59results about "Reflective surface testing" patented technology

Provided are a detection circuit and an image generation device capable of accurately generating a detection signal corresponding to a change in a scanning speed. Mirror detection circuit (detection circuit) inputs a voltage generated in a monitoring piezoelectric element for monitoring an operation state of a second scanning part (light deflecting element) to a gate of field effect transistor constituting a source follower circuit, and generates a detection signal corresponding to expansion or contraction of the piezoelectric element from a source voltage of field effect transistor.

The present invention relates to a measuring apparatus (10) for measuring the interference shape of the surface (12) of a test object (14-1; 14-2), the measuring apparatus comprising: a diffractive optical element (26-1; 26-2) for generating a test wave (28) from a measurement radiation (18) that has been radiated into the test object, the test wave being configured to radiate onto the surface of the test object; a deflection element (22) upstream of the diffractive optical element in the beam path of the measurement radiation; and a holding device (24, 124) for holding the deflection element, the holding device being configured to change the position of the deflection element (22) by a combination of tilting motion and translational motion.

The invention relates to a semiconductor technology system, in particular an EUV lithography system, comprising: a housing (25) in which a plurality of preferably reflective optical elements (M1, M2, ...) are arranged in a beam path (33) of the semiconductor technology system, and an inspection device, in particular a camera (30) which has an imaging optic (31) for imaging at least a partial area (T1, T2, ...) of an optical surface (M1', M2', ...) of at least one optical element (M1, M2, ...) to be inspected in the housing (25) onto a spatially resolving detector (32). The inspection device is designed to inspect at least the partial area (T2, T3, ...) of the optical surface (M2', M3', ...) of the optical element (M2, M3, ...) to be inspected via at least one optical surface (M1', M2', ...) of at least one in the beam path (33) between the optical element (M2, M3, ...) to be inspected.) and the optical element (M1, M2, ...) arranged in the housing (25) of the inspection device. The invention also relates to an associated method.

To determine the imaging quality of the optical system (13) when illuminated by the illumination light (1) within the entrance pupil or exit pupil (11) to be measured, the test structure (5) is initially arranged in the object plane (4) of the optical system (13) and an illumination angular distribution is specified for illuminating the test structure (5) with the illumination light (1). The test structure (5) is illuminated at different distance positions (z m ) of the test structure (5). The intensity I(x, y, z m ) of the illumination light (1) is measured in the image plane (15) of the optical system (13). The spatial image measured in this way is compared with the simulated spatial image, the fitting parameters of the function set used to describe the simulated spatial image are adjusted, and the wavefront of the optical system (13) is determined on the basis of the result of minimizing the difference. The specified illumination angular distribution corresponds to a sub-aperture (10 i ) within the entrance pupil (11) to be measured. For another specified sub-aperture, the steps from "specify" to "determine" are repeated. The wavefront of the optical system is determined by combining the results obtained for the measurement sub-apertures (10 i ) within the entrance pupil (11) to be measured.

To provide a method that evaluates a surface shape of an optical surface of an optical element.SOLUTION: An optical element as a test object is completely arranged within a measuring range of an interferometric test device. Between individual measurements, the test object is rotated around a test object rotation axis. At least two measurement series are recorded that have a rotation position with M or N pieces of equidistances, where the numbers M and N are mutually prime natural numbers. First and second measurement values of the different measurement series are jointly evaluated. An evaluation operation involves using an iterative evaluation method, that is, a process of repeating identical or same evaluation steps a plurality of times in order to approach a sought end result step by step.SELECTED DRAWING: None

A method for reducing aberrations of an optical element (Mi) e.g., in a lithography system includes: determining a temporal change in an optical property of the optical element (Mi), e.g., a temporal change of a surface FIGURE(P(x,y)) of a surface (24a) of a substrate (24) of the optical element (Mi), that is expected over the operational life of the optical element (Mi), with the temporal change in the optical property over the operational life (T) of the optical element (Mi) causing varying aberrations, and reducing the aberrations that vary over the operational life of the optical element (Mi) by generating an allowance, in particular a surface figure allowance (∆PV), which compensates at least a portion of the total temporal change in the optical property (P(x,y)) that is expected over the operational life.

