The invention provides a groove type
JFET device of a
wide band gap material and a preparation method of the groove type
JFET device. The device includes: a
cell region trench; a cellular area platform; a plurality of transition region trenches; a plurality of transition zone platforms; the source region is formed at the top of the cellular region platform; the
cell region gate region is formed in the epitaxial layer on the side wall and the bottom of the
cell region groove, and the transition region gate region is formed in the epitaxial layer on the side wall and the bottom of the transition region groove; the source
electrode metal covers the top of the source region; the cellular region gate
metal covers the bottom of the cellular region groove, and the transition region gate first
metal covers the bottom of the transition region groove; the
cell region gate metal and the transition region gate first metal form
interconnection at the bottom of the groove; the transition region gate second contact metal covers the top of the transition region platform and is arranged in a floating manner. The device is high in reliability and low in
etching difficulty.