10results about How to "Etching precision" patented technology

The invention discloses a preparation method of a titanium etching solution, which comprises the following steps: S1, dividing 88.75-96.25 parts of water into three parts of A, B and C according to a volume ratio of 10: 1: 1, and the two parts of B and C are equal in quantity; s2, mixing 2.5-7.5 parts of ferric salt with B parts of water to obtain ferric salt premixed liquid; s3, mixing 1.25-3.75 parts of ammonium bifluoride with C parts of water to obtain an ammonium bifluoride premixed solution; s4, mixing the iron salt premixed solution obtained in the step S2 with the ammonium bifluoride premixed solution obtained in the step S3 to obtain an intermediate mixed solution; and S5, slowly adding the part A of water into the intermediate mixed solution obtained in the step S4, and detecting for multiple times to obtain the final titanium etching solution. According to the invention, on one hand, the etching effect on peptide products is ensured, and on the other hand, environmental pollution and harm to human bodies are reduced.

The present invention relates to an apparatus for processing a substrate and a method for processing a substrate. The inventive concept provides a mask processing apparatus. The mask processing apparatus includes a support unit configured to support and rotate a mask having a first pattern within a plurality of cells thereof and a second pattern outside an area of the plurality of cells; and a heating unit having a laser irradiator for irradiating a laser to a specific area of the mask supported on the support unit; and a controller configured to control the support unit and the heating unit, and wherein the support unit includes a support portion for supporting the mask and a moving stage portion configured to move a position of the support portion, and wherein the controller controls the moving stage portion to thereby change a position of the mask supported on the support portion such that the second pattern is positioned at the specific area.

The invention discloses a composite film etching solution and application thereof in etching of a copper layer and nickel layer composite film, and belongs to the field of chemical etching of electronic equipment. The etching solution comprises the following main components: sulfuric acid, hydrochloric acid, ferric chloride, oxalic acid, hydrogen peroxide, sodium sulfate, glutamic acid and the balance of ultrapure water. The etching solution can be used for etching a copper and nickel composite film, the etched edge is flat and smooth, the taper angle is proper, the etching speed is high, no insoluble substance is generated, the operation is simple, the consumed time is less, and the etching solution is suitable for industrial batch production.

The invention discloses a columnar side-emitting optical fiber diffuser and a manufacturing method thereof. The structure mainly comprises an optical fiber connector, a transmission optical fiber and a dispersion fiber core. One end of the transmission optical fiber is connected with the optical fiber connector, the other end of the transmission optical fiber is connected with the dispersion fiber core, the transmission optical fiber comprises an optical fiber coating layer, an optical fiber cladding layer and an optical fiber core, and the optical fiber cladding layer and the optical fiber coating layer are sequentially coated on the outer surface of the optical fiber core. The outer surface of the dispersion fiber core is sequentially coated with a sapphire powder layer, an optical fiber coating layer and an optical fiber coating layer. The dispersion fiber core is communicated with one end of the fiber core, a lattice structure is etched in the fiber core of the dispersion fiber core through femtosecond laser, the aperture of the lattice structure is gradually increased from the front section to the rear section, the distance between holes is gradually reduced, and the number of the holes is gradually increased. The dispersion fiber core with the lattice structure is formed through femtosecond laser etching, and light signals are uniformly scattered to the side face of the optical fiber, so that the high-precision light scattering effect and the uniformity of output light are ensured.

The embodiment of the invention relates to a parameter updating method of a simulation model, a simulation method, electronic equipment and a medium. The parameter updating method of the simulation model comprises the following steps: determining a simulation value of the final height of the bottom of the etched groove based on each time step and a corresponding etching rate; an updated value of a parameter related to an etch rate of the trench is determined based on a comparison of the emulation value and a target value such that a difference between the emulation value corresponding to the updated value of the parameter and the target value becomes small. According to the technical scheme, a high-precision simulation model is provided, and the etching process in the semiconductor technology can be accurately simulated.

