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59 results about "Edge segment" patented technology
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Process window optimization method and device, medium, program product and terminal
ActiveCN119312750AReduce defective ratehigh feasibilitySpecial data processing applicationsCAD numerical modellingGraphicsEdge segment
The invention provides a process window optimization method and device, a medium, a program product and a terminal, and solves the problems of low light intensity contrast ratio, limited process window and high finished product defect rate of weak point and dead pixel areas through an objective function optimization and numerical programming solution method. And establishing a reasonable optimization model by taking the sum of squares of light intensity logarithmic slopes of weak and dead pixel areas as an optimization target and combining an edge section moving range, an edge position error and mutual influence factors. And meanwhile, a plurality of matrix methods such as a sparse matrix and a dense matrix are introduced, so that the optimization efficiency and precision are improved, the accurate optimization of the mask pattern is realized, the process window is expanded, the defect rate is reduced, the process stability and adaptability are enhanced, and the production efficiency and the product quality are remarkably improved.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Masking process and optical proximity joint correction method, device and equipment
The invention relates to the field of semiconductor processing, in particular to a mask process and optical proximity joint correction method, device and equipment. Inputting the target pattern into a pre-trained joint correction model, enabling the joint correction model to take the target pattern as an initial current mask pattern, and segmenting the edge of an optical proximity correction target pattern in the current mask pattern to obtain a plurality of edge sections, performing iterative adjustment on the position of the edge section according to a preset mask image density function, a first linear coefficient corresponding to the mask image density function, a preset photoresist image item and a second linear coefficient corresponding to the photoresist image item; the edge placement errors of all the edge sections of the current mask pattern are smaller than a preset qualified threshold value; and outputting the current mask pattern of which the edge placement error of the edge section is smaller than a preset qualified threshold value as a corrected mask pattern. According to the invention, the process period and cost are reduced.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Mask process correction method, device and equipment and storage medium
The invention relates to the field of integrated circuit production, in particular to a mask process correction method, device and equipment and a storage medium, and the method comprises the steps: receiving an original mask pattern and a target simulation pattern; converting the original mask pattern into a pattern enclosed by a plurality of edge sections; performing analogue simulation on the original mask pattern through a pre-trained correction intensive model to obtain a mask process deviation value corresponding to each edge section; determining an original design deviation value of each edge section according to the original mask pattern and the target simulation pattern; determining an edge placement error corresponding to each edge section according to the original design deviation value and the mask process deviation value; and adjusting the position of the corresponding edge section according to the edge placement error to obtain a corrected mask pattern. According to the method, only the edge section is simulated, so that the running speed is greatly increased, and relatively high calculation precision is also ensured.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Quality monitoring method and system for road construction
The invention relates to the technical field of road engineering construction, and discloses a quality monitoring method and system for road construction, and the method comprises the steps: obtaining a time sequence image sequence of a construction region, carrying out the processing of the image sequence based on an improved Canny edge detection process, obtaining a binary image containing texture features, and carrying out the processing of the binary image. The method comprises the steps of calculating edge offset data of edge line segments between adjacent frames based on a dynamic time warping algorithm, constructing a pavement texture change model based on the edge offset data, identifying an abnormal region and calculating an area proportion of the abnormal region, and obtaining a construction quality evaluation index based on an edge expansion index and fusing data collected by an Internet of Things sensor. And comparing the construction quality evaluation index with a quality preset threshold value, triggering a grading early warning mechanism, and synchronously pushing the grading early warning mechanism to a highlight area of the construction site model. Based on the improved algorithm, the road surface texture noise interference is effectively inhibited, the edge detection stability is improved, the compactness prediction accuracy is improved, and the road construction quality monitoring efficiency is improved.
