Patents
Literature
20 results about "Solution processed" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Preparation method of flexible HZO ferroelectric memristor based on all-solution method
The invention provides a preparation method of a flexible HZO ferroelectric memristor based on an all-solution method. The preparation method comprises the steps that S1, a mica sheet is used as a flexible substrate layer after being cleaned; s2, mixing a graphene conductive coating and ethanol according to a mass ratio of 1: 1000, stirring, carrying out ultrasonic treatment, layering graphene to obtain a mixture, uniformly dispensing the obtained mixture on the upper surface of the flexible substrate layer prepared in the S1, and heating and curing to prepare a bottom electrode layer; s3, mixing and stirring HfCl4 powder, ZrCl4 powder, an ethanol solution and deionized water according to a weight ratio of 1: 1: 10: 5, and performing ultrasonic treatment to obtain an HZO precursor solution; spin-coating the HZO precursor solution on the upper surface of the bottom electrode layer, and performing high-temperature annealing to form a nerve bionic layer; and S4, uniformly coating Pt conductive slurry on the upper surface of the nerve bionic layer prepared in the S3, and heating and curing to form the top electrode. The method effectively overcomes the problems of film forming difficulty and ferroelectric crystal structure regulation and control in the prior art, and has the advantages of simplicity, convenience and low cost.
Owner:NANKAI UNIV
Organic metal halide hybrid scintillators and methods of making
ActiveUS12552987B2X/gamma/cosmic radiation measurmentLuminescent compositionsMetal halidesScintillator
X-ray scintillators based on amorphous organic metal halide hybrid films are demonstrated, which can be prepared via a facile solution processing with a non-crystalline organic halide salt reacting with metal halide at low temperature. The solution processed scintillators exhibit excellent scintillation properties, thermal stability, mechanical resilience, and processability.
Owner:FLORIDA STATE UNIV RES FOUND INC
Solution processing apparatus and solution processing method
To provide a solution treatment apparatus and a solution treatment method which achieve excellent suppression of odor generated in a solution treatment step and suppression of odor generated from dewatered sludge generated in the solution treatment step.SOLUTION: A solution as a processing object is treated by nitrification reaction and denitrification reaction by microorganisms in an environment where alkali-treated sludges and minerals coexist.SELECTED DRAWING: Figure 1
Owner:CANADEVIA CO LTD
Restricted area printing by ink drawing (RAPID) for solution-processed thin films
PendingUS20250324900A1Semiconductor/solid-state device manufacturingMechanical engineeringSolution processed
The present invention relates to an apparatus for printing, and methods of using to prepare printed articles (such as films suitable for use in electronics applications).
Owner:THE ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIV OF ARIZONA
A method for controlling metal impurities on the surface of a silicon wafer
ActiveCN112614789BSemiconductor/solid-state device testing/measurementMaterial analysis by electric/magnetic meansChemical physicsMetal impurities
The present invention relates to a method for controlling metal impurities on the surface of silicon wafers. The method comprises the following steps: providing a silicon wafer; performing a wetting treatment by spraying ultrapure water on the silicon wafer to fully wet the surface of the silicon wafer; drying the silicon wafer with a fully wetted surface; repeating the steps of the wetting treatment and the drying treatment; performing an acid solution treatment by treating the surface of the silicon wafer with an acid solution to obtain a treatment solution; performing an analysis treatment by using ICPMS to analyze the metal ion content in the treatment solution; and a judgment step of comparing the detected metal ion content with a metal pollution lower limit value to judge whether the ultrapure water can continue to clean the silicon wafer. Thus, through this method, the pollution amount of metal ions in the ultrapure water to the silicon wafer can be detected, the relative influence of the increase or decrease of the metal content on the surface of the silicon wafer by the metal ions in the ultrapure water can be determined, and this method also has the advantages of simple operation and high accuracy rate.