A test system (1) having a test chamber (2) for a test object, wherein the test chamber has at least one chamber wall (3) delimiting the test chamber. The test chamber is assigned a first vacuum generator (12) generating a vacuum in the test chamber. The chamber wall has an opening (4) to which a sensor module (5) is assigned. The sensor module has a carrier element (6), which is arranged on the chamber wall, to close the opening. A sensor (10) is arranged on a side of the carrier element facing toward the test chamber. A negative-pressure chamber (17) assigned to the opening is formed on the side of the chamber wall facing away from the test chamber. The negative-pressure chamber is assigned a negative-pressure generator (19) generating a negative pressure in the negative-pressure chamber independently of a vacuum in the test chamber.

The invention relates to a method for characterizing an object having at least one reflective property, the method comprising: providing an optical system comprising a panel displaying a first model having asymmetric patterns and a second model having irregular patterns, and at least one sensor, the object to be characterized comprising a first surface; detecting, by the sensor, the first model and the second model in reflection on the first surface of the object; the detection being a single image capture by the sensor; determining coefficients of deformation of the first model reflected on the first surface and detected by the sensor, relative to the first model displayed on the panel; establishing a unique relationship between the patterns of the second model detected by the sensor after reflection on the first surface and the patterns of the second model displayed on the panel.

An apparatus (1) for measuring a component (2) of a lithography system, having a vibration isolator device (3), a measuring system (4) mounted on the vibration isolator device and a supply device (5) supplying the measuring system via a data connection (6) transferring data between the supply device and the measuring system, a current connection (7) transferring electrical energy between the supply device and the measuring system, a gas connection (8) transferring a gas between the supply device and the measuring system, a liquid connection (9) transferring a liquid between the supply device and the measuring system, and / or a vacuum connection (10) transferring a vacuum between the supply device and the measuring system. A decoupling device (11) mechanically at least partially decouples the measuring system from the supply device at least during the measurement of the component.

The invention relates to a device (100) for determining an imaging quality of at least one image for an inspection item (105), the device comprising at least one projection unit (115) for outputting light (120) toward the inspection item (105) in order to project at least one luminous and / or illuminating object structure through the inspection item (105), an optical receiving unit (110) for receiving light beams (130) of the light (120), which represent at least one image of the projected object structure, a holding unit (145), which is located between the projection unit (115) and the optical receiving unit (110), and a computing unit (150) for simultaneously evaluating a first light parameter, which represents at least one optical light parameter, and a second light parameter, which represents at least one colorimetric or photometric light parameter, of light beams (130) transmitted by or reflected off the inspection item (105), in order to determine the imaging quality of the at least one image, wherein the computing unit (150) is connected to the projection unit (115), to the receiving unit (110) and / or to the holding unit (145).

Method (80) for interferometric measurement of the shape of a surface (12) of a test object (14), comprising the steps: - respective measurement of the surface shape using an interferometric measuring device (10) in at least two different measuring configurations, - Differentiation (92) of the measurement results (82, 84) and separation (96) of measurement artifacts attributable to the respective measurement configuration (88, 90), - Subtracting (98) the associated measurement artifacts (88, 90) from at least one of the measurement results (82, 84).

An apparatus (10) for interferometrically measuring a surface shape (12) of a test object (14) in relation to a reference shape (41) includes (a) a diffractive optical element (30) generating a test wave (32) from measurement radiation (22), whereas a wavefront (42) of the test wave is adapted to a target shape (43) of the surface (12) of the test object (14) and the target shape is configured as a first non-spherical surface, (b) a reference element (38) with a reference surface (40) having the reference shape (41), the reference shape being configured as a further non-spherical surface, (c) a first holder (60) configured to arrange the test object (14) in the beam path of the test wave (32) in a measurement configuration, and (d) a further holder (62) configured to arrange the reference element (38) in the beam path of a reference wave (34) in the measurement configuration.

The invention relates to a method for estimating a geometry of a reflective surface, which method comprises the steps of measuring (10) a slope field (I) of the surface by means of a deflectometry device (1) connected to a measurement processing computer, then integrating (20) the slope field by modelling the presence of a rotational component (II) in the field, and by jointly searching for a gradient component (ϕ) of said field and alignment errors (III), which consist of rotational components, of the deflectometry device.