Owner:CHINA CONSTR SECOND ENG BUREAU LTD
Optical proximity correction method and device
ActiveCN121232545APhotomechanical exposure apparatusDesign optimisation/simulationIntegrated circuit manufacturingWafering
The invention relates to the field of integrated circuit manufacturing, in particular to an optical proximity correction method and device. Determining a target wafer grid image according to a preset grid size and the target wafer pattern; taking the target wafer pattern as a current mask pattern; inputting the current mask pattern into a pre-trained three-dimensional optical proximity correction model, and obtaining an emulational wafer grid image with the assistance of a grid size; calculating an edge height error corresponding to each edge section; judging whether the edge height error exceeds a preset adjustment threshold value or not; when the edge height error exceeds a preset adjustment threshold value, adjusting the position of each edge section in the corresponding normal direction according to the edge height error to obtain an updated current mask pattern; and the step 4 to the step 7 are cycled until the edge height error does not exceed the adjustment threshold value. According to the invention, the defects of photoresist height loss and the like are reduced, and the yield of finished products is improved.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Intelligent control method and system for full-automatic plate edge sealing equipment
The invention provides an intelligent control method and system for full-automatic plate edge sealing equipment, and relates to the technical field of intelligent control, and the method comprises the steps: carrying out the median filtering of super-resolution edge coordinates, then carrying out the clockwise sorting, forming an ordered set, calculating curvature marking segmentation points, dividing edge segments, and carrying out the segmentation of the edge segments; randomly selecting points to fit a circle by taking each section as a unit, optimizing to obtain a final arc model, mapping to an original image coordinate system along sampling points of the arc model, and combining to form a super-resolution edge coordinate set after fitting; acquiring a real-time state parameter of the edge sealing equipment, and performing normalization processing on the state parameter to obtain a correction factor for correcting the measurement deviation; and correcting the fitted super-resolution edge coordinate set through a correction factor to obtain a corrected edge coordinate set. According to the invention, high-precision identification and edge sealing control on the edge of the plate are realized, and the edge sealing precision and efficiency are improved.
Owner:ZHONGPIN INTELLIGENT MASCH CO LTD
A mask process and optical proximity joint correction method, device and equipment
The present invention relates to the field of semiconductor processing, and in particular to a mask process and optical proximity joint correction method, device, and apparatus. The method comprises receiving a target pattern, inputting the target pattern into a pre-trained joint correction model, causing the joint correction model to use the target pattern as an initial current mask pattern, segmenting the edges of an optical proximity correction target pattern in the current mask pattern to obtain a plurality of edge segments, and then iteratively adjusting the positions of the edge segments according to a preset mask image density function, a first linear coefficient corresponding to the mask image density function, a preset photoresist image item, and a second linear coefficient corresponding to the photoresist image item, until the edge placement errors of all edge segments of the current mask pattern are less than a preset qualified threshold; and outputting the current mask pattern with edge segments having edge placement errors less than the preset qualified threshold as a correction mask pattern. The present invention reduces process cycle time and costs.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Watch parts production quality inspection method and system based on machine vision
The present invention relates to the field of image processing technology, and in particular to a method and system for detecting the production quality of watch parts based on machine vision, including: obtaining a gear grayscale image and its edge, and recording its gear center; dividing the edge of the gear grayscale image into a number of edge segments, and obtaining the extension trend of the pixel points in each edge segment according to the distance between the adjacent pixel points in each edge segment and the gear center, so as to divide all edge segments into tooth top edges and concave edges; screening tooth groove edges according to the distance between the tooth root point of each concave edge and the gear center, and the symmetry of the suspected tooth groove edge; evaluating the gear quality according to the tooth top edge and the tooth groove edge. The present invention analyzes the difference between the edge of the highlight area generated at the gear groove and the edge at the actual gear groove, thereby avoiding interference from the edge of the highlight area when detecting the gear quality through the edge, thereby improving the accuracy of detecting the gear quality.