Owner:ZHONGHUAN ADVANCED (XUZHOU) SEMICONDUCTOR MATERIALS CO LTD +1
All-solution OLED device and preparation method thereof
The invention relates to the technical field of OLED device preparation, in particular to an all-solution OLED device and a preparation method thereof. The preparation method of the all-solution OLED device comprises the following steps: preparing a hole injection layer and a hole transport layer on the surface of a substrate in sequence; spin-coating a luminescent material solution on the surface of the hole transport layer and then annealing to prepare a luminescent layer; sequentially preparing an electron transport layer, an electron injection layer and a cathode on the surface of the light-emitting layer to obtain an all-solution OLED device; the luminescent material in the luminescent material solution is V-MFCz, V-HFCz or V-SAFCz. According to the invention, the film prepared from V-MFCz, V-HFCz and V-SAFCz through a solution method has excellent photophysical properties, thermal stability and solvent resistance, the preparation of a dark blue light all-solution method non-doped OLED device is realized for the first time, and four organic layers from a hole injection layer to an electron transport layer are continuously deposited through an all-solution process.
Owner:TIANJIN UNIV
Novel multi-component organometallic compound, composition containing same for solution process, and method for manufacturing thin film using same
PendingUS20250197434A1Liquid/solution decomposition chemical coatingGroup 6/16 element organic compoundsPhysical chemistryOptical transducers
Owner:KOREA RES INST OF CHEM TECH
Method of manufacturing an organic light emitting device and organic light emitting device
A method of manufacturing an organic light emitting device and an organic light emitting device are provided. The method includes performing a heat treatment at a set or predetermined temperature range when a solution process is used to form a hole transport layer. When a solution process is used to form an emission layer on the hole transport layer, a mixed layer can be formed to a suitable thickness to improve hole injection into the emission layer. The method can be used to manufacture an organic light emitting device.
Owner:SAMSUNG DISPLAY CO LTD
Solution handling guide device and solution handling method using same
PCT designated stageWO2025159237A1Bioreactor/fermenter combinationsBiological substance pretreatmentsStructural engineeringMechanical engineering
Owner:CELLAMES INC
Treatment solution supply apparatus, reporting method, and storage medium
PendingUS20250116942A1Semiconductor/solid-state device manufacturingPhotomechanical coating apparatusMechanical engineeringSolution processed
Owner:TOKYO ELECTRON LTD
Organic metal halide hybrid scintillators & methods of making
ActiveUS20260035613A1X/gamma/cosmic radiation measurmentLuminescent compositionsMetal halidesScintillator
X-ray scintillators based on amorphous organic metal halide hybrid films are demonstrated, which can be prepared via a facile solution processing with a non-crystalline organic halide salt reacting with metal halide at low temperature. The solution processed scintillators exhibit excellent scintillation properties, thermal stability, mechanical resilience, and processability.
Owner:FLORIDA STATE UNIV RES FOUND INC
Organic metal halide hybrid scintillators and methods of making
PCT designated stageWO2026030550A1Group 5/15 element organic compoundsLuminescent compositionsMetal halidesScintillator
X-ray scintillators based on amorphous organic metal halide hybrid films are demonstrated, which can be prepared via a facile solution processing with a non-crystalline organic halide salt reacting with metal halide at low temperature. The solution processed scintillators exhibit excellent scintillation properties, thermal stability, mechanical resilience, and processability.
Owner:FLORIDA STATE UNIV RES FOUND INC
High-transmission ultra-thin film having efficient broadband radiation and diffuse reflection through application of solution process and manufacturing method therefor
The present invention relates to a high-transmission ultra-thin film and a manufacturing method therefor, the high-transmission ultra-thin film comprising: an absorption layer comprising a conjugated polymer; and a reflection layer comprising inorganic nanoparticles. The present invention can achieve broadband radiation and diffuse reflection characteristics enabling passive reduction of the internal temperature while maintaining transparency by using a water-dispersed organic-inorganic hybrid film based on a transparent and infrared emitting polymer.
Owner:UI (UNIVERSITY IND FOUNDATION) YONSEI UNIVERSITY
Apparatus and methods for solution processing
Equipment, systems, processes and techniques for conducting processing of solutions are described. The techniques can be applied to provide diluted solution (i.e. purified solvent), concentrate solution or each. A variety of specific equipment, example systems and processes are depicted and described.
Owner:SOLUTION DYNAMICS
Pixel unit, manufacturing method thereof and full-color display
The invention discloses a pixel unit which at least comprises a first sub-pixel, a second sub-pixel and a third sub-pixel. Particularly, at least one of the first light-emitting layer and the second light-emitting layer is prepared through a solution process, and the third light-emitting layer is prepared through an evaporation process. The novel pixel units prepared by a specific mixing process can obtain more excellent device performance when being used in a full-color display.
