1127results about How to "Suitable for processing" patented technology

In one of the many embodiments, a method for processing a substrate is provided which includes generating a first fluid meniscus and a second fluid meniscus on a surface of the substrate where the first fluid meniscus being substantially adjacent to the second fluid meniscus. The meniscus also includes substantially separating the first fluid meniscus and the second fluid meniscus with a barrier.

An apparatus for managing plasma in wafer processing operations is disclosed which includes a housing having an internal region defined by an inner wall. The housing has an input port for supplying a plasma into the housing at a first end and an output port at a second end. The apparatus includes a hollow tube contained in the internal region within the housing. The hollow tube is defined by a wall that extends between the first end and the second end and contains a plurality of orifices generating a plurality of fluid paths through the wall. A fluid input is included supplying fluid into the internal region of the housing. The supplied fluid is capable of passing through the plurality of orifices, and the plasma supplied through the input port is capable of being mixed within the hollow tube with the supplied fluid. The output port at the second end of the housing enables the mixed plasma and fluid supply to exit the housing.

A film deposition apparatus includes: a turntable; a first reaction gas supply part and a second reaction gas supply part extending from a circumferential edge toward a rotation center of the turntable; and a first separation gas supply part provided between the first and second reaction gas supply parts. A first space contains the first reaction gas supply part and has a first height. A second space contains the second reaction gas supply part and has a second height. A third space contains a first separation gas supply part and has a height lower than the first and second heights. A motor provided under the rotation center of the turntable rotates the turntable. A rotation shaft of the turntable and a drive shaft of the motor are coupled without generation of slip.

A printed circuit board has a liquid crystalline polymer layer that is bonded to an electrically conductive layer that includes traces that electrically connect components mounted on the printed circuit board. The liquid crystalline polymer material is thermally conductive and dielectric. When the components produce heat, the liquid crystalline polymer layer absorbs and dissipates the heat produced by the electrical components mounted on the printed circuit board. The thermal equilibrium of the printed circuit board is lower than the maximum operating temperature of the components.

A shared control channel structure includes at least one control channel to be allocated at least to a user for at least one of uplink and downlink directions in a network, which the at least one control channel is arranged as at least a part of a modular structure comprising of modular code blocks on at least two different sizes. One of such modular structures may be represented as a tree structure in particular, where each of the modular code blocks define one node of the tree, respectively.

A speech processing apparatus includes a statistics collecting module operable to collect, for each of a prescribed utterance units of a speech in a training speech corpus, a prescribed type of acoustic feature and statistic information on a plurality of paralinguistic information labels being selected by a plurality of listeners to a speech corresponding to the utterance unit; and a training apparatus trained by supervised machine training using said prescribed acoustic feature as input data and using the statistic information as answer data, to output probability of allocation of the label to a given acoustic feature, for each of said plurality of paralinguistic information labels, forming a paralinguistic information vector.

A parallel plate type plasma processing apparatus including a RF feed rod for applying a high frequency power to a susceptor and a temperature detection unit for detecting the temperature of a substrate on the susceptor is configured to reduce an effect that high frequency current flowing in the RF feed rod has on temperature detection of the temperature detection unit. A surface portion of the susceptor serves as a mounting unit including an electrostatic chuck and a heater. A shaft, which is a protection pipe extracted downward from the processing chamber, is provided under the mounting unit. A chuck electrode of the electrostatic chuck serves as an electrode for applying a high frequency voltage. Provided in the shaft are two RF feed rod for supplying a power to the electrode and an optical fiber, i.e., a temperature detection unit, having a dielectric fluorescent material is disposed in a leading end thereof. Then, the two RF feed rods and bar type conductive leads for the heater are alternately arranged at equal intervals in a circumferential direction on a circle having the optical fiber at the center thereof such that the region having therein the optical fiber is an electromagnetic wave-free region since the electric force lines respectively traveling from the RF feed rods to bar type conductive leads are offset with each other.

A vectorizable execution unit is capable of being operated in a plurality of modes, with the processing lanes in the vectorizable execution unit grouped into different combinations of logical execution units in different modes. By doing so, processing lanes can be selectively grouped together to operate as different types of vector execution units and/or scalar execution units, and if desired, dynamically switched during runtime to process various types of instruction streams in a manner that is best suited for each type of instruction stream. As a consequence, a single vectorizable execution unit may be configurable, e.g., via software control, to operate either as a vector execution or a plurality of scalar execution units.

The present invention relates to a capacitive-coupled plasma processing apparatus, wherein an electric field regulating element, i.e., an “electric field lens”, is arranged in the reaction chamber to generate a regenerated electric field in a direction opposite to that of the original radio frequency electric field in the reaction chamber, so that the non-uniformity of etching rate on the surface of the substrate of the plasma incurred by the original radio frequency electric field is decreased; and the electric field regulating element, i.e., the “electric field lens”, further decreases the equivalent quality factor Q value of the reaction chamber, expands the radio frequency band, and prevents high-voltage electric arcing. The present invention further provides a method for processing the substrate using the processing apparatus.