Owner:SHENZHEN GAOJIN IND CO LTD
Edge data adjustment method for element geometric measurement
The invention belongs to the related technical field of computer digital image processing, and particularly relates to an element geometric measurement-oriented edge data adjustment method, which comprises the following steps of: carrying out overlapped division on element edges in an image to obtain an edge fragment set; based on a finite Gaussian mixture model and by fusing wavelets and total variation, establishing an adjustment edge maximum posteriori estimation function corresponding to all the edge segments, minimizing the function, performing independent adjustment on the edge segments, and aggregating the adjusted edge segments to obtain a pre-adjustment edge; carrying out overlapping division on the pre-adjustment edge to obtain a pre-adjustment edge fragment set; and the obtained finite Gaussian mixture model is fused with second-order total variation regularization, an ideal edge maximum posteriori estimation function of each pre-adjustment edge fragment is established, the function is minimized, independent smooth correction is performed on the pre-adjustment edge fragments, all the edge fragments after smooth correction are aggregated, and a final adjustment edge is obtained. According to the method, the geometric element measurement precision is improved on the algorithm level.
Owner:HUAZHONG UNIV OF SCI & TECH
Image semantic segmentation-based spliced prefabricated part splicing area identification method
The invention relates to the technical field of region segmentation, in particular to a splicing type prefabricated part splicing region identification method based on image semantic segmentation, which comprises the following steps of: acquiring a part image and extracting a light and shade change region, analyzing pixel arrangement and a jump edge, endowing a semantic label, tracking a contour path and extracting a trend and a direction. Recognizing turn-back, eliminating abnormal edge segments, recombining paths, extracting center line coordinates, adjusting directions, complementing point positions, and generating a label map to divide a splicing seam area. According to the method, boundary regions are divided through pixel arrangement and brightness edge connectivity, independent labeling of semantic blocks is completed, a structured edge segment set is constructed through path trend and turning point information, the coherence and connection relation sequence of the boundary direction is kept, direction sudden change positions are recognized, path anomalies are eliminated, and structural fracture and overlapping are reduced; central line pixels are extracted, a path trunk is formed through point supplementing operation at the turning position, an attribution area is delimited by combining contour extension and label coding, and the consistency and segmentation integrity of the abutted seam boundary are improved.
Owner:THE GUANGDONG NO 3 WATER CONSERVANCY & HYDRO ELECTRIC ENG BOARD CO LTD +1
A mask process correction method, device, equipment and storage medium
The present invention relates to the field of integrated circuit production, and in particular to a mask process correction method, device, equipment and storage medium, which receives an original mask pattern and a target simulation pattern; converts the original mask pattern into a figure surrounded by multiple edge segments; simulates the original mask pattern through a pre-trained correction intensive model to obtain mask process deviation values corresponding to each edge segment; determines the original design deviation value of each edge segment according to the original mask pattern and the target simulation pattern; determines the edge placement error corresponding to each edge segment according to the original design deviation value and the mask process deviation value; adjusts the position of the corresponding edge segment according to the edge placement error to obtain a corrected mask pattern. The present invention only simulates the edge segment, which greatly improves the running speed and ensures a high calculation accuracy.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Method and system for layout enhancement based on inter-cell correlation
ActiveUS12607926B2Photomechanical exposure apparatusOriginals for photomechanical treatmentComputer hardwareHidden layer
A method includes: providing a first design layout including a plurality of cells; updating a first cell of the plurality of cells using optical proximity correction to provide a first updated cell and a data set; and updating a second cell from remaining cells in the first design layout based on the data set and a model without involvement of optical proximity correction to provide a second updated cell, wherein the model includes hidden layers including nodes and is trained to obtaining converged values of the nodes of the hidden layers through providing a mapping of edge segments before lithography enhancement and edge segments after lithography enhancement using optical proximity correction, and wherein at least one of the providing, and updating is executed by one or more processors.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
OPC correction method and system, and layout
PendingCN121613671APhotomechanical exposure apparatusOriginals for photomechanical treatmentEdge segmentStructural engineering
The invention provides an OPC correction method and system and a layout, and belongs to the field of semiconductors. The OPC correction method comprises the following steps: providing a layout, wherein the layout comprises a plurality of metal layer patterns; and performing OPC correction on the segmented line segment, expanding the first line edge segment outwards to the periphery of the corner, and shrinking the second line edge segment and the third line edge segment inwards to the interior of the line pattern. According to the method, OPC correction is carried out on the segmented line segments, the first line edge segment is expanded outwards to the periphery of the corner, and the second line edge segment and the third line edge segment are contracted inwards to the interior of the line pattern. When the pattern after OPC is used for manufacturing the photomasks, the distance between the two adjacent photomasks can be increased, so that the photomask manufacturing can be prevented from being restricted by manufacturing process conditions, the photomasks are prevented from generating defects, and the yield of photomask manufacturing is improved.
