This invention discloses a method for
electroplating soft gold onto a circuit board, and also discloses the circuit board. The method includes the following steps: S1: Obtaining a circuit board with a
copper layer on its surface; S2:
Electroplating a
nickel layer on the surface of the
copper layer, wherein the surface of the
nickel layer has gold bonding lines and non-gold bonding lines; S3: Forming multiple arrayed and spaced bump structures in the gold bonding lines, each bump structure including a
nickel substrate and a
gold surface layer disposed on the surface of the
nickel substrate; S4:
Electroplating the circuit board with gold to form a first
gold layer on the gold bonding lines and a second
gold layer on the non-gold bonding lines, wherein the thickness of the first
gold layer is greater than the thickness of the second gold layer. In this way, selective thickening of the gold bonding lines is achieved during the
gold plating process, ensuring that the gold bonding lines have a sufficiently thick gold layer to guarantee the reliability of the gold bonding lines, while the non-gold bonding lines maintain a relatively thin gold layer, which can reduce the amount of gold used and lower the production cost of the circuit board.