Device (100) for determining the image quality of at least one image for a test specimen (105), wherein the device (100) has the following features: - at least one projection unit (115) for emitting light (120) in the direction of the test object (105) in order to project at least one luminous and / or illuminated object structure (300) onto the test object (105); - optical receiving unit (110) for receiving light rays (130) of the light (120) transmitted through or by the test object (105) or reflected, which represent at least one image of the projected object structure (300), wherein the receiving unit (110) comprises an optical device (135) and an optical detector (140) and wherein the receiving unit (110) is adjustable or variable in its spectral sensitivity; - a mounting unit (145) for holding the test specimen (105), wherein the mounting unit (145) is arranged between the projection unit (115) and the optical receiving unit (110); and - a computing unit (150) for simultaneously evaluating a first light parameter (825), representing at least one optical light parameter, and a second light parameter (830), representing at least one colorimetric and / or photometric light parameter, of light rays (130) of the light (120) transmitted through or on the test object (105) and received using the receiving unit (110), in order to determine the image quality of the at least one image for the test object (105), wherein the computing unit (150) is connected to the projection unit (115), the receiving unit (110) and / or the mounting unit (145).

The invention discloses focus ray paraboloid detection equipment and a use method, and belongs to the field of solar reflector precision detection. The device comprises a ray source, a scale and a keel, rays of the ray source or an extension line of the rays penetrate through a paraboloid focus to be detected, a dial corresponding to the ray source is arranged on the scale, an original point of the dial and an intersection point ray source are located on the same paraboloid, and the ray source and the scale which are located on the same paraboloid are fixedly connected through a support. The focus ray paraboloid detection unit is called as a focus ray paraboloid detection unit; the number of the focus ray paraboloid detection units is two or more, the focus ray paraboloid detection units are connected through the keel, and the focus ray paraboloid detection units are arranged in parallel and are perpendicular to the keel. By adopting the paraboloid detection equipment, the system error caused by the detection according to the theoretical paraboloid focal line of the traditional paraboloid detection equipment is eliminated, and the optical interception rate of the heat collector is improved.

The invention relates to a method and a device for characterizing the surface of an optical element, in particular for characterizing the surface shape and / or for spatially resolved layer or contamination characterization of an optical element. In a method according to the invention, a plurality of interference images are recorded in an interferogram measurement series, wherein a test wave reflected at the optical element (105) is superimposed on an interferometer camera (110) with a reference wave that is not reflected at the optical element and passes over a reference element, wherein these interference images differ from each other with respect to the relative phase between the test wave and the reference wave, so that an intensity profile dependent on this relative phase is obtained for several pixels on the interferometer camera, wherein the interferogram measurement series is carried out with light of different wavelengths.wherein the intensity profile obtained for each of the multiple pixels on the interferometer camera is subjected to a transformation from spatial space to frequency space to determine a phase spectrum, and wherein a characterization of the surface shape and / or a spatially resolved layer or contamination characterization is carried out taking these phase spectra into account.

A Hindle lens array for performing a Hindle test on a secondary mirror system of a telescope includes a plurality of lens assemblies, each housed within a frame structure that supports the lenses in an optically aligned configuration. The lens assemblies include a central lens and a plurality of peripheral lenses. The frame structure is secured using an adjustable hexapod, providing six degrees of freedom for fine alignment with the secondary mirror system. The Hindle lens array is an alternative to a single large Hindle mirror, mitigating weight-induced sagging and providing improved optical performance through modular alignment capabilities. In a method of performing a Hindle test using the Hindle lens array, a test wavefront is introduced, reflected, and analyzed to measure and correct wavefront distortions.

The field of the invention is that of methods for measuring the deformation of a reflective surface (10) of an object. The measuring device comprises a lighting pattern (21) including light points (22), a camera (30, 31), and an image analysis device (40). The lighting pattern and the camera are arranged so that, in the measurement position, the virtual or real image (23) of the lighting pattern is visible to the camera's detector through the surface. This image is representative of the deformation of the illuminated area (11). The method according to the invention comprises the following steps: - Measuring the distance between the images of two light points; - Calculating the ratio between this measured distance and a reference distance; - Calculating, from this ratio, the magnification in a given direction; - Calculating the deformation of the reflective surface in said given direction.