Owner:CHONGQING XINLIAN MICROELECTRONICS CO LTD
Adjustable modularized electromagnetic shielding structure
The invention provides an adjustable modular electromagnetic shielding structure. The adjustable modular electromagnetic shielding structure comprises a plurality of L-shaped monomer modules, each L-shaped monomer module is composed of a first edge section and a second edge section which are vertically connected with each other, the length of each first edge section is larger than that of each second edge section, and the plurality of L-shaped monomer modules can be mutually spliced to form the modular electromagnetic shielding structure in a two-dimensional space and a three-dimensional space. The adjacent L-shaped monomer modules can generate relative displacement through a driving mechanism, so that the modularized electromagnetic shielding structure is switched between an unfolded state and a folded state. According to the adjustable modular electromagnetic shielding structure provided by the invention, through two-dimensional and three-dimensional orthogonal stacking of the L-shaped monomer modules, multi-dimensional adjustability of the porosity of the electromagnetic shielding structure is realized, and the structure has a self-locking characteristic, is high in stability and modular degree, is convenient to expand and maintain, and is suitable for various electromagnetic shielding application scenes.
Owner:ANHUI AGRICULTURAL UNIVERSITY
Pipe fitting injection molding monitoring method and system
The invention relates to the technical field of image processing, in particular to a pipe fitting injection molding monitoring method and system.The method comprises the steps that a to-be-detected image of an injection molding pipe fitting is obtained, edge detection is conducted on the to-be-detected image, closed edges are screened out, any closed edge serves as a target edge, and the target edge is obtained; dividing the target edge into a plurality of edge sections by using angular points on the target edge, obtaining matched edge sections of the edge sections through translation operation, calculating the translation coincidence degree of the target edge, and calculating the target edge according to the translation coincidence degree of the target edge, the first complexity, the second complexity and the flatness of a connected domain of the target edge. And calculating the probability that the target edge is a defective edge so as to remove the closed edge of which the probability of the corresponding defective edge is smaller than a preset threshold value, and monitoring the abnormality of the injection molding pipe fitting based on the remaining edges. According to the invention, the defect detection accuracy can be improved.
Owner:GKBM XIANYANG PIPELINE TECH
Wafer Edge Tilt and Etch Rate Uniformity
PendingJP2025506022AElectric discharge tubesSemiconductor/solid-state device manufacturingEdge segmentPlasma chamber
[Solution] An edge ring for use in a plasma chamber includes a first pair of edge ring segments, each of the first pair of edge ring segments having a first thickness, and a second pair of edge ring segments, each of the second pair of edge ring segments having a second thickness, each of the first pair of edge ring segments disposed adjacent to each of the second pair of edge ring segments, and each of the second pair of edge ring segments disposed adjacent to each of the first pair of edge ring segments.
