15 results about "Sequential deposition" patented technology

This invention discloses a method for preparing a (111) preferred-oriented perovskite thin film based on substrate control, comprising: providing a substrate; forming a SnO2 electron transport layer on the substrate; forming a zinc oxalate (ZnOX) interlayer on the electron transport layer; and preparing the perovskite active layer on the ZnOX interlayer using a two-step sequential deposition method, wherein the perovskite active layer has a (111) preferred orientation; in this invention, the interaction between oxalate anions and PbI2 induces the formation of a porous PbI2 film, which, combined with Zn... 2+ The defect compensation and lattice regulation effects of the embedded perovskite lattice successfully induced the growth of a (111) preferred orientation perovskite thin film with large grains (up to 3 μm in size) and low defect density, and the (111) / (100) peak intensity ratio was improved by nearly 5 times. This invention achieves the simultaneous optimization of perovskite thin film structure and device performance with a simple and effective interface modification strategy, providing a new path that is both scientific and practical for the industrialization of high-performance long-life perovskite solar cells.

An integrated semiconductor photodetector and its fabrication method are disclosed, relating to the field of integrated photodetector technology. This invention addresses the problems of existing detectors, such as limited functionality, insufficient responsivity, low integration, and difficulty in achieving synergistic miniaturization and high performance improvement. The method involves depositing a Cr conductive layer on the front side of a superlens substrate, uniformly coating the conductive layer surface with photoresist, pre-baking to prepare a dot-matrix mask pattern, developing and fixing followed by Ni deposition, and then stripping to obtain the Ni dot-matrix mask. ICP etching is used to remove the surface conductive layer, and a nanopillar array superlens structure is then fabricated. A photodetector layer is transferred to the back side of the substrate. Positive photoresist is spin-coated onto the substrate surface, pre-baking to prepare a source / drain electrode pattern, developing and fixing followed by sequential deposition of an adhesion layer metal and an electrode body metal layer. The metal layer in the non-electrode region is then stripped to obtain the metal electrode in contact with the photodetector layer, completing the detector fabrication. This invention can be applied to polarization imaging, space remote sensing, airborne detection, and optical communication.

A system for the fabrication of ε-phase MnAl / Co bilayer thin films, consisting of: a) a high-frequency magnetron sputtering system for the deposition of multilayer thin films on a silicon substrate, the sputtering system comprising: • a system for maintaining base pressure, configured to maintain a constant pressure; • three 2-inch targets consisting of MnAl, Co and Ta; and • a substrate rotation mechanism configured to rotate the substrate at a constant number of revolutions per minute; b) a layer deposition unit that is operationally connected to the RF magnetron sputtering system and enables the sputtering system to deposit layers sequentially: • a 3 nm thick Ta buffer layer on the silicon substrate; • a 60 nm thick MnAl layer on the Ta buffer layer; • a Co layer with a thickness of 1 nm to 5 nm on the MnAl layer; and • a 5 nm thick Ta top layer on the Co layer; c) an annealing furnace configured to anneal the deposited Ta and MnAl layers for 2 hours at 600 °C before the Co layer is deposited; and d) a characterization unit for analyzing the produced thin films, wherein the characterization unit comprises the following: • an X-ray diffraction (XRD) system for structural characterization; • an optical 3D profilometer for measuring surface structure and mean roughness; and • a field emission scanning electron microscope (FESEM) with energy-dispersive X-ray spectrometer (EDS) for analyzing surface morphology and elemental composition.

This invention relates to the field of alloy material processing technology, and discloses a preparation process for a lightweight, high-strength silver-plated copper alloy conductor for next-generation aerospace and marine engineering equipment. The process includes: vacuum melting of raw materials containing copper, lightweight reinforcing components, and microstructure stabilizing agents; obtaining wire through multiple cold drawing passes; pretreatment followed by sequential deposition of a transition layer and a silver plating layer, and then synergistic heat treatment. This application reduces density through lightweight reinforcing components, locks grain boundaries using microstructure stabilizing agents, and constructs a multi-scale strengthening system through cold drawing and heat treatment, significantly improving the tensile strength of the conductor. By setting a transition layer and a precision silver plating process, interfacial bonding is enhanced and atomic diffusion is suppressed, achieving a deep coupling of lightweight, high-strength, high-conductivity, and excellent environmental adaptability in the conductor.

