The invention opens a manufacturing method of the
thin film transistor liquid crystal display array substrate. Including the following steps: first, forms the first
metal film on the substrate; uses the version of the first layer
metal film define the design of the first
metal film and to form grid
scan line and grid
electrode. Next, the first insulating layer, the
active layer,
ohmic contact layer and the second layer metal film were deposited above the
metal grid in turn; The use of the second block
mask, namely, a gray-first definition of the second
mask layer metal film patterns, forms a source of leakage and data scanning lines; Secondly forms the
active layer island and conductive
thin film transistor device channel. Then it forms the second insulation film on the second metal layer. Finally, the use of the third block
mask, that is the second block of gray-definition version of the second
mask layer insulation film, forms a second layer insulation film designs, makes some part of the second layer and the second layer of metal
insulation layer exposed, and the other part was the protection of light-sensitive materials. Here a transparent conductive film deposits on it, and then removes
light sensitive materials and their attachment -the electro-conductive film, finally forms the design of the electric conduction thin film.