The invention relates to a method and a device for detecting optical properties of an optical composite component. Wherein the composite component comprises a plurality of transparent elements connected to one another and a reflective layer, the transparent elements and the reflective layer being arranged in such a way that light coupled in at the coupling-in section is split into a plurality of first partial beams by means of the plurality of transparent elements in a first section of the composite component, the first partial beam is conducted along different paths in the composite element, and wherein the first partial beam is partially reflected a plurality of times in the second section likewise by means of a plurality of transparent elements such that a plurality of second partial beams are emitted laterally as a result of the partial reflection, and wherein the second partial beams are detected by means of a detector, and determining a quality indicator for the plurality of second partial beams from the signal of the detector, and wherein the plurality of second partial beams are preferably selected according to an aggregation rule, a quality indicator is determined from the signal of said second partial beams such that the quality indicator can be assigned to a particular part of the composite component.

In order to inspect whether or not a spatial light modulator has a defective element, this exposure device exposes an object to pattern light corresponding to drawing data and generated by a spatial light modulator having a plurality of elements, and comprises: a data output unit that outputs the drawing data to the spatial light modulator; an illumination optical system that irradiates the spatial light modulator with illumination light; a fist mobile object that holds the object; a projection optical system that projects an image of the pattern light generated by the spatial light modulator onto the object; a detection unit that detects the projected image of the pattern light; and a determination unit that, on the basis of a detection result from the detection unit, determines whether or not the spatial light modulator can generate the pattern light corresponding to the drawing data outputted from the data output unit.　

The invention relates to a method for detecting a reflecting surface (200) of an object arranged in a measurement space, using a device comprising at least one two-dimensional illumination pattern (201) for reflection on the reflecting surface (200) and a plurality of cameras (203) for pixel-by-pixel acquisition of image data of the illumination pattern (201) reflected on the surface (200), wherein the positions and orientations of the plurality of cameras (203) and the at least one two-dimensional illumination pattern (201) are known in a common coordinate system and the illumination pattern is an illumination pattern that varies over time, and wherein object image data is generated by applying a measurement sequence in which the cameras capture portions of the measurement space. Processing the object image data by means of an evaluation device in order to generate output data relating to a detection task relating to the object in consideration of the determined segmentation information, wherein the detection task comprises, for example, generating defect information of the object and / or calculating the surface normal of a plurality of points in at least one region of the reflecting surface of the object and / or calculating the curvature of a plurality of points in at least one region of the reflecting surface of the object, and taking the result as output data. The invention also relates to a corresponding device, a calibration method and a computer program product.

The invention relates to a method for reducing aberration of an optical element (Mi), in particular of an optical element (Mi) in a lithographic system, comprising: determining a temporal variation of an optical property of the optical element (Mi), in particular a temporal variation of a surface shape (P (x, y)) of a surface (24a) of a substrate (24) of the optical element (Mi), which is expected during the service life of the optical element (Mi), a change in time of the optical property during the service life (T) of the optical element (Mi) causes a changing aberration; and reducing aberrations that vary during the service life of the optical element (Mi) by creating tolerances, in particular planar tolerances ([Delta] PV), which compensate for at least part of the total temporal variation of the optical property (P (x, y)) expected during the service life. The invention also relates to an optical element (Mi) and to a device for semiconductor lithography.

Acquisition method and system configured for implementing such a method The invention relates to a method for acquiring, by an acquisition device (1), the light image originating from an object (2) to be controlled by phase-shift deflectometry after a series of light images having sinusoidal fringes, characterized in that the method comprises: adjusting an optical mechanism (11) according to a depth of field (4) whose sharpness distance is less than the thickness of the object (2), positioning a first portion of the object (2) in this depth of field (4), acquiring a first image in reflection or transmission originating from the first portion of the object (2), moving a second portion of the object (2) in this depth of field (4), acquiring a second image originating from a second portion of the object (2),the construction of a light image by combining images acquired from different portions of the object (2). Figure to be published with the abstract: Fig. 1,

A measuring device (10) for the interferometric shape measurement of a surface (12) of a test object (14-1; 14-2) includes (i) a diffractive optical element (26-1; 26-2) that generates a test wave (28) from incoming measurement radiation (18), wherein the diffractive optical element radiates the test wave onto the surface of the test object, (ii) a deflection element (22) that is disposed upstream of the diffractive optical element in the beam path of the measurement radiation, and (iii) a holding device (24, 124) that holds the deflection element and that changes a position of the deflection element (22) through a combination of a tilting movement and a translation movement.