The invention belongs to the field of nuclear fuel cladding material surface engineering, and particularly relates to a gradient structure protective coating and a preparation method and application thereof. According to the method, the Cr layer, the Cr-Al-Si layer and the Cr-Al-Si-N layer are sequentially deposited, a three-layer structure with components and density in gradient transition is constructed, interlayer stress concentration is effectively avoided, and the binding force and toughness are improved. Wherein the grain size of the Cr-Al-Si intermediate layer is 25-45nm, and the Cr-Al-Si intermediate layer can accommodate and combine irradiation point defects; the surface Cr-Al-Si-N layer is of a composite structure with 5-15 nm nanocrystals wrapped by an amorphous matrix, a rapid defect annihilation channel is provided, and the anti-irradiation performance is synergistically enhanced. The method is completed through single-period sequential deposition, the process is easy and convenient to control, reproducibility is good, industrialization implementation is easy, and the prepared coating has excellent radiation resistance, high-temperature water vapor oxidation resistance and good film-substrate bonding strength.

Disclosed herein are systems and methods for producing structural color in layer-by-layer assemblies of Ti3C2Tz MXene nanosheets and polyelectrolyte heterostructures with controlled block thicknesses. In an aspect, the block thickness and spatial placement of MXene is controlled by the assembly's salt concentration and number of layer pairs. In a further aspect, to achieve controllable thicknesses in MXene blocks a processing method called layer-by-layer (LbL) assembly is employed. LbL assembly uses electrostatic interactions to alternately deposited layers of desired materials. In a still further aspect, layers of desired thicknesses can be built up by sequential deposition, allowing the creation of MXene blocks of specific thicknesses in order to attain structural color.

The invention discloses a characterization method for a nano structure of an X-ray photoetching grayscale mask, and relates to the technical field of micro-nano processing. The method comprises the following steps: before preparing a focused ion beam cross section, sequentially depositing a multi-layer composite protective film on the surface of a to-be-detected X-ray photoetching gray scale mask nanostructure, and sequentially comprising a first carbon layer, a first tungsten layer, a second carbon layer and a second tungsten layer from bottom to top; according to the structure, pollution of the tungsten layer is isolated through the carbon layer, the purity of interface component analysis is ensured, meanwhile, mechanical support and ion sputtering resistance are provided through the tungsten layer, the original three-dimensional shape of the nanostructure is protected, finally, focused ion beam cutting is carried out, and detection and analysis are carried out through a scanning electron microscope-energy dispersion X-ray spectrometer. Accurate characterization of the depth, the side wall morphology and the elemental components of the X-ray photoetching grayscale mask nanostructure is realized.

The invention belongs to the field of photoelectric materials and devices, and discloses a perovskite light-emitting diode based on biguanide salt intercalation and a preparation method thereof. The perovskite light-emitting diode sequentially comprises an anode substrate, a hole injection layer, a hole transport layer, a perovskite light-emitting layer, an electron transport layer, an electron injection layer and a metal cathode layer from bottom to top, wherein the perovskite light-emitting layer is formed by sequentially depositing CsX ', biguanide salt and PbX ''2 on the surface of the hole transport layer under a vacuum condition through an annealing reaction, and X' and X ''are independently selected from Cl, Br or I. According to the invention, the biguanide salt is introduced into the perovskite light-emitting layer through a sequential deposition process, so that dimension control of evaporation perovskite is realized, various defects in the perovskite light-emitting layer are effectively passivated, ion migration is inhibited, and the efficiency and stability of a device are remarkably improved.

The invention discloses a low-temperature silicon nitride sequential deposition method for improving adhesive force and regulating stress, which belongs to the technical field of low-temperature silicon nitride, and comprises the following steps: S1, pretreating a wafer to obtain a substrate; s2, a raw material with the radio frequency power of 1200-1400 W and the silicon-nitrogen ratio of 2: 1-5: 1 is used for deposition of a pre-activated layer; s3, a raw material with the radio frequency power being 900-1100 W and the silicon-nitrogen ratio being 1: 2-1: 5 is used for main body layer deposition; and S4, raw materials with the radio frequency power ranging from 1000 W to 1200 W and the silicon-nitrogen ratio ranging from 1: 2 to 1: 5 are used for generating a covering layer, the distance between the covering layer and the reactor ranges from 11 mm to 13 mm, and the sequentially deposited film is obtained. According to the method, the pre-activation layer, the main body layer and the covering layer are sequentially deposited, so that a gradient film structure from interface chemical enhancement to bulk phase function optimization to surface stress fine adjustment is realized, and the problems of poor film adhesion, uncontrollable stress and insufficient uniformity caused by low reaction activity in a low-temperature silicon nitride process are solved.