Owner:LAM RES CORP
Hot spot layout correction method, device and equipment in mask layout and storage medium
The present application relates to the technical field of mask lithography, and discloses a hot spot layout correction method, device and equipment in a mask layout and a storage medium, the hot spot layout correction method comprises determining a hot spot layout in an initial mask layout; determining the environmental graphic parameters of each contour edge segment in the hot spot layout; constructing a basic optimization objective function according to the edge placement error varying with the displacement amount of the contour edge segment; superimposing an optimization compensation term on the basic optimization objective function according to each environmental graphic parameter to obtain an optimization objective function; optimizing the displacement amount of each contour edge segment according to the optimization objective function to obtain the corrected displacement amount corresponding to each contour edge segment, so as to determine the corrected layout of the hot spot layout. The present application realizes the automatic correction of the hot spot layout without manual operation, improves the correction efficiency of the hot spot layout, and ensures the accuracy and reliability of the correction result.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Positioning method and device, electronic equipment and storage medium
The invention provides a positioning method and device, electronic equipment and a storage medium, and the method comprises the steps: obtaining a to-be-processed product image, extracting an edge image corresponding to the to-be-processed product image, segmenting the edge image to obtain a plurality of sub-edge images, extracting a target edge pixel point corresponding to each sub-edge image, and obtaining a target edge pixel point corresponding to each sub-edge image; based on each target edge pixel point, a first edge line segment and a second edge line segment corresponding to the edge image are constructed, the first edge line segment is not parallel to the second edge line segment, and according to the first edge line segment and the second edge line segment, the corresponding attachment position of the target identification product on the surface of the to-be-processed product is determined. And the target identification product is installed at the attaching position. By adopting the method, the attaching position corresponding to the logo can be accurately positioned, and the installation success rate of the logo is improved.
Owner:HEFEI LCFC INFORMATION TECH
Forming tool, forming device and method for producing a gear on a workpiece
Owner:OSG EX CELL O GMBH
OPC method and method for manufacturing semiconductor device using the same
PendingUS20260118772A1Photomechanical apparatusSemiconductor/solid-state device manufacturingEdge segmentDevice material
Provided is a method for manufacturing a semiconductor device including performing optical proximity correction on a layout. The optical proximity correction includes generating a contour of a target pattern of the layout, generating first to fourth error vectors between the contour and first to fourth edge segments of the target pattern, and generating a correction pattern by sequentially performing a first correction and a second correction on the target pattern. The first correction includes moving the first edge segment on the basis of the first error vector, and moving the second edge segment on the basis of the second error vector. The second correction includes moving the third and fourth edge segments on the basis of a sum of the third error vector and the fourth error vector. The first and second edge segments face each other, and the third and fourth edge segment face each other.
Owner:SAMSUNG ELECTRONICS CO LTD
Pad via hole identifying and positioning method and system
The invention belongs to the technical field of integrated circuit manufacturing and industrial detection, and provides a bonding pad via hole recognition and positioning method and system, and the method comprises the steps: carrying out the preprocessing of a bonding pad image, and extracting a continuous edge segment in the bonding pad image based on an edge detection algorithm; calculating a curvature inner side angle of the continuous edge section, and segmenting the continuous edge section based on the curvature inner side angle to obtain a plurality of arc sections; calculating the rough radius of the arc section; based on a preset radius matching condition and the rough radius pair arc section, if the ratio of the arcs in any arc group is greater than a preset threshold value, calculating the circle center and the radius of the arc group based on triangle fitting, otherwise, calculating the circle center and the radius of the arc group through least square fitting; and verifying the circle center and the radius by adopting a Helmholtz significance criterion pair, and outputting a corresponding circle center coordinate and radius as a via hole positioning result when the verification is passed. The method has better recognition performance, and reduces the misjudgment probability caused by a short arc at the same time.
Owner:GUANGDONG POLYTECHNIC NORMAL UNIV
Graph aware memory allocation
A processor-implemented method includes determining a lifespan of each tensor generated by a deep neural network based on an architecture of the deep neural network. The method also includes allocating memory to each tensor based on lifespan data. The process also allocates the memory based on availability of edge segments in the memory. The memory may be on-chip memory.
Owner:QUALCOMM INC
A method, system, medium, device and terminal for extracting identification documents.