A method and a device for processing a light-polymerizable material (5, 55) for building up an object (27) in layers, using a lithography based generative manufacture having a construction platform (12) for building up the object (27), a projecting exposure unit (10, 60) that can be controlled for locally selected exposing of a surface on the construction platform (12, 62) to an intensity pattern having a prescribed shape, and a control unit (11, 61) prepared for polymerizing overlapping layers (28) on the construction platform (12, 62) in successive exposure steps, each having a prescribed geometry, by controlling the projecting exposure unit (10, 60), in order to thus successively build up the object (27) in the desired shape, said shape resulting from the sequence of layer geometries. The invention is characterized in that a further exposure unit (16, 66) for exposing the surface of the construction platform (12, 62) is provided on the side opposite the projecting exposure unit (10, 60), and that the construction platform (12, 62) is designed to be at least partially transparent to light, and that the control unit (11, 61) is designed for controlling the further exposure unit (16, 66) at least while building up the first layer (28), said layer adhering to the construction platform (12, 62), for exposing in the prescribed geometry.

Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.

A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.

A sterile nonstick compress having an open-mesh flexible fabric, the fabric including yarns which are coated with a cohesive and nonstick gel so as to leave the meshes essentially unobstructed, the gel being formed from a highly plasticized hydrophobic elastomeic matrix having a dispersion of hydrophilic particles of a hydrocolloid.

The present invention relates to a process of making a zinc-oxide-based thin film semiconductor, for use in a transistor, comprising thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising first, second, and third gaseous materials, wherein the first gaseous material is a zinc-containing volatile material and the second gaseous material is reactive therewith such that when one of the first or second gaseous materials are on the surface of the substrate the other of the first or second gaseous materials will react to deposit a layer of material on the substrate, wherein the third gaseous material is inert and wherein a volatile indium-containing compound is introduced into the first reactive gaseous material or a supplemental gaseous material.

An optimal thermal seawater desalination process is disclosed, which combines two or more substantially different water pretreatment processes in a unique manner and in a special configuration, hereto unknown to prior desalination arts, to produce a high yield of high quality fresh water, including potable water. In this process a two stage NF membrane pretreatment unit (NF₂) with an energy recovery turbo charger (TC) device in between the stages or equipped with an energy recovery pressure exchanger (PX) is synergistically combined with at least one thermal desalination unit to form a dual hybrid of NF₂-Thermal (FIG. 4 ), or alternatively the two stage NF₂ unit is synergistically combined with a two stage SWRO unit (SWRO₂) with an energy recovery TC in between the stages or combined with one stage SWRO (SWRO₁) equipped with an energy recovery TC or PX system and the reject from the SWRO₂ or SWRO₁ unit is made make-up to a thermal unit to form a tri-hybrid of NF₂-SWRO_{2 reject}-Thermal (FIG. 5 ). In both the cases of di- or trihybrids the thermal unit is equivalent to a multistage flash distillation (MSFD) or multieffect distillation (MED) or vapor compression distillation (VCD) or thermal reheat (RH) evaporator. Typically a process of this invention using the two stage NF₂ initial pretreatment step will perform a semi-desalination step by reducing feed TDS by about 35 to 50%, but most important, especially to the thermal seawater desalination process, it removes the water recovery limiting, scale forming hardness ions of Ca⁺⁺ and Mg⁺⁺ by better than 80% and their covalent anions of sulfate to better than 95% and bicarbonate to about 65%. The removal of scale forming hardness ions, especially SO₄⁼, and bicarbonates allowed for the operation of thermal unit in the above hybrids at top brine temperature (TBT) much greater than its present TBT limit by the singular conventional process of 120° C. for MSFD and operation of MED or VCD or RH unit at TBT much higher than their present TBT limit of 65-70° C., with many advantages gained by this process over prior art sweater desalination processes. The process of this invention exceeds all prior thermal seawater desalination arts in efficiency, including water yield, product water recovery ratio and unit water cost as well as in energy consumption per unit product which is equivalent or less than other efficient prior art seawater thermal desalination processes. By this process, an NF product recovery ratio of 75 and 80% or better is achieved from the high salinity Gulf sea (TDS≈45,000 ppm) and about an equal product recovery ratio is also obtained from the SWRO or thermal unit when it is operated on NF product for a total water recovery ratio in excess of 52% for seawater

The present invention describes an apparatus and method for creating dense nano-multi molecular packing of gaseous molecules concentrated in liquid solutions and the ionization of the resultant dense gaseous nano-multi-molecular molecules forming a concentration of free-radicals saturating liquid solutions without cavitation of nuclei and without bubbles for the dissolution, destruction, disinfection and remediation of biological, chemical and electrochemical threats and contaminants.

The invention relates to a method and an apparatus for improving the responsiveness and accuracy of speech recognition systems with tightly integrated Automatic Speech Recognition (ASR) and voice resources, more particularly to a system and method for providing an improved speech recognition enhanced user interface through a reduction in the effective talk-over period. The speech recognition system comprises a host server, managing and arbitrating between a voice resource and an ASR resource, among other resources, through the exchange of run-time controls. The novel method provides for a daisy chain architecture within the speech recognition system, whereby the voice data, or prompt, output by the voice resource is passed directly to the ASR resource, where it is output to the system user. Upon detection of speech from the user, the ASR resource stops transmitting the prompt to the system user, transparent to both the voice resource and the server, followed by a "speech detected" message sent to the server. The delay between the time at which the speech is detected and the time at which the voice resource stops playing the prompt, as a result of a "stop play" request received from the server, goes unnoticed by the system user due to the ASR resource intervention.