A method and system for checking a process for building a tyre including sequential deposition of an ordered plurality of N semi-finished elements on a drum. The method includes: establishing an ordered plurality of N classes of drum states, wherein a first class corresponds to a bare drum state and an i-th class corresponds to a drum state including the i-1th semi-finished element deposited in radially outermost position; before the deposition of the i-th semi-finished element: processing an acquired image of a drum state to associate to the current drum state a current class among the ordered plurality of N classes of drum states; authorising the deposition of the i-th semi-finished element based on a comparison between the current class and the expected class.

The invention discloses a high double-sided rate TOPCon battery based on a Poly Finger structure and a preparation method thereof. The preparation method comprises the following steps: S1, performing alkali texturing treatment to form a positive pyramid textured surface; s2, performing boron diffusion to form a boron diffusion layer; s3, removing borosilicate glass on the back surface; s4, polishing the substrate; s5, sequentially depositing a silicon dioxide tunneling oxide layer, a phosphorus-doped amorphous silicon layer and a silicon dioxide mask layer on the back surface; s6, performing annealing crystallization to obtain a phosphorus-doped polycrystalline silicon layer and a phosphorosilicate glass layer; s7, the phosphorosilicate glass is loosened through picosecond laser; s8, performing surface etching to form a Poly Finger structure; s9, polishing the back surface; s10, performing ink jet etching on a non-grid line area, and cleaning to obtain an inverted pyramid light trapping structure; s11, preparing an aluminum oxide passivation layer; s12, coating the front and back surfaces; and S13, preparing an electrode. The product prepared by the invention can significantly improve the back efficiency and the cell double-sided rate.

The application belongs to the technical field of solar cells, and relates to a perovskite gradient band gap film and a preparation method and application thereof. The perovskite gradient band gap film with different band gap ranges is prepared by stacking a wide band gap perovskite layer and a narrow band gap perovskite layer, the band gap range of the perovskite gradient band gap film is 1.35eV-2.3eV, and the perovskite gradient band gap film is matched with multiple scene applications. According to the spectral variation range of a light source, the perovskite polycrystal film superposition structure with a matched band gap is flexibly regulated and controlled, and then the optimal ambient light utilization efficiency is realized, and the efficient utilization of the spectrum in different application scenes is realized. The perovskite gradient band gap film prepared by using the layer-by-layer sequential deposition method has high crystallinity and good uniformity. By precisely regulating and controlling the thickness ratio of the evaporated lead halide and the organic salt, the annealing temperature and time, a multilayer high-quality perovskite film superposition structure with a gradient band gap is prepared.

The invention relates to the field of photovoltaic technology, and discloses a composite interlayer for a perovskite organic laminated cell, and a preparation method and application thereof. The preparation method comprises the step of integrally preparing a buffer layer-gradient composite transition layer-electron transport layer composite structure at one time by adopting multi-target PVD (Physical Vapor Deposition) in combination with sequential deposition and co-sputtering. According to the preparation method, a clear layered structure is reserved, meanwhile, the gradient composite transition layer is constructed through PVD co-sputtering, the problems of energy level, passivation, stability, bidirectional carrier transmission and the like are synchronously solved, and on the premise that the charge transmission efficiency is not sacrificed, the performance of the device is improved. And low parasitic absorption, low optical loss, high interface quality and excellent long-term stability of the composite intermediate layer are synchronously realized. The invention provides a full-dry-method and integrated technical path for industrial preparation of efficient and stable perovskite organic laminated cells, is particularly suitable for the perovskite organic laminated cells, can reduce the interface recombination rate of the perovskite organic laminated cells, and can improve the electrical properties of Voc, FF, Jsc, Eta and the like of the perovskite organic laminated cells.

A kind of solar cell based on sequential deposition method realizes low temperature phase conversion of perovskite active layer and preparation method thereof, belong to photovoltaic cell technical field.The device is composed of indium tin oxide conductive glass substrate, tin oxide electron transport layer, potassium chloride interface modification layer, perovskite active layer, 2-(1-cyclohexenyl) ethyl ammonium iodide surface passivation layer, 2,2',7,7'-tetrakis[N,N-bis (4-methoxyphenyl) amino]-9,9'-spirobifluorene hole transport layer and gold electrode;The application value and potential of O-phospho-D-serine and O-phospho-L-serine in the field of perovskite precursor doping strategy are developed, the strong interaction between the two and PbI2 is utilized, the phase conversion and film growth of perovskite are effectively controlled in the preparation process, the energy barrier of δ-FAPbI3 converted into α-FAPbI3 is reduced, and the performance and light stability of the device are improved.

A method for manufacturing a supported catalyst. The method involves the steps of: (ia) sequential deposition of an aqueous solution comprising a platinum group metal (PGM) salt followed by depositio