38 results about "Electron-beam technology" patented technology

This invention proposes, among other things, systems and methods for providing ozone generators or plasma generators that generate an electric field in an electron generation chamber that is separate from a reaction chamber. An electron beam emitter in an electron generation chamber is configured to emit a beam of electrons and is separated from the reaction chamber by an electron permeable barrier that provides a window through which the beam of electrons passes. The electrons are accelerated to the required energy in the electron generation chamber and transmitted through the barrier to the reaction chamber, where an input gas source introduces an input gas into the reaction chamber. The input gas may react with the beam of electrons inside the reaction chamber to form an output gas comprising a plasma or a concentration of ozone, and the output gas passes from the reaction chamber to a wafer processing chamber.

The invention discloses a cotton fabric hydrophobic finishing method based on an acrylics-modified silicon ball-electron beam technology, and belongs to the field of functional textiles. The method disclosed by the invention adopts an electron beam radiation technology, the method can react under room temperature, the energy consumption is low, an initiator does not need to be added, the reaction time is short, and the production cost can be obviously reduced; long-chain acrylic acid can be selected and used as monomers, so that the free energy of fabric surface can be obviously reduced, and meanwhile the environment-friendly problem easily generated by a fluorine-containing reagent is avoided; the roughness of the fabric surface can be improved through the addition of modified silicon dioxide, and meanwhile the problem, such as low adhesion caused by pure physical absorption, of silicon dioxide silicon balls is avoided. According to the method in which the lower surface energy is combined and the fabric surface roughness is improved, textiles with high hydrophobic performance are obtained through an electron beam one-step radiation graft polymerization technology.