) and received using the receiving unit (110), in order to determine the image quality of the at least one image for the test object (105), wherein the computing unit (150) is connected to the projection unit (115), the receiving unit (110) and / or the mounting unit (145).

The invention discloses focus ray paraboloid detection equipment and a use method, and belongs to the field of solar reflector precision detection. The device comprises a ray source, a scale and a keel, rays of the ray source or an extension line of the rays penetrate through a paraboloid focus to be detected, a dial corresponding to the ray source is arranged on the scale, an original point of the dial and an intersection point ray source are located on the same paraboloid, and the ray source and the scale which are located on the same paraboloid are fixedly connected through a support. The focus ray paraboloid detection unit is called as a focus ray paraboloid detection unit; the number of the focus ray paraboloid detection units is two or more, the focus ray paraboloid detection units are connected through the keel, and the focus ray paraboloid detection units are arranged in parallel and are perpendicular to the keel. By adopting the paraboloid detection equipment, the system error caused by the detection according to the theoretical paraboloid focal line of the traditional paraboloid detection equipment is eliminated, and the optical interception rate of the heat collector is improved.

The invention relates to a device (100) for determining the imaging quality of at least one image of a sample (105), comprising: at least one projection unit (115) for outputting light (120) in the direction of the sample (105) in order to project at least one luminescent and / or illuminated object structure and to penetrate the sample (105); an optical receiving unit (110) for receiving light beams (130) of light (120) representing at least one image of the structure of the projected object; a holder unit (145) disposed between the projection unit (115) and the optical receiving unit (110); and a calculation unit (150) for simultaneously evaluating a first light parameter representing at least one optical light parameter and a second light parameter representing at least one chromaticity or photometric light parameter of the light beam (130) transmitted through or reflected at the sample (105) in order to determine the imaging quality of the at least one image. The computing unit (150) is connected to the projection unit (115), the receiving unit (110) and / or the holder unit (145).