The invention provides a tire cylindrical coordinate-based three-dimensional laser etching method, which comprises the following steps of: establishing a plane design polar coordinate during design based on the appearance characteristics of a tire, giving a polar radius and a polar angle of a reference point coordinate and an etching coordinate, and obtaining a polar radius deviation value and a polar angle deviation value through operation; the relative plane position from the etching point to the reference point is determined; establishing polar coordinates on the tire conveying surface, wherein the pole is the circle center of the tire; establishing a polar axis in a reverse direction by connecting the pole and a projection point of the origin of the base coordinate of the robot in the polar coordinate; the Z axis passes through the pole, the vertical polar coordinate plane faces upwards, and three-dimensional cylindrical coordinates are established; based on the three-dimensional coordinates, the robot carries out 3D camera scanning and modeling; and after the center of the sixth axis of the robot moves to the second center, the sixth axis rotates by an angle to carry out laser etching by calculating the operation coordinate of the sixth axis and coordinate transformation of the base coordinate of the robot.

The application provides a three-dimensional laser etching method based on tire cylindrical coordinates, which establishes a plane design polar coordinate based on the shape characteristics of the tire in the design, gives a reference point coordinate and an etching coordinate polar radius and polar angle, obtains a polar radius deviation value and a polar angle deviation value through operation to determine the relative plane position of the etching point to the reference point; the polar coordinate is established on the tire conveying surface, the polar point is the center of the tire; the polar axis is established in the opposite direction by connecting the polar point and the projection point of the base coordinate origin of the robot in the polar coordinate; the Z axis passes through the polar point, is perpendicular to the polar coordinate plane and faces upward to establish a three-dimensional cylindrical coordinate; based on the three-dimensional coordinate, the robot performs 3D camera scanning and modeling; through calculation of the running coordinate of the sixth axis and the coordinate conversion with the base coordinate of the robot, after the sixth axis center of the robot runs to the second center, the sixth axis is rotated by an angle to perform laser etching.

The embodiment of the present application discloses an exposure device and a combined mask thereof, wherein the combined mask comprises a first metal layer, a plurality of first light transmission holes are formed in the first metal layer; a second metal layer is arranged opposite to the first metal layer, a plurality of second light transmission holes are formed in the second metal layer, and the second light transmission holes are arranged corresponding to the first light transmission holes along an optical axis. The present application filters the oblique light in the light beam through the multiple metal layers, ensures that all the light rays in the light beam propagate along the optical axis direction, increases the parallelism of all the light rays in the light beam, makes the dispersion of the laser beam lower, and further enables the laser beam to perform accurate etching under a large gap. The technical problem that the parallelism of the light path of the current proximity exposure machine is not high in the prior art, the formed laser beam is relatively dispersed, and a lower gap needs to be used is solved.

A semiconductor photoresist composition and a method of forming a pattern using the same are provided. The semiconductor photoresist composition includes an organometallic compound; an alcohol compound substituted with at least one halogen; an alcohol compound not substituted with a halogen; and a solvent. The present application provides a photoresist pattern having excellent line edge roughness and pattern line width.

The invention belongs to the technical field of battery materials, and particularly relates to a coated modified nickel cobalt lithium aluminate positive electrode material as well as a preparation method and application thereof. The lithium nickel cobalt aluminate positive electrode material comprises an inner core and a coating layer coated on the inner core, a is greater than or equal to 1.01 and less than or equal to 1.05, x is greater than or equal to 0.75 and less than or equal to 0.90, y is greater than or equal to 0.05 and less than or equal to 0.20, z is greater than or equal to 0.01 and less than or equal to 0.05, and p is greater than or equal to 0 and less than or equal to 0.05; l comprises one of Mg, Zr, Mo, Ti and Zn; and the tap density of the coated and modified nickel cobalt lithium aluminate positive electrode material is 2.7-3.2 g / cm < 3 >. The coated modified nickel cobalt lithium aluminate positive electrode material provided by the invention has relatively good electronic conductivity and rate capability, and can inhibit lattice collapse caused by phase change under high voltage, reduce intergranular gaps, enhance thermal stability of the material, inhibit capacity fading caused by structure looseness in charge and discharge processes, and prolong the cycle life of a battery.