4results about How to "Etching precision" patented technology

The application provides a three-dimensional laser etching method based on tire cylindrical coordinates, which establishes a plane design polar coordinate based on the shape characteristics of the tire in the design, gives a reference point coordinate and an etching coordinate polar radius and polar angle, obtains a polar radius deviation value and a polar angle deviation value through operation to determine the relative plane position of the etching point to the reference point; the polar coordinate is established on the tire conveying surface, the polar point is the center of the tire; the polar axis is established in the opposite direction by connecting the polar point and the projection point of the base coordinate origin of the robot in the polar coordinate; the Z axis passes through the polar point, is perpendicular to the polar coordinate plane and faces upward to establish a three-dimensional cylindrical coordinate; based on the three-dimensional coordinate, the robot performs 3D camera scanning and modeling; through calculation of the running coordinate of the sixth axis and the coordinate conversion with the base coordinate of the robot, after the sixth axis center of the robot runs to the second center, the sixth axis is rotated by an angle to perform laser etching.

The embodiment of the present application discloses an exposure device and a combined mask thereof, wherein the combined mask comprises a first metal layer, a plurality of first light transmission holes are formed in the first metal layer; a second metal layer is arranged opposite to the first metal layer, a plurality of second light transmission holes are formed in the second metal layer, and the second light transmission holes are arranged corresponding to the first light transmission holes along an optical axis. The present application filters the oblique light in the light beam through the multiple metal layers, ensures that all the light rays in the light beam propagate along the optical axis direction, increases the parallelism of all the light rays in the light beam, makes the dispersion of the laser beam lower, and further enables the laser beam to perform accurate etching under a large gap. The technical problem that the parallelism of the light path of the current proximity exposure machine is not high in the prior art, the formed laser beam is relatively dispersed, and a lower gap needs to be used is solved.

A semiconductor photoresist composition and a method of forming a pattern using the same are provided. The semiconductor photoresist composition includes an organometallic compound; an alcohol compound substituted with at least one halogen; an alcohol compound not substituted with a halogen; and a solvent. The present application provides a photoresist pattern having excellent line edge roughness and pattern line width.

The invention belongs to the technical field of battery materials, and particularly relates to a coated modified nickel cobalt lithium aluminate positive electrode material as well as a preparation method and application thereof. The lithium nickel cobalt aluminate positive electrode material comprises an inner core and a coating layer coated on the inner core, a is greater than or equal to 1.01 and less than or equal to 1.05, x is greater than or equal to 0.75 and less than or equal to 0.90, y is greater than or equal to 0.05 and less than or equal to 0.20, z is greater than or equal to 0.01 and less than or equal to 0.05, and p is greater than or equal to 0 and less than or equal to 0.05; l comprises one of Mg, Zr, Mo, Ti and Zn; and the tap density of the coated and modified nickel cobalt lithium aluminate positive electrode material is 2.7-3.2 g / cm < 3 >. The coated modified nickel cobalt lithium aluminate positive electrode material provided by the invention has relatively good electronic conductivity and rate capability, and can inhibit lattice collapse caused by phase change under high voltage, reduce intergranular gaps, enhance thermal stability of the material, inhibit capacity fading caused by structure looseness in charge and discharge processes, and prolong the cycle life of a battery.