A method is provided for analyzing a reflective surface through deflectometry, with a system including a display and imaging optics. The method includes the following steps: successively displaying n luminous images on the display, a luminous image having a binarized luminous intensity that is obtained by dithering the pattern M(x−xi), detecting, on the matrix detector, n images obtained by reflection of the n luminous images from the reflective surface, determining a function, referred to as object absolute phase function, based on the n detected images, the function g also satisfying the relationship: g(k·M)=g(M), with k being any real value, comparing the object absolute phase function with a reference absolute phase function, and deducing therefrom information about the shape of the surface.

An optical measurement system for measuring an optical grating (102 comprises a light source (100) that outputs collimated light beam (200) that is monochromatic and coherent. An interferometer arrangement (5) splits the collimated light beam (200) and guides the first and second light beams (104, 106) to the optical grating (102) for back-diffraction to the interferometer (5). The system causes interference between each of grating light beams (122G, 122G') diffracted from the optical grating (102) set in said two positions (G, G'), and a reference light beam (122M) reflected from a reference (118). The system also causes at least four predetermined relative wavefront phase shifts between the first and second light beams. A camera (124) forms interferograms of the interference in the two different positions (G, G') of the optical grating (102) with the at least two predetermined wavefront shifts. And a data processing unit (140) processes the interferograms, and present data on the optical grating (102) based on the interferograms.

The field of the invention is that of methods for measuring the deformation of a reflective surface (10) of an object. The measuring device comprises a lighting pattern (21) comprising light points (22), a camera (30, 31) and an image analysis device (40), the lighting pattern and the camera being arranged so that in the measuring position, the virtual or real image (23) of the lighting pattern is visible by the detector of the camera through the surface, said image being representative of the deformation of the illuminated area (11). The method according to the invention comprises the following steps: - Measurement of a distance between the images of two light points; - Calculation of the ratio between this measured distance and a reference distance; - Calculation, from this ratio, of the magnification in a determined direction; - Calculation of the deformation of the reflective surface in said determined direction

The invention relates to methods for inspecting a reflective surface (200) of an object arranged in a measurement chamber, with a device which has at least one 2-dimensional illumination pattern (201) for reflection on the reflective surface (200) and a plurality of cameras (203) for pixel-by-pixel recording of image information of the illumination pattern (201) reflected on the surface (200), wherein the position and orientation of the plurality of cameras (203) and of the at least one 2-dimensional illumination pattern (201) are known in a common coordinate system and the illumination pattern represents a temporally varying illumination pattern, wherein object image information is generated by applying a measuring sequence in which the cameras capture sections of the measurement chamber. The object image information is processed by means of the evaluation device, in such a way that output data is generated therefrom with regard to an object-related inspection task taking into account determined segmentation information, wherein the inspection task comprises, for example, the generation of defect information on the object and / or the calculation of surface normals for a plurality of points in at least one section of the reflective surface of the object and / or the calculation of the curvature for a plurality of points in at least one section of the reflective surface of the object, as output data. The invention further relates to a corresponding device, a calibration method and a computer program product.

The invention relates to an apparatus (1) for measuring a component (2), in particular an optical component (2) of a lithographic system, having at least one vibration isolator device (3), a measuring system (4) mounted on the at least one vibration isolator device (3), and a supply device (5) for supplying the measuring system (4) via at least the following connections:-a data connection (6), the invention relates to a device (1) for transmitting data between a supply device (5) and a measuring system (4), and / or a galvanic connection (7) for transmitting electrical energy between the supply device (5) and the measuring system (4), and / or a gas connection (8) for transmitting at least one gas between the supply device (5) and the measuring system (4), and / or a liquid connection (9) for transmitting electrical energy between the supply device (5) and the measuring system (4). -a supply device (5) for transferring at least one liquid between the supply device (5) and the measuring system (4), and / or-a vacuum connection (10) for transferring a vacuum between the supply device (5) and the measuring system (4). According to the invention, a decoupling device (11) is provided which is designed to mechanically at least partially decouple the measuring system (4) from the supply device (5) at least during the measurement of the component (2).