Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Abstract

The invention relates to an illumination system (12) of a microlithographic projection exposure apparatus (10), comprising a pupil surface and a substantially planar arrangement of beam deflecting elements (28) which can preferably be triggered in an individual manner and are used for variably illuminating the pupil surface. Each beam deflecting element (28) allows a projection light beam (32) that is incident thereon to be deflected in accordance with a control signal which is applied to the beam deflecting element (28). A measuring illumination device (54, 56, 58, 60; 88; 90; 98) directs a measuring light beam (36) that is independent from the projection light beams (32) onto a beam deflecting element (28). A detector device detects the measuring light beam (38) after the latter has been deflected on the beam deflecting element (28). An evaluation unit determines the deflection of the projection light beam (32) from the test signals supplied by the detector device.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine

Login to view more

AI Technical Summary

Benefits of technology

This technology allows an imaging lens (such as those made up of multiple reflective surfaces) to measure its properties without interference between measurements taken with another measurement tool. It also includes a special type of sensor called a scanning laser diode detector(SLFD), which helps detect any deviations in the image being formed due to imperfections within the lenses themselves. Additionally, there may exist devices like microscopes that control how much material needs to penetrate into them while they work through their own process. These technical improvements allow for precise monitoring and correction of these processes throughout manufacturing operations.

Problems solved by technology

Technological Problem: The technical problem addressed in this patents relates to improving the accuracy and efficiency of microscopic photolithographic processes while minimizing losses during image quality control procedures. Specifically, there has been proposed methods involving varying the angles at which certain parts of the projected images pass through optical devices called multiple reflection element arrays. However, these techniques have limitations because they require precise knowledge of how each component's movement affects its final outcome. Additionally, current methods involve extracting significant amounts of energy from the reflected radiation, making them difficult to operate efficiently without damaging sensitive areas within the system.

Images