This invention belongs to the field of image segmentation technology and discloses a method, system, medium, device, and terminal for extracting identification documents. The system utilizes an embedded device to acquire multispectral images of the identification document; it models the document image edge segments based on their straight-line geometric properties and infers from the contextual information of the global image; it extracts global image features using a ResNet network and then encodes them using a Deformable DETR encoder; in the first-stage decoding process, it predicts the document edge segments using an attention mechanism and learnable line segment and position queries; in the second-stage decoding process, it compares the correlation between line segment features and image features to predict the relative order between line segments, and obtains the complete edges, vertices, and bounding boxes of the document image through perspective transformation. This invention uses a two-part matching method to predict line segments, avoiding pre- and post-processing, simplifying the detection channel, and achieving true end-to-end processing.
Owner:HUAZHONG UNIV OF SCI & TECH
A deep learning-based forging defect feature recognition method
The application discloses a kind of based on deep learning's forging defect feature identification method, it is related to intelligent manufacturing technical field, the edge pixel coordinates of candidate defect area are read, and edge sequential numbering and edge trend sequence are generated;Three point direction variation is calculated, and curvature transition point is determined according to threshold;With the edge pixel sequence between adjacent curvature transition point generates defect profile segmentation label;The direction variation sequence of edge section, the sequence of internal and external gray difference and the trend of section head and section tail are called, and curvature direction symbol sequence, gray difference synchronous change state and edge section closure trend are generated, and each segmented exclusive selection is selected to stable defect curvature channel, texture interference exclusion channel or to be judged curvature channel, and form edge section level supervision signal.The application can make neural network with defect profile segmentation as supervision unit to carry out channel learning, reduce the feature of real defect boundary and texture, noise edge is mixed, improve the delicacy and explainability of forging defect identification.
Owner:CHONGQING BEIBEI GUOTONG FORGING
A method and apparatus for optical proximity correction
ActiveCN121232545BPhotomechanical exposure apparatusDesign optimisation/simulationIntegrated circuit manufacturingWafering
The present application relates to the field of integrated circuit manufacturing, in particular to an optical proximity correction method and device, by receiving a target wafer pattern; determining a target wafer grid image according to the target wafer pattern according to a preset grid size; taking the target wafer pattern as a current mask pattern; inputting the current mask pattern into a pre-trained three-dimensional optical proximity correction model, and assisting with the grid size to obtain a simulation wafer grid image; calculating the edge height error corresponding to each edge segment; judging whether the edge height error exceeds a preset adjustment threshold; when the edge height error exceeds the preset adjustment threshold, adjusting the position of each edge segment in the corresponding normal direction according to the edge height error to obtain an updated current mask pattern; repeating steps four to seven until the edge height error does not exceed the adjustment threshold. The present application reduces defects such as photoresist height loss and improves product yield.
Owner:HUAXINCHENG (HANGZHOU) TECH CO LTD
Intelligent grading method for procambarus clarkii based on image processing technology
The invention relates to the technical field of image processing, in particular to an intelligent grading method for procambarus clarkii based on an image processing technology. The method comprises the following steps: acquiring a back trunk area and a side trunk area in a back image and a side image of procambarus clarkii; obtaining the contour edge of the back torso area and edge segments in the back torso area, and screening the edge segments to obtain suspected abdominal segment edge segments; the suspected abdominal segment edge section closest to the tail direction and the contour edge of the back trunk area form a suspected tail segment area, then whether the shrimp tail is curled or not is judged, and if yes, a first key point and a second key point are obtained; thirdly, acquiring a third key point and a fourth key point on the contour edge of the side trunk area; and analyzing the edge section between the third key point and the fourth key point to obtain the curling degree of the shrimp tail, further correcting the area of the back trunk area, and judging the grade of the procambarus clarkii according to the corrected area. According to the method, the grading accuracy of the procambarus clarkii can be improved.