Owner:BEIJING SUMMER SPROUT TECH CO LTD
Path planning method, device, equipment and computer readable storage medium
A path planning method, device, equipment and computer-readable storage medium. The method includes: predetermining a critical path and its length, avoiding repeated calculation of the same critical path in the subsequent solution process, thereby saving computing resources and time. Secondly, in the process of iteratively seeking the optimal solution, the two adjacent nodes with the longest shortest path are determined from the node sequence based on the length of the critical path, and the two adjacent nodes are randomly inserted into the node sequence to obtain a new node sequence. There is a greater probability of generating a node sequence with a lower cost, thereby reducing the number of iterations and improving the efficiency of the algorithm. Through the embodiments of the present application, the solution efficiency of the multi-point logistics distribution path planning problem is significantly improved while taking into account the solution quality, which can well meet the needs of practical applications.
Owner:DONGFENG AUTOMOBILE COMPANY
Substrate processing apparatus and substrate processing method
The substrate is held in place by suction with sufficient force to withstand its rotation while being processed with the processing solution. [Solution] In this invention, the suction area of the chuck body is surrounded by an annular elastic portion of the packing. Before the center of the lower surface of the substrate and the suction area of the chuck body come into contact, the annular elastic portion deforms to follow the lower surface of the substrate while surrounding the center of the lower surface of the substrate, and adheres tightly. As a result, suction leakage is less likely to occur, and the substrate is held in place by the suction area not only when there is no warping, but also when there is warping.
Owner:SCREEN HOLDINGS CO LTD
A flat membrane type evaporation crystallization integrated machine
This utility model discloses a planar film-type evaporation and crystallization integrated machine, belonging to the technical field of evaporation and crystallization equipment. It includes: a stirring tank with a lid on top; an evaporation chamber on one side of the stirring tank; multiple sets of planar evaporation films inside the evaporation chamber; and a stirring assembly inside the stirring tank, comprising bevel gear one, bevel gear two, and bevel gear three. This assembly can stir the solution from different directions and angles, enabling faster and more comprehensive mixing of the solvent and solution, ensuring uniform solute distribution in the solution, providing a stable material basis for subsequent evaporation and crystallization, reducing localized crystallization or differences in crystal quality caused by uneven solution distribution, and allowing for quick installation and removal of the lid. Operators can directly and thoroughly clean the inside of the stirring tank, preventing residual crystals or impurities from affecting subsequent solution processing.
Owner:JIANGYIN JINSHUI MEMBRANE TECH & ENG
Method for processing substrate, kit for processing substrate, and method for manufacturing semiconductor substrate
There are provided a method for processing a substrate in which a surface of a pattern on a substrate is processed, the method including: a first step for processing the surface of the pattern with a first chemical solution, the first chemical solution including a silane coupling agent that has a SP value of Hansen solubility parameter of 15 or more; and a second step for processing the surface of the pattern with a second chemical solution after the first step, the second chemical solution including an anionic or amphoteric surfactant; a kit for processing a substrate; and a method for manufacturing a semiconductor substrate.
Owner:TOKYO OHKA KOGYO CO LTD
Solution-treatable ultra-thin substrates and related techniques
PendingCN119768272AOther chemical processesSynthetic resin layered productsEngineering physicsMaterials science
Concepts, systems, methods, and machines are described for providing devices (e.g., electronic devices) on transferable ultra-thin substrates. The described concepts, systems, methods, and machines may be used to fabricate electronic devices on transferable ultra-thin substrates using solution-based (e.g., wet) processing techniques only. The described concepts, systems, methods, and machines may also be used to fabricate releasable substrates for electronic devices having some desired characteristics. A structure including the device is also described. The structure may include a device, a releasable substrate, and a removable release liner carrier. Systems, methods, and machines for removing a release liner carrier from a releasable substrate and device, for applying a releasable substrate and device to a permanent substrate, and for reusing a release liner carrier to manufacture another device are also described.
Owner:MASSACHUSETTS INST OF TECH