Owner:YANCHENG INST OF TECH
Machine vision-based clock spare and accessory part production quality detection method and system
ActiveCN119672021Aavoid interferenceimprove accuracyMachine part testingImage enhancementImaging processingMachine vision
The invention relates to the technical field of image processing, in particular to a clock part production quality detection method and system based on machine vision, and the method comprises the steps: obtaining a gear gray-scale map and the edge thereof, and recording the center of a gear; dividing the edge of the gear grey-scale map into a plurality of edge sections, and obtaining the extension trend of the pixel points in each edge section according to the distance between the adjacent pixel points in each edge section and the center of the gear, so as to divide all the edge sections into tooth top edges and concave edges; screening out tooth groove edges according to the distance between the tooth root point of each concave edge and the center of the gear and the symmetry of the suspected tooth groove edges; and evaluating the gear quality according to the tooth crest edge and the tooth groove edge. By analyzing the difference between the edge of the highlight area generated at the gear groove and the edge of the actual gear groove, the interference of the edge of the highlight area when the gear quality is detected through the edge is avoided, so that the accuracy of detecting the gear quality is improved.
Owner:SHENZHEN GAOJIN IND CO LTD
Image target matching and positioning method, storage medium and computer
The present invention provides an image target matching and positioning method, a storage medium and a computer. The method comprises: converting edge points in a template image into line segments to obtain an edge line segment set, describing each line segment in the obtained edge line segment set to obtain a line segment descriptor; converting edge points in a detection image into line segments to obtain an edge line segment set, describing each line segment in the obtained edge line segment set to obtain a line segment descriptor; matching and screening the line segment descriptors in the template image with the line segment descriptors in the detection image to obtain a pairing relationship between the line segment descriptors in the template image and the line segment descriptors in the detection image; and calculating an affine change matrix between the template image and the detection image based on the pairing relationship between the line segment descriptors in the template image and the detection image to obtain a coordinate mapping relationship between the template image in the detection image.
Owner:DSTEK CO LTD
Microsensor comprising stiffening means on a membrane
PCT designated stageWO2026104213A1Fluid pressure measurement by electric/magnetic elementsPiezoelectric/electrostrictive devicesEdge segmentMembrane surface
The invention relates to a microsensor (10) for measuring a measurement variable, having an edge region (14), at least one membrane (16) having a membrane surface (22) which adjoins the edge region (14), is self-supporting, is spanned by a first main axis (18) and a second main axis (20), and has a total length (26) along the first main axis (18), and which can be deflected in a normal direction (24) of the membrane surface (22) depending on the measurement variable, and stiffening means (34) connected to the membrane surface (22) which are arranged, running along the first main axis (18), at least in a first section (36) between a first edge section (38) of the edge region (14) as far as a centre (40) of the total length (26), and which have a width (52) in the direction of the second main axis (20), wherein the width (52) of the stiffening means (34) increases precisely once at least in a first direction (54) along the first main axis (18), starting from the first edge section (38) to the centre (40), and then decreases again precisely once.
Owner:ROBERT BOSCH GMBH
Diopter parameter analysis model optimization method and system
The invention relates to the technical field of image pattern recognition, in particular to a diopter parameter analysis model optimization method and system, and the method comprises the following steps: collecting image sequence recognition region features, constructing edge segments, judging the structural continuity, executing concurrent recognition and trajectory analysis, and outputting a diopter parameter analysis optimization graph. According to the method, through constructing curvature section and gray vector distribution in an image sequence, extracting continuous features of a boundary structure, screening stable graph frames in combination with inter-frame direction consistency, recording corresponding boundaries by using a dual-channel recognition rhythm alignment mode, establishing a structure difference value and generating an error trajectory graph; the stable nodes are identified based on the offset trend, and the key graph segment is backtracked, so that the restoration coherence and response consistency of the image structure are enhanced, and the expression ability of the graph result to the change characteristics of the crystalline lens and the accuracy of parameter extraction are improved.
Owner:南通诺瞳奕目医疗科技